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61. 发明授权

US07400403B2 Beam profile ellipsometer with rotating compensator 有权
标题翻译：带旋转补偿器的光束椭偏仪
公开(公告)号：US07400403B2
公开(公告)日：2008-07-15
申请号：US11715584
申请日：2007-03-08
申请人： Jon Opsal
发明人： Jon Opsal
IPC分类号： G01J4/00
CPC分类号： G01J4/04 , G01N21/211
摘要： An optical inspection device includes a light source for generating a probe beam. The probe beam is focused onto a sample to create a spread of angles of incidence. After reflecting from the sample, the light is imaged onto a two dimensional array of photodetectors. Prior to reaching the detector array, the beam is passed through a rotating compensator. A processor functions to evaluate the sample by analyzing the output of the photodetectors lying along one or more azimuthal angles and at different compensator positions.
摘要翻译：光学检查装置包括用于产生探测光束的光源。探测光束被聚焦到样品上以产生入射角的扩展。从样品反射后，将光成像到二维阵列的光电探测器上。在到达检测器阵列之前，光束通过旋转补偿器。处理器用于通过分析沿着一个或多个方位角并且处于不同补偿器位置的光电探测器的输出来评估样本。

62. 发明授权

US07233390B2 Scatterometry for samples with non-uniform edges 有权
标题翻译：具有不均匀边缘的样品的散射法
公开(公告)号：US07233390B2
公开(公告)日：2007-06-19
申请号：US10795915
申请日：2004-03-08
申请人： Yia-Chung Chang , Hanyou Chu , Jon Opsal
发明人： Yia-Chung Chang , Hanyou Chu , Jon Opsal
IPC分类号： G01N21/00
CPC分类号： G01N21/95607
摘要： A method for simulating the optical properties of samples having non-uniform line edges includes creating a model for the sample being analyzed. To simulate roughness, lines within the model are represented as combinations of three dimensional objects, such as circular or elliptical mesas. The three-dimensional objects are arranged in a partially overlapping linear fashion. The objects, when spaced closely together resemble a line with edge roughness that corresponds to the object size and pitch. A second method allows lines within the model to vary in width over their lengths. The model is evaluated using a suitable three-dimensional technique to simulate the optical properties of the sample being analyzed.
摘要翻译：用于模拟具有不均匀线边缘的样品的光学性质的方法包括为正在分析的样品创建模型。为了模拟粗糙度，模型中的线被表示为三维对象的组合，例如圆形或椭圆形台面。三维物体以部分重叠的线性方式排列。当物体间隔紧密的时候，物体的边缘粗糙度对应于物体的大小和间距。第二种方法允许模型内的线宽度在其长度上变化。使用合适的三维技术评估该模型，以模拟正在分析的样品的光学性质。

63. 发明授权

US07215431B2 Systems and methods for immersion metrology 有权
标题翻译：沉浸计量系统和方法
公开(公告)号：US07215431B2
公开(公告)日：2007-05-08
申请号：US10794094
申请日：2004-03-04
申请人： Jon Opsal
发明人： Jon Opsal
IPC分类号： G01B11/28 , G01B11/06
CPC分类号： G01N21/211 , G01B11/0641 , G01B2210/56
摘要： Fluid immersion technology can be utilized to increase the resolution and angular range of existing metrology systems. An immersion fluid placed between the metrology optics and the sample can reduce the refraction at the sample interface, thereby decreasing the spot size of the beam on a feature of the sample while simultaneously increasing the angular range of the system. The decreased spot size, in combination with an increased angular spread, allows an existing metrology system to measure parameters of a sample, such as a semiconductor or microelectronic device, with improved resolution and without expensive and/or complex changes to the mechanics of the metrology system.
摘要翻译：流体浸没技术可用于提高现有计量系统的分辨率和角度范围。放置在计量光学元件和样品之间的浸没流体可以减少样品界面处的折射，从而在样品特征上减小光束的光斑尺寸，同时增加系统的角度范围。减小的光斑尺寸与增加的角度扩展相结合，允许现有的计量系统以改进的分辨率测量样品（例如半导体或微电子器件）的参数，并且不会对计量学的力学进行昂贵和/或复杂的变化系统。

64. 发明授权

US07206070B2 Beam profile ellipsometer with rotating compensator 有权
标题翻译：带旋转补偿器的光束椭偏仪
公开(公告)号：US07206070B2
公开(公告)日：2007-04-17
申请号：US11269204
申请日：2005-11-08
申请人： Jon Opsal
发明人： Jon Opsal
IPC分类号： G01N11/06
CPC分类号： G01J4/04 , G01N21/211
摘要： An optical inspection device includes a light source for generating a probe beam. The probe beam is focused onto a sample to create a spread of angles of incidence. After reflecting from the sample, the light is imaged onto a two dimensional array of photodetectors. Prior to reaching the detector array, the beam is passed through a rotating compensator. A processor functions to evaluate the sample by analyzing the output of the photodetectors lying along one or more azimuthal angles and at different compensator positions.
摘要翻译：光学检查装置包括用于产生探测光束的光源。探测光束被聚焦到样品上以产生入射角的扩展。从样品反射后，将光成像到二维阵列的光电探测器上。在到达检测器阵列之前，光束通过旋转补偿器。处理器用于通过分析沿着一个或多个方位角并且处于不同补偿器位置的光电探测器的输出来评估样本。

65. 发明申请

US20070040852A1 Global shape definition method for scatterometry 有权
标题翻译：用于散点的全局形状定义方法
公开(公告)号：US20070040852A1
公开(公告)日：2007-02-22
申请号：US11542806
申请日：2006-10-04
申请人： Jon Opsal , Hanyou Chu , Xuelong Cao , Youxian Wen
发明人： Jon Opsal , Hanyou Chu , Xuelong Cao , Youxian Wen
IPC分类号： G09G5/00
CPC分类号： G01N21/4788
摘要： A method for modeling samples includes the use of control points to define lines profiles and other geometric shapes. Each control point used within a model influences a shape within the model. Typically, the control points are used in a connect-the-dots fashion where a set of dots defines the outline or profile of a shape. The layers within the sample are typically modeled independently of the shape defined using the control points. The overall result is to minimize the number of parameters used to model shapes while maintaining the accuracy of the resulting scatterometry models.
摘要翻译：用于建模样本的方法包括使用控制点来定义线轮廓和其他几何形状。模型中使用的每个控制点影响模型内的形状。通常，控制点以连接点的方式使用，其中一组点定义形状的轮廓或轮廓。样品中的层通常被模拟，独立于使用控制点定义的形状。总体结果是最小化用于建模形状的参数数量，同时保持得到的散射测量模型的准确性。

66. 发明授权

US07085676B2 Feed forward critical dimension control 有权
标题翻译：前馈关键维度控制
公开(公告)号：US07085676B2
公开(公告)日：2006-08-01
申请号：US10801023
申请日：2004-03-15
申请人： Jon Opsal , Youxian Wen
发明人： Jon Opsal , Youxian Wen
IPC分类号： G06F11/30 , G01B11/02
CPC分类号： G03F7/70625
摘要： Feed forward techniques can be used to improve optical metrology measurements for microelectronic devices. Metrology tools can be used to measure parameters such as critical dimension, profile, index of refraction, and thickness, as well as various material properties. Three-dimensional feature characterizations can be performed, from which parameters can be extracted and correlations executed. Process fingerprints on a wafer can be tracked after each process step, such that correlation between profile and structure parameters can be established and deviations from specification can be detected instantaneously. A “feed forward” approach allows information relating to dimensions, profiles, and layer thicknesses to be passed on to subsequent process steps. By retaining information from previous process steps, calculations such as profile determinations can be simplified by reducing the number of variables and degrees of freedom used in the calculation.
摘要翻译：前馈技术可用于改进微电子器件的光学测量测量。计量工具可用于测量临界尺寸，型材，折射率和厚度等参数，以及各种材料性能。可以执行三维特征表征，从中可以提取参数并执行相关性。可以在每个处理步骤之后跟踪晶片上的处理指纹，使得可以建立轮廓和结构参数之间的相关性并且可以立即检测到与规格的偏差。 “前馈”方法允许将与尺寸，型材和层厚度相关的信息传递到后续的工艺步骤。通过保留先前工艺步骤的信息，可以通过减少在计算中使用的变量数量和自由度来简化诸如简档确定之类的计算。

67. 发明授权

US07038850B2 CD metrology analysis using green's function 有权
标题翻译： CD测量分析使用绿色功能
公开(公告)号：US07038850B2
公开(公告)日：2006-05-02
申请号：US11030735
申请日：2005-01-06
申请人： Yia Chung Chang , Hanyou Chu , Jon Opsal
发明人： Yia Chung Chang , Hanyou Chu , Jon Opsal
IPC分类号： G01B11/00
CPC分类号： G01N21/4788
摘要： A method for modeling optical scattering includes an initial step of defining a zero-th order structure (an idealized representation) for a subject including a perturbation domain and a background material. A Green's function and a zero-th order wave function are obtained for the zero-th order structure using rigorous coupled wave analysis (RCWA). A Lippmann-Schwinger equation is constructed including the Green's function, zero-th order wave function and a perturbation function. The Lippmann-Schwinger equation is then evaluated over a selected set of mesh points within the perturbation domain. The resulting linear equations are solved to compute one or more reflection coefficients for the subject.
摘要翻译：一种用于模拟光学散射的方法包括为包括扰动域和背景材料的对象定义零级结构（理想化表示）的初始步骤。使用严格的耦合波分析（RCWA）为零阶结构获得了绿色函数和零阶波函数。构建了包括绿色函数，零阶波函数和扰动函数的Lippmann-Schwinger方程。然后在扰动域内的选定的一组网格点上评估Lippmann-Schwinger方程。求出所得到的线性方程，以计算被摄体的一个或多个反射系数。

68. 发明申请

US20060012803A1 Critical dimension analysis with simultaneous multiple angle of incidence measurements 有权
公开(公告)号：US20060012803A1
公开(公告)日：2006-01-19
申请号：US11231638
申请日：2005-09-21
申请人： Jon Opsal , Allan Rosencwaig
发明人： Jon Opsal , Allan Rosencwaig
IPC分类号： G01B11/14
CPC分类号： G01B11/024 , G01B11/02 , G01B11/14 , G03F7/70625
摘要： A method and apparatus are disclosed for evaluating relatively small periodic structures formed on semiconductor samples. In this approach, a light source generates a probe beam which is directed to the sample. In one preferred embodiment, an incoherent light source is used. A lens is used to focus the probe beam on the sample in a manner so that rays within the probe beam create a spread of angles of incidence. The size of the probe beam spot on the sample is larger than the spacing between the features of the periodic structure so some of the light is scattered from the structure. A detector is provided for monitoring the reflected and scattered light. The detector includes multiple detector elements arranged so that multiple output signals are generated simultaneously and correspond to multiple angles of incidence. The output signals are supplied to a processor which analyzes the signals according to a scattering model which permits evaluation of the geometry of the periodic structure. In one embodiment, the sample is scanned with respect to the probe beam and output signals are generated as a function of position of the probe beam spot.

69. 发明授权

US06972852B2 Critical dimension analysis with simultaneous multiple angle of incidence measurements 有权
标题翻译：具有同时多重入射角测量的关键尺寸分析
公开(公告)号：US06972852B2
公开(公告)日：2005-12-06
申请号：US10973703
申请日：2004-10-26
申请人： Jon Opsal , Allan Rosencwaig
发明人： Jon Opsal , Allan Rosencwaig
IPC分类号： G01B11/02 , G01B11/14
CPC分类号： G01B11/024 , G01B11/02 , G01B11/14 , G03F7/70625
摘要： A method and apparatus are disclosed for evaluating relatively small periodic structures formed on semiconductor samples. In this approach, a light source generates a probe beam which is directed to the sample. In one preferred embodiment, an incoherent light source is used. A lens is used to focus the probe beam on the sample in a manner so that rays within the probe beam create a spread of angles of incidence. The size of the probe beam spot on the sample is larger than the spacing between the features of the periodic structure so some of the light is scattered from the structure. A detector is provided for monitoring the reflected and scattered light. The detector includes multiple detector elements arranged so that multiple output signals are generated simultaneously and correspond to multiple angles of incidence. The output signals are supplied to a processor which analyzes the signals according to a scattering model which permits evaluation of the geometry of the periodic structure. In one embodiment, the sample is scanned with respect to the probe beam and output signals are generated as a function of position of the probe beam spot.
摘要翻译：公开了一种用于评估在半导体样品上形成的相对小的周期性结构的方法和装置。在这种方法中，光源产生指向样品的探针束。在一个优选实施例中，使用非相干光源。使用透镜将探针束聚焦在样品上，使得探针束内的射线产生入射角的扩展。样品上的探针光斑的尺寸大于周期结构特征之间的间距，所以一些光从结构散射。提供了一种用于监测反射和散射光的检测器。检测器包括多个检测器元件，其布置成使得多个输出信号同时产生并对应于多个入射角。输出信号被提供给处理器，该处理器根据允许评估周期性结构的几何形状的散射模型分析信号。在一个实施例中，相对于探测光束扫描样品，并且根据探针束斑的位置产生输出信号。

70. 发明授权

US06963401B2 Combination thermal wave and optical spectroscopy measurement systems 失效
标题翻译：组合热波和光谱测量系统
公开(公告)号：US06963401B2
公开(公告)日：2005-11-08
申请号：US10691132
申请日：2003-10-22
申请人： Jon Opsal , Minna Hovinen
发明人： Jon Opsal , Minna Hovinen
IPC分类号： G01N21/17 , G01N21/21 , G01J4/00
CPC分类号： G01N21/1717 , G01N21/211
摘要： A combination metrology tool is disclosed which is capable of obtaining both thermal wave and optical spectroscopy measurements on a semiconductor wafer. In a preferred embodiment, the principal combination includes a thermal wave measurement and a spectroscopic ellipsometric measurement. These measurements are used to characterize ion implantation processes in semiconductors over a large dosage range.
摘要翻译：公开了一种能够在半导体晶片上获得热波和光谱测量的组合计量工具。在优选实施例中，主要组合包括热波测量和光谱椭偏测量。这些测量用于表征在大剂量范围内的半导体中的离子注入过程。

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