专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

61. 发明专利

JP2009060112A Single type substrate treating apparatus and cleaning method thereof 审中-公开
标题翻译：单类基板处理装置及其清洗方法
公开(公告)号：JP2009060112A
公开(公告)日：2009-03-19
申请号：JP2008222199
申请日：2008-08-29
申请人： Semes Co Ltd , セメス株式会社Semes Co., Ltd.
发明人： CHOI CHUNG-SIC , JANG YONG-JU
IPC分类号： H01L21/304 , H01L21/683
CPC分类号： H01L21/67051
摘要： PROBLEM TO BE SOLVED: To provide a single type substrate treating apparatus that can remove pollution materials on a substrate support member supporting a substrate and minimize thermal deformation of the substrate support member due to a high-temperature chemical solution, and to provide the cleaning method thereof. SOLUTION: A chemical solution is sprayed onto the bottom surface of a substrate W supported by a substrate support member 200 in a state spaced upwardly from the substrate support member 200 to treat the substrate W, and a cleaning solution is sprayed onto the top surface of the substrate support member 200 to remove the chemical solution remaining on the substrate support member 200. The thermal deformation of the substrate support member 200 can be minimized by cleaning the substrate support member 200 using the cleaning solution in a room-temperature state after a series of repeated substrate treating processes. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种可以消除支撑基板的基板支撑部件上的污染物质并使由于高温化学溶液引起的基板支撑部件的热变形最小化的单一基板处理装置，并提供其清洗方法。解决方案：以与衬底支撑构件200向上间隔开的状态将化学溶液喷涂到由衬底支撑构件200支撑的衬底W的底表面上，以处理衬底W，并将清洁溶液喷涂到基板支撑构件200的上表面，以去除残留在基板支撑构件200上的化学溶液。通过使用室温状态下的清洁溶液清洁基板支撑构件200，可以最小化基板支撑构件200的热变形经过一系列重复的底物处理工艺。版权所有（C）2009，JPO＆INPIT

62. 发明专利

JP5686261B2 基板処理装置及び基板処理方法有权
标题翻译：一种基板处理装置和基板处理方法
公开(公告)号：JP5686261B2
公开(公告)日：2015-03-18
申请号：JP2012163299
申请日：2012-07-24
申请人：セメス株式会社SEMES CO., Ltd , セメス株式会社SEMES CO., Ltd
发明人：ボンキム , ボンキム , オジンウォン , オジンウォン , チャン　スンホ , スンホチャン , ジョジパク , ジョジパク
IPC分类号： H01L21/304
CPC分类号： H01L21/67028 , F26B25/14 , H01L21/67034 , H01L21/67051 , H01L21/67109 , H01L21/67126 , H01L21/67178 , H01L21/6719 , H01L21/67748 , H01L21/6875

63. 发明专利

JP5641374B2 基板処理装置有权
公开(公告)号：JP5641374B2
公开(公告)日：2014-12-17
申请号：JP2013116258
申请日：2013-05-31
申请人：セメス株式会社SEMES CO., Ltd , セメス株式会社SEMES CO., Ltd
发明人：ヨンフンチョイ , ヨンフンチョイ , ジョンソンパク , ジョンソンパク , ピルキュンヘオ , ピルキュンヘオ
IPC分类号： H01L21/304
CPC分类号： H01L21/67034 , H01L21/67017

64. 发明专利

JP5639686B2 基板処理方法有权
公开(公告)号：JP5639686B2
公开(公告)日：2014-12-10
申请号：JP2013115646
申请日：2013-05-31
申请人：セメス株式会社SEMES CO., Ltd , セメス株式会社SEMES CO., Ltd
发明人：基峰金 , 基峰金 , 鵬金 , 鵬金 , 吉勳宋 , 吉勳宋 , 五珍権 , 五珍権
IPC分类号： H01L21/304
CPC分类号： H01L21/02101 , B08B7/0021 , F26B21/12 , F26B21/14 , H01L21/67017 , H01L21/67034 , H01L21/67051

65. 发明专利

JP2013232650A Substrate cleaning device and substrate cleaning method 有权
标题翻译：基板清洁装置和基板清洁方法
公开(公告)号：JP2013232650A
公开(公告)日：2013-11-14
申请号：JP2013095894
申请日：2013-04-30
申请人： Semes Co Ltd , セメス株式会社SEMES CO., Ltd
发明人： KIM YOO HWAN , KANG BYUNG MAN , OH SE HOON , KIM YEON JOON
IPC分类号： H01L21/304
CPC分类号： B08B3/10 , H01L21/67028 , H01L21/67051
摘要： PROBLEM TO BE SOLVED: To provide a substrate cleaning device capable of improving drying efficiency.SOLUTION: A substrate cleaning device comprises: a first step chamber 260 for supplying processing liquid to a substrate and treating it with the liquid; a second step chamber 280 for drying the substrate; and a conveying unit 500 for conveying the substrate between the first step chamber 260 and the second step chamber 280. The first step chamber 260 comprises: a liquid treatment housing for supplying a space in which the substrate is treated with the liquid; a spin chuck 340 supporting the substrate in the liquid treatment housing; and a liquid supply member 380 for supplying the treatment liquid to the substrate supported by the spin chuck 340. The second step chamber 280 comprises: a drying housing 410 for providing a space in which the substrate is dried; a substrate support member 430 supporting the substrate in the drying chamber 410; and a heater 440 for heating the substrate.
摘要翻译：要解决的问题：提供能够提高干燥效率的基板清洗装置。解决方案：基板清洗装置包括：第一阶段室260，用于将处理液体提供给基板并用液体处理; 用于干燥基板的第二台阶室280; 以及用于在第一台阶室260和第二台阶室280之间输送基板的输送单元500.第一阶段室260包括：用于供应其中用基板处理液体的空间的液体处理壳体; 支撑液体处理壳体中的基板的旋转卡盘340; 以及用于将处理液供给到由旋转卡盘340支撑的基板的液体供给构件380.第二台阶室280包括：干燥壳体410，用于提供干燥基板的空间; 将基板支撑在干燥室410中的基板支撑部件430; 以及用于加热衬底的加热器440。

66. 发明专利

JP2013078757A Substrate processing apparatus and substrate processing method 审中-公开
标题翻译：基板处理装置和基板处理方法
公开(公告)号：JP2013078757A
公开(公告)日：2013-05-02
申请号：JP2012188085
申请日：2012-08-28
申请人： Semes Co Ltd , セメス株式会社SEMES CO., Ltd
发明人： PARK CHUL HO
IPC分类号： B05C9/12 , B05B5/025 , B05B5/08 , B05C5/00 , B05C13/00 , B05D1/26 , B05D3/00 , H05K3/10
摘要： PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a substrate processing method for forming a line on the substrate and solidifying the same.SOLUTION: The substrate processing apparatus 100 includes: a stage 1100 for placing the substrate S; a discharge unit 1200 discharging ink I and forming a plurality of lines on the substrate S placed on the stage 1100; a solidifying unit 1400 for solidifying the discharged ink I; and a transferring unit 1500 moving the stage 1100 or moving the discharge unit 1200 and solidifying unit 1400.
摘要翻译：要解决的问题：提供一种用于在基板上形成线并使其固化的基板处理装置和基板处理方法。＆lt; P＆gt;解决方案：基板处理装置100包括：用于放置基板S的台1100; 排出单元1200排出油墨I并在放置在台1100上的基板S上形成多条线; 用于固化排出的油墨I的固化单元1400; 以及移动台1100或移动排出单元1200和固化单元1400的转移单元1500.（C）2013，JPO和INPIT

67. 发明专利

JP2013031840A Substrate processing apparatus and method 有权
标题翻译：基板加工装置和方法
公开(公告)号：JP2013031840A
公开(公告)日：2013-02-14
申请号：JP2012166684
申请日：2012-07-27
申请人： Semes Co Ltd , セメス株式会社SEMES CO., Ltd
发明人： KIM CHULWOO , LEE SUNGHEE
IPC分类号： B05C9/06 , B05C5/00 , B05D1/26 , B05D1/36 , G02F1/13 , H01L21/683
摘要： PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and method capable of shortening an entire process time.SOLUTION: The substrate processing apparatus includes: a substrate supporting unit for supporting a substrate; an inkjet nozzle for ejecting a first processing liquid to the substrate; a coating nozzle for ejecting a second processing liquid different from the first processing liquid to the substrate; and a gentry unit for linearly moving the inkjet nozzle and the coating nozzle in the first direction so that the position of the inkjet nozzle and the coating nozzle can be changed relative to the substrate supporting unit.
摘要翻译：解决的问题：提供能够缩短整个处理时间的基板处理装置和方法。解决方案：基板处理装置包括：用于支撑基板的基板支撑单元; 用于将第一处理液喷射到基板的喷墨喷嘴; 用于将不同于所述第一处理液体的第二处理液喷射到所述基板的涂布喷嘴; 以及用于沿着第一方向线性地移动喷墨喷嘴和涂布喷嘴的绅士单元，使得可以相对于基板支撑单元改变喷墨喷嘴和涂布喷嘴的位置。版权所有（C）2013，JPO＆INPIT

68. 发明专利

JP2013016804A Electrostatic chucks, substrate treating apparatuses including the same, and substrate treating methods 审中-公开
标题翻译：静电切割机，包括其的基板处理装置以及基板处理方法
公开(公告)号：JP2013016804A
公开(公告)日：2013-01-24
申请号：JP2012147040
申请日：2012-06-29
申请人： Semes Co Ltd , セメス株式会社SEMES CO., Ltd
发明人： YI WON-HEN
IPC分类号： H01L21/683 , B23Q3/15 , H02N13/00
CPC分类号： H01L21/6833 , H01J37/32715
摘要： PROBLEM TO BE SOLVED: To provide an electrostatic chuck capable of stably chucking a substrate.SOLUTION: The electrostatic chuck for fixing a substrate using electrostatic force includes: a dielectric plate on which the substrate is placed; a first electrode disposed in an inner center region of the dielectric plate, and working as one of a positive electrode and a negative electrode; and a second electrode disposed in an inner edge region of the dielectric plate so as to surround the first electrode, and working as the other of a positive electrode and a negative electrode. The second electrode has an area different from that of the first electrode.
摘要翻译：要解决的问题：提供一种能够稳定地夹持基板的静电卡盘。解决方案：用于使用静电力固定基板的静电卡盘包括：放置基板的电介质板; 所述第一电极设置在所述电介质板的内部中心区域中，并且作为正极和负极之一工作; 以及设置在所述电介质板的内缘区域中以包围所述第一电极并且作为正极和负极中的另一个工作的第二电极。第二电极具有与第一电极不同的面积。版权所有（C）2013，JPO＆INPIT

69. 发明专利

JP2010067978A Photoresist supply device and method 审中-公开
标题翻译：光电设备和方法
公开(公告)号：JP2010067978A
公开(公告)日：2010-03-25
申请号：JP2009207317
申请日：2009-09-08
申请人： Semes Co Ltd , セメス株式会社Semes Co., Ltd.
发明人： HWANG SOO MIN , KIM DONG-HO
IPC分类号： H01L21/027 , B05C11/10
CPC分类号： G03F7/16 , B05C11/1013
摘要： PROBLEM TO BE SOLVED: To provide a photoresist supply device that is capable of supplying a constant amount of a photoresist and of previously detecting the presence of an abnormality in the constant discharge of a photoresist and the presence of air bubbles, and is employed in a semiconductor photolithography process.
SOLUTION: The photoresist supply device includes: a discharge nozzle for discharging the photoresist to a wafer; a metering pump for supplying a constant amount of the photoresist to the discharge nozzle; a trap tank for temporarily storing the photoresist that is supplied from the metering pump to the discharge nozzle; a bottle filled with the photoresist that is stored in the trap tank; an air bubble detection member for detecting whether air bubbles are included in the photoresist that is on standby to be supplied from the metering pump to the discharge nozzle; and a first drain line for coupling the metering pump to a waste fluid tank in order to drain the photoresist on standby in the metering pump to the waste fluid tank when the air bubble detection member detects the presence of the air bubbles.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供能够提供恒定量的光致抗蚀剂并且预先检测光致抗蚀剂的恒定放电中的异常的存在和气泡的存在的光致抗蚀剂供应装置，并且是用于半导体光刻工艺。解决方案：光致抗蚀剂供应装置包括：用于将光致抗蚀剂排放到晶片的放电喷嘴; 用于将一定量的光致抗蚀剂供应到排出喷嘴的计量泵; 用于临时存储从计量泵供给到排出喷嘴的光致抗蚀剂的捕集槽; 填充有存储在捕集罐中的光致抗蚀剂的瓶子; 气泡检测部件，用于检测处于备用状态的光致抗蚀剂中是否包含气泡以从计量泵供给至排出喷嘴; 以及用于将计量泵连接到废液箱的第一排水管线，以便当气泡检测构件检测到气泡的存在时，将计量泵中待机的光致抗蚀剂排出到废液箱。版权所有（C）2010，JPO＆INPIT

70. 发明专利

JP2010016387A Substrate conveyance equipment and method for conveying substrate 审中-公开
标题翻译：基板输送装置及输送基板的方法
公开(公告)号：JP2010016387A
公开(公告)日：2010-01-21
申请号：JP2009160424
申请日：2009-07-07
申请人： Semes Co Ltd , セメス株式会社Semes Co., Ltd.
发明人： YEO YOUNG KOO , KIM TAE HO , CHOI JIN-YOUNG
IPC分类号： H01L21/677
CPC分类号： H01L21/67775 , H01L21/67769
摘要： PROBLEM TO BE SOLVED: To provide substrate conveyance equipment for conveying a semiconductor substrate, and a method of conveying the substrate.
SOLUTION: The substrate conveyance equipment includes a main mounting unit, a buffer mounting unit, and a distribution unit. The main mounting unit is disposed at the front of a process module for mounting a plurality of containers. Each of containers can contain a plurality of substrates. The main mounting unit is configured to convey substrates between the mounted containers and the process module. The buffer mounting unit can mount a plurality of containers. The distribution unit disposed above the main mounting unit conveys the container between the main mounting unit and the buffer mounting unit. Thus, the substrate conveyance equipment provided with a buffer mounting unit for mounting containers conveys containers between the main mounting unit and the buffer mounting unit through the distribution unit so that a time required for conveying the substrates is shortened and productivity is increased.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供用于输送半导体衬底的衬底输送设备以及输送衬底的方法。解决方案：基板输送设备包括主安装单元，缓冲器安装单元和分配单元。主安装单元设置在用于安装多个容器的处理模块的前部。每个容器可以包含多个基底。主安装单元构造成在安装的容器和处理模块之间输送基板。缓冲器安装单元可以安装多个容器。设置在主安装单元上方的分配单元在主安装单元和缓冲器安装单元之间传送容器。因此，设置有用于安装容器的缓冲器安装单元的基板输送设备通过分配单元在主安装单元和缓冲器安装单元之间输送容器，从而缩短输送基板所需的时间并提高生产率。版权所有（C）2010，JPO＆INPIT

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式