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    • 61. 发明授权
    • Discrete device modeling
    • 离散设备建模
    • US08694938B2
    • 2014-04-08
    • US13534526
    • 2012-06-27
    • Ching-Shun YangChih Ming YangWei-Yi HuYi-Kan Cheng
    • Ching-Shun YangChih Ming YangWei-Yi HuYi-Kan Cheng
    • G06F17/50
    • G06F17/5036
    • Among other things, one or more techniques and/or systems are provided for modeling a discrete device as a macro device. That is, the discrete device can comprise one or more parasitic elements, such as parasitic resistances and/or capacitances. Because values of the parasitic elements are unknown during pre-simulation of the discrete device, the discrete device can be modeled as a macro device, which can be used during pre-simulation to take into account the parasitic elements. For example, specified parameters, such as channel length, can be used to obtain a set of RC values that specify predicted values for the one or more parasitic elements of the discrete device. The discrete device can be modeled as the macro device using the set of RC values. In this way, the macro device can be used during pre-simulation to take into account the parasitic effects of parasitic elements of the discrete device.
    • 除其他之外,提供一个或多个技术和/或系统用于将分立设备建模为宏设备。 也就是说,分立器件可以包括一个或多个寄生元件,例如寄生电阻和/或电容。 由于寄生元件的值在分立器件的预仿真期间是未知的,所以可将分立器件建模为宏器件,可在预仿真期间使用以考虑寄生元件。 例如,可以使用诸如通道长度的指定参数来获得指定离散器件的一个或多个寄生元件的预测值的一组RC值。 可以使用一组RC值将离散器件建模为宏器件。 以这种方式,可以在预仿真期间使用宏器件来考虑分立器件的寄生元件的寄生效应。
    • 62. 发明申请
    • DISCRETE DEVICE MODELING
    • 离散装置建模
    • US20140007028A1
    • 2014-01-02
    • US13534526
    • 2012-06-27
    • Ching-Shun YangChih Ming YangWei-Yi HuYi-Kan Cheng
    • Ching-Shun YangChih Ming YangWei-Yi HuYi-Kan Cheng
    • G06F17/50
    • G06F17/5036
    • Among other things, one or more techniques and/or systems are provided for modeling a discrete device as a macro device. That is, the discrete device can comprise one or more parasitic elements, such as parasitic resistances and/or capacitances. Because values of the parasitic elements are unknown during pre-simulation of the discrete device, the discrete device can be modeled as a macro device, which can be used during pre-simulation to take into account the parasitic elements. For example, specified parameters, such as channel length, can be used to obtain a set of RC values that specify predicted values for the one or more parasitic elements of the discrete device. The discrete device can be modeled as the macro device using the set of RC values. In this way, the macro device can be used during pre-simulation to take into account the parasitic effects of parasitic elements of the discrete device.
    • 除其他之外,提供一个或多个技术和/或系统用于将分立设备建模为宏设备。 也就是说,分立器件可以包括一个或多个寄生元件,例如寄生电阻和/或电容。 由于寄生元件的值在分立器件的预仿真期间是未知的,所以可将分立器件建模为宏器件,可在预仿真期间使用以考虑寄生元件。 例如,可以使用诸如通道长度的指定参数来获得指定离散器件的一个或多个寄生元件的预测值的一组RC值。 可以使用一组RC值将离散器件建模为宏器件。 以这种方式,可以在预仿真期间使用宏器件来考虑分立器件的寄生元件的寄生效应。
    • 63. 发明授权
    • Multi-patterning method
    • 多图案化方法
    • US08473873B2
    • 2013-06-25
    • US13224486
    • 2011-09-02
    • Chin-Chang HsuYing-Yu ShenWen-Ju YangHsiao-Shu ChaoYi-Kan Cheng
    • Chin-Chang HsuYing-Yu ShenWen-Ju YangHsiao-Shu ChaoYi-Kan Cheng
    • G06F17/50
    • G06F17/50G03F1/70
    • A method includes receiving data representing a layout of a DPT-layer of an integrated circuit generated by a place and route tool. The layout includes a plurality of polygons to be formed in the DPT-layer by a multi-patterning process. First and second ones of the plurality of polygons to be formed using first and second photomasks, respectively are identified. Any intervening polygons along a first path connecting the first polygon to the second polygon, and separator regions between adjacent polygons along the first path are identified. The separator regions have sizes less than a minimum threshold distance between polygons formed on the first photomask. The separator regions are counted. A multi-patterning conflict is identified, if the count of separator regions is even, prior to assigning all remaining ones of the plurality of polygons to the first or second masks.
    • 一种方法包括接收表示由位置和路线工具生成的集成电路的DPT层的布局的数据。 该布局包括通过多图案化工艺在DPT层中形成的多个多边形。 分别使用第一和第二光掩模形成的多个多边形中的第一和第二多边形。 识别沿着连接第一多边形到第二多边形的第一路径以及沿着第一路径的相邻多边形之间的分隔区域的任何中间多边形。 分离器区域具有小于形成在第一光掩模上的多边形之间的最小阈值距离的尺寸。 计数分离器区域。 在将所述多个多边形中的所有剩余的多边形分配给第一或第二掩模之前,如果分离器区域的计数是偶数,则识别多图案化冲突。