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    • 61. 发明授权
    • Active pixel sensor cell with integrating varactor and method for using such cell
    • 具有积分变容二极管的有源像素传感器单元和使用这种单元的方法
    • US07102117B2
    • 2006-09-05
    • US10863058
    • 2004-06-08
    • Peter J. HopperPhilipp LindorferMark W. PoulterYuri Mirgorodski
    • Peter J. HopperPhilipp LindorferMark W. PoulterYuri Mirgorodski
    • H01L27/00
    • H01L27/14609H04N5/35572H04N5/361H04N5/37452
    • An active pixel sensor cell including at least one photodiode and reset circuitry and an integrating varactor coupled to the photodiode, a method for reading out such a cell, and an image sensor including an array of such cells. The photodiode can be exposed to photons during an exposure interval to accumulate a sequence of subexposure charges at a first node of the photodiode. Each of the subexposure charges accumulates at the first node during a different subexposure interval of the exposure interval. The photodiode is reset during each of a sequence of reset intervals, each reset interval occurring before a different one of the subexposure intervals. An output signal indicative of an exposure charge accumulated at the storage node during the exposure interval can be asserted from the cell, where the exposure charge is indicative of a sum of all the subexposure charges.
    • 包括至少一个光电二极管和复位电路的有源像素传感器单元和耦合到光电二极管的积分变容二极管,用于读出这样的单元的方法以及包括这种单元阵列的图像传感器。 在曝光间隔期间,可以将光电二极管暴露于​​光子,以在光电二极管的第一节点处累积次曝光电荷序列。 在曝光间隔的不同子曝光间隔期间,每个次曝光电荷在第一节点处累积。 在每个复位间隔的每一个期间复位光电二极管,每个复位间隔发生在不同的次曝光间隔之前。 指示在曝光间隔期间在存储节点处累积的曝光电荷的输出信号可以从单元断言,其中曝光电荷指示所有次曝光电荷的总和。
    • 63. 发明申请
    • Active pixel sensor cell with integrating varactor and method for using such cell
    • 具有积分变容二极管的有源像素传感器单元和使用这种单元的方法
    • US20050269482A1
    • 2005-12-08
    • US10863058
    • 2004-06-08
    • Peter HopperPhilipp LindorferMark PoulterYuri Mirgorodski
    • Peter HopperPhilipp LindorferMark PoulterYuri Mirgorodski
    • H01L27/146H04N5/353H04N5/361H04N5/3745H01L27/00
    • H01L27/14609H04N5/35572H04N5/361H04N5/37452
    • An active pixel sensor cell including at least one photodiode and reset circuitry and an integrating varactor coupled to the photodiode, a method for reading out such a cell, and an image sensor including an array of such cells. The photodiode can be exposed to photons during an exposure interval to accumulate a sequence of subexposure charges at a first node of the photodiode. Each of the subexposure charges accumulates at the first node during a different subexposure interval of the exposure interval. The photodiode is reset during each of a sequence of reset intervals, each reset interval occurring before a different one of the subexposure intervals. An output signal indicative of an exposure charge accumulated at the storage node during the exposure interval can be asserted from the cell, where the exposure charge is indicative of a sum of all the subexposure charges.
    • 包括至少一个光电二极管和复位电路的有源像素传感器单元和耦合到光电二极管的积分变容二极管,用于读出这样的单元的方法以及包括这种单元阵列的图像传感器。 在曝光间隔期间,可以将光电二极管暴露于​​光子,以在光电二极管的第一节点处累积次曝光电荷序列。 在曝光间隔的不同子曝光间隔期间,每个次曝光电荷在第一节点处累积。 在每个复位间隔的每一个期间复位光电二极管,每个复位间隔发生在不同的次曝光间隔之前。 指示在曝光间隔期间在存储节点处累积的曝光电荷的输出信号可以从单元断言,其中曝光电荷指示所有次曝光电荷的总和。
    • 64. 发明授权
    • Fabrication of semiconductor structure having N-channel channel-junction field-effect transistor
    • 具有N沟道沟道结场效应晶体管的半导体结构的制造
    • US07595243B1
    • 2009-09-29
    • US11495225
    • 2006-07-28
    • Constantin BuluceaPhilipp Lindorfer
    • Constantin BuluceaPhilipp Lindorfer
    • H01L21/8236
    • H01L21/823807H01L21/26586H01L27/0883H01L27/0928H01L29/1041H01L29/105H01L29/665H01L29/7833
    • A semiconductor technology combines a normally off n-channel channel-junction insulated-gate field-effect transistor (“IGFET”) (104) and an n-channel surface-channel IGFET (100 or 160) to reduce low-frequency 1/f noise. The channel-junction IGFET is normally fabricated to be of materially greater gate dielectric thickness than the surface-channel IGFET so as to operate across a greater voltage range than the surface-channel IGFET. A p-channel surface-channel IGFET (102 or 162), which is typically fabricated to be of approximately the same gate-dielectric thickness as the n-channel surface-channel IGFET, is preferably combined with the two n-channel IGFETs to produce a complementary-IGFET structure. A further p-channel IGFET (106, 180, 184, or 192), which is typically fabricated to be of approximately the same gate dielectric thickness as the n-channel channel-junction IGFET, is also preferably included. The further p-channel IGFET can be a surface-channel or channel-junction device.
    • 半导体技术结合了正常n沟道沟道结绝缘栅场效应晶体管(“IGFET”)(104)和n沟道表面沟道IGFET(100或160),以降低低频1 / f 噪声。 沟道结IGFET通常被制造为具有比表面沟道IGFET大得多的栅介质厚度,以便在比表面沟道IGFET更大的电压范围内工作。 典型地制造为与n沟道表面沟道IGFET大致相同的栅介质厚度的p沟道表面沟道IGFET(102或162)优选地与两个n沟道IGFET组合以产生 互补IGFET结构。 还优选包括通常被制造为具有与n沟道沟道结IGFET大致相同的栅介质厚度的另外的p沟道IGFET(106,180,184或192)。 另外的p沟道IGFET可以是表面沟道或沟道结器件。
    • 66. 发明授权
    • Apparatus for high sensitivity, low lag, high voltage swing in a pixel cell with an electronic shutter
    • 用于具有电子快门的像素单元中的高灵敏度,低滞后,高电压摆幅的装置
    • US06720592B1
    • 2004-04-13
    • US09895803
    • 2001-06-29
    • Willem Johannes KindtPhilipp Lindorfer
    • Willem Johannes KindtPhilipp Lindorfer
    • H01L27148
    • H01L27/14601
    • The present invention is directed to a photogate based pixel cell with an electronic shutter and which provides relatively low lag and high sensitivity for sensing infrared light reflected from objects. Additionally, this invention eliminates the need for a transfer gate in the pixel cell. In one embodiment, the reset and shutter transistors are implemented with PMOS transistors so that the pixel cell can have an increased dynamic range and a relatively high voltage swing. In another embodiment, the actual size of each pixel cell can be further reduced when the reset gate and the electronic shutter are implemented with NMOS transistors. Also, when a P− well is not disposed beneath the photogate, the ability of the pixel cell to sense infrared light is improved. Correlated double sampling can be used to improve the accuracy of the signal read out from the pixel cell.
    • 本发明涉及一种具有电子快门的基于光栅的像素单元,其提供用于感测从物体反射的红外光的相对较低的滞后和高灵敏度。 另外,本发明消除了对像素单元中的传输门的需要。 在一个实施例中,复位和快门晶体管由PMOS晶体管实现,使得像素单元可以具有增加的动态范围和相对高的电压摆幅。 在另一个实施例中,当复位门和电子快门用NMOS晶体管实现时,可以进一步减小每个像素单元的实际尺寸。 此外,当P-阱不设置在光栅下方时,像素单元感测红外光的能力得到改善。 可以使用相关的双重采样来提高从像素单元读出的信号的精度。
    • 68. 发明授权
    • Configuration and fabrication of semiconductor structure having n-channel channel-junction field-effect transistor
    • 具有n沟道沟道结场效应晶体管的半导体结构
    • US07176530B1
    • 2007-02-13
    • US10803203
    • 2004-03-17
    • Constantin BuluceaPhilipp Lindorfer
    • Constantin BuluceaPhilipp Lindorfer
    • H01L29/76
    • H01L21/823807H01L21/26586H01L27/0883H01L27/0928H01L29/1041H01L29/105H01L29/665H01L29/7833
    • A semiconductor technology combines a normally off n-channel channel-junction insulated-gate field-effect transistor (“IGFET”) (104) and an n-channel surface-channel IGFET (100 or 160) to reduce low-frequency 1/f noise. The channel-junction IGFET is normally of materially greater gate dielectric thickness than the surface-channel IGFET so as to operate across a greater voltage range than the surface-channel IGFET. Alternatively or additionally, the channel-junction IGFET may conduct current through a field-induced surface channel. A p-channel surface-channel IGFET (102 or 162), which is typically of approximately the same gate-dielectric thickness as the n-channel surface-channel IGFET, is preferably combined with the two n-channel IGFETs to produce a complementary-IGFET structure. A further p-channel IGFET (106, 180, 184, or 192), which is typically of approximately the same gate dielectric thickness as the n-channel channel-junction IGFET, is also preferably included. The further p-channel IGFET can be a surface-channel or channel-junction device.
    • 半导体技术结合了正常n沟道沟道结绝缘栅场效应晶体管(“IGFET”)(104)和n沟道表面沟道IGFET(100或160),以降低低频1 / f 噪声。 沟道结IGFET通常具有比表面沟道IGFET大得多的栅介质厚度,以便在比表面沟道IGFET更大的电压范围内工作。 或者或另外,通道结IGFET可以传导电流通过场诱导的表面通道。 通常与n沟道表面沟道IGFET大致相同的栅介质厚度的p沟道表面沟道IGFET(102或162)优选与两个n沟道IGFET组合, IGFET结构。 还优选包括通常具有与n沟道沟道结IGFET大致相同的栅介质厚度的另外的p沟道IGFET(106,180,184或192)。 另外的p沟道IGFET可以是表面沟道或沟道结器件。