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61. 发明专利

JPH05337705A 失效
公开(公告)号：JPH05337705A
公开(公告)日：1993-12-21
申请号：JP17750192
申请日：1992-06-11
申请人： SUMITOMO ELECTRIC INDUSTRIES
发明人： OHARA HISANORI
IPC分类号： B23B27/14 , B23P15/28 , C23C16/06 , C23C16/30 , C23C16/52
摘要： PURPOSE:To improve the cutting performance by setting a cutting face down to 1.5-9.0 and a flank to 0.6-1.4, respectively when the ratio of aluminum and titanium or metallic ingredients in a coating film is expressed with the ratio CAl/CTi of the atom% in aluminum to atom% in titanium. CONSTITUTION:When an abrasive resistant coating film is formed on the surface of a hard base material 1 by means of a plasma CVD process, titanium and aluminum or constituent ingredients of this coating film and a stock gas inclusive of N and/or C are fed out of a nozzle 5, and the discharge energy strength of plasma is more intensified at the side of a cutting face than the side of a flank of the hard base material 1. With this constitution, the ratio of aluminum and titanium or metallic ingredients in the formed coating film is set down 1.5-9.0 in the cutting face and to 0.6-1.4 in the flank, respectively, when it is expressed with the ratio CAl/CTi of atom% of aluminum to that of titanium.

62. 发明专利

JPH05208806A RIGID AND SOLID LUBRICATING FILM HAVING SELF-REPAIRING PROPERTY AND ITS PRODUCTION 失效
公开(公告)号：JPH05208806A
公开(公告)日：1993-08-20
申请号：JP3726092
申请日：1992-01-28
申请人： SUMITOMO ELECTRIC INDUSTRIES
发明人： OHARA HISANORI , KAWAI HIROSHI
IPC分类号： C01B31/02 , C04B41/50 , C10M103/00 , C10M103/02 , C10N50/08 , C23C14/06 , C23C14/32 , C23C16/26 , C23C16/27 , C30B29/04
摘要： PURPOSE:To provide a rigid and solid lubricating film capable of forming on a substrate of mechanical component, etc., by industrially low-cost process, small in coefficient of friction regardless of its high rigidity and having a self- repairing property by including boron, and production thereof. CONSTITUTION:The objective rigid and solid lubricating film small in coefficient of friction and having self-lubricating property consists of a diamond-like carbon or amorphous carbon formed on a substrate by a plasma CVD method or an ion plating method, having 3-50atom% boron added at least in the utmost outer surface layer.

63. 发明专利

JPH05169459A MOLD FOR RESIN OR RUBBER, PART OF RESIN OR RUBBER MOLDING APPARATUS AND METHOD FOR MOLDING RESIN OR RUBBER 失效
公开(公告)号：JPH05169459A
公开(公告)日：1993-07-09
申请号：JP35626091
申请日：1991-12-24
申请人： SUMITOMO ELECTRIC INDUSTRIES
发明人： OHARA HISANORI , KAWAI HIROSHI
IPC分类号： B29C33/38 , B29C33/56 , C23C14/06
摘要： PURPOSE:To provide a mold and a part used in the molding of a resin or rubber and excellent in releasability and abrasion resistance by improving problems such that a PTFE coated one has good releasability but no abrasion resistance and a hard metal or ceramic coated one is excellent in abrasion resistance but inferior to releasability. CONSTITUTION:The base material of a mold and a part is coated with a hard carbon film or diamond like carbon film having 1-20 atomic % of fluorine added thereto. Releasability is improved because of fluorine. Abrasion resistance is good because of the hard carbon film or diamond like carbon film. It is further pref. to provide a metal or ceramic layer having high hardness as an intermediate layer.

64. 发明专利

JPH0598422A CONTINUOUS TREATMENT FOR ION NITRIDING-CERAMIC COATING 失效
公开(公告)号：JPH0598422A
公开(公告)日：1993-04-20
申请号：JP33442691
申请日：1991-11-22
申请人： SUMITOMO ELECTRIC INDUSTRIES
发明人： UKEKAWA JIHEI , OHARA HISANORI , YOSHIOKA TAKESHI , KAWAI HIROSHI
IPC分类号： C23C8/38 , C23C14/06 , C23C16/02 , C23C16/30 , C23C28/04
摘要： PURPOSE:To greatly improve the adhesion between a ceramic film and a base material by subjecting the surface of an iron alloy base material to an ion nitriding treatment to form a hardened layer which does not generate an brittle layer, then subjecting this surface to ceramic coating in succession thereto. CONSTITUTION:A work 2 (iron, steel, etc.) is installed on an electrode 3 having a heater 7 in a vacuum vessel 1 and the inside of the vessel is evacuated to a vacuum by a discharge system 11. Gaseous raw materials (N2, H2, etc.) are then blown from a nozzle 4 into the vessel and the pressure in the vessel 1 is kept at about 0.1 to 8Torr. High-frequency electric power is then applied to the work 2 from an RF power source 6 and the work is subjected to the ion nitriding treatment at about 0.2 to 5W/cm plasma density. The hardened layer which does not generate the brittle layer is formed on the surface of the work 2 and is continuously subjected to ceramic coating. The ceramic film has a preferable double-layered structure. The lowermost layer part is formed of the nitride, carbide, etc., of Ti and the uppermost layer part is formed of the nitride or carbide of Si or Al. The parts which exhibit hard mechanical characteristics are formed in this way.

65. 发明专利

JP2003089533A MOLDING DIE FOR GLASS LENS 审中-公开
公开(公告)号：JP2003089533A
公开(公告)日：2003-03-28
申请号：JP2001280250
申请日：2001-09-14
申请人： SUMITOMO ELECTRIC INDUSTRIES
发明人： ODA KAZUHIKO , OHARA HISANORI , UCHIUMI YOSHIHARU
IPC分类号： G02B3/00 , C03B11/00 , C03B11/08
摘要： PROBLEM TO BE SOLVED: To improve the durability of a molding die and the yield of a product (lens) by preventing a work (glass) from stacking to the molding die of a glass lens and preventing the molding face of the die from being damaged for a long time. SOLUTION: A transparent carbon film 2 having >=95 at.% carbon content and 3,000 to 7,000 Knoop hardness is formed on the surface of the die base material 1. The transparent carbon film 2 contains no hydrogen, has a small content of a graphite component and has a long life.

66. 发明专利

JP2002113604A CUTTING TOOL 失效
公开(公告)号：JP2002113604A
公开(公告)日：2002-04-16
申请号：JP2001032304
申请日：2001-02-08
申请人： SUMITOMO ELECTRIC INDUSTRIES
发明人： FUKUI HARUYO , UCHIUMI YOSHIHARU , MORIGUCHI HIDEKI , IMAMURA SHINYA , OHARA HISANORI , HASHIMOTO YASUHISA
IPC分类号： B23B27/14 , B22F3/24 , C23C14/06
摘要： PROBLEM TO BE SOLVED: To provide a cutting tool concurrently provided with abrasion resistance at a high temperature and lubricity to reduce a chipping loss by intermittent cutting and to prevent a chipping loss by fusion. SOLUTION: This cutting tool is provided with a base material and a lubricious coat formed on this base material by alternately laminating an abrasive resistant coat containing a compound comprising two or more kinds of elements selected from a group of titanium, chromium and aluminum, and one or more elements selected from a group of carbon and nitrogen, or an abrasive resistant coat containing a compound comprising one or more elements selected from a group of titanium, zirconium and aluminum, and one or more element selected from a group of carbon and nitrogen, a hard carbon film formed so as to be brought into contact with the upper part of this abrasive resistant coat, and noncarbon film containing one or more element selected from a group of titanium, chromium, zirconium, hafnium, vanadium, boron, aluminum and silicon.

67. 发明专利

JP2002011690A CUTTING BLADE FOR FIBER CUTTER, SCRAPER FOR FIBER CUTTER, FIBER CUTTER, AND FIBER CUTTING METHOD 失效
公开(公告)号：JP2002011690A
公开(公告)日：2002-01-15
申请号：JP2000193801
申请日：2000-06-28
申请人： SUMITOMO ELECTRIC INDUSTRIES , TORAY DU PONT KK
发明人： FUKUI HARUYO , OHARA HISANORI , YAMAMOTO TSUTOMU , TSUNODA ATSUSHI
IPC分类号： D01G1/04 , B26D1/40
摘要： PROBLEM TO BE SOLVED: To provide a fiber cutter which can reliably discharge cut fibers without plugging even when the space between cutting blades is very small, and prolong the service life thereof, a fiber cutting method, the cutting blades and a scraper used therefor. SOLUTION: The cutting blades (1) for the fiber cutter comprise a base material (10) which contains tungsten carbide and cobalt and consists of cemented carbide with the mean grain size of tungsten carbide particles being >=0.1 μm to = 8 mass % to =0.05 μm to =0.1 μm to

68. 发明专利

JP2001353603A TOOL FORMED OF SURFACE-COVERED CUBIC BORON NITRIDE SINTERED COMPACT 失效
公开(公告)号：JP2001353603A
公开(公告)日：2001-12-25
申请号：JP2000178290
申请日：2000-06-14
申请人： SUMITOMO ELECTRIC INDUSTRIES
发明人： OTA TOMOKO , FUKUI HARUYO , OHARA HISANORI , FUKAYA TOMOHIRO
IPC分类号： B23C5/16 , B23B27/14 , B23B51/00 , B23D61/00 , B23D77/00 , B23G5/06 , C04B35/583 , C04B41/50 , C04B41/87
摘要： PROBLEM TO BE SOLVED: To provide a tool formed of a cBN sintered compact which has the excellent wear resistance and toughness and controls any peeling or chipping of a cover film during the intermittent cutting. SOLUTION: This tool formed of the cBN sintered compact comprises a base metal 2 having a portion consisting of the cBN sintered compact containing >=20 vol.% cBN and the cover film 1 formed on the cBN sintered compact. The cover film 1 is formed of a material containing, for example, TiCN with the internal stress of >=-10 GPa to =1 GPa between a face side and a back side.

69. 发明专利

JP2001293602A CUTTING TOOL, AND MANUFACTURING METHOD AND DEVICE FOR THE SAME 失效
公开(公告)号：JP2001293602A
公开(公告)日：2001-10-23
申请号：JP2000109933
申请日：2000-04-11
申请人： SUMITOMO ELECTRIC INDUSTRIES
发明人： FUKUI HARUYO , MATSUSHIMA MASATO , OHARA HISANORI , OTA TOMOKO
IPC分类号： B23C5/16 , B23B27/14 , B23B51/00 , B23D61/00 , B23F21/00 , B23P15/28 , C04B41/50 , C04B41/87 , C23C14/06 , C23C14/24 , C23C14/34
摘要： PROBLEM TO BE SOLVED: To provide a surface-coated cutting tool that is suitable as a drill, an end mill and the like and is improved in abrasion resistance, sliding performance, seizing performance, machining-stock machining accuracy and the like. SOLUTION: The cutting tool comprises a base material, and an abrasion- resistant coating formed on the base material and having, as its principal component, a nitride or carbonitride of one or more types of element selected from a group containing the Group 4a, 5a and 6a elements and Al. The abrasion- resistant coating includes at least one type of ultrafine compound selected from a group containing B4DC, BN, TiB2, TiB, TiC, WC, SiC, SiNX (X=0.5 to 1.33), and Al2O3. The ultrafine compound preferably has a grain size of 0.5 to 50 nm. The base material can be a cBN sintered body and a diamond sintered body.

70. 发明专利

JP2000072415A FORMING METHOD OF CRYSTALLINE CARBON NITRIDE FILM 失效
公开(公告)号：JP2000072415A
公开(公告)日：2000-03-07
申请号：JP25187398
申请日：1998-08-20
申请人： RIYUUKOKU UNIV , SUMITOMO ELECTRIC INDUSTRIES , IST KK
发明人： KAMIJO EIJI , TANI YOJI , OHARA HISANORI , TSUJIOKA MASANORI
IPC分类号： C01B21/082 , H01L21/205
摘要： PROBLEM TO BE SOLVED: To provide a method by which a crystalline carbon nitride film having >1 nitrogen to carbon ratio (N/C) can be formed by an ECR(electron cyclotron resonance) sputtering method. SOLUTION: A graphite target 7 is sputtered in ECR plasma essentially consisting of nitrogen. In this case, nitrogen-contg. gas is used for an introducing gas. A negative DC voltage applied on the target 7 is made between >=250 V and =45 V and =400 deg.C and

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