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    • 64. 发明授权
    • Apparatus and method for growing semiconductor crystal
    • 用于生长半导体晶体的装置和方法
    • US5772757A
    • 1998-06-30
    • US475170
    • 1995-06-07
    • Junji Saito
    • Junji Saito
    • C30B23/08C23C16/44C23C16/455C30B25/02C30B25/14H01L21/203
    • C23C16/4551C23C16/4401C23C16/45561C23C16/45565C23C16/4557C23C16/45572C23C16/45574C30B25/02C30B25/14C30B29/40
    • The present invention relates to molecr beam epitaxy, in particular, to a gas source molecular beam epitaxy apparatus using compound gases as sources of semiconductor component elements, and also relates to a method for growing semiconductor crystal using this apparatus. It is an object of the present invention to prevent an epitaxial layer from being contaminated with organic compounds produced by decomposition of source gases. It is another object to grow a high purity semiconductor crystal at a growth rate high enough for practical applications. To achieve the above objects, in a growth apparatus in accordance with the present invention, the ambient gas pressure is maintained at the order of 10.sup.-5 -10.sup.-3 Torr during a growing process. The distance between a substrate on which semiconductor is to be grown and a gas effusion cell made shorter than the mean free path of source gases and by-products produced by decomposition of the source gases, wherein the mean free path is determined from the above ambient gas pressure. Moreover, a heat insulation plate is provided between the gas effusion cell and the substrate, wherein the heat insulation plate has apertures corresponding to gas effusion cells. Furthermore, as source gases, amino compounds are used such as trimethyl amine galane ((CH.sub.3).sub.3 N.multidot.GaH.sub.3), triethyl amine alane ((C.sub.2 H.sub.5).sub.3 N), tris-dimethylamino arsine (As(N(CH.sub.3).sub.2).sub.3), trimethyl amine ilane ((CH.sub.3).sub.3 N.multidot.InH.sub.3), and tris-diethylamino phosphine (P(N(C.sub.2 H.sub.5).sub.2).sub.3), wherein the amino compounds include elements composing compound semiconductor such as GaAs and InP.
    • 本发明涉及分子束外延,特别涉及使用复合气体作为半导体元件元件的源的气体源分子束外延装置,还涉及使用该装置生长半导体晶体的方法。 本发明的目的是防止外延层被源气体分解产生的有机化合物污染。 另一个目的是以实际应用足够高的生长速度生长高纯度半导体晶体。 为了实现上述目的,在根据本发明的生长装置中,环境气体压力在生长过程中维持在10-5-10-3乇的数量级。 在其上生长半导体的基板与比原始气体的平均自由程和源气体分解产生的副产物短的气体注入单元之间的距离,其中平均自由程是根据上述环境 气压。 此外,在气体注入单元和基板之间设置绝热板,其中隔热板具有对应于气体积聚单元的孔。 此外,作为源气体,使用氨基化合物,例如三甲基胺加仑((CH 3)3 N x GaH 3),三乙胺烷((C 2 H 5)3 N),三 - 二甲基氨基胂(As(N(CH 3)2)3),三甲胺 ((CH 3)3 N x InH 3)和三 - 二乙基氨基膦(P(N(C 2 H 5)2)3),其中氨基化合物包括构成化合物半导体如GaAs和InP的元素。
    • 69. 发明授权
    • Apparatus and method for growing semiconductor crystal
    • 用于生长半导体晶体的装置和方法
    • US5458689A
    • 1995-10-17
    • US384389
    • 1995-02-03
    • Junji Saito
    • Junji Saito
    • C30B23/08C23C16/44C23C16/455C30B25/02C30B25/14H01L21/203C23C16/00
    • C23C16/4551C23C16/4401C23C16/45561C23C16/45565C23C16/4557C23C16/45572C23C16/45574C30B25/02C30B25/14C30B29/40
    • The present invention relates to molecr beam epitaxy, in particular, to a gas source molecular beam epitaxy apparatus using compound gases as sources of semiconductor component elements, and also relates to a method for growing semiconductor crystal using this apparatus. It is an object of the present invention to prevent an epitaxial layer from being contaminated with organic compounds produced by decomposition of source gases. It is another object to grow a high purity semiconductor crystal at a growth rate high enough for practical applications. To achieve the above objects, in a growth apparatus in accordance with the present invention, the ambient gas pressure is maintained at the order of 10.sup.-5 -10.sup.-3 Torr during a growing process. The distance between a substrate on which semiconductor is to be grown and a gas effusion cell made shorter than the mean free path of source gases and by-products produced by decomposition of the source gases, wherein the mean free path is determined from the above ambient gas pressure. Moreover, a heat insulation plate is provided between the gas effusion cell and the substrate, wherein the heat insulation plate has apertures corresponding to gas effusion cells. Furthermore, as source gases, amino compounds are used such as trimethyl amine galane ((CH.sub.3).sub.3 N.GaH.sub.3), triethyl amine alane ((C.sub.2 H.sub.5).sub.3 N) , tris-dimethylamino arsine (As (N (CH.sub.3).sub.2).sub.3) , trimethyl amine ilane ((CH.sub.3).sub.3 N.InH.sub.3), and tris-diethylamino phosphine (P (N (C.sub.2 H.sub.5).sub.2).sub.3) , wherein the amino compounds include elements composing compound semiconductor such as GaAs and InP.
    • 本发明涉及分子束外延,特别涉及使用复合气体作为半导体元件元件的源的气体源分子束外延装置,还涉及使用该装置生长半导体晶体的方法。 本发明的目的是防止外延层被源气体分解产生的有机化合物污染。 另一个目的是以实际应用足够高的生长速度生长高纯度半导体晶体。 为了实现上述目的,在根据本发明的生长装置中,环境气体压力在生长过程中维持在10-5-10-3乇的数量级。 在其上生长半导体的基板与比原始气体的平均自由程和源气体分解产生的副产物短的气体注入单元之间的距离,其中平均自由程是根据上述环境 气压。 此外,在气体注入单元和基板之间设置绝热板,其中隔热板具有对应于气体积聚单元的孔。 此外,作为源气体,使用氨基化合物,例如三甲基胺加仑((CH 3)3 N·GaH 3),三乙基胺甲烷((C 2 H 5)3 N),三 - 二甲基氨基胂(As(N(CH 3)2)3) ((CH 3)3 N·InH 3)和三 - 二乙基氨基膦(P(N(C 2 H 5)2)3),其中氨基化合物包括构成化合物半导体如GaAs和InP的元素。