会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 64. 发明申请
    • Single poly, multi-bit non-volatile memory device and methods for operating the same
    • 单个多重多位非易失性存储器件及其操作方法
    • US20070274130A1
    • 2007-11-29
    • US11420701
    • 2006-05-26
    • Ming-Chang Kuo
    • Ming-Chang Kuo
    • G11C16/04
    • G11C16/0458G11C2216/10
    • A non-volatile memory device comprises a substrate with a dielectric layer formed thereon. A control gate is formed on the dielectric layer, as are two floating gates, one on either side of the control gate. Accordingly, the non-volatile memory device can be constructed using a single poly process that is compatible with conventional CMOS processes. In addition, the device can store two bits of data, one in each floating gate. The device can comprises two diffusion regions formed in the substrate, one near each floating gate, or four diffusion regions, one near each edge of each floating gate.
    • 非易失性存储器件包括其上形成有介电层的衬底。 控制栅极形成在电介质层上,两个浮动栅极也是如此,一个位于控制栅极的两侧。 因此,非易失性存储器件可以使用与常规CMOS工艺兼容的单一多晶工艺来构造。 另外,该设备可以存储两位数据,每个浮动门中有一位数据。 该器件可以包括形成在衬底中的两个扩散区域,每个浮置栅极附近的一个扩散区域或四个扩散区域,一个在每个浮置栅极的每个边缘附近。
    • 68. 发明申请
    • NON-VOLATILE MEMORY
    • 非易失性存储器
    • US20090219763A1
    • 2009-09-03
    • US12465872
    • 2009-05-14
    • Ming-Chang Kuo
    • Ming-Chang Kuo
    • G11C16/04G11C11/34G11C16/06
    • G11C16/3404
    • A non-volatile memory includes a plurality of cells on a substrate of a first conductivity type, each cell including a portion of the substrate, a control gate, a charge-storing layer between the portion of the substrate and the control gate, and two S/D regions of a second conductivity type in the portion of the substrate. A circuit provides a first voltage to the substrate and a second voltage to both S/D regions of each cell, wherein the difference between the first and second voltages is sufficient to cause band-to-band tunneling hot holes. The circuit also provides a voltage to the control gate and the period of applying the voltages are controlled such that the threshold voltages of all the cells converge in a tolerable range.
    • 非挥发性存储器包括在第一导电类型的衬底上的多个单元,每个单元包括衬底的一部分,控制栅极,在衬底的部分和控制栅极之间的电荷存储层,以及两个 第二导电类型的S / D区域在衬底的该部分中。 电路向基板提供第一电压,并向每个单元的两个S / D区域提供第二电压,其中第一和第二电压之间的差值足以引起带对隧道的热孔。 电路还向控制栅极提供电压,并且控制施加电压的周期使得所有单元的阈值电压在可容许的范围内收敛。
    • 70. 发明授权
    • Non-volatile memory and manufacturing method and operating method thereof and circuit system including the non-volatile memory
    • 非易失性存储器及其制造方法及其操作方法以及包括非易失性存储器的电路系统
    • US07512012B2
    • 2009-03-31
    • US11742345
    • 2007-04-30
    • Ming-Chang Kuo
    • Ming-Chang Kuo
    • G11C16/04
    • H01L21/28282H01L29/42348H01L29/66833H01L29/7923
    • The memory cell includes a first unit, a semiconductor layer, a second unit, and a doped region. The first unit includes a first gate, a first charge trapping layer, and a second charge trapping layer. The first and the second charge trapping layer are respectively disposed on both sides of the first gate. The semiconductor layer is disposed on the first unit. The second unit is disposed on the semiconductor layer and is in mirror symmetry to the first unit. The second unit includes a second gate and a third and a fourth charge trapping layer respectively disposed on both sides of the second gate. The doped region is disposed at both sides of the semiconductor layer and serves as a common source/drain region of both the first and the second unit.
    • 存储单元包括第一单元,半导体层,第二单元和掺杂区域。 第一单元包括第一栅极,第一电荷俘获层和第二电荷俘获层。 第一和第二电荷俘获层分别设置在第一栅极的两侧。 半导体层设置在第一单元上。 第二单元设置在半导体层上并且与第一单元成镜像对称。 第二单元包括分别设置在第二栅极两侧的第二栅极和第三和第四电荷捕获层。 掺杂区域设置在半导体层的两侧,并且用作第一和第二单元的公共源极/漏极区域。