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61. 发明授权

US5311362A Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US5311362A
公开(公告)日：1994-05-10
申请号：US70051
申请日：1993-06-01
申请人： Koichi Matsumoto , Kazuo Ushida , Masaomi Kameyama , Hiroyuki Tsuchiya
发明人： Koichi Matsumoto , Kazuo Ushida , Masaomi Kameyama , Hiroyuki Tsuchiya
IPC分类号： G03F7/20 , G02B9/08 , G03B27/68
CPC分类号： G03F7/7025 , G03F7/70241 , G03F7/70308
摘要： A projection exposure apparatus is provided with an illumination optical system for illuminating a reticle having a predetermined pattern and a projection optical system having a predetermined numerical aperture for projecting the predetermined pattern of the reticle illuminated by the illumination optical system onto a wafer surface. The projection optical system is arranged so that, with respect to the focusing of an image of the reticle onto the wafer surface, spherical aberration, which depends on the numerical aperture of the projection optical system, shows a positive tendency corresponding to overcorrection in third-order spherical aberration and a negative tendency corresponding to undercorrection in fifth-order spherical aberration.
摘要翻译：投影曝光装置设置有用于照射具有预定图案的掩模版的照明光学系统和具有预定数值孔径的投影光学系统，用于将由照明光学系统照射的标线图的预定图案投影到晶片表面上。投影光学系统被布置成使得相对于掩模版的图像在晶片表面上的聚焦，取决于投影光学系统的数值孔径的球面像差表现出对应于第三方面中过度校正的正向倾向，在五阶球面像差中对应于欠矫正的阶次球面像差和负趋势。

62. 发明授权

US5120647A Phospholipase A.sub.2 inhibitor 失效
公开(公告)号：US5120647A
公开(公告)日：1992-06-09
申请号：US617882
申请日：1990-11-26
申请人： Tadashi Yoshida , Hiroshi Itazaki , Hitoshi Arita , Yoshimi Kawamura , Koichi Matsumoto
发明人： Tadashi Yoshida , Hiroshi Itazaki , Hitoshi Arita , Yoshimi Kawamura , Koichi Matsumoto
IPC分类号： C12P7/44 , A61K31/19 , A61K31/215 , A61K31/365 , A61P7/02 , A61P43/00 , C07C59/245 , C07C59/42 , C07C69/675 , C07C69/732 , C07D307/33 , C07D493/10 , C12N9/99 , C12P7/42 , C12P7/64 , C12P17/02 , C12P17/04 , C12P17/18 , C12R1/645
CPC分类号： C07D307/33 , C07C59/245 , C07C59/42 , C07C69/675 , C07C69/732 , C07D493/10 , C12P17/04 , C12P7/42 , C12R1/645
摘要： A compound of the formula (I): ##STR1## wherein R.sup.1, R.sup.2, and R.sup.3 are --COOR.sup.4, --COOR.sup.5, and --COOR.sup.6, respectively; R.sup.4, R.sup.5, and R.sup.6 each is hydrogen, lower alkyl, or alkali metal; W is hydroxyl; X, Y, and Z each is hydrogen or hydroxyl; a dotted line indicates the presence or absence of a single bond; or where W/R.sup.3, X/R.sup.1, and/or Z/R.sup.3 may be combined together, a lactone is formed, which compound is useful as a phospholipase A.sub.2 inhibitor. Process for the production of the compound (I) and a cell culture of a microorganism Circinotrichum falcatisporum RF-641 producing the same are also provided.

63. 发明授权

US5112944A Cyclic tetrapeptide and process for preparing the same 失效
标题翻译：循环四肽和其制备方法
公开(公告)号：US5112944A
公开(公告)日：1992-05-12
申请号：US536764
申请日：1990-06-12
申请人： Kenji Sugita , Hiroshi Itazaki , Koichi Matsumoto , Yoshimi Kawamura
发明人： Kenji Sugita , Hiroshi Itazaki , Koichi Matsumoto , Yoshimi Kawamura
IPC分类号： A61K38/00 , A61P35/00 , C07K5/12 , C07K14/37 , C07K14/41 , C12P21/04 , C12R1/645
CPC分类号： C07K5/126 , Y10S930/27
摘要： A cyclic tetrapeptide having the formula (I): ##STR1## wherein n is 4 or 3 and a process for preparing the above cyclic tetrapeptide. The cyclic tetrapeptide of the present invention inhibits transformation of cells caused by oncogenes and possesses activities for recovering to a normal cell and for inhibiting proliferation of carcinoma cells. Therefore, the cyclic tetrapeptide of the present invention is useful for an active ingredient of an antitumor agent.

64. 发明授权

US5045458A Antibiotics PB-6042S 失效
标题翻译：抗生素PB-6042S
公开(公告)号：US5045458A
公开(公告)日：1991-09-03
申请号：US424366
申请日：1989-10-19
申请人： Tadashi Yoshida , Teruo Hattori , Koichi Matsumoto , Yoshihiro Terui , Junichi Shoji
发明人： Tadashi Yoshida , Teruo Hattori , Koichi Matsumoto , Yoshihiro Terui , Junichi Shoji
IPC分类号： C07D307/34 , C12P17/04
CPC分类号： C07D307/34 , C12P17/04 , Y10S435/822
摘要： A compound of the formula (I): ##STR1## wherein R is: (CH.sub.2).sub.8 CH.sub.3,(CH.sub.2).sub.3 CH.sup.(cis) CH(CH.sub.2).sub.5 CH.sub.3,(CH.sub.2).sub.10 CH.sub.3, or(CH.sub.2).sub.4 CH.sup.(cis) CH(CH.sub.2).sub.6 CH.sub.3.or salt thereof, and a microorganism producing the compound are provided.

65. 发明授权

US4918583A Illuminating optical device 失效
标题翻译：照明光学装置
公开(公告)号：US4918583A
公开(公告)日：1990-04-17
申请号：US340444
申请日：1989-04-19
申请人： Yuji Kudo , Koichi Matsumoto
发明人： Yuji Kudo , Koichi Matsumoto
IPC分类号： G02B3/00 , G02B19/00 , G03F7/20
CPC分类号： G02B27/0955 , G02B19/0028 , G02B19/0047 , G02B27/0994 , G02B3/005 , G03F7/70058
摘要： An illuminating optical device having an optical integrator capable of receiving a light flux from a light source and substantially forming a plane light source comprising a plurality of light source images and uniformly illuminating an object includes a square-pillar-like internal reflection type integrator having a plurality of reflecting surfaces capable of reflecting the light flux from the light source and forming a plurality of virtual images of the light source on a plane near the entrance surface thereof, a fly-eye type integrator comprising a plurality of lens elements receiving the light flux from the light source and capable of forming a plurality of light source images on a plane, the lens elements being juxtaposed in proximity to one another, and relay lens means provided between the two integrators so that the exit surface of one of the two integrators which is adjacent to the light source and the entrance surface of the other integrator which is adjacent to the object are substantially conjugate with each other.
摘要翻译：一种照明光学装置，其具有能够从光源接收光束并且基本上形成包括多个光源图像的平面光源并且均匀地照射物体的光学积分器包括：方柱状内反射型积分器，其具有多个反射面，其能够反射来自光源的光束，并且在其入射面附近的平面上形成多个光源的虚拟图像;飞眼型积分器，包括接收光束的多个透镜元件并且能够在平面上形成多个光源图像，透镜元件彼此靠近并置，并且设置在两个积分器之间的中继透镜装置，使得两个积分器之一的出射表面邻近物体ar的光源和另一个积分器的入射表面 e基本上彼此共轭。

66. 发明授权

US4906612A Method for animal growth promotion using glyclopeptides 失效
标题翻译：使用糖肽进行动物生长促进的方法
公开(公告)号：US4906612A
公开(公告)日：1990-03-06
申请号：US303745
申请日：1989-01-25
申请人： Yoshiyuki Hayashi , Takao Konishi , Koichi Matsumoto
发明人： Yoshiyuki Hayashi , Takao Konishi , Koichi Matsumoto
IPC分类号： A23K20/195 , A61K38/00 , A61P15/00 , A61P43/00 , C07K9/00
CPC分类号： A61K31/70 , A23K20/195 , C07K9/008
摘要： An agent for animal growth promotion which comprises, as an essential component, a compound of the formula I: ##STR1## wherein R is ##STR2## or H, or a salt thereof. A method for growth promotion of animals is also provided.

67. 发明授权

US4806987A Projection-exposing apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US4806987A
公开(公告)日：1989-02-21
申请号：US135377
申请日：1987-12-21
申请人： Takashi Mori , Koichi Matsumoto , Tsutomu Takai , Masaichi Murakami , Kyoichi Suwa
发明人： Takashi Mori , Koichi Matsumoto , Tsutomu Takai , Masaichi Murakami , Kyoichi Suwa
IPC分类号： H01L21/30 , G03F7/20 , H01L21/027 , G03B27/42
CPC分类号： G03F7/70475
摘要： A projection-exposing apparatus comprises a projecting optical system for projecting an image of a reticle having a predetermined pattern onto a wafer, and a stage for causing a relative shifting movement between a position of the wafer and a position of the reticle. A first exposure is effected for projecting and exposing the reticle image pattern from the projection optical system in a first area on the wafer and then the stage is shifted by a predetermined amount to effect second exposure for projecting and exposing the reticle image pattern in a second area positioned adjacent to the first area on the wafer thereby the reticle image being projected and exposed onto different areas on the same wafer. The stage causes the relative shifting movement between the reticle and the wafer in such a manner that the reticle image pattern obtained by the first exposure and the reticle image pattern obtained by the second exposure are overlapped with each other on the wafer by a predetermined amount.
摘要翻译：投影曝光装置包括投影光学系统，用于将具有预定图案的掩模版的图像投影到晶片上，以及用于在晶片的位置和光罩之间进行相对移动的台。进行第一曝光以在晶片上的第一区域中投影和曝光来自投影光学系统的标线片图像图案，然后将该台移动预定量，以进行第二次曝光，以在第二曝光中投影和曝光标线图像图案区域定位成与晶片上的第一区域相邻，从而掩模版图像被投影并暴露在同一晶片上的不同区域上。该阶段以这样的方式引起标线片和晶片之间的相对移动运动，使得通过第一曝光获得的标线图像图案和通过第二次曝光获得的标线图像图案在晶片上彼此重叠预定量。

68. 发明授权

US4145643A Control apparatus for driving a pulse motor 失效
标题翻译：用于驱动脉冲电机的控制装置
公开(公告)号：US4145643A
公开(公告)日：1979-03-20
申请号：US797692
申请日：1977-05-17
申请人： Yoshio Maeda , Koichi Matsumoto
发明人： Yoshio Maeda , Koichi Matsumoto
IPC分类号： H02P8/00 , G05B19/40 , G05B19/414
CPC分类号： G05B19/40 , G05B19/4142 , G05B2219/34087
摘要： A control apparatus for driving a pulse motor which receives from a computer or the like a command signal indicative of the number of drive pulses to be applied to the pulse motor within a given time interval in order to drive the pulse motor at a given rotating speed produces, in response to the command signal, drive pulses equal in number to the commanded number within that time interval, preferably with uniform distribution, and drives the pulse motor in accordance with the drive pulses.
摘要翻译：一种用于驱动脉冲电动机的控制装置，其在给定的时间间隔内从计算机等接收指示施加到脉冲电动机的驱动脉冲的数量的命令信号，以便以给定的转速驱动脉冲电动机在该时间间隔内，优选地以均匀分布的方式，响应于命令信号产生与命令数相等的驱动脉冲，并且根据驱动脉冲驱动脉冲电机。

69. 发明授权

US09059312B2 Semiconductor device and manufacturing method of semiconductor device 有权
标题翻译：半导体器件及半导体器件的制造方法
公开(公告)号：US09059312B2
公开(公告)日：2015-06-16
申请号：US13278809
申请日：2011-10-21
申请人： Koichi Matsumoto
发明人： Koichi Matsumoto
IPC分类号： H01L21/70 , H01L27/118 , H01L27/092 , H01L21/02 , H01L21/8238 , H01L29/49 , H01L29/66
CPC分类号： H01L27/0924 , H01L21/28079 , H01L21/28088 , H01L21/28097 , H01L21/823814 , H01L21/823821 , H01L21/823828 , H01L21/823842 , H01L21/82385 , H01L21/823864 , H01L27/092 , H01L27/0928 , H01L29/0649 , H01L29/0847 , H01L29/41783 , H01L29/42356 , H01L29/42376 , H01L29/4958 , H01L29/4966 , H01L29/4975 , H01L29/4983 , H01L29/517 , H01L29/66545 , H01L29/66553 , H01L29/6656
摘要： A semiconductor device includes: a first conductivity type transistor and a second conductivity type transistor, wherein each of the first conductivity type transistor and the second conductivity type includes a gate insulating film formed on a base, a metal gate electrode formed on the gate insulating film, and side wall spacers formed at side walls of the metal gate electrode, wherein the gate insulating film is made of a high dielectric constant material, and wherein offset spacers are formed between the side walls of the metal gate electrode and the inner walls of the side wall spacers in any one of the first conductivity type transistor and the second conductivity type transistor, or offset spacers having different thicknesses are formed in the first conductivity type transistor and the second conductivity type transistor.
摘要翻译：半导体器件包括：第一导电型晶体管和第二导电型晶体管，其中第一导电型晶体管和第二导电类型中的每一个包括形成在基极上的栅极绝缘膜，形成在栅极绝缘膜上的金属栅电极以及形成在所述金属栅电极的侧壁处的侧壁间隔物，其中所述栅极绝缘膜由高介电常数材料制成，并且其中在所述金属栅电极的侧壁和所述金属栅电极的内壁之间形成有偏置间隔物在第一导电型晶体管和第二导电型晶体管中形成第一导电型晶体管和第二导电型晶体管中的任一个中的侧壁间隔物或具有不同厚度的偏移间隔物。

70. 发明授权

US09039956B2 Cooling system for hot-rolled steel strip 有权
标题翻译：热轧钢带冷却系统
公开(公告)号：US09039956B2
公开(公告)日：2015-05-26
申请号：US13825373
申请日：2011-09-05
申请人： Koichi Matsumoto , Yuji Ikemoto , Yoichi Haraguchi , Kazuaki Kobayashi
发明人： Koichi Matsumoto , Yuji Ikemoto , Yoichi Haraguchi , Kazuaki Kobayashi
IPC分类号： C21D1/667 , B21B39/16 , B21B45/02 , B21B27/10
CPC分类号： C21D1/667 , B21B39/16 , B21B45/0218 , B21B45/0233 , B21B2027/103
摘要： Provided is a cooling system for a hot-rolled steel strip capable of increasing the cooling rate for rapidly cooling a rolled steel immediately after rolling and suitable for an apparatus for manufacturing a hot-rolled steel strip having a fine-grained structure. For this purpose, guides (16A, 16B) having guiding surfaces (16a, 16b) to guide a rolled steel (W) exiting work rolls (12A, 12B) in the conveyance direction are provided at exits of the work rolls in a final stand (Sn) of a finish rolling mill line in a manner that the guides can follow a change in the diameter of the work rolls, a number of injection holes (21A, 21B) are formed in the guides, and a number of rolled steel cooling nozzles (23A, 23B) are provided to spray a large amount of cooling water through the injection holes directly onto the rolled steel.
摘要翻译：本发明提供一种能够在轧制后立即提高用于快速冷却轧制钢的冷却速度的热轧钢带的冷却系统，适用于具有细粒度结构的热轧钢带的制造装置。为此，具有引导表面（16a，16b）的引导件（16a，16b）用于在输送方向上引导从工作辊（12A，12B）排出的轧制钢（W），在工作辊的出口处设置在最终的支架（Sn），导向件可以跟随工作辊直径的变化，在引导件中形成多个喷射孔（21A，21B），并且多个轧制钢冷却提供喷嘴（23A，23B），以将大量的冷却水通过喷射孔直接喷射到轧制钢上。

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