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    • 61. 发明授权
    • Vertical fuse structure for integrated circuits containing an exposure window in the layer over the fuse structure to facilitate programming thereafter
    • 用于集成电路的垂直熔丝结构,其在熔丝结构的层中包含曝光窗口,以便于之后进行编程
    • US06486527B1
    • 2002-11-26
    • US09344613
    • 1999-06-25
    • John MacPhersonJayaraman IyerAlan H. HugginsJohn S. StarzynskiKeith R. ErbDennis L. Lantz, Jr.
    • John MacPhersonJayaraman IyerAlan H. HugginsJohn S. StarzynskiKeith R. ErbDennis L. Lantz, Jr.
    • H01L2900
    • H01L23/5256H01L2924/0002H01L2924/00
    • According to the present invention, after manufacture of a disconnect fuse circuit, windows are opened in the insulating film overlying the second interconnect layer at all possible disconnection points, the disconnection points preferably being an exposure window that is aligned over a disconnect fuse circuit that includes a via that electrically connects electrical conductors disposed on different respective layers. This insulating film may consist of one or more layers of one or more materials, but preferentially consists of a single layer of silicon oxide. The wafer is then stored for later configuration. When the wafer is to be configured, a non-precision mask is manufactured. The wafer is coated with photoresist and patterned using the mask to produce disconnection holes in the photoresist at the desired disconnection points. Since the area over the desired disconnection points are free of the insulating film overlying the second patterned interconnect layer, the etching process can be limited to etch techniques which are optimized to etch metal with selectivity to the insulating film. The areas at the disconnection sites that are covered by the insulating film are further protected during the etch process, since the insulating film acts as an etch barrier to inhibit the etching of active circuit elements in proximity to the desired disconnect points.
    • 根据本发明,在断开保险丝电路的制造之后,在所有可能的断开点处在覆盖第二互连层的绝缘膜中打开窗口,断开点优选地是在断开熔丝电路上对准的曝光窗口, 通孔,其电连接设置在不同的各层上的电导体。 该绝缘膜可由一层或多层一层或多层材料组成,但优选由单层氧化硅组成。 然后将晶片存储以供稍后配置。 当要构造晶片时,制造非精密掩模。 晶片用光刻胶涂覆,并使用掩模进行图案化,以在期望的断开点处在光致抗蚀剂中产生断开孔。 由于期望的断开点上的区域没有覆盖第二图案化互连层的绝缘膜,所以蚀刻工艺可以限于蚀刻技术,其被优化以蚀刻具有对绝缘膜的选择性的金属。 在绝缘膜被覆盖的断开位置处的区域在蚀刻工艺期间被进一步保护,因为绝缘膜用作蚀刻阻挡层,以阻止在期望的断开点附近蚀刻有源电路元件。
    • 66. 发明申请
    • SYSTEM AND METHOD FOR PROVIDING MOBILITY IN A NETWORK ENVIRONMENT
    • 在网络环境中提供移动性的系统和方法
    • US20100325714A1
    • 2010-12-23
    • US12488151
    • 2009-06-19
    • Jayaraman IyerAnand Padmanabha Iyer
    • Jayaraman IyerAnand Padmanabha Iyer
    • H04L9/32H04W84/02G06F21/00
    • H04W12/06H04L63/162H04W8/26H04W84/02H04W92/02
    • A method is provided in one example embodiment and includes providing an Internet Protocol (IP) address based on an authentication request associated with a device, the authentication request being associated with a Wi-Fi protocol. The method also includes identifying a Wi-Fi event associated with the IP address, and mapping the Wi-Fi event to a WiMax event. Further, the method includes providing a WiMax message, which is based on the Wi-Fi event, to a network element. In other embodiments, the mapping further includes converting the Wi-Fi event to the WiMax message such that the WiMax message is presented to the network element in a WiMax format. The same IP address can be used for both the Wi-Fi event and the WiMax message. In yet other embodiments, the method includes communicating a disconnection request to the network element when the device moves from a Wi-Fi coverage area to a WiMax coverage area, mapping a new WiMax event to a new Wi-Fi event, and providing a Wi-Fi message, which is based on the new WiMax event, to the device.
    • 在一个示例实施例中提供了一种方法,并且包括基于与设备相关联的认证请求来提供因特网协议(IP)地址,认证请求与Wi-Fi协议相关联。 该方法还包括识别与IP地址相关联的Wi-Fi事件,以及将Wi-Fi事件映射到WiMax事件。 此外,该方法包括向网络元件提供基于Wi-Fi事件的WiMax消息。 在其他实施例中,映射还包括将Wi-Fi事件转换为WiMax消息,使得WiMax消息以WiMax格式呈现给网络元件。 Wi-Fi事件和WiMax消息都可以使用相同的IP地址。 在其他实施例中,该方法包括当设备从Wi-Fi覆盖区域移动到WiMax覆盖区域时向网络单元传送断开请求,将新的WiMax事件映射到新的Wi-Fi事件,以及提供Wi -Fi消息,这是基于新的WiMax事件,到设备。
    • 68. 发明申请
    • Mobile network backward compatibility support
    • 移动网络向后兼容支持
    • US20080043698A1
    • 2008-02-21
    • US11504864
    • 2006-08-16
    • Jayaraman IyerDavid Lindert
    • Jayaraman IyerDavid Lindert
    • H04B7/216
    • H04W80/045
    • In one embodiment, a method for supporting backward compatibility in a mobile network can include: receiving a packet in a first device that can support a first protocol; forming a modified packet by adding a field to the packet, where the field is related to a context for a second protocol; and providing the modified packet to a second device, where the second device can support the first and second protocols. The context can include a Packet Data Protocol (PDP) context and the field can include a PDP identifier. The mobility layer can include Mobile IP, for example. The first and second protocols can be Mobile IP and PDP, respectively.
    • 在一个实施例中,用于支持移动网络中的向后兼容性的方法可以包括:在可支持第一协议的第一设备中接收分组; 通过向所述分组添加字段来形成修改的分组,其中所述字段与第二协议的上下文相关; 以及将修改的分组提供给第二设备,其中所述第二设备可以支持所述第一和第二协议。 上下文可以包括分组数据协议(PDP)上下文,并且该领域可以包括PDP标识符。 移动层可以包括例如移动IP。 第一和第二协议分别可以是移动IP和PDP。