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61. 发明授权

US09529283B2 Radiation source, lithographic apparatus, and device manufacturing method 有权
标题翻译：辐射源，光刻设备和器件制造方法
公开(公告)号：US09529283B2
公开(公告)日：2016-12-27
申请号：US13058783
申请日：2009-07-29
申请人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Leonid Aizikovitch Sjmaenok
发明人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Leonid Aizikovitch Sjmaenok
IPC分类号： G21K5/04 , G03F7/20 , B82Y10/00 , G02B5/20 , G21K1/06 , G21K1/10
CPC分类号： G03F7/70958 , B82Y10/00 , G02B5/208 , G03F7/70033 , G03F7/70191 , G03F7/70575 , G03F7/70941 , G21K1/062 , G21K1/10
摘要： A spectral purity filter is configured to transmit extreme ultraviolet (EUV) radiation and deflect or absorb non-EUV secondary radiation. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of material highly reflective of non-EUV secondary radiation located on a radiation incident side of the body. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of high emissivity material on an end of the body.
摘要翻译：光谱纯度滤光器被配置为透射极紫外（EUV）辐射并偏转或吸收非EUV次级辐射。在一个实施例中，光谱纯度滤光器包括高度透射EUV辐射的材料体和高度反射位于身体辐射入射侧的非EUV次级辐射的材料层。在一个实施例中，光谱纯度滤光器包括在EUV辐射高度透射的材料体和在身体端部上的高发射率材料层。

62. 发明授权

US09207548B2 Radiation source with a debris mitigation system, lithographic apparatus with a debris mitigation system, method for preventing debris from depositing on collector mirror, and device manufacturing method 有权
标题翻译：具有碎片缓解系统的辐射源，具有碎片缓解系统的光刻设备，用于防止碎屑沉积在集光镜上的方法和装置制造方法
公开(公告)号：US09207548B2
公开(公告)日：2015-12-08
申请号：US13058776
申请日：2009-07-30
申请人： Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors
发明人： Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors
IPC分类号： G03F7/20 , H05G2/00
CPC分类号： G03F7/70916 , G03F7/70033 , G03F7/70175 , G03F7/70883 , G03F7/70908 , G03F7/70983 , H05G2/003
摘要： A lithographic apparatus includes a radiation source configured to produce extreme ultraviolet radiation, the radiation source including a chamber in which a plasma is generated; a collector mirror configured to reflect radiation emitted by the plasma; and a debris mitigation system including a gas supply system configured to supply a first gas flow toward the plasma, the first gas flow being selected to thermalize debris generated by the plasma, and a plurality of gas manifolds arranged at a location proximate the collector mirror, the gas manifolds configured to supply a second gas flow in the chamber, the second gas flow being directed toward the plasma to prevent thermalized debris from depositing on the collector mirror.
摘要翻译：光刻设备包括被配置为产生极紫外辐射的辐射源，所述辐射源包括其中产生等离子体的室; 收集器反射镜，被配置为反射等离子体发射的辐射; 以及包括气体供应系统的碎片减缓系统，所述气体供应系统被配置为朝向所述等离子体供应第一气流，所述第一气流被选择为热等离子体产生的碎屑，以及布置在靠近所述收集器反射镜的位置处的多个气体歧管，所述气体歧管被构造成在所述室中提供第二气流，所述第二气流指向所述等离子体以防止热碎屑沉积在所述收集器反射镜上。

63. 发明授权

US08901521B2 Module and method for producing extreme ultraviolet radiation 有权
标题翻译：用于产生极紫外线辐射的模块和方法
公开(公告)号：US08901521B2
公开(公告)日：2014-12-02
申请号：US12197693
申请日：2008-08-25
申请人： Tjarko Adriaan Rudolf Van Empel , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski
发明人： Tjarko Adriaan Rudolf Van Empel , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski
IPC分类号： G01J3/10 , G03F7/20 , H05G2/00
CPC分类号： H05G2/008 , G03F7/70175 , G03F7/70891 , G03F7/70916 , G03F7/70983 , H05G2/003 , H05G2/006 , H05K7/2039
摘要： A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.
摘要翻译：用于产生极紫外线辐射的模块包括被配置为将点火材料的液滴供应到预定的目标点火位置的电源和布置成聚焦在预定的目标点火位置上的激光器，并且通过击打位于在预定的目标点火位置，以便将液滴变成极紫外线产生等离子体。此外，模块包括收集器反射镜，其具有构造和布置成反射辐射的镜面，以便将辐射聚焦在焦点上。流体供应器被构造和布置成在相对于镜面横向的方向上形成从镜面流出的气流，以便减轻由等离子体产生的颗粒碎片。

64. 发明授权

US08094288B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08094288B2
公开(公告)日：2012-01-10
申请号：US10842637
申请日：2004-05-11
申请人： Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors
发明人： Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors
IPC分类号： G03B27/52 , G03B27/54
CPC分类号： G03F7/70191 , G03F7/70575
摘要： A lithographic apparatus includes an illumination system configured to transmit a beam of radiation, the beam of radiation comprising desired radiation having a predetermined wavelength or a predetermined wavelength range, and undesired radiation having another wavelength or another wavelength range; a support structure configured to support a patterning structure, the patterning structure being configured to impart the beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate; wherein at least part of the lithographic apparatus, in use, includes a gas substantially transmissive for at least part of the desired radiation and substantially less transmissive for at least part of the undesired radiation.
摘要翻译：光刻设备包括被配置为透射辐射束的照明系统，所述辐射束包括具有预定波长或预定波长范围的期望辐射，以及具有另一波长或另一波长范围的不需要的辐射; 支撑结构，其构造成支撑图案形成结构，所述图案化结构被配置为在其横截面中赋予所述辐射束的图案; 被配置为保持基板的基板台; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 其中在使用中至少部分光刻设备包括至少部分所需辐射基本上透射的气体，对于至少部分不需要的辐射基本上较少透射。

65. 发明申请

US20100085547A1 SOURCE MODULE, RADIATION SOURCE AND LITHOGRAPHIC APPARATUS 有权
标题翻译：源模块，辐射源和平面设备
公开(公告)号：US20100085547A1
公开(公告)日：2010-04-08
申请号：US12566060
申请日：2009-09-24
申请人： Dzmitry Labetski , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Gerardus Hubertus Petrus Maria Swinkels
发明人： Dzmitry Labetski , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Gerardus Hubertus Petrus Maria Swinkels
IPC分类号： B41F3/30 , A61N5/06
CPC分类号： H05G2/001 , H05G2/003
摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a fuel supply configured to supply a fuel to a plasma formation site; a laser configured to emit a beam of radiation to the plasma formation site so that a plasma that emits extreme ultraviolet radiation is generated when the beam of radiation impacts the fuel; a fuel particulate interceptor constructed and arranged to shield at least part of the radiation source from fuel particulates that are emitted by the plasma, the fuel particulate interceptor comprising a first portion and a second portion, the second portion being positioned closer to the plasma formation site than the first portion, and the first portion being rotatable; and a fuel particulate remover constructed and arranged to remove fuel particulates from a surface of the fuel particulate interceptor and to direct the fuel particulates towards a collection location.
摘要翻译：辐射源被配置成产生极紫外辐射。辐射源包括构造成将燃料供应到等离子体形成位置的燃料供应; 激光器被配置为向等离子体形成位置发射辐射束，使得当辐射束影响燃料时产生发射极紫外辐射的等离子体; 燃料颗粒拦截器，其被构造和布置成将辐射源的至少一部分屏蔽在由等离子体发射的燃料颗粒中，所述燃料颗粒拦截器包括第一部分和第二部分，所述第二部分位于更靠近等离子体形成位置并且所述第一部分可旋转; 以及构造和布置成从燃料颗粒拦截器的表面去除燃料颗粒并将燃料颗粒引导到收集位置的燃料颗粒去除器。

66. 发明授权

US07515245B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07515245B2
公开(公告)日：2009-04-07
申请号：US10942102
申请日：2004-09-16
申请人： Johannes Hubertus Josephina Moors , Vadim Yevgenyevich Banine
发明人： Johannes Hubertus Josephina Moors , Vadim Yevgenyevich Banine
IPC分类号： G03B27/32 , G03B27/42
CPC分类号： G03F7/70916
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system for providing a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the projection beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an infrared radiation source for providing infrared radiation into a measurement zone within the lithographic apparatus, and a detector for receiving the infrared radiation from the infrared radiation source after having passed through the measurement zone, and for outputting a signal indicative of the presence of a gas present within the measurement zone.
摘要翻译：公开了一种光刻设备。该装置包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。图案形成装置用于使投影光束在其横截面上具有图案。该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统，用于将红外辐射提供到光刻设备内的测量区域的红外辐射源，以及用于接收来自红外线辐射源的红外辐射在经过测量区域之后，并且用于输出指示存在于测量区域内的气体的信号。

67. 发明授权

US07372623B2 Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby 有权
标题翻译：多层光谱纯度滤光片，包括这种光谱纯度滤光片的光刻设备，器件制造方法以及由此制造的器件
公开(公告)号：US07372623B2
公开(公告)日：2008-05-13
申请号：US11091923
申请日：2005-03-29
申请人： Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Leonid Shmaenok , Nikolay Salashchenko
发明人： Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Leonid Shmaenok , Nikolay Salashchenko
IPC分类号： G02B5/20
CPC分类号： G03F7/70916 , G03F7/70191 , G03F7/70308 , G03F7/70575 , G03F7/70941
摘要： A multi-layered spectral purity filter improves the spectral purity of extreme ultra-violet (EUV) radiation and also collects debris emitted from a radiation source.
摘要翻译：多层光谱纯度过滤器提高了极紫外（EUV）辐射的光谱纯度，并且还收集了辐射源发射的碎屑。

68. 发明授权

US07075620B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US07075620B2
公开(公告)日：2006-07-11
申请号：US10820103
申请日：2004-04-08
申请人： Jan Evert Van Der Werf , Mark Kroon , Wilhelmus Cornelis Keur , Vadim Yevgenyevich Banine , Hans Van Der Laan , Johannes Hubertus Josephina Moors , Erik Roelof Loopstra
发明人： Jan Evert Van Der Werf , Mark Kroon , Wilhelmus Cornelis Keur , Vadim Yevgenyevich Banine , Hans Van Der Laan , Johannes Hubertus Josephina Moors , Erik Roelof Loopstra
IPC分类号： G01B11/00
CPC分类号： G03F7/70558 , G01J1/58 , G03F7/70741 , G03F7/7085 , G03F7/70916 , G03F7/70983
摘要： A lithographic projection apparatus includes a radiation system for providing a projection beam of radiation having a wavelength λ1 smaller than 50 nm; a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus further includes a radiation sensor which is located so as to be able to receive radiation out of the projection beam, said sensor comprising a radiation-sensitive material which converts incident radiation of wavelength λ1 into secondary radiation; and sensing means capable of detecting said secondary radiation emerging from said layer.
摘要翻译：光刻投影设备包括用于提供具有小于50nm的波长λ1的辐射的投影光束的辐射系统; 用于支撑图案形成结构的支撑结构，用于根据期望图案对投影光束进行图案化的图案形成结构; 用于保持衬底的衬底台; 以及用于将图案化的光束投影到基板的目标部分上的投影系统。该装置还包括辐射传感器，其被定位成能够将辐射从投影光束中接收，所述传感器包括辐射敏感材料，其将波长λ1的入射辐射转换成二次辐射 ; 以及能够检测从所述层出射的所述次级辐射的感测装置。

69. 发明授权

US08610089B2 Thermal conditioning system for thermal conditioning a part of a lithographic apparatus and a thermal conditioning method 有权
标题翻译：用于热调节光刻设备的一部分的热调节系统和热调节方法
公开(公告)号：US08610089B2
公开(公告)日：2013-12-17
申请号：US13449030
申请日：2012-04-17
申请人： Sjoerd Nicolaas Lambertus Donders , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Martinus Cornelis Maria Verhagen , Olav Waldemar Vladimir Frijns , Gerrit Van Donk , Henk Jan Van Gerner
发明人： Sjoerd Nicolaas Lambertus Donders , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Martinus Cornelis Maria Verhagen , Olav Waldemar Vladimir Frijns , Gerrit Van Donk , Henk Jan Van Gerner
IPC分类号： H01J5/00
CPC分类号： G03F7/70858 , F28D15/0266
摘要： A conditioning system for conditioning a part of a lithographic apparatus, includes an evaporator positioned in thermal contact with the part for extracting heat from the part by evaporation of a fluid inside the evaporator; a condenser for removing heat from the fluid inside the condenser; fluid lines arranged between the evaporator and the condenser to form a fluid circuit; a pump arranged in the circuit to circulate the fluid in the circuit; an accumulator to hold fluid, wherein the accumulator is in fluid communication with the circuit and comprises a heat exchanger to transfer heat from or to fluid inside the accumulator; a temperature sensor to provide a signal representative of the fluid temperature; and a controller to maintain a substantially constant temperature of the fluid inside the circuit by regulating the amount of heat transferred by the heat exchanger based on the signal.
摘要翻译：用于调节光刻设备的一部分的调节系统包括：蒸发器，其定位成与部件热接触，用于通过蒸发器内部的流体的蒸发从部件中提取热量; 用于从冷凝器内的流体中除去热量的冷凝器; 布置在蒸发器和冷凝器之间以形成流体回路的流体管线; 布置在电路中以使流体循环的电路中的泵; 储液器以保持流体，其中所述蓄液器与所述回路流体连通，并且包括热交换器以将热量从所述蓄能器内部流体传递到流体; 温度传感器，用于提供表示流体温度的信号; 以及控制器，通过基于该信号调节由热交换器传递的热量来维持电路内的流体的基本上恒定的温度。

70. 发明申请

US20130327955A1 RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：辐射源，光刻设备和器件制造方法
公开(公告)号：US20130327955A1
公开(公告)日：2013-12-12
申请号：US13686633
申请日：2012-11-27
申请人： Erik Roelof Loopstra , Gerardus Hubertus Petrus Maria Swinkels , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors
发明人： Erik Roelof Loopstra , Gerardus Hubertus Petrus Maria Swinkels , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors
IPC分类号： H05G2/00
CPC分类号： H05G2/006 , G03F7/70033 , G03F7/70891 , G03F7/70916 , G21K1/06 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma.
摘要翻译：辐射源被配置为产生极紫外辐射。辐射源包括在其中使用中产生等离子体的腔室，以及蒸发表面，该蒸发表面构造成蒸发由等离子体形成的副产物并被发射到蒸发表面的材料。用于在平版印刷设备的等离子体辐射源中除去或来自等离子体辐射源的副产物材料的方法包括在等离子体中蒸发在使用中发射到该表面的材料。

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