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    • 61. 发明授权
    • Filling machine having a continuous particle monitoring system
    • 具有连续粒子监测系统的灌装机
    • US5806282A
    • 1998-09-15
    • US828353
    • 1997-03-28
    • David Hansen
    • David Hansen
    • B65B55/02B65B1/28B65B31/02
    • B65B55/027
    • A continuous particle monitoring system for use in a filling machine is provided. The filling machine has a plurality of processing stations in which containers are conveyed to each processing station to execute at least one process to collectively form, fill and seal each container. The filling machine also includes an air intake in fluid communication with a clean air supply. A chamber is connected in fluid communication with the air intake to receive the clean air supply. The particle monitoring system is constructed and arranged to monitor the clean air supply within the chamber. To this end, the particle monitoring system includes a sampling probe arranged in the chamber and oriented anisoaxially with respect to the clean air supply. The sampling probe preferably includes a substantially tubular body having a sampling port arranged at an end thereof. Also, a mounting plate for securing the probe within the filling machine is formed in the tubular body. A sampling line connection point is arranged at another end of the tubular body in fluid communication with the sampling port. The sampling probe is connected via a sampling line to a particle counter. A vacuum pump draws an air sample through the probe and into the counter to continuously monitor the air quality in the filling station of the filling machine.
    • 提供了一种用于灌装机的连续粒子监测系统。 填充机具有多个处理站,其中容器被输送到每个处理站以执行至少一个处理以共同形成,填充和密封每个容器。 灌装机还包括与清洁空气源流体连通的进气口。 腔室与进气口流体连通地连接以接收清洁空气源。 颗粒监测系统被构造和布置以监测室内的清洁空气供应。 为此,颗粒监测系统包括布置在室中并且相对于清洁空气供给不均匀取向的取样探针。 采样探针优选地包括具有布置在其端部的采样端口的基本上管状的主体。 此外,在管状体中形成有用于将探针固定在填充机内的安装板。 取样线连接点布置在管状体的与采样口流体连通的另一端。 采样探头通过采样线连接到粒子计数器。 真空泵通过探头将空气样品吸入计数器,以连续监测灌装机加油站的空气质量。
    • 66. 发明申请
    • Method of making a planar electrode
    • 制作平面电极的方法
    • US20110204019A1
    • 2011-08-25
    • US12927552
    • 2010-11-15
    • Jonathan BornsteinDavid HansenSteven W. Longcor
    • Jonathan BornsteinDavid HansenSteven W. Longcor
    • H05K3/00
    • Chemical mechanical polishing (CMP) of thin film materials using a slurry including a surfactant chemical operative to polish high portions of the film being planarized while preventing the polishing of low portions of the film is disclosed. The low portions can be in a step reduction region of a deposited film. The CMP process can be used for form a planar surface upon which subsequent thin-film layers can be deposited, such as an electrically conductive material for an electrode. The subsequently deposited thin-film layers are substantially planar as deposited without having to use CMP. The resulting thin-film layers are planar and have a uniform cross-sectional thickness that can be beneficial for layers of memory material for a memory cell. The processing can be performed back-end-of-the-line (BEOL) on a previously front-end-of-the-line (FEOL) processed substrate (e.g., silicon wafer) and the BEOL process can be used to fabricate two-terminal non-volatile cross-point memory arrays.
    • 公开了使用包括表面活性剂化学品的浆料的薄膜材料的化学机械抛光(CMP),其可操作以抛光待平坦化的膜的高部分,同时防止薄膜的低部分的抛光。 低部分可以在沉积膜的阶梯还原区域中。 CMP工艺可以用于形成平坦表面,在该平面上可以沉积后续的薄膜层,例如用于电极的导电材料。 随后沉积的薄膜层基本上是平面的,不必使用CMP沉积。 所得到的薄膜层是平面的并且具有均匀的横截面厚度,这对存储单元的记忆材料层是有利的。 可以在先前的前端(FEOL)处理的基板(例如,硅晶片)上执行后端处理(BEOL),并且BEOL过程可用于制造两个 - 终端非易失性交叉点存储器阵列。
    • 67. 发明授权
    • Covered in-floor receptacle box
    • 有盖的地板插座盒
    • US07989710B2
    • 2011-08-02
    • US12199950
    • 2008-08-28
    • David HansenJohn Macaluso
    • David HansenJohn Macaluso
    • H02G3/18H02G3/08
    • H02G3/185
    • An in-floor receptacle or electrical conduit box with a compartment divider removably attached to a gang-plate divider, a gang-plate divider removably attached to a gang-unit holder, at least one gang-unit holder removably attached to the inside of the box, and at least one knockout located on each side or floor of the box. The in-floor electrical conduit box enables the connection of permanent cables, wires or cords to temporary cables, wires or cords.The in-floor electrical conduit box further comprises a lid with at least one removable door whereby the removal of the door permits cable access to the box while the box is still covered.
    • 一个地板上的插座或电气导管盒,带有可拆卸地连接到组合板分隔器的隔室分隔件,可拆卸地附接到组合单元保持器的组合板分隔件,至少一个组合单元保持器,其可移除地附接到 盒子,以及位于盒子的每一侧或底部的至少一个敲门器。 地板电气管道箱可以将永久电缆,电线或电线连接到临时电缆,电线或电线。 地板上的电气导管盒还包括具有至少一个可拆卸门的盖子,由此当箱子仍被覆盖时,门的移除允许电缆进入盒子。
    • 68. 发明授权
    • Method of making a planar electrode
    • 制作平面电极的方法
    • US07832090B1
    • 2010-11-16
    • US12660424
    • 2010-02-25
    • Jonathan BornsteinDavid HansenSteven W. Longcor
    • Jonathan BornsteinDavid HansenSteven W. Longcor
    • H01R43/00
    • H01L27/24H01L21/3212H01L21/7684H01L21/76849Y10T29/49117Y10T29/49126Y10T29/4913Y10T29/49155Y10T29/49165
    • Chemical mechanical polishing (CMP) of thin film materials using a slurry including a surfactant chemical operative to polish high portions of the film being planarized while preventing the polishing of low portions of the film is disclosed. The low portions can be in a step reduction region of a deposited film. The CMP process can be used for form a planar surface upon which subsequent thin-film layers can be deposited, such as an electrically conductive material for an electrode. The subsequently deposited thin-film layers are substantially planar as deposited without having to use CMP. The resulting thin-film layers are planar and have a uniform cross-sectional thickness that can be beneficial for layers of memory material for a memory cell. The processing can be performed back-end-of-the-line (BEOL) on a previously front-end-of-the-line (FEOL) processed substrate (e.g., silicon wafer) and the BEOL process can be used to fabricate two-terminal non-volatile cross-point memory arrays.
    • 公开了使用包括表面活性剂化学品的浆料的薄膜材料的化学机械抛光(CMP),其可操作以抛光待平坦化的膜的高部分,同时防止薄膜的低部分的抛光。 低部分可以在沉积膜的阶梯还原区域中。 CMP工艺可以用于形成平坦表面,在该平面上可以沉积后续的薄膜层,例如用于电极的导电材料。 随后沉积的薄膜层基本上是平面的,不必使用CMP沉积。 所得到的薄膜层是平面的并且具有均匀的横截面厚度,这对存储单元的记忆材料层是有利的。 可以在先前的前端(FEOL)处理的基板(例如,硅晶片)上执行后端处理(BEOL),并且BEOL过程可用于制造两个 - 终端非易失性交叉点存储器阵列。
    • 70. 发明授权
    • Breather system for a reciprocating mold plate patty-forming machine
    • 往复式模板贴片成型机的通气系统
    • US07416753B2
    • 2008-08-26
    • US10942755
    • 2004-09-16
    • Scott A. LindeeDavid HansenDavid Hancock
    • Scott A. LindeeDavid HansenDavid Hancock
    • A22C7/00
    • A22C7/0038A22C7/0023A22C7/003A22C7/0084A23P30/10
    • A breather air and food product fines pumping system for a reciprocating mold plate food product forming machine pumps air and fines to a collection area. A pumping surface is provided by a rearward facing surface of the mold plate. A pumping chamber is arranged between the pumping surface and a food product fines collection area. The rearward facing surface of the mold plate defines a movable limit of the pumping chamber. A valve element of a first valve is arranged between the pumping chamber and the collection area to create suction in the pumping chamber when the rearward facing surface of the mold plate is moving forward, and to allow the pumping chamber to pump air and fines into the collection area when the rearward facing surface of the mold plate is moving rearward. Breather holes in a breather plate are in communication with a breather passage that is in communication with the pumping chamber and with outside air through further valve arrangements. The further valve arrangements and the first valve act to flush the breather passage with outside air to drive air and fines in the breather passage into the pumping chamber where it is then pumped to the collection area.
    • 用于往复式模板食品成型机的呼吸器空气和食品产品细粉泵送系统将空气和细粒泵送到收集区域。 泵送表面由模板的面向后的表面提供。 泵送室设置在泵送面和食品收集区之间。 模板的朝后的表面限定了泵送室的可移动极限。 第一阀的阀元件布置在泵送室和收集区之间,以在模板向后的表面向前移动时在泵送室中产生抽吸,并且允许泵送室将空气和细粒泵入 当模板的朝后表面向后移动时的收集区域。 通气板中的通气孔与与泵送室连通的通气通道连通,并且通过另外的阀装置与外部空气连通。 另外的阀装置和第一阀用于以外部空气冲洗通气通道,以驱动空气和通气孔中的细粉进入泵送室,然后泵送到收集区域。