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61. 发明授权

US07977651B2 Illumination system particularly for microlithography 有权
标题翻译：照明系统特别适用于微光刻
公开(公告)号：US07977651B2
公开(公告)日：2011-07-12
申请号：US12547135
申请日：2009-08-25
申请人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
发明人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
IPC分类号： G01T1/20 , A61N5/00
CPC分类号： G21K1/06 , B82Y10/00 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358
摘要： There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.
摘要翻译：提供了一种用于投影曝光装置的投影物镜，该投影曝光装置具有用于发射具有波长＆nlE; 193nm的主射线的电磁辐射的主光源。投影物镜包括物平面，第一镜，第二镜，第三镜，第四镜; 和一个图像平面。物体平面，第一反射镜，第二反射镜，第三反射镜，第四反射镜和像平面以围绕公共光轴的中心布置布置。第一镜，第二镜，第三镜和第四镜位于物平面和像平面之间。当从主光源方向入射到物平面中的物体上时，主光线远离公共光轴倾斜。

62. 发明申请

US20110122384A1 IMAGING OPTICS 有权
标题翻译：成像光学
公开(公告)号：US20110122384A1
公开(公告)日：2011-05-26
申请号：US13006025
申请日：2011-01-13
申请人： Hans-Juergen Mann
发明人： Hans-Juergen Mann
IPC分类号： G03F7/20 , G02B17/06 , G03B27/70
CPC分类号： G03F7/70233 , G02B17/0663
摘要： An imaging optics has a plurality of mirrors to image an object field in an object plane into an image field in an image plane. At least one of the mirrors has a through opening for the passage of imaging light. An arrangement of the mirrors is such that principal rays run parallel or divergently in the beam path of the imaging light between the object plane and the first downstream mirror. The imaging optics can have an entrance pupil plane that lies in the beam path of the imaging light in the range of between 5 m and 2000 m in front of the object plane. The imaging optics can have an entrance pupil plane that lies in the beam path of the imaging light in the range of between 100 mm and 5000 mm in front of the object plane. Imaging optics with improved imaging quality are provided.
摘要翻译：成像光学元件具有多个反射镜，用于将物平面中的物场映像成图像平面中的图像场。至少一个反射镜具有用于成像光通过的通孔。反射镜的布置使得主光线在物平面和第一下游反射镜之间的成像光束的光束路径中平行或分散地延伸。成像光学器件可以具有入射光瞳平面，该入射光瞳平面位于物体平面前面的5m和2000m之间的成像光束的光束路径中。成像光学器件可以具有入射光瞳平面，该入射光瞳平面位于物体平面前方的成像光束的光束路径中的介于100mm与5000mm之间的范围内。提供了具有改善成像质量的成像光学元件。

63. 发明申请

US20100265572A1 CATADIOPTRIC PROJECTION OBJECTIVE 有权
标题翻译：目标投影目标
公开(公告)号：US20100265572A1
公开(公告)日：2010-10-21
申请号：US12816863
申请日：2010-06-16
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
IPC分类号： G02B17/08
CPC分类号： G02B17/0816 , G02B13/16 , G02B13/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G02B21/02 , G02B21/33 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分，其包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径Dmax，最大像场高度Y'和像侧数值孔径NA; 其中COMP1 = Dmax /（Y'·NA2），并且其中条件COMP1 <10成立。

64. 发明申请

US20100253999A1 CATADIOPTRIC PROJECTION OBJECTIVE 有权
标题翻译：目标投影目标
公开(公告)号：US20100253999A1
公开(公告)日：2010-10-07
申请号：US12817628
申请日：2010-06-17
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
IPC分类号： G02B17/08
CPC分类号： G02B17/0804 , G02B17/08 , G02B17/0812 , G02B17/0844 , G02B17/0856 , G02B17/0892 , G03F7/70225
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的反射折射投射物镜包括：用于将设置在物平面中的图案成像为第一中间图像的第一物镜部分; 第二目标部分，用于将第一中间成像成像成第二中间图像; 用于将第二中间成像直接成像到图像平面上的第三目标部分; 其中具有第一连续镜面的第一凹面镜和具有第二连续镜面的至少一个第二凹面镜布置在所述第二中间图像的上游; 瞳孔表面形成在物平面与第一中间图像之间，第一和第二中间图像之间以及第二中间图像与图像平面之间; 并且所有凹面反射镜光学地远离光瞳表面布置。该系统具有中等透镜材料质量消耗的非常高的数值孔径的潜力。

65. 发明申请

US20100231886A1 IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY INCLUDING AN IMAGING OPTICAL SYSTEM 有权
标题翻译：成像光学系统和投影曝光装置，包括成像光学系统的微观计算
公开(公告)号：US20100231886A1
公开(公告)日：2010-09-16
申请号：US12767574
申请日：2010-04-26
申请人： Hans-Juergen Mann
发明人： Hans-Juergen Mann
IPC分类号： G02B17/06 , G03B27/54 , G03F7/20
CPC分类号： G02B17/0657 , G03F7/70233
摘要： In certain aspects, imaging optical systems with a plurality of mirrors image an object field in an object plane into an image field in an image plane. In the light path between non-obscured mirrors, imaging rays pass through at least one multiple pass-through region between spaced-apart planes which are arranged parallel to the object plane and/or parallel to the image plane. The imaging optical systems have at least one pupil plane. The pupil plane is arranged outside the multiple pass-through region between the non-obscured mirrors. This can provide an imaging optical system which provides for an easier correction of image errors
摘要翻译：在某些方面，具有多个反射镜的成像光学系统将物平面中的物体场图像成像面中的图像场。在非模糊反射镜之间的光路中，成像光线穿过平行于物平面和/或平行于像平面的间隔开的平面之间的至少一个多通道区域。成像光学系统具有至少一个光瞳平面。瞳孔平面布置在非遮蔽镜之间的多个通过区域的外侧。这可以提供一种能够更容易地校正图像误差的成像光学系统

66. 发明申请

US20100208225A1 PROJECTION OBJECTIVE FOR MICRLOLITHOGRAPHY HAVING AN OBSCURATED PUPIL 审中-公开
标题翻译：用于具有观察平板的微结构的投影目标
公开(公告)号：US20100208225A1
公开(公告)日：2010-08-19
申请号：US12723456
申请日：2010-03-12
申请人： Daniel Kraehmer , Aurelian Dodoc , Hans-Juergen Mann , Toralf Gruner
发明人： Daniel Kraehmer , Aurelian Dodoc , Hans-Juergen Mann , Toralf Gruner
IPC分类号： G03B27/54 , G02B9/00
CPC分类号： G02B5/003 , G02B5/005 , G02B17/0657 , G02B27/0018 , G03F7/70233
摘要： A projection objective with obscurated pupil for microlithography has a first optical surface, which has a first region provided for application of useful light, and at least one second optical surface, which has a second region provided for application of useful light. A beam envelope of the useful light extends between the first region and the second region. At least one tube open on the input side and on the output side in the light propagation direction severs to screen scattered light. The at least one tube is between the first optical surface and the second optical surface. The wall of the tube is opaque in the wavelength range of the useful light. The tube extends in the propagation direction of the useful light over at least a partial length of the beam envelope and circumferentially surrounds the beam envelope.
摘要翻译：具有用于微光刻的遮蔽光瞳的投影物镜具有第一光学表面，其具有提供用于施加有用光的第一区域和至少一个第二光学表面，该第二光学表面具有用于施加有用光的第二区域。有用光的束包络在第一区域和第二区域之间延伸。在光传播方向上的至少一个在输入侧和输出侧开口的管切断以屏蔽散射光。所述至少一个管在所述第一光学表面和所述第二光学表面之间。管的壁在有用光的波长范围内是不透明的。管在有用光的传播方向上延伸到束包络的至少一部分长度上并且周向地包围光束包络。

67. 发明申请

US20090268189A1 MASKS, LITHOGRAPHY DEVICE AND SEMICONDUCTOR COMPONENT 有权
标题翻译：掩模，光刻设备和半导体元件
公开(公告)号：US20090268189A1
公开(公告)日：2009-10-29
申请号：US12498226
申请日：2009-07-06
申请人： Hans-Juergen MANN , Martin Lowisch , Wolfgang Singer
发明人： Hans-Juergen MANN , Martin Lowisch , Wolfgang Singer
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F7/70091 , G03F7/70191 , G21K2201/061
摘要： One problem of projection optics concerns pupil apodization which leads to imaging defects. As here proposed, the illumination system is configured to illuminate the mask inhomogeneously. As a result, inhomogeneities in reflectivity caused by the mask itself are at least partly counteracted. This compensation not only makes the apodization over the pupil become more symmetric but also makes the intensity variation smaller overall.
摘要翻译：投影光学的一个问题涉及导致成像缺陷的瞳孔变迹。如这里提出的，照明系统被配置为不均匀地照亮掩模。结果，由掩模本身引起的反射率的不均匀性至少部分被抵消。这种补偿不仅使瞳孔变得更加对称，而且使得整体的强度变化更小。

68. 发明申请

US20090073398A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置
公开(公告)号：US20090073398A1
公开(公告)日：2009-03-19
申请号：US12210514
申请日：2008-09-15
申请人： Michael Totzeck , Aksel Goehnermeier , Wolfgang Singer , Helmut Beierl , Heiko Feldmann , Hans-Juergen Mann , Jochen Hetzler
发明人： Michael Totzeck , Aksel Goehnermeier , Wolfgang Singer , Helmut Beierl , Heiko Feldmann , Hans-Juergen Mann , Jochen Hetzler
IPC分类号： G03B27/52 , G03B27/72
CPC分类号： G03F7/70308 , G03F7/70216 , G03F7/70566
摘要： The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an object plane of the projection objective. The mask can have structures which are to be imaged. The method can include illuminating a pupil plane of the illumination system with light. The method can also include modifying, in a plane of the projection objective, the phase, amplitude and/or polarization of the light passing through that plane. The modification can be effected for at least two diffraction orders in mutually different ways. A mask-induced loss in image contrast obtained in the imaging of the structures can be reduced compared to a method without the modification.
摘要翻译：本发明涉及微光刻投影曝光装置和微光刻投影曝光装置，以及通过该方法制造的相关部件，方法和制品。微光刻投影曝光装置包括照明系统和投影物镜。照明系统可以照亮布置在投影物镜的物平面中的掩模。掩模可以具有待成像的结构。该方法可以包括用光照射照明系统的光瞳平面。该方法还可以包括在投影物镜的平面中修改通过该平面的光的相位，幅度和/或极化。可以以相互不同的方式对至少两个衍射级进行修改。与没有修改的方法相比，在结构成像中获得的掩模诱导的图像对比损失可以减少。

69. 发明申请

US20080315134A1 OPTICAL SYSTEM FOR RADIATION IN THE EUV-WAVELENGTH RANGE AND METHOD FOR MEASURING A CONTAMINATION STATUS OF EUV-REFLECTIVE ELEMENTS 有权
标题翻译：用于辐射EUV波长范围的光学系统和测量EUV反射元件的污染状态的方法
公开(公告)号：US20080315134A1
公开(公告)日：2008-12-25
申请号：US11855849
申请日：2007-09-14
申请人： Dirk Heinrich EHM , Hermann Bieg , Hans-Juergen Mann , Stephan Muellender , Johannes Hubertus Josephina Moors , Bastian Theodor Wolschrijn
发明人： Dirk Heinrich EHM , Hermann Bieg , Hans-Juergen Mann , Stephan Muellender , Johannes Hubertus Josephina Moors , Bastian Theodor Wolschrijn
IPC分类号： A61N5/06 , G03B27/54
CPC分类号： G03F7/70916 , G03F7/7085 , G03F7/70941
摘要： An optical system for radiation in the EUV wavelength range, in particular a projection exposure apparatus, having at least one vacuum vessel, including: at least one EUV-reflective optical element arranged in an optical path, and a holder which includes at least one sample element, the sample element having an optical surface which is exposed to incident EUV-radiation outside of the optical path, the sample element being sensitive to chemical alterations under influence of the incident EUV-radiation which also affect the optical element. The optical system further includes at least one detection unit for online detection of the contamination status of the sample element during exposure of the sample element to the incident EUV-radiation.
摘要翻译：一种用于EUV波长范围的辐射的光学系统，特别是具有至少一个真空容器的投影曝光装置，包括：至少一个设置在光路中的EUV反射光学元件，以及一个保持器，该保持器包括至少一个样品元件，样品元件具有暴露于光路外部的入射EUV辐射的光学表面，样品元件在影响光学元件的入射EUV辐射的影响下对化学变化敏感。光学系统还包括至少一个检测单元，用于在将样品元件暴露于入射的EUV辐射期间在线检测样品元件的污染状态。

70. 发明授权

US07414781B2 Catoptric objectives and systems using catoptric objectives 有权
标题翻译：使用反射目标的目标和系统
公开(公告)号：US07414781B2
公开(公告)日：2008-08-19
申请号：US11520558
申请日：2006-09-13
申请人： Hans-Juergen Mann , Wilhelm Ulrich , Marco Pretorius
发明人： Hans-Juergen Mann , Wilhelm Ulrich , Marco Pretorius
IPC分类号： G02B17/00 , G02B3/00
CPC分类号： G03F7/70233 , G02B13/0065 , G02B13/16 , G02B17/0621 , G02B17/0663 , G02B17/08 , G02B17/0804 , G02B21/04 , G03F7/70308
摘要： In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength λ from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about λ or more at one or more locations of the rotationally-asymmetric surface.
摘要翻译：通常，在第一方面，本发明的特征在于包括微光刻投影光学系统的系统。微光刻投影光学系统包括多个元件，其被布置成使得在操作期间，多个元件将从物体平面到像平面的波长λ的图像辐射。元件中的至少一个是具有位于辐射路径中的旋转非对称表面的反射元件。旋转非对称表面在旋转对称表面的一个或多个位置处偏离旋转对称的参考表面约λ或更大的距离。

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