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61. 发明授权

US06903338B2 Method and apparatus for reducing substrate edge effects in electron lenses 有权
标题翻译：减少电子透镜中基板边缘效应的方法和装置
公开(公告)号：US06903338B2
公开(公告)日：2005-06-07
申请号：US10600050
申请日：2003-06-20
申请人： Marian Mankos , David L. Adler
发明人： Marian Mankos , David L. Adler
IPC分类号： H01L21/66 , G01N23/203 , G01Q30/02 , G01Q30/20 , G21K7/00 , H01J37/20 , H01J37/244 , H01J37/28
CPC分类号： H01J37/20 , H01J2237/153 , Y10T428/12528
摘要： One embodiment disclosed pertains to a method for inspecting a substrate. The method includes inserting the substrate into a holding place of a substrate holder, moving the substrate holder under an electron beam, and applying a voltage to a conductive element of the substrate holder. The voltage applied to the conductive element reduces a substrate edge effect. Another embodiment disclosed relates to an apparatus for holding a substrate that reduces a substrate edge effect. The apparatus includes a holding place for insertion of the substrate and a conductive element. The conductive element is positioned so as to be located within a gap between an edge of the holding place and an edge of the substrate.
摘要翻译：所公开的一个实施例涉及用于检查基板的方法。该方法包括将基板插入基板保持器的保持位置，将基板保持器移动到电子束下方，并向基板保持器的导电元件施加电压。施加到导电元件的电压降低了衬底边缘效应。公开的另一实施例涉及一种用于保持降低衬底边缘效应的衬底的装置。该装置包括用于插入基板和导电元件的保持位置。导电元件被定位成位于保持位置的边缘和基板的边缘之间的间隙内。

62. 发明授权

US06885000B1 Method and apparatus to correct for stage motion in E-beam inspection 有权
标题翻译：在电子束检查中校正舞台运动的方法和装置
公开(公告)号：US06885000B1
公开(公告)日：2005-04-26
申请号：US10702270
申请日：2003-11-06
申请人： David L. Adler
发明人： David L. Adler
IPC分类号： G01Q10/00 , G01Q30/02 , G01N23/22 , H01J37/26 , G01N21/00 , H01J37/244
CPC分类号： H01J37/26 , G01N23/22 , H01J2237/226 , H01J2237/2446 , H01J2237/24495 , H01J2237/2817
摘要： One embodiment disclosed relates to an apparatus for inspecting a substrate. The apparatus includes at least an illumination system, a stage, a multiple-pixel detector, an imaging system, a deflector, and a deflector controller. The illumination system is configured to expose at least a portion of the substrate to an incident beam which causes said portion to emit radiation. The stage holds the substrate and moves the substrate relative to the beam during said exposure of the substrate. The imaging system images the emitted radiation onto the multi-pixel detector, which includes an array of detector elements configured to detect the emitted radiation. The deflector is configured to deflect the emitted radiation under control of the deflector controller. The deflection is controlled so as to compensate for the motion of the substrate relative to the beam.
摘要翻译：所公开的一个实施例涉及用于检查基板的装置。该装置至少包括照明系统，舞台，多像素检测器，成像系统，偏转器和偏转器控制器。照明系统被配置为将衬底的至少一部分暴露于引起所述部分发射辐射的入射光束。在所述衬底的曝光期间，所述台架保持所述衬底并相对于所述光束移动所述衬底。成像系统将发射的辐射成像到多像素检测器上，该多像素检测器包括被配置为检测发射的辐射的检测器元件的阵列。偏转器被配置为在偏转器控制器的控制下偏转发射的辐射。控制偏转以补偿基板相对于梁的运动。

63. 发明授权

US06872942B1 High-speed inspection of flat substrates with underlying visible topology 有权
标题翻译：对具有潜在可见拓扑结构的平面基板进行高速检测
公开(公告)号：US06872942B1
公开(公告)日：2005-03-29
申请号：US10701857
申请日：2003-11-05
申请人： David L. Adler
发明人： David L. Adler
IPC分类号： G01N23/22 , H01J37/28 , H01J37/20 , G21K3/10
CPC分类号： H01J37/28 , G01N23/22 , H01J2237/0048 , H01J2237/20214 , H01J2237/20228 , H01J2237/20278 , H01J2237/221 , H01J2237/24495 , H01J2237/2803
摘要： One embodiment disclosed relates to a method for inspecting a substrate. The method includes exposing the substrate to an incident beam, inducing relative motion between the incident beam and the substrate, and detecting charged particles emitted from the substrate. The relative motion is such that the beam travels over a surface of the substrate along a substantially spiral shaped path.
摘要翻译：所公开的一个实施例涉及用于检查基板的方法。该方法包括将衬底暴露于入射光束，引起入射光束和衬底之间的相对运动，以及检测从衬底发射的带电粒子。相对运动是使得光束沿着基本上螺旋形的路径在基板的表面上行进。

64. 发明授权

US06610980B2 Apparatus for inspection of semiconductor wafers and masks using a low energy electron microscope with two illuminating beams 失效
公开(公告)号：US06610980B2
公开(公告)日：2003-08-26
申请号：US09854332
申请日：2001-05-11
申请人： Lee Veneklasen , David L. Adler , Matthew Marcus
发明人： Lee Veneklasen , David L. Adler , Matthew Marcus
IPC分类号： G01N2300
CPC分类号： H01J37/256 , H01J37/26 , H01J2237/0044 , H01J2237/2538 , H01J2237/262
摘要： A novel dual beam low energy electron microscope (LEEM) apparatus for inspecting semiconductor circuits or masks. Direct imaging records many pixels in parallel, offering higher inspection rates than prior art scanning methods. A low energy flood beam is superimposed with a second, higher energy flood beam. The use of two beams avoids charging effects upon insulating or partially insulating substrates. Under appropriate conditions, the net charging flux to each image element can be balanced on a pixel by pixel, as well as global basis. Either the low energy or the higher energy beam may be used to form an image of the surface. An electron optical apparatus and configuration for this dual beam LEEM is described.

65. 发明授权

US06211518B1 Electron beam dose control for scanning electron microscopy and critical dimension measurement instruments 有权
标题翻译：扫描电子显微镜和关键尺寸测量仪器的电子束剂量控制
公开(公告)号：US06211518B1
公开(公告)日：2001-04-03
申请号：US09195097
申请日：1998-11-18
申请人： Neil Richardson , Farid Askary , Stefano E. Concina , Kevin M. Monahan , David L. Adler
发明人： Neil Richardson , Farid Askary , Stefano E. Concina , Kevin M. Monahan , David L. Adler
IPC分类号： H01J3700
CPC分类号： H01J37/28 , H01J2237/004 , H01J2237/2817
摘要： A system and method for controlling electron exposure on image specimens by adjusting a raster scan area in-between scan frame cycles. A small, zoomed-in, scan area and the surrounding area are flooded with positive charge for a number of frame cycles between scan frames to reduce the voltage differential between the scan area and surrounding area, thereby reducing the positive charge buildup which tends to obscure small features in scanned images. The peak current into a pixel element on the specimen is reduced by scanning the beam with a line period that is very short compared to regular video. Frames of image data may further be acquired non-sequentially, in arbitrarily programmable patterns. Alternatively, an inert gas can be injected into the scanning electron microscope at the point where the electron beam impinges the specimen to neutralize a charge build-up on the specimen by the ionization of the inert gas by the electron beam.
摘要翻译：通过调整扫描帧周期之间的光栅扫描区域来控制图像样本上的电子曝光的系统和方法。一个小的，放大的扫描区域和周围区域在扫描帧之间的多个帧周期中充满正电荷，以减少扫描区域和周围区域之间的电压差，从而减少倾向于模糊的正电荷积聚扫描图像中的小功能。通过以与常规视频相比非常短的线周期扫描光束来减小进入样品中的像素元件的峰值电流。图像数据的帧可以以任意可编程的模式进一步非依次获取。或者，可以在电子束照射样品的点处将惰性气体注入到扫描电子显微镜中，以通过电子束电离惰性气体来中和样品上的电荷积累。

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