会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 61. 发明授权
    • Method and apparatus for inspecting a pattern formed on a substrate
    • 用于检查在基板上形成的图案的方法和装置
    • US06900888B2
    • 2005-05-31
    • US10650756
    • 2003-08-29
    • Minoru YoshidaShunji MaedaAtsushi ShimodaKaoru SakaiTakafumi OkabeMasahiro Watanabe
    • Minoru YoshidaShunji MaedaAtsushi ShimodaKaoru SakaiTakafumi OkabeMasahiro Watanabe
    • G01N21/956G03F7/20G03F9/00G01N21/88
    • G03F7/7065G01N21/95684
    • The inventive method and apparatus for detecting defects of a microscopic circuit pattern by imaging the pattern at high resolution comprises an objective lens for imaging the subject pattern, a laser illumination means for illuminating the pupil of the objective lens, means of diminishing the coherency of the laser illumination, an accumulative detector, and means of processing the signal detected by the detector. The method and apparatus are capable of imaging the subject pattern at high sensitivity and high speed based on the illumination by a short wavelength, which is indispensable for the enhancement of resolution, particularly based on a laser light source which is advantageous for practicing, with a resulting image being the same or better in quality as compared with an image resulting from the ordinary discharge tube illumination, whereby it is possible to detect microscopic defects at high sensitivity.
    • 用于通过以高分辨率对图案进行成像来检测微观电路图案的缺陷的本发明的方法和装置包括用于对被摄体图案进行成像的物镜,用于照射物镜的瞳孔的激光照明装置,降低该物镜的相干性的手段 激光照明,累积检测器,以及处理由检测器检测到的信号的装置。 该方法和装置能够以高灵敏度和高速度基于短波长的照明来对被摄体图案进行成像,这对于提高分辨率是不可或缺的,特别是基于有利于实践的激光光源 与普通放电管照明产生的图像相比,所得到的图像的质量相同或更好,从而可以以高灵敏度检测微观缺陷。
    • 69. 发明申请
    • DEFECT INSPECTION METHOD AND DEVICE THEREOF
    • 缺陷检查方法及其设备
    • US20110274342A1
    • 2011-11-10
    • US13141375
    • 2009-10-22
    • Shunji MaedaKaoru SakaiHidetoshi Nishiyama
    • Shunji MaedaKaoru SakaiHidetoshi Nishiyama
    • G06K9/00
    • H01L22/20G01N21/95623G06T7/001G06T2207/30148H01L22/12
    • The invention provides a defect inspection method and a defect inspection device which enable a defect to be inspected regardless of optical conditions. The invention comprises the steps of setting a target local region and a plurality of corresponding local regions in the image signals, the target local region including a target pixel and an area surrounding the target pixel, the corresponding local regions including pixels corresponding to the target pixel and areas surrounding the corresponding pixels; searching similarities between the image signal of the target local region and the image signals of the plurality of corresponding local regions; determining a plurality of image signals that represent corresponding local regions and are similar to the image signal of the target local region; and comparing the image signal of the target local region with the image signals that represent the corresponding local regions.
    • 本发明提供一种缺陷检查方法和缺陷检查装置,其能够在不考虑光学条件的情况下检查缺陷。 本发明包括以下步骤:在图像信号中设置目标局部区域和多个对应的局部区域,目标局部区域包括目标像素和围绕目标像素的区域,对应的局部区域包括与目标像素对应的像素 和相应像素周围的区域; 搜索所述目标局部区域的图像信号与所述多个对应的局部区域的图像信号之间的相似度; 确定表示对应的局部区域并且与目标局部区域的图像信号相似的多个图像信号; 并将目标局部区域的图像信号与表示对应的局部区域的图像信号进行比较。
    • 70. 发明授权
    • Pattern inspection method and its apparatus
    • 图案检验方法及其装置
    • US07949178B2
    • 2011-05-24
    • US12230362
    • 2008-08-28
    • Kaoru SakaiShunji MaedaTakafumi Okabe
    • Kaoru SakaiShunji MaedaTakafumi Okabe
    • G06K9/00
    • G06T7/001G06T2207/30148
    • In a pattern inspection apparatus for comparing images of corresponding areas of two patterns, which are formed so as to be identical, so as to judge that a non-coincident part of the images is a defect, the influence of unevenness in brightness of patterns caused by a difference of thickness or the like is reduced, whereby highly sensitive pattern inspection is realized. In addition, high-speed pattern inspection can be carried out without changing the image comparison algorithm. For this purpose, the pattern inspection apparatus operates to perform comparison processing of images in parallel in plural areas. Further, the pattern inspection apparatus operates to convert gradation of an image signal among compared images using different plural processing units such that, even in the case in which a difference of brightness occurs in an identical pattern among images, a defect can be detected correctly.
    • 在用于比较形成为相同的两个图案的相应区域的图像的图形检查装置中,以判断图像的不重合的部分是缺陷,导致图案的亮度不均匀性的影响 通过减小厚度差等,从而实现高灵敏度图案检查。 此外,可以进行高速图案检查,而不改变图像比较算法。 为此,图案检查装置在多个区域中并行地执行图像的比较处理。 此外,图案检查装置进行操作以使用不同的多个处理单元来转换比较图像中的图像信号的灰度,使得即使在图像中以相同图案发生亮度差异的情况下,也可以正确检测缺陷。