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61. 发明申请

US20090262328A1 ILLUMINATION SYSTEM AND LITHOGRAPHIC METHOD 审中-公开
标题翻译：照明系统和光刻方法
公开(公告)号：US20090262328A1
公开(公告)日：2009-10-22
申请号：US12426804
申请日：2009-04-20
申请人： Jan Bernard Plechelmus VAN SCHOOT , Erik Roelof Loopstra
发明人： Jan Bernard Plechelmus VAN SCHOOT , Erik Roelof Loopstra
IPC分类号： G03B27/32 , G02B26/10 , G03B27/42
CPC分类号： G03B27/32 , G03B27/42 , G03F7/70108
摘要： An illumination system of a lithographic apparatus is disclosed that includes a first optical element to receive a radiation beam, the first optical element comprising first raster elements that partition the radiation beam into a plurality of radiation channels, and a second optical element to receive the plurality of radiation channels, the second optical element comprising second raster elements. For each of the radiation channels a raster element of said first raster elements is associated with a respective raster element of said second raster elements to provide a continuous beam path from said first optical element to an object plane. A filter is disposed in a path traversed by the radiation beam to create a desired spatial intensity distribution in a pupil of the illumination system, by, for example, reducing a transmittance of a selection of one or more of the radiation channels.
摘要翻译：公开了一种光刻设备的照明系统，其包括用于接收辐射束的第一光学元件，所述第一光学元件包括将辐射束分割成多个辐射通道的第一光栅元件和用于接收多个辐射束的第二光学元件的第二光学元件，第二光学元件包括第二光栅元件。对于每个辐射通道，所述第一光栅元件的光栅元件与所述第二光栅元件的相应光栅元件相关联，以提供从所述第一光学元件到物平面的连续光束路径。滤光器设置在由辐射束穿过的路径中，以通过例如降低对一个或多个辐射通道的选择的透射率来在照明系统的光瞳中产生期望的空间强度分布。

62. 发明申请

US20090047604A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20090047604A1
公开(公告)日：2009-02-19
申请号：US11889722
申请日：2007-08-15
申请人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Diederik Jan Maas
发明人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Diederik Jan Maas
IPC分类号： G03C5/00 , G03B27/42
CPC分类号： G03F7/7045 , G03F7/70425 , G03F7/70466 , G03F7/70733 , G03F7/70991
摘要： A lithographic apparatus and method is disclosed to reduce the exposure time that a substrate spends within a main lithographic apparatus by pre- (or post-) exposing one or more edge devices on the substrate. Because an edge device does not ultimately yield a useful device, it can be exposed with a lithographic apparatus that has a lower resolution than that used to expose one or more of the other, complete devices produced from the substrate. Therefore, the pre- (or post-) exposure of an edge device can be performed using a less complex, and less expensive, lithographic device.
摘要翻译：公开了一种光刻设备和方法，以通过预先（或后）暴露基板上的一个或多个边缘设备来减少基板在主平版印刷设备内花费的曝光时间。因为边缘装置最终不会产生有用的装置，所以可以用光刻设备曝光，该光刻设备的分辨率比用于暴露从基板产生的一个或多个其它完整装置的分辨率低。因此，可以使用较不复杂和较便宜的光刻设备来执行边缘设备的预曝光（或后曝光）。

63. 发明授权

US06750949B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US06750949B2
公开(公告)日：2004-06-15
申请号：US10193688
申请日：2002-07-12
申请人： Erik Roelof Loopstra , Dominicus Jacobus Petrus Adrianus Franken , Josephus Jacobus Smits , Antonius Johannes Josephus Van Dijsseldonk , Johannes Hubertus Josephina Moors , Albrecht Hof , Günter Maul , Michael Mühlbeyer , Klaus Mehlkopp
发明人： Erik Roelof Loopstra , Dominicus Jacobus Petrus Adrianus Franken , Josephus Jacobus Smits , Antonius Johannes Josephus Van Dijsseldonk , Johannes Hubertus Josephina Moors , Albrecht Hof , Günter Maul , Michael Mühlbeyer , Klaus Mehlkopp
IPC分类号： G03B2742
CPC分类号： G03F7/70258 , G02B7/008 , G02B7/02 , G03F7/70833
摘要： A lithographic projection apparatus according to one embodiment of the invention includes a projection system having a plurality of optical elements or sensors mounted on a frame. The frame includes support portions made of a material (e.g. a glass ceramic) having a coefficient of thermal expansion of less than or approximately equal to 0.1×10−6 K−1.
摘要翻译：根据本发明的一个实施例的光刻投影设备包括具有安装在框架上的多个光学元件或传感器的投影系统。框架包括由热膨胀系数小于或大约等于0.1×10 -6 K -1的材料（例如玻璃陶瓷）制成的支撑部分。

64. 发明授权

US07492443B2 Device manufacturing method, device manufactured thereby and a mask for use in the method 有权
标题翻译：装置制造方法，由此制造的装置和用于该方法的掩模
公开(公告)号：US07492443B2
公开(公告)日：2009-02-17
申请号：US11023359
申请日：2004-12-29
申请人： Jan Evert Van Der Werf , Erik Roelof Loopstra , Hans Meiling , Johannes Hubertus Josephina Moors , Martinus Hendrikus Antonius Leenders
发明人： Jan Evert Van Der Werf , Erik Roelof Loopstra , Hans Meiling , Johannes Hubertus Josephina Moors , Martinus Hendrikus Antonius Leenders
IPC分类号： G03B27/68 , G03B27/42 , G03F9/00 , G03C5/00
CPC分类号： G03F7/707 , G03F7/70233 , G03F7/70258 , G03F7/70283 , G03F7/703
摘要： A device manufacturing method according to one embodiment of the invention includes positioning a reflective patterning structure to reflect at least a portion of a beam of radiation as a patterned beam of radiation having a pattern in its cross-section. The method also includes using a projection system to project the patterned beam of radiation to form an image on a target portion of a layer of radiation-sensitive material. Positioning includes at least one among shifting and tilting a nominal reflective surface of the reflective patterning structure with respect to a nominal object plane of the projection system according to a distortion value.
摘要翻译：根据本发明的一个实施例的器件制造方法包括定位反射图案形成结构以将辐射束的至少一部分反射为在其横截面中具有图案的图案化辐射束。该方法还包括使用投影系统投影图案化的辐射束以在辐射敏感材料层的目标部分上形成图像。定位包括根据失真值相对于投影系统的标称物平面移动和倾斜反射图案形成结构的标称反射表面中的至少一个。

65. 发明授权

US06741329B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US06741329B2
公开(公告)日：2004-05-25
申请号：US10235854
申请日：2002-09-06
申请人： Martinus Hendrikus Antonius Leenders , Johannes Hubertus Josephina Moors , Erik Roelof Loopstra , Noud Jan Gilissen , Markus Franciscus Antonius Eurlings
发明人： Martinus Hendrikus Antonius Leenders , Johannes Hubertus Josephina Moors , Erik Roelof Loopstra , Noud Jan Gilissen , Markus Franciscus Antonius Eurlings
IPC分类号： G03B2742
CPC分类号： G03F7/70066 , G03F7/70083 , G03F7/70358 , G03F7/70558
摘要： An illumination intensity adjustment device includes a plurality of blades disposed in the projection beam so as to cast half-shadows extending across the illumination field. The blades can be selectively rotated to increase their width perpendicular to the projection beam to control uniformity.
摘要翻译：照明强度调节装置包括设置在投影光束中的多个叶片，以便投射横过照明场的半阴影。叶片可以选择性地旋转以增加它们垂直于投影光束的宽度，以控制均匀性。

66. 发明授权

US07202934B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07202934B2
公开(公告)日：2007-04-10
申请号：US11015770
申请日：2004-12-20
申请人： Johannes Hubertus Josephina Moors , Erik Leonardus Ham , Gert-Jan Heerens , Paulus Martinus Maria Liebregts , Erik Roelof Loopstra , Henri Gerard Cato Werij
发明人： Johannes Hubertus Josephina Moors , Erik Leonardus Ham , Gert-Jan Heerens , Paulus Martinus Maria Liebregts , Erik Roelof Loopstra , Henri Gerard Cato Werij
IPC分类号： G03B27/52 , G03B27/42 , G03F7/00
CPC分类号： G03F7/70933 , G03F7/70908
摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed. The apparatus includes an optics compartment that contains a patterned surface of the patterning device and an optical element, and a substrate compartment connected to the optics compartment by a connection that is arranged to pass a patterned beam of radiation from the optical element to the substrate. The apparatus also includes a first flush gas inlet arranged to supply a first flush gas into the connection, a second flush gas inlet adjacent to the patterned surface and arranged to supply a second flush gas into the optics compartment and to create a region adjacent the patterned surface in which the second flush gas flows in a direction with a component normal to and away from the patterned surface, and a gas pump arranged to pump the flush gases from the optics compartment.
摘要翻译：公开了一种布置成将图案从图案形成装置转印到基底上的光刻设备。该装置包括光学隔室，其包含图案形成装置的图案化表面和光学元件，以及通过布置成将图案化的辐射束从光学元件传递到衬底的连接部连接到光学隔室的衬底隔室。该装置还包括第一冲洗气体入口，其布置成将第一冲洗气体供应到连接中，第二冲洗气体入口与图案化表面相邻，并且布置成将第二冲洗气体供应到光学隔室中并且产生邻近图案化的区域表面，其中第二冲洗气体沿具有垂直于和远离图案化表面的部件的方向流动;以及气泵，其布置成泵送来自光学隔室的冲洗气体。

67. 发明申请

US20110013157A1 LITHOGRAPHIC APPARATUS COMPRISING A MAGNET, METHOD FOR THE PROTECTION OF A MAGNET IN A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：包含磁铁的平面设备，用于保护磁铁的方法和设备制造方法
公开(公告)号：US20110013157A1
公开(公告)日：2011-01-20
申请号：US12735823
申请日：2009-02-19
申请人： Johannes Hubertus Josephina Moors , Norbertus Benedictus Koster , Erik Roelof Loopstra , Martin Frans Pierre Smeets , Antonius Theodorus Wilhelmus Kempen
发明人： Johannes Hubertus Josephina Moors , Norbertus Benedictus Koster , Erik Roelof Loopstra , Martin Frans Pierre Smeets , Antonius Theodorus Wilhelmus Kempen
IPC分类号： G03B27/32 , H01F7/02
CPC分类号： G03F7/70933 , G03F7/70808 , G03F7/70858 , G03F7/70916
摘要： A lithographic apparatus includes a magnet being contained in a protective enclosure, the protective enclosure being arranged to protect the magnet from contact with a H2-containing or H-atom containing gas. The enclosure may further contain a hydrogen getter, such as a magnet-surface modifying gas, or a non-hydrogen containing gas. A non-hydrogen containing gas flow may be provided or a non-hydrogen getter gas flow may be provided through at least part of the protective enclosure.
摘要翻译：光刻设备包括容纳在保护壳体中的磁体，保护壳体被布置成保护磁体免受含H2或含H原子气体的接触。外壳还可以包含氢气吸气剂，例如磁体表面改性气体或非含氢气体。可以提供不含氢的气流，或者可以通过保护外壳的至少一部分提供非氢吸气剂气流。

68. 发明申请

US20050146703A1 Device manufacturing method, device manufactured thereby and a mask for use in the method 有权
标题翻译：装置制造方法，由此制造的装置和用于该方法的掩模
公开(公告)号：US20050146703A1
公开(公告)日：2005-07-07
申请号：US11023359
申请日：2004-12-29
申请人： Jan Evert Van Der Werf , Erik Roelof Loopstra , Hans Meiling , Johannes Hubertus Josephina Moors , Martinus Hendrikus Antonius Leenders
发明人： Jan Evert Van Der Werf , Erik Roelof Loopstra , Hans Meiling , Johannes Hubertus Josephina Moors , Martinus Hendrikus Antonius Leenders
IPC分类号： G03F1/16 , G03F7/20 , H01L21/027 , G03B27/54
CPC分类号： G03F7/707 , G03F7/70233 , G03F7/70258 , G03F7/70283 , G03F7/703
摘要： A device manufacturing method according to one embodiment of the invention includes positioning a reflective patterning structure to reflect at least a portion of a beam of raditaion as a patterned beam of radiation having a pattern in its cross-section. The method also includes using a projection system to project the patterned beam of radiation to form an image on a target portion of a layer of radiation-sensitive material. Positioning includes at least one among shifting and tilting a nominal reflective surface of the reflective patterning structure with respect to a nominal object plane of the projection system according to a distortion value.
摘要翻译：根据本发明的一个实施例的器件制造方法包括定位反射图案形成结构，以将辐射束的至少一部分反射为在其横截面中具有图案的图案化的辐射束。该方法还包括使用投影系统投影图案化的辐射束以在辐射敏感材料层的目标部分上形成图像。定位包括根据失真值相对于投影系统的标称物平面移动和倾斜反射图案形成结构的标称反射表面中的至少一个。

69. 发明授权

US06879374B2 Device manufacturing method, device manufactured thereby and a mask for use in the method 有权
标题翻译：装置制造方法，由此制造的装置和用于该方法的掩模
公开(公告)号：US06879374B2
公开(公告)日：2005-04-12
申请号：US10173559
申请日：2002-06-18
申请人： Jan Evert Van Der Werf , Erik Roelof Loopstra , Hans Meiling , Johannes Hubertus Josephina Moors , Martinus Hendrikus Antonius Leenders
发明人： Jan Evert Van Der Werf , Erik Roelof Loopstra , Hans Meiling , Johannes Hubertus Josephina Moors , Martinus Hendrikus Antonius Leenders
IPC分类号： G03F1/16 , G03F7/20 , H01L21/027 , G03B27/68 , G03B27/42 , G03C5/00 , G03F9/00
CPC分类号： G03F7/707 , G03F7/70233 , G03F7/70258 , G03F7/70283 , G03F7/703
摘要： A device manufacturing method according to one embodiment of the invention includes positioning a reflective patterning structure to reflect at least a portion of a beam of radiation as a patterned beam of radiation having a pattern in its cross-section. The method also includes using a projection system to project the patterned beam of radiation to form an image on a target portion of a layer of radiation-sensitive material. Positioning includes at least one among shifting and tilting a nominal reflective surface of the reflective patterning structure with respect to a nominal object plane of the projection system according to a distortion value.
摘要翻译：根据本发明的一个实施例的器件制造方法包括定位反射图案形成结构以将辐射束的至少一部分反射为在其横截面中具有图案的图案化辐射束。该方法还包括使用投影系统投影图案化的辐射束以在辐射敏感材料层的目标部分上形成图像。定位包括根据失真值相对于投影系统的标称物平面移动和倾斜反射图案形成结构的标称反射表面中的至少一个。

70. 发明授权

US07170586B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07170586B2
公开(公告)日：2007-01-30
申请号：US11335681
申请日：2006-01-20
申请人： Vadim Yevgenyevich Banine , Levinus Pieter Bakker , Jeroen Jonkers , Erik Roelof Loopstra
发明人： Vadim Yevgenyevich Banine , Levinus Pieter Bakker , Jeroen Jonkers , Erik Roelof Loopstra
IPC分类号： G03B24/54
CPC分类号： G03F7/70008 , G03F7/7005
摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and a distributor which is arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distributor in a first direction by a mirror surface. The distributor may include a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.
摘要翻译：光刻设备包括被配置为提供辐射束的照明系统，被配置为支撑图案形成装置的支撑件，衬底台和投影系统。此外，光刻设备包括用于向照明系统提供EUV辐射的多个EUV源和布置成将来自每个EUV源的EUV辐射转换成中间辐射束的分配器。辐射的中间束通过镜面从第一方向从分配器引导。分配器可以包括旋转驱动的反射镜布置，旋转轴线不平行于镜面。

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