会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 64. 发明授权
    • Method and apparatus for fabricating semiconductor
    • 用于制造半导体的方法和装置
    • US06206969B1
    • 2001-03-27
    • US08853863
    • 1997-05-09
    • Kosei TakahashiSadayoshi Matsui
    • Kosei TakahashiSadayoshi Matsui
    • C23C1600
    • C30B23/02C23C14/564C23C14/566
    • A semiconductor fabrication apparatus for evaporating a material in a growth chamber by a molecular beam epitaxy technique to fabricate a semiconductor is provided. The apparatus includes: an ultra-high vacuum chamber including a liquid nitrogen cold trap therein, the ultra-high vacuum chamber being connected to the growth chamber via a valve; a first evacuation system including an ultra-high vacuum evacuation system, the first evacuation system being connected to the ultra-high vacuum chamber; and a second evacuation system including an evacuation system capable of conducting an evacuation operation even in a low vacuum condition, the second evacuation system being connected to the liquid nitrogen cold trap. The first evacuation system and the second evacuation system independently conduct the respective evacuation operations.
    • 提供了一种用于通过分子束外延技术蒸发生长室中的材料以制造半导体的半导体制造装置。 该装置包括:超高真空室,其中包含液氮冷阱,超高真空室经由阀连接到生长室; 包括超高真空排气系统的第一抽空系统,所述第一抽空系统连接到所述超高真空室; 以及第二排气系统,其包括即使在低真空条件下能够进行排气操作的排气系统,所述第二抽空系统连接到所述液氮冷阱。 第一疏散系统和第二疏散系统独立进行各自的撤离操作。
    • 68. 发明授权
    • Buried type semiconductor laser device
    • 埋式半导体激光器件
    • US4839900A
    • 1989-06-13
    • US897337
    • 1986-08-15
    • Toshihiko YoshidaHaruhisa TakiguchiShinji KaneiwaHiroaki KudoSadayoshi Matsui
    • Toshihiko YoshidaHaruhisa TakiguchiShinji KaneiwaHiroaki KudoSadayoshi Matsui
    • H01S5/00H01S5/223H01S5/227H01S5/24
    • H01S5/24H01S5/227H01S5/0035H01S5/2235H01S5/2237H01S5/2275
    • A buried type semiconductor laser device comprising a multi-layered epitaxial growth crystal including a striped laser-oscillation operating area on a semiconductor substrate, wherein said laser-oscillation operating area contains a buffer layer having the same polarity as said substrate, an active layer and a cladding layer having a polarity different from that of said substrate, said laser-oscillation operating area being sandwiched between one part of the burying layer and another part of the burying layer, which are disposed on said substrate and which have a polarity different from that of said substrate, through said substrate or a diffusion region having an impurity with the same polarity as said substrate so as to electrically isolate said burying layer from said cladding layer, thereby maintaining ineffective current flowing from said cladding layer to said burying layer at a low level even when current injected into said device is increased.
    • 一种埋式半导体激光器件,包括在半导体衬底上包括条纹激光振荡操作区的多层外延生长晶体,其中所述激光振荡操作区域包含具有与所述衬底相同极性的缓冲层,活性层和 具有与所述基板的极性不同的包覆层,所述激光振荡操作区域被夹在所述基板上并且具有与所述基板不同的极性不同的所述掩埋层的一部分与所述掩埋层的另一部分之间 的所述衬底,通过所述衬底或具有与所述衬底具有相同极性的杂质的扩散区域,以将所述掩埋层与所述包层电隔离,从而保持无效电流从低覆盖层流到所述掩埋层 即使当注入到所述装置中的电流增加时。