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61. 发明申请

US20080181363A1 Surface topography with X-ray reflection phase-contrast microscopy 审中-公开
标题翻译：表面形貌与X射线反射相差显微镜
公开(公告)号：US20080181363A1
公开(公告)日：2008-07-31
申请号：US11657805
申请日：2007-01-25
申请人： Paul Fenter , Wenbing Yun
发明人： Paul Fenter , Wenbing Yun
IPC分类号： G01N23/20
CPC分类号： G01N23/20
摘要： A system and method for monitoring a surface or interfacial area. The system and method includes an intense X-ray beam directed to a surface or interface at a low angle to achieve specular reflection with phase contrast associated with an event, such as changing topography, chemistry or magnetic state being detected by a CCD. Upstream or downstream processing can be carried out with the X-ray phase contrast system.
摘要翻译：用于监测表面或界面区域的系统和方法。该系统和方法包括以低角度指向表面或界面的强烈X射线束，以实现与诸如由CCD检测到的地形，化学或磁状态的事件相关联的相位对比的镜面反射。上游或下游处理可以用X射线相位对比系统进行。

62. 发明授权

US07183547B2 Element-specific X-ray fluorescence microscope and method of operation 有权
公开(公告)号：US07183547B2
公开(公告)日：2007-02-27
申请号：US10995642
申请日：2004-11-23
申请人： Wenbing Yun , Kenneth W. Nill
发明人： Wenbing Yun , Kenneth W. Nill
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： B82Y10/00 , G01N23/223 , G01N2223/076 , G21K1/062
摘要： An element-specific imaging technique utilizes the element-specific fluorescence X-rays that are induced by primary ionizing radiation. The fluorescence X-rays from an element of interest are then preferentially imaged onto a detector using an optical train. The preferential imaging of the optical train is achieved using a chromatic lens in a suitably configured imaging system. A zone plate is an example of such a chromatic lens; its focal length is inversely proportional to the X-ray wavelength. Enhancement of preferential imaging of a given element in the test sample can be obtained if the zone plate lens itself is made of a compound containing substantially the same element. For example, when imaging copper using the Cu La spectral line, a copper zone plate lens is used. This enhances the preferential imaging of the zone plate lens because its diffraction efficiency (percent of incident energy diffracted into the focus) changes rapidly near an absorption line and can be made to peak at the X-ray fluorescence line of the element from which it is fabricated. In another embodiment, a spectral filter, such as a multilayer optic or crystal, is used in the optical train to achieve preferential imaging in a fluorescence microscope employing either a chromatic or an achromatic lens.

63. 发明申请

US20050109936A1 Element-specific X-ray fluorescence microscope and method of operation 有权
标题翻译：元素特异性X射线荧光显微镜及其操作方法
公开(公告)号：US20050109936A1
公开(公告)日：2005-05-26
申请号：US10995642
申请日：2004-11-23
申请人： Wenbing Yun , Kenneth Nill
发明人： Wenbing Yun , Kenneth Nill
IPC分类号： G01N23/223 , G01N23/225 , G21K1/06 , G21K3/00 , G21K7/00 , H01J37/12 , H01J37/244 , G01N23/00
CPC分类号： B82Y10/00 , G01N23/223 , G01N2223/076 , G21K1/062
摘要： An element-specific imaging technique utilizes the element-specific fluorescence X-rays that are induced by primary ionizing radiation. The fluorescence X-rays from an element of interest are then preferentially imaged onto a detector using an optical train. The preferential imaging of the optical train is achieved using a chromatic lens in a suitably configured imaging system. A zone plate is an example of such a chromatic lens; its focal length is inversely proportional to the X-ray wavelength. Enhancement of preferential imaging of a given element in the test sample can be obtained if the zone plate lens itself is made of a compound containing substantially the same element. For example, when imaging copper using the Cu La spectral line, a copper zone plate lens is used. This enhances the preferential imaging of the zone plate lens because its diffraction efficiency (percent of incident energy diffracted into the focus) changes rapidly near an absorption line and can be made to peak at the X-ray fluorescence line of the element from which it is fabricated. In another embodiment, a spectral filter, such as a multilayer optic or crystal, is used in the optical train to achieve preferential imaging in a fluorescence microscope employing either a chromatic or an achromatic lens.
摘要翻译：元素特异性成像技术利用由初级电离辐射诱导的元素特异性荧光X射线。然后使用光学列车将来自感兴趣元素的荧光X射线优先成像到检测器上。使用适当配置的成像系统中的色差透镜实现光学列表的优选成像。区域板是这种彩色透镜的示例; 其焦距与X射线波长成反比。如果区域透镜本身由含有基本上相同的元素的化合物制成，则可以获得对测试样品中给定元素的优先成像的增强。例如，当使用Cu La光谱线成像铜时，使用铜带平板透镜。这增强了带状透镜的优选成像，因为它的衍射效率（衍射到聚焦中的入射能量的百分比）在吸收线附近快速变化，并且可以在其所在元素的X射线荧光线处达到峰值制造。在另一个实施例中，在光学系列中使用光谱滤光器，例如多层光学元件或晶体，以在使用有色或无色透镜的荧光显微镜中实现优先成像。

64. 发明授权

US06815363B2 Method for nanomachining high aspect ratio structures 失效
标题翻译：纳米加工高纵横比结构的方法
公开(公告)号：US06815363B2
公开(公告)日：2004-11-09
申请号：US09927428
申请日：2001-08-09
申请人： Wenbing Yun , John Spence , Howard A. Padmore , Alastair A. MacDowell , Malcolm R. Howells
发明人： Wenbing Yun , John Spence , Howard A. Padmore , Alastair A. MacDowell , Malcolm R. Howells
IPC分类号： H01L21302
CPC分类号： B81C1/00619 , B81C1/00595 , B81C2201/0143
摘要： A nanomachining method for producing high-aspect ratio precise nanostructures. The method begins by irradiating a wafer with an energetic charged-particle beam. Next, a layer of patterning material is deposited on one side of the wafer and a layer of etch stop or metal plating base is coated on the other side of the wafer. A desired pattern is generated in the patterning material on the top surface of the irradiated wafer using conventional electron-beam lithography techniques. Lastly, the wafer is placed in an appropriate chemical solution that produces a directional etch of the wafer only in the area from which the resist has been removed by the patterning process. The high mechanical strength of the wafer materials compared to the organic resists used in conventional lithography techniques with allows the transfer of the precise patterns into structures with aspect ratios much larger than those previously achievable.
摘要翻译：用于生产高纵横比精确纳米结构的纳米加工方法。该方法通过用能量带电粒子束照射晶片开始。接下来，在晶片的一侧上沉积图案材料层，并且在晶片的另一侧上涂覆有一层蚀刻停止层或金属电镀底座。使用常规电子束光刻技术在照射晶片的顶表面上的图形材料中产生期望的图案。最后，将晶片放置在合适的化学溶液中，仅在通过图案化工艺除去抗蚀剂的区域中产生晶片的定向蚀刻。与常规光刻技术中使用的有机抗蚀剂相比，晶片材料的高机械强度允许将精确图案转移到具有比先前可实现的更高的纵横比的结构。

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