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61. 发明授权

US07420164B2 Objective lens, electron beam system and method of inspecting defect 有权
标题翻译：物镜，电子束系统和检测缺陷的方法
公开(公告)号：US07420164B2
公开(公告)日：2008-09-02
申请号：US11136668
申请日：2005-05-25
申请人： Mamoru Nakasuji , Tohru Satake , Hirosi Sobukawa , Takeshi Murakami , Kenji Watanabe , Nobuharu Noji
发明人： Mamoru Nakasuji , Tohru Satake , Hirosi Sobukawa , Takeshi Murakami , Kenji Watanabe , Nobuharu Noji
IPC分类号： H01J1/50
CPC分类号： H01J37/141 , H01J2237/1534 , H01J2237/28
摘要： An electron beam system or a method for manufacturing a device using the electron beam system in which an electron beam can be irradiated at a high current density and a ratio of transmittance of a secondary electron beam of an image projecting optical system can be improved and which can be compact in size. The surface of the sample S is divided into plural stripe regions which in turn are divided into rectangle-shaped main fields. The main field is further divided into plural square-shaped subfields. The irradiation with the electron beams and the formation of a two-dimensional image are repeated in a unit of the subfields. A magnetic gap formed by the inner and outer magnetic poles of the objective lens is formed on the side of the sample, and an outer side surface and an inner side surface of each of the inner magnetic pole and the outer magnetic pole, respectively, forming the magnetic gap have each part of a conical shape with a convex having an angle of 45° or greater with respect to the optical axis.
摘要翻译：可以提高电子束系统或使用其中以高电流密度照射电子束并且可以提高图像投影光学系统的二次电子束的透射率的电子束系统的装置的方法，并且哪些可以紧凑的尺寸。样品S的表面被分成多个条纹区域，其又分成矩形主场。主场进一步分为多个方形子场。以子场为单位重复照射电子束和形成二维图像。在物体侧形成由物镜的内，外磁极形成的磁隙，分别形成内磁极和外磁极的外侧面和内侧面，形成磁隙具有相对于光轴具有45°或更大角度的凸起的圆锥形状的每一部分。

62. 发明申请

US20100213370A1 Electron Beam Apparatus 有权
标题翻译：电子束装置
公开(公告)号：US20100213370A1
公开(公告)日：2010-08-26
申请号：US11884367
申请日：2006-02-17
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Hirosi Sobukawa
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Hirosi Sobukawa
IPC分类号： H01J37/26 , H01J37/141 , H01J37/147 , G01N23/22 , H01J37/06
CPC分类号： H01J37/244 , G01N23/225 , G02F2001/136254 , H01J37/226 , H01J2237/15 , H01J2237/2482 , H01J2237/2817 , H01L27/146 , H01L27/14601
摘要： The present invention provides an electron beam apparatus which can capture images at high speeds even using an area sensor which senses a small number of frames per second, by deflecting a primary electron beam by a deflector to irradiate each of sub-visual fields which are formed by dividing an evaluation area on a sample surface, and detecting secondary electrons containing information on the sample surface in each of the sub-visual fields by a detecting device. For this purpose, the detecting device 26 of the electron beam apparatus comprises a plurality of unit detectors 24-1 each including an area sensor CCD 1 (˜CCD 14), a bundle of optical fibers 25 having one end coupled to a detection plane of the area sensor, an FOP coated on the other end of the bundle of optical fibers and formed with a scintillator, on which a secondary electron beam emitted from the sub-visual fields are focused. An electromagnetic deflector deflects the secondary electron beam emitted from the sub-visual fields each time the electron beam is irradiated to a next sub-visual field to move the secondary electron beams over the surfaces of the FOPs of the unit detectors. Since image information can be fetched from each unit detector during exposure of the other unit detectors, images can be captured at high speeds.
摘要翻译：本发明提供了一种电子束装置，其即使使用通过偏转器偏转一次电子束来照射形成的每个子视场，也可以高速捕获图像，甚至使用每秒感测少量帧数的区域传感器通过划分样品表面上的评估区域，并且通过检测装置检测在每个子视野中包含样品表面上的信息的二次电子。为此，电子束装置的检测装置26包括多个单元检测器24-1，每个单元检测器24-1包括区域传感器CCD 1（〜CCD 14），一束光纤25，其一端耦合到检测平面区域传感器，涂覆在光纤束的另一端并形成有闪烁体的FOP，其上从副视野发射的二次电子束聚焦。每当电子束照射到下一个副视野时，电磁偏转器偏转从副视野发射的二次电子束，以将二次电子束移动到单位检测器的FOP的表面上。由于在其他单元检测器的曝光期间可以从每个单元检测器获取图像信息，因此可以高速捕获图像。

63. 发明授权

US09390886B2 Electro-optical inspection apparatus using electron beam 有权
标题翻译：使用电子束的电光检查装置
公开(公告)号：US09390886B2
公开(公告)日：2016-07-12
申请号：US11884367
申请日：2006-02-17
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Hirosi Sobukawa
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Hirosi Sobukawa
IPC分类号： G01N23/00 , H01J37/244 , G01N23/225 , H01J37/22 , G02F1/1362 , H01L27/146
CPC分类号： H01J37/244 , G01N23/225 , G02F2001/136254 , H01J37/226 , H01J2237/15 , H01J2237/2482 , H01J2237/2817 , H01L27/146 , H01L27/14601
摘要： An electron beam apparatus for capturing images by deflecting a primary electron beam by a deflector to irradiate each of sub-visual fields which are formed by dividing an evaluation area on a sample surface, and detecting secondary electrons containing information on the sample surface in each of the sub-visual fields by a detecting device. The detecting device includes a plurality of unit detectors each including an area sensor, a bundle of optical fibers having one end coupled to a detection plane of the area sensor, and an FOP coated on the other end of the bundle of optical fibers and formed with a scintillator, on which a secondary electron beam emitted from the respective sub-visual field is focused. An electromagnetic deflector deflects the secondary electron beam each time the electron beam is irradiated to the next sub-visual field to move the secondary electron beams over the surfaces of the FOPs.
摘要翻译：一种电子束装置，用于通过偏转器偏转一次电子束以照射通过划分样品表面上的评估区域而形成的每个副视野并且检测在每个样本表面上包含样品表面上的信息的二次电子来捕获图像通过检测装置的子视野。检测装置包括多个单元检测器，每个单元检测器包括一个区域传感器，一束光纤，其一端连接到该区域传感器的检测平面，并且一个FOP涂覆在该光纤束的另一端上，并形成有闪烁体，其上从相应的子视野发射的二次电子束聚焦。每当电子束照射到下一个子视场时，电磁偏转器偏转二次电子束，以将二次电子束移动到FOP的表面上。

64. 发明授权

US07888642B2 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus 有权
标题翻译：电子束装置及使用该装置制造半导体器件的方法
公开(公告)号：US07888642B2
公开(公告)日：2011-02-15
申请号：US12188567
申请日：2008-08-08
申请人： Mamoru Nakasuji , Nabuharu Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
发明人： Mamoru Nakasuji , Nabuharu Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
IPC分类号： H01J49/48 , G21K5/04
CPC分类号： B82Y10/00 , B82Y40/00 , G01N23/225 , H01J37/06 , H01J37/063 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J37/3174 , H01J2237/0435 , H01J2237/0635 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/2446 , H01J2237/24485 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.
摘要翻译：本发明提供了一种用于用一次电子束照射样品的电子束装置，以通过用于评估样品表面的照射来检测从样品表面产生的二次电子束。在电子束装置中，电子枪具有用于发射一次电子束的阴极。阴极包括用于发射一次电子束的多个发射器，其以在主电光系统的光轴为中心的圆周彼此分开布置。多个发射器被布置成使得当多个发射器投射到与一次电子束扫描的方向平行的直线上时，直线上的所得点以相等的间隔隔开。

65. 发明申请

US20070018101A1 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus 失效
标题翻译：电子束装置及使用该装置制造半导体器件的方法
公开(公告)号：US20070018101A1
公开(公告)日：2007-01-25
申请号：US11528673
申请日：2006-09-28
申请人： Mamoru Nakasuji , Nobuhara Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
发明人： Mamoru Nakasuji , Nobuhara Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
IPC分类号： G21K7/00
CPC分类号： B82Y10/00 , B82Y40/00 , G01N23/225 , H01J37/06 , H01J37/063 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J37/3174 , H01J2237/0435 , H01J2237/0635 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/2446 , H01J2237/24485 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.
摘要翻译：本发明提供了一种用于用一次电子束照射样品的电子束装置，以通过用于评估样品表面的照射来检测从样品表面产生的二次电子束。在电子束装置中，电子枪具有用于发射一次电子束的阴极。阴极包括用于发射一次电子束的多个发射器，其以在主电光系统的光轴为中心的圆周彼此分开布置。多个发射器被布置成使得当多个发射器投射到与一次电子束扫描的方向平行的直线上时，直线上的所得点以相等的间隔隔开。

66. 发明授权

US07952071B2 Apparatus and method for inspecting sample surface 有权
标题翻译：用于检查样品表面的装置和方法
公开(公告)号：US07952071B2
公开(公告)日：2011-05-31
申请号：US12162071
申请日：2007-01-24
申请人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Masahiro Hatakeyama , Kenji Terao , Takeshi Murakami , Katsuya Okumura , Tatsuhiko Higashiki
发明人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Masahiro Hatakeyama , Kenji Terao , Takeshi Murakami , Katsuya Okumura , Tatsuhiko Higashiki
IPC分类号： G01N23/00
CPC分类号： H01J37/29 , H01J37/045 , H01J2237/2446
摘要： Provided is a defect inspection apparatus and an inspection (or evaluation) method with highly improved accuracy, which would not be provided by the prior art, in the defect inspection apparatus used in a manufacturing process of a semiconductor device.Provided is a method for inspecting a sample surface with a projection type electron beam inspection apparatus, comprising the steps of: forming such an irradiation area on the sample surface by an electron beam generated from an electron gun 21 that has approximately a circular or elliptical shape of a size larger than a pattern on the sample surface; irradiating the electron beam substantially onto a center of the pattern on the sample surface; and forming an image on an electron detection plane of a detector from secondary electrons emanating from the sample surface in response to the irradiation of the electron beam for inspecting the sample surface.
摘要翻译：提供了在半导体器件的制造工艺中使用的缺陷检查装置中，现有技术不能提供高精度的缺陷检查装置和检查（或评价）方法。提供一种用投影型电子束检查装置检查样品表面的方法，包括以下步骤：通过由具有大致圆形或椭圆形的电子枪21产生的电子束在样品表面上形成这样的照射区域尺寸大于样品表面上的图案; 将电子束基本上照射到样品表面上的图案的中心; 以及响应于用于检查样品表面的电子束的照射，从从样品表面发射的二次电子在检测器的电子检测平面上形成图像。

67. 发明申请

US20090026368A1 APPARATUS AND METHOD FOR INSPECTING SAMPLE SURFACE 有权
标题翻译：检测样品表面的装置和方法
公开(公告)号：US20090026368A1
公开(公告)日：2009-01-29
申请号：US12162071
申请日：2007-01-24
申请人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Masahiro Hatakeyama , Kenji Terao , Takeshi Murakami , Katsuya Okumura , Tatsuhiko Higashiki
发明人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Masahiro Hatakeyama , Kenji Terao , Takeshi Murakami , Katsuya Okumura , Tatsuhiko Higashiki
IPC分类号： G01N23/00
CPC分类号： H01J37/29 , H01J37/045 , H01J2237/2446
摘要： Provided is a defect inspection apparatus and an inspection (or evaluation) method with highly improved accuracy, which would not be provided by the prior art, in the defect inspection apparatus used in a manufacturing process of a semiconductor device.Provided is a method for inspecting a sample surface with a projection type electron beam inspection apparatus, comprising the steps of: forming such an irradiation area on the sample surface by an electron beam generated from an electron gun 21 that has approximately a circular or elliptical shape of a size larger than a pattern on the sample surface; irradiating the electron beam substantially onto a center of the pattern on the sample surface; and forming an image on an electron detection plane of a detector from secondary electrons emanating from the sample surface in response to the irradiation of the electron beam for inspecting the sample surface.
摘要翻译：提供了在半导体器件的制造工艺中使用的缺陷检查装置中，现有技术不能提供高精度的缺陷检查装置和检查（或评价）方法。提供一种用投影型电子束检查装置检查样品表面的方法，包括以下步骤：通过由具有大致圆形或椭圆形的电子枪21产生的电子束在样品表面上形成这样的照射区域尺寸大于样品表面上的图案; 将电子束基本上照射到样品表面上的图案的中心; 以及响应于用于检查样品表面的电子束的照射，从从样品表面发射的二次电子在检测器的电子检测平面上形成图像。

68. 发明授权

US08525127B2 Method and apparatus for inspecting sample surface 有权
标题翻译：检测样品表面的方法和装置
公开(公告)号：US08525127B2
公开(公告)日：2013-09-03
申请号：US13398112
申请日：2012-02-16
申请人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Kenji Terao , Masahiro Hatakeyama , Katsuya Okumura
发明人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Kenji Terao , Masahiro Hatakeyama , Katsuya Okumura
IPC分类号： G21K5/10
CPC分类号： H01J37/265 , G01R31/307 , H01J37/04 , H01J2237/2441 , H01J2237/2446 , H01J2237/2594 , H01J2237/2817
摘要： Provided is a method and an apparatus for inspecting a sample surface with high accuracy. Provided is a method for inspecting a sample surface by using an electron beam method sample surface inspection apparatus, in which an electron beam generated by an electron gun of the electron beam method sample surface inspection apparatus is irradiated onto the sample surface, and secondary electrons emanating from the sample surface are formed into an image toward an electron detection plane of a detector for inspecting the sample surface, the method characterized in that a condition for forming the secondary electrons into an image on a detection plane of the detector is controlled such that a potential in the sample surface varies in dependence on an amount of the electron beam irradiated onto the sample surface.
摘要翻译：提供了一种用于以高精度检查样品表面的方法和装置。提供了一种使用电子束法样品表面检查装置检查样品表面的方法，其中由电子束法样品表面检查装置的电子枪产生的电子束照射到样品表面上，并且发射二次电子从样品表面形成为检测样品表面的检测器的电子检测面的图像，其特征在于，将检测器的检测面上的二次电子形成为图像的条件进行控制，使得样品表面的电位根据照射到样品表面上的电子束的量而变化。

69. 发明申请

US20120145921A1 METHOD AND APPARATUS FOR INSPECTING SAMPLE SURFACE 有权
标题翻译：检测样品表面的方法和装置
公开(公告)号：US20120145921A1
公开(公告)日：2012-06-14
申请号：US13398112
申请日：2012-02-16
申请人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Kenji Terao , Masahiro Hatakeyama , Katsuya Okumura
发明人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Kenji Terao , Masahiro Hatakeyama , Katsuya Okumura
IPC分类号： G21K5/10
CPC分类号： H01J37/265 , G01R31/307 , H01J37/04 , H01J2237/2441 , H01J2237/2446 , H01J2237/2594 , H01J2237/2817
摘要： Provided is a method and an apparatus for inspecting a sample surface with high accuracy. Provided is a method for inspecting a sample surface by using an electron beam method sample surface inspection apparatus, in which an electron beam generated by an electron gun of the electron beam method sample surface inspection apparatus is irradiated onto the sample surface, and secondary electrons emanating from the sample surface are formed into an image toward an electron detection plane of a detector for inspecting the sample surface, the method characterized in that a condition for forming the secondary electrons into an image on a detection plane of the detector is controlled such that a potential in the sample surface varies in dependence on an amount of the electron beam irradiated onto the sample surface.
摘要翻译：提供了一种用于以高精度检查样品表面的方法和装置。提供了一种使用电子束法样品表面检查装置检查样品表面的方法，其中由电子束法样品表面检查装置的电子枪产生的电子束照射到样品表面上，并且发射二次电子从样品表面形成为检测样品表面的检测器的电子检测面的图像，其特征在于，将检测器的检测面上的二次电子形成为图像的条件进行控制，使得样品表面的电位根据照射到样品表面上的电子束的量而变化。

70. 发明授权

US08859984B2 Method and apparatus for inspecting sample surface 有权
标题翻译：检测样品表面的方法和装置
公开(公告)号：US08859984B2
公开(公告)日：2014-10-14
申请号：US13954425
申请日：2013-07-30
申请人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Kenji Terao , Masahiro Hatakeyama , Katsuya Okumura
发明人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Kenji Terao , Masahiro Hatakeyama , Katsuya Okumura
IPC分类号： G01N23/00
CPC分类号： H01J37/265 , G01R31/307 , H01J37/04 , H01J2237/2441 , H01J2237/2446 , H01J2237/2594 , H01J2237/2817
摘要： Provided is a method and an apparatus for inspecting a sample surface with high accuracy. Provided is a method for inspecting a sample surface by using an electron beam method sample surface inspection apparatus, in which an electron beam generated by an electron gun of the electron beam method sample surface inspection apparatus is irradiated onto the sample surface, and secondary electrons emanating from the sample surface are formed into an image toward an electron detection plane of a detector for inspecting the sample surface, the method characterized in that a condition for forming the secondary electrons into an image on a detection plane of the detector is controlled such that a potential in the sample surface varies in dependence on an amount of the electron beam irradiated onto the sample surface.
摘要翻译：提供了一种用于以高精度检查样品表面的方法和装置。提供了一种使用电子束法样品表面检查装置检查样品表面的方法，其中由电子束法样品表面检查装置的电子枪产生的电子束照射到样品表面上，并且发射二次电子从样品表面形成为检测样品表面的检测器的电子检测面的图像，其特征在于，将检测器的检测面上的二次电子形成为图像的条件进行控制，使得样品表面的电位根据照射到样品表面上的电子束的量而变化。

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