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    • 63. 发明专利
    • FRICTION WELDING
    • JPH115179A
    • 1999-01-12
    • JP15474997
    • 1997-06-12
    • HITACHI LTD
    • SATO AKIHIROFUNYU MASAOSAKAMOTO MASAHIKOOKAMURA HISANOBU
    • B23K37/06B23K20/12B23K33/00B61D17/00
    • PROBLEM TO BE SOLVED: To realize a friction welding method without a generation of unwelded parts by installing a grooved backing plate on the reverse face of a workpiece right under a tool, which is inserted to the welded part of the workpiece and moves while rotating. SOLUTION: A groove 7 made on a backing plate 2 is placed right under a welding face 3 of the workpiece 1, and welding is performed while a tip 4a of a tool 4 is inserted until it penetrates the reverse face of the workpiece 1. In this welding method, a part of the workpiece 1 is plastic flowed to the groove 7 made on the backing plate 2. During the welding processing, since the welding surface is being plastic flowed by the pressure of the tool 4, when the groove 7 is filled with metal, the metal on the welding part surface is decreased to make a concave form. The metal, which is to fill the groove 7, is supplemented by forming a projection 8 on the welding surface in advance. The tip 4a of the tool 4 is preferred to be welded while moving in the groove 7 of the backing plate 2. In this way, the overall of the welding part is fused are eliminates unwelded parts by deleting the backing waves.
    • 64. 发明专利
    • SEMICONDUCTOR DEVICE
    • JPH07201895A
    • 1995-08-04
    • JP33490893
    • 1993-12-28
    • HITACHI LTD
    • BABA NOBORUOKAMURA HISANOBUSAKAMOTO MASAHIKOAKIYAMA HIROSHISAITO RYUICHIKOIKE YOSHIHIKOKITANO MAKOTO
    • H01L21/52H01L25/07H01L25/18
    • PURPOSE:To prevent generation of cracks to improve reliability by using a Cu-base alloy showing the hardness under a high temperature which is only a half of that under the room temperature and also showing a very higher softening temperature for a metallic heat radiating plate of the device where a semiconductor element is mounted on an insulating substrate, metallic heat radiating plate and stress alleviating material on a metallic supporting plate of a power control element. CONSTITUTION:An IGBT module is formed by joining eight (8) Mo blocks 4 consisting of Cu-Cr-Zr heat radiating plate 3 in the thickness of 4mm and a heat stress alleviating material with Sn solder including Au of 20%. Eight semiconductor blocks 4 and electrodes of insulating layer through AlO are joined on the blocks 4 and Cu-Cr-Zr heat radiating plate 3 respectively with Sn-5%Sb solder. Moreover, the AlO ceramics of the insulated substrate 2 and a pure Cu supporting plate 1 are joined with Sn-40%Pb solder and thereafter a lead wire 13 is soldered. After an epoxy case 12 is placed thereon, the inside is filled with silicon gel 9. The metallic supporting plate 1 is made of a Cu group alloy which shows the hardness under a high temperature equal to a half of the hardness under the room temperature and also shows the softening temperature of 350 deg.C or more.
    • 65. 发明专利
    • SEMICONDUCTOR DEVICE
    • JPH06236947A
    • 1994-08-23
    • JP2098393
    • 1993-02-09
    • HITACHI LTD
    • YASUKAWA AKIOSAITO RYUICHIOKAMURA HISANOBUKOIKE YOSHIHIKO
    • H01L23/12H01L23/40
    • PURPOSE:To prevent a solder layer from being cracked and to prevent a wire from being discontinued by a method wherein the distribution in the horizontal direction of the hardness of a thermal diffusion plate is made low in a chip mounting position and the distribution is made high in its circumference. CONSTITUTION:A plurality of buffer plates 3 are bonded to one thermal diffusion plate 4 by using hard solder 5. After that, a plurality of IGBT chips 1 and a plurality of diode-chips are bonded onto the plurality of buffer plates 3 by high-temperature solder 6, and a thermal diffusion set 7 is formed. The distribution in the horizontal direction of the hardness of the thermal diffusion plate 4 of the thermal diffusion set 7 is made low in a chip mounting position, i.e., in parts corresponding to positions of the buffer plates 3, and the distribution is made high in its circumference. Thereby, when the chips 1 are mounted, a stress exerted on their solder is suppressed, heat generated form the chips 1 is made to escape easily to a base, and it is possible to prevent a defect from being caused by an excessive temperature rise.
    • 70. 发明专利
    • SEMICONDUCTOR DEVICE AND MANUFACTURE THEREOF
    • JPH02125456A
    • 1990-05-14
    • JP27724588
    • 1988-11-04
    • HITACHI LTD
    • OKAMURA HISANOBUKAMOSHITA RIKUOAKIYAMA HIROSHISAKAMOTO MASAHIKO
    • H01L23/34H01L23/36
    • PURPOSE:To connect the metallized part of an AlN ceramic surface to AlN or SiC at a low temperature and to simultaneously conduct in the same process by manufacturing ceramics by previously dividing it into a member having a cooling function for externally dissipating heat from a semiconductor element and a member having a function for sealing the element from the atmosphere, and assembling both the members by a metallic connection. CONSTITUTION:Heat from a LSI element 2 is transferred to a movable fin 4, and externally dissipated through a stationary fin 6 formed on the AlN ceramic cooling board 5 of the same material. On the other hand, a frame 7 for sealing the element 2 from the atmosphere is formed in a gate shape of AlN ceramics, and metallically connected to an AlN ceramic cap 5 and a multilayer circuit board 1. The AlN ceramic cooling board 5 of the frame 7 and the face to be connected to the board 1 are printed with pastelike brazing material. Then, it is superposed on the board 7 integrated with a heat sink fin, and heated to a temperature slightly higher than the melting point of the brazing material in a reduced pressure Ar atmosphere.