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61. 发明授权

US6074518A Plasma processing apparatus 有权
标题翻译：等离子体处理装置
公开(公告)号：US6074518A
公开(公告)日：2000-06-13
申请号：US225010
申请日：1999-01-04
申请人： Kosuke Imafuku , Shosuke Endo , Kazuhiro Tahara , Hiroshi Tsuchiya , Masayuki Tomoyasu , Yukio Naito , Kazuya Nagaseki , Ryo Nonaka , Keizo Hirose , Yoshio Fukasawa , Akira Koshiishi , Isao Kobayashi
发明人： Kosuke Imafuku , Shosuke Endo , Kazuhiro Tahara , Hiroshi Tsuchiya , Masayuki Tomoyasu , Yukio Naito , Kazuya Nagaseki , Ryo Nonaka , Keizo Hirose , Yoshio Fukasawa , Akira Koshiishi , Isao Kobayashi
IPC分类号： H01J37/32 , C23F1/02 , C23C16/00
CPC分类号： H01J37/32623
摘要： A plasma processing apparatus comprises a chamber, and an upper electrode and a lower electrode, parallelly provided in the chamber to oppose each other at a predetermined interval, for defining a plasma generation region between the electrodes. An object to be processed is mounted on the lower electrode. RF powers are supplied to the electrodes, so that a plasma generates between the electrodes, thereby performing a plasma process with respect to the object to be processed. A cylindrical ground electrode is provided around the plasma generation region in the chamber, for enclosing the plasma in the plasma generation region, and has a plurality of through holes for passing a process gas.
摘要翻译：等离子体处理装置包括室，以及上部电极和下部电极，其平行地设置在腔室中以预定间隔彼此相对，用于限定电极之间的等离子体产生区域。被处理物体安装在下电极上。向电极提供RF功率，使得在电极之间产生等离子体，从而对被处理物进行等离子体处理。在室内的等离子体产生区域周围设置圆柱形接地电极，用于将等离子体封装在等离子体产生区域中，并具有用于通过处理气体的多个通孔。

62. 发明授权

US5942075A Plasma processing apparatus 失效
标题翻译：等离子体处理装置
公开(公告)号：US5942075A
公开(公告)日：1999-08-24
申请号：US664500
申请日：1996-06-17
申请人： Kazunori Nagahata , Kazuya Nagaseki
发明人： Kazunori Nagahata , Kazuya Nagaseki
IPC分类号： H05H1/46 , C23C16/44 , C23C16/50 , C23C16/509 , C23F4/00 , H01J37/32 , H01L21/205 , H01L21/302 , H01L21/3065 , C23F1/08
CPC分类号： H01J37/32458 , C23C16/4401 , C23C16/5096 , H01J37/32082
摘要： A plasma processing apparatus includes a processing vessel for accommodating an object to be processed, a processing supplying mechanism for supplying processing gas into the processing vessel, first and second electrodes arranged to oppose each other in the processing vessel, and high-frequency power supply for supplying a high-frequency power to at least one of the first and second electrodes. The apparatus forms a plasma of the processing gas by using discharge occurring between the first and second electrodes due to the high-frequency power and performs a plasma process for the object by using the plasma. The surface of a solid except for the object to be processed in the processing vessel has a corner portion and a portion other than the corner portion, and the solid surface has a shape by which the thickness of a sheath formed between the solid surface and the plasma is nearly uniform in the corner portion and the other portion.
摘要翻译：等离子体处理装置包括用于容纳被处理物体的处理容器，将处理气体供给到处理容器内的处理供给机构，处理容器内相对配置的第一和第二电极，以及高频电源，向第一和第二电极中的至少一个提供高频电力。该装置由于高频功率而通过使用在第一和第二电极之间发生的放电来形成处理气体的等离子体，并且通过使用等离子体来执行对象的等离子体处理。在处理容器中除了待处理物体之外的固体表面具有角部和角部以外的部分，并且固体表面具有在固体表面和固体表面之间形成的护套的厚度的形状等离子体在角部和另一部分中几乎均匀。

63. 发明授权

US5698062A Plasma treatment apparatus and method 失效
标题翻译：等离子体处理装置及方法
公开(公告)号：US5698062A
公开(公告)日：1997-12-16
申请号：US533383
申请日：1995-09-25
申请人： Takao Sakamoto , Kazuhiro Tahara , Kenji Momose , Kosuke Imafuku , Shosuke Endo , Yukio Naito , Kazuya Nagaseki , Keizo Hirose
发明人： Takao Sakamoto , Kazuhiro Tahara , Kenji Momose , Kosuke Imafuku , Shosuke Endo , Yukio Naito , Kazuya Nagaseki , Keizo Hirose
IPC分类号： C23C16/44 , C23C16/448 , C23C16/455 , C23C16/509 , C23C16/517 , H01J37/32 , C23F1/02 , C23C14/34 , C23C16/00
CPC分类号： C23C16/45565 , C23C16/4405 , C23C16/4407 , C23C16/4483 , C23C16/4485 , C23C16/4557 , C23C16/5096 , C23C16/517 , H01J37/32082 , H01J37/32155 , H01J37/32165 , H01J37/3244
摘要： A plasma treatment apparatus comprising a chamber earthed, a vacuum pump for exhausting the chamber, a suscepter on which a wafer is mounted, a shower electrode arranged in the chamber, opposing to the suscepter, a unit for supplying plasma generating gas to the wafer on the suscepter through the shower electrode, a first radio frequency power source for adding radio frequency voltage, which has a first frequency f.sub.1, to both of the suscepter and the shower electrode, a second radio frequency power source for adding radio frequency voltage, which has a second frequency f.sub.2 higher than the first frequency f.sub.1, at least to one of the suscepter and the shower electrode, a transformer whose primary side is connected to the first radio frequency power source and whose secondary side to first and second electrodes, and a low pass filter arranged in a circuit on the secondary side of the transformer, and serving to allow radio frequency voltage, which has the first frequency f.sub.1, to pass through it but to cut off radio frequency voltage, which has the second frequency f.sub.2, while plasma is being generated.
摘要翻译：一种等离子体处理装置，包括接地室，用于排出室的真空泵，安装有晶片的可动装置，布置在室中的与电容器相对的喷淋电极，用于向晶片供给等离子体产生气体的单元通过淋浴电极的检测器，将具有第一频率f1的射频电压的第一射频电源提供给所述吸入器和淋浴电极，所述第二射频电源用于增加射频电压，所述第二射频电源具有比第一频率f1高的第二频率f2，至少一个至少一个所述电动机和所述淋浴电极，其一次侧连接到所述第一射频电源并且其次级侧连接到所述第一和第二电极的变压器和低布置在变压器的次级侧的电路中，并且用于使具有第一频率f1的射频电压通过而是在等离子体产生时切断具有第二频率f2的射频电压。

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