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    • 61. 发明授权
    • Master cylinder
    • 主缸
    • US4744219A
    • 1988-05-17
    • US898802
    • 1986-08-21
    • Kouji YamamotoHiroaki Takeuchi
    • Kouji YamamotoHiroaki Takeuchi
    • B60T11/224B60T11/08
    • B60T11/224
    • A master cylinder has a piston slidably fitted in a stepped cylinder bore including a first pressure chamber connected through a coupling hole to a reservoir. When a fluid pressure in the first pressure chamber is increased to a predetermined level at the time the piston is moved forward, a second valve disposed in the coupling hole is opened to release a fluid pressure from the first pressure chamber into the reservoir. When a negative pressure is developed in the first pressure chamber as the piston is moved back, a first valve in the coupling hole is opened to supply a fluid from the reservoir into the first pressure chamber. The first valve comprises an annular plate fixedly mounted in the coupling hole, a valve body housing the second valve and disposed concentrically with respect to the plate, a spring disposed between an upper portion of the valve body and an upper portion of the plate, and seal member fixed to a lower portion of the plate, the valve body having a flange engageable with the seal member.
    • 主缸具有可滑动地装配在阶梯式气缸孔中的活塞,其包括通过联接孔连接到储存器的第一压力室。 当在第一压力室中的流体压力在活塞向前移动时增加到预定水平时,设置在联接孔中的第二阀被打开以将流体压力从第一压力室释放到储存器中。 当活塞向后移动时在第一压力室中产生负压,打开联接孔中的第一阀,以将流体从储存器供应到第一压力室中。 第一阀包括固定地安装在联接孔中的环形板,容纳第二阀并相对于板同心设置的阀体,设置在阀体的上部和板的上部之间的弹簧,以及 密封构件固定到板的下部,阀体具有可与密封构件接合的凸缘。
    • 62. 发明授权
    • Master cylinder
    • 主缸
    • US4483145A
    • 1984-11-20
    • US335248
    • 1981-12-28
    • Hiroaki TakeuchiHiroshi KawaguchiKiyoshi NishiwakiFujio TobaYoshihisa Nomura
    • Hiroaki TakeuchiHiroshi KawaguchiKiyoshi NishiwakiFujio TobaYoshihisa Nomura
    • B60T11/20B60T11/22B60T11/224B60T17/22B60T11/28
    • B60T11/20B60T11/22B60T11/224B60T17/225
    • A master cylinder is provided on the cylinder body with a reservoir-receiving mouth formed near the border of the section of of a large diameter and the section of a small diameter of a stepped bore, a through hole being formed between the bottom surface of the reservoir-receiving mouth and the first pressure chamber, a compensation hole being formed between the bottom surface of the reservoir-receiving mouth and the second pressure chamber, a valve seat fitted in and fixed to the reservoir-receiving mouth and having an internal hole formed therein, a check valve provided within the reservoir-receiving mouth between the bottom surface of the reservoir-receiving mouth and the valve seat with the valve element being pressed against a resilient member fixed to the valve seat by means of a spring, a projecting member protruding into the first pressure chamber through the through hole provided for the valve element coaxially with the valve element so that the valve element is titlted to form a passage between the valve element and the resilient member by engagement of the piston section of a small diameter of the stepped piston with the projecting member while the stepped piston is at a return position, and the valve element including a passage formed therein through which the first pressure chamber communicates with the reservoir via the internal hole formed in the valve seat and an relief valve for maintaining the passage closed until the effective pressure within the first pressure chamber reaches a predetermined value.
    • 主缸在缸体上设置有在大直径部分的边界附近形成的储存器接收口和小直径的阶梯孔的部分,通孔形成在缸体的底表面之间, 储液器容纳口和第一压力室,在储液口接纳口的底面和第二压力室之间形成有补偿孔,安装在储存容纳口上并固定于贮存容纳口的阀座,形成有内孔 其中设置在储存器容纳口的底部表面和储存器容纳口的阀座之间的止回阀通过弹簧压靠在固定到阀座的弹性构件上,该弹性构件通过弹簧压靠在阀座上,突出构件 通过与阀元件同轴地设置的阀元件的通孔突出到第一压力室中,使得阀元件被倾斜以用于 通过所述阶梯式活塞的小直径的活塞部分与所述突出构件的接合而在所述阀元件和所述弹性构件之间通过,同时所述阶梯式活塞处于返回位置,并且所述阀元件包括形成在其中的通道, 第一压力室通过形成在阀座中的内孔与储存器连通,并且用于保持通道关闭的安全阀直到第一压力室内的有效压力达到预定值。
    • 70. 发明授权
    • Plasma processing method
    • 等离子体处理方法
    • US06936310B1
    • 2005-08-30
    • US09541089
    • 2000-03-31
    • Hiroaki TakeuchiTohru Okuda
    • Hiroaki TakeuchiTohru Okuda
    • B05D3/06B05D3/14B05D7/24C23C16/50H05H1/46
    • H01J37/32082B05D1/62B05D3/141C23C16/50
    • In a plasma processing method making use of a plasma processing gas of a reactant gas and an inert gas, it is aimed at enhancing an efficiency of use of high-frequency power and a reactant gas to increase a processing rate. The plasma processing method comprises supplying high frequency power to an electrode 2 opposed to a substrate 6 to thereby generate plasma between the electrode 2 and the substrate 6 on the basis of a plasma processing gas comprising a reactant gas and an inert gas to perform film formation, etching, surface treatment or the like on the substrate 6, pressure P(Torr) of the plasma processing gas being set to satisfy the following relationship 2×10−7(Torr/Hz)×f(Hz)≦P(Torr)≦500(Torr) where f(Hz) is a frequency of high frequency power.
    • 在利用反应气体和惰性气体的等离子体处理气体的等离子体处理方法中,旨在提高使用高频电力和反应气体的效率,以提高处理速度。 等离子体处理方法包括向与基板6相对的电极2提供高频电力,从而基于包括反应气体和惰性气体的等离子体处理气体在电极2和基板6之间产生等离子体,以进行成膜 ,蚀刻,表面处理等,等离子体处理气体的压力P(Torr)被设定为满足以下关系:2×10 -7(Torr / Hz)×f(Hz) = P(Torr)<= 500(Torr)其中f(Hz)是高频功率的频率。