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    • 65. 发明授权
    • Cyanoquinoline compounds
    • 氰基喹啉化合物
    • US5565408A
    • 1996-10-15
    • US423325
    • 1995-04-17
    • Helmut HagenJuergen PfisterGunter BrillGerhard NilzBruno WuerzerKarl-Otto Westphalen
    • Helmut HagenJuergen PfisterGunter BrillGerhard NilzBruno WuerzerKarl-Otto Westphalen
    • A01N43/42A01N25/32C07D215/48C07D215/50C07D215/54C07D215/56C07D401/04C07D401/06C07D401/12C07D401/14C07D413/04C07D413/14C07D417/04C07D215/28A01N43/40C07D215/26
    • C07D401/04A01N25/32C07D215/48C07D215/54C07D215/56C07D401/12
    • Cyanoquinoline compounds Ia or Ib ##STR1## where R.sup.1 is CH.dbd.C(CN).sub.2 ; CH.dbd.N--N.dbd.CH--(5-quinolyl); methylsulfonyl; CH.dbd.NOH; halogen; hydroxyl; nitro; cyano; unsubstituted or substituted C.sub.1 -C.sub.4 -alkyl, C.sub.1 -C.sub.4 -alkoxy or C.sub.1 -C.sub.4 -alkylthio, pyrrolidinyl; piperidinyl; morpholinyl; thiomorpholinyl; unsubstituted or substituted phenyl, phenoxy, phenylthio, phenyldithiolyl, phenylsulfonyl or pyrrolyl;m is 0, 1, 2 or 3;R.sup.2 is hydrogen; hydroxyl; halogen; C.sub.1 -C.sub.4 -alkoxy; --NR.sup.3 R.sup.4 ; --NR.sup.5 --CXR.sup.6 or --N.dbd.CR.sup.7 R.sup.8 ;R.sup.3 is hydrogen or unsubstituted or substituted C.sub.1 -C.sub.4 -alkyl;R.sup.4 is a radical R.sup.3 ; C.sub.1 -C.sub.4 -alkylamino; di-C.sub.1 -C.sub.4 -alkylamino; substituted C.sub.1 -C.sub.4 -alkyl; CH.dbd.N--(3-cyano-2-quinolinyl); or R.sup.3 and R.sup.4 together form C.sub.4 - or C.sub.3 -alkylene which may be interrupted by a hetero atom, or unsubstituted or substituted 1,3-butadienyl;R.sup.5 and R.sup.7 are each hydrogen or C.sub.1 -C.sub.4 -alkyl;R.sup.6 and R.sup.8 are each a radical R.sup.5 ; substituted C.sub.1 -C.sub.4 -alkyl; C.sub.3 -C.sub.7 -cycloalkyl; C.sub.1 -C.sub.4 -alkoxycarbonyl; unsubstituted or substituted phenyl or unsubstituted or substituted amino, andX is oxygen or sulfur,processes for their preparation and herbicides which contain them.
    • 氰基喹啉化合物Ia或Ib其中R 1是CH = C(CN)2; CH = N-N = CH-(5-喹啉基); 甲基磺酰基; CH = NOH; 卤素; 羟; 硝基 氰基; 未取代或取代的C 1 -C 4 - 烷基,C 1 -C 4 - 烷氧基或C 1 -C 4 - 烷硫基,吡咯烷基; 哌啶基; 吗啉基 硫代吗啉基; 未取代或取代的苯基,苯氧基,苯硫基,苯基二硫代基,苯基磺酰基或吡咯基; m为0,1,2或3; R2是氢; 羟; 卤素; C1-C4-烷氧基; -NR3R4; -NR5-CXR6或-N = CR7R8; R3是氢或未取代的或取代的C1-C4-烷基; R4是一个基团R3; C 1 -C 4烷基氨基; 二-C 1 -C 4烷基氨基; 取代的C 1 -C 4 - 烷基; CH = N-(3-氰基-2-喹啉基); 或者R 3和R 4一起形成可以被杂原子间隔的C4-或C3-亚烷基,或未取代或取代的1,3-丁二烯基; R5和R7各自为氢或C1-C4-烷基; R6和R8各自为基团R5; 取代的C 1 -C 4 - 烷基; C 3 -C 7 - 环烷基; C 1 -C 4烷氧基羰基; 未取代或取代的苯基或未取代或取代的氨基,X为氧或硫,其制备方法和含有它们的除草剂。
    • 69. 发明授权
    • Tetrahydroindazoles with a phenyl ether structure, compositions and use
    • 具有苯基醚结构的四氢吲唑,组合物和用途
    • US4997472A
    • 1991-03-05
    • US457973
    • 1989-12-27
    • Lothar RuebKarl EickenPeter PlathKarl-Otto WestphalenBruno Wuerzer
    • Lothar RuebKarl EickenPeter PlathKarl-Otto WestphalenBruno Wuerzer
    • A01N43/56C07D231/56C07D405/12C07D409/12
    • C07D231/56C07D405/12C07D409/12
    • N-(Phenyl)-tetrahydroindazole derivatives of the general formula Ia and Ib ##STR1## where R.sup.1 is halogen;R.sup.2 is C.sub.1 -C.sub.6 -alkoxycarbonyl-C.sub.3 -C.sub.5 -alkenyl or C.sub.1 -C.sub.3 -alkyl which is substituted in the 1- or 2-position by C.sub.1 -C.sub.6 -alkoxycarbonyl or a 5- or 6-membered saturated or monounsaturated heterocycle which contains one oxygen or sulfur as heteroatom and can be substituted by from one to four C.sub.1 -C.sub.4 -alkyls, andR.sup.3 is C.sub.2 -C.sub.7 -alkyl, C.sub.3 -C.sub.6 -alkenyl, C.sub.3 -C.sub.6 -alkynyl, C.sub.1 -C.sub.6 -alkoxycarbonyl-C.sub.3 -C.sub.5 -alkenyl of C.sub.1 -C.sub.3 -alkyl which is substituted in the 1- or 2-position by C.sub.1 -C.sub.6 -alkoxycarbonyl or a 5- or 6-membered saturated or monounsaturated heterocycle which contains one oxygen or sulfur as heteroatom and can be substituted by from one to four C.sub.1 -C.sub.4 -alkyls,their manufacture and their use.
    • 通式Ia和Ib的N-(苯基) - 四氢吲唑衍生物,其中R 1是卤素; R2是C1-C6-烷氧基羰基-C3-C5-烯基或C1-C6-烷氧基羰基或5-或6-元饱和或单不饱和杂环被取代在1或2位上的C1-C3-烷基, 一个氧或硫作为杂原子,并且可以被1至4个C 1 -C 4烷基取代,并且R 3是C 2 -C 7 - 烷基,C 3 -C 6 - 烯基,C 3 -C 6 - 炔基,C 1 -C 6 - 烷氧基羰基-C 3 - C 1 -C 3 - 烷基的C 1 -C 3 - 烷基,其被C 1 -C 6 - 烷氧基羰基取代在1-或2-位,或含有一个氧或硫作为杂原子并可被取代的5或6元饱和或单不饱和杂环 通过一至四个C 1 -C 4烷基,其制备及其用途。