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    • 63. 发明授权
    • Chemical derivatization of silica coated fullerenes and use of derivatized silica coated fullerenes
    • 二氧化硅涂覆的富勒烯的化学衍生化和使用衍生的二氧化硅涂覆的富勒烯
    • US07491376B2
    • 2009-02-17
    • US11451110
    • 2006-06-12
    • Andrew R. BarronDennis J. FloodAndrew A. Guzelian
    • Andrew R. BarronDennis J. FloodAndrew A. Guzelian
    • C01B31/00
    • C07F7/1804C07B2200/11Y10S423/39Y10S423/40Y10S977/734Y10S977/735Y10S977/742Y10T428/2993
    • This invention is directed to a new composition of matter in the form of chemically derivatized silica coated fullerenes, including silica coated C60 molecules and silica coated carbon nanotubes, processes for making the same and to uses for the derivatized silica coated fullerenes. Included among many uses in chemical, physical or biological fields of use, but not limited thereto, are high speed, low loss electrical interconnects for nanoscale electronic devices, components and circuits. In one embodiment, this invention also provides a method for preparing silica coated fullerenes having substituents attached to the surface of silica coated fullerenes by reacting silica coated fullerenes with a wide range of organic or inorganic chemical species in a gaseous or liquid state. Preferred substituents include but are not limited to organic groups and organic groups containing heteroatoms such as oxygen, nitrogen, sulfur, and halogens. The identity of the surface functional group is chosen to provide desirable properties to the silica coated fullerenes including but not limited to solubility, miscibility, stickiness, and melting point. The present invention also describes the application of surface functionalized silica coated fullerenes as components of polymer blends and composites.
    • 本发明涉及以化学衍生的二氧化硅涂覆的富勒烯形式的物质的新组合物,包括二氧化硅涂覆的C60分子和二氧化硅涂覆的碳纳米管,其制备方法和用于衍生的二氧化硅涂覆的富勒烯的用途。 在化学,物理或生物领域的许多用途中包括用于纳米级电子器件,部件和电路的高速度,低损耗电互连,但不限于此。 在一个实施方案中,本发明还提供了一种制备二氧化硅涂覆的富勒烯的方法,其具有通过使二氧化硅涂覆的富勒烯与宽范围的气态或液态的有机或无机化学物质反应而附着到二氧化硅涂覆的富勒烯的表面上的取代基。 优选的取代基包括但不限于有机基团和含有杂原子如氧,氮,硫和卤素的有机基团。 选择表面官能团的身份来为二氧化硅涂覆的富勒烯提供所需的性质,包括但不限于溶解度,混溶性,粘性和熔点。 本发明还描述了表面官能化二氧化硅涂覆的富勒烯作为聚合物共混物和复合材料的组分的应用。
    • 68. 发明授权
    • Chemical vapor deposition from single organometallic precursors
    • 来自单一有机金属前体的化学气相沉积
    • US5300320A
    • 1994-04-05
    • US903256
    • 1992-06-23
    • Andrew R. BarronMichael B. PowerAndrew N. MacInnesAloysius F. HeppPhillip P. Jenkins
    • Andrew R. BarronMichael B. PowerAndrew N. MacInnesAloysius F. HeppPhillip P. Jenkins
    • C23C16/30H01L21/20H01L21/285H01L21/314C23C16/00
    • H01L21/02568C23C16/30C23C16/305H01L21/02392H01L21/02395H01L21/0262
    • A method is disclosed for forming a passivating/buffer film on a substrate. The method includes heating the substrate to a temperature which is sufficient to cause a volatilized organometallic precursor to pyrolyze and thereby form a passivating/buffer film on a substrate. The organometallic precursor is volatilized at a precursor source. A carrier gas is directed from a carrier gas source across the precursor source to conduct the volatilized precursor from the precursor source to the substrate. The volatilized precursor pyrolyzes and is deposited onto the substrate, thereby forming the passivating/buffer film on the substrate. The passivating/buffer film can be a cubic-phase passivating/buffer film. An oxide layer can also be formed on the passivating/buffer film to thereby form a composite of the substrate, the passivating/buffer film and the oxide layer. Cubic-phase passivating/buffer films formed by the method of the invention can be lattice-matched with the substrate. Electronic or electro-optical circuits or circuit elements can be formed which include passivating/buffer films formed by the method of the invention.
    • 公开了在基板上形成钝化/缓冲膜的方法。 该方法包括将基底加热到足以引起挥发的有机金属前体热解的温度,从而在基底上形成钝化/缓冲膜。 有机金属前驱体在前体源处挥发。 载气从载体气体源引导穿过前体源,以将挥发的前体从前体源引导到基底。 挥发的前体热解并沉积在基材上,从而在基材上形成钝化/缓冲膜。 钝化/缓冲膜可以是立方相钝化/缓冲膜。 也可以在钝化/缓冲膜上形成氧化物层,从而形成基板,钝化/缓冲膜和氧化物层的复合物。 通过本发明的方法形成的立方相钝化/缓冲膜可以与衬底晶格匹配。 可以形成包括通过本发明的方法形成的钝化/缓冲膜的电子或电光电路或电路元件。