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61. 发明授权

US08241757B2 Multilayer substrate 有权
标题翻译：多层基板
公开(公告)号：US08241757B2
公开(公告)日：2012-08-14
申请号：US12606265
申请日：2009-10-27
申请人： Chao-Tsang Wei , Chung-Pei Wang , Chien-Hao Huang , Wei-Cheng Ling , Chia-Ying Wu , Ga-Lane Chen
发明人： Chao-Tsang Wei , Chung-Pei Wang , Chien-Hao Huang , Wei-Cheng Ling , Chia-Ying Wu , Ga-Lane Chen
IPC分类号： B32B15/04 , B32B9/04 , B32B17/06
CPC分类号： C23C14/0036 , C23C14/025 , C23C14/0641 , C23C28/321 , C23C28/322 , C23C28/34 , C23C28/341 , C23C28/343 , H05K1/053 , H05K3/388 , Y10T428/12021 , Y10T428/12458 , Y10T428/12535 , Y10T428/249961 , Y10T428/30 , Y10T428/31678
摘要： A multilayer substrate includes a base layer, a coating layer and an intermediate layer positioned between the base layer and the coating layer. The intermediate layer contains chromium and nitrogen. A content of the chromium in the intermediate layer gradually decreases from the base layer to the coating layer.
摘要翻译：多层基板包括基层，涂层和位于基层与涂层之间的中间层。中间层含有铬和氮。中间层中的铬的含量从基层向涂层逐渐减少。

62. 发明授权

US08241473B2 Sputter-coating apparatus 失效
标题翻译：溅射装置
公开(公告)号：US08241473B2
公开(公告)日：2012-08-14
申请号：US12728259
申请日：2010-03-21
申请人： Chung-Pei Wang
发明人： Chung-Pei Wang
IPC分类号： C23C14/34
CPC分类号： C23C14/3464 , C23C14/505 , H01J37/3435
摘要： A sputter-coating apparatus for coating a plurality of workpieces includes a deposition case defining a cavity, a supporting assembly received in the cavity, and a target assembly received in the cavity and extending through the supporting assembly to face the workpieces. The supporting assembly includes a plurality of supporting members. Each supporting member includes a body and a plurality of adjusting units extending through the body. Each adjusting unit includes a supporting pole fixed to the body, a first fixing pole and a second fixing pole fixedly connected to the supporting pole and radially extending from the supporting pole, a first threaded pole and a second threaded pole retractably connected to the supporting pole and radially extending from the supporting pole, and a driving member received in the supporting pole for driving the first threaded pole and the second threaded pole to retract relative to the supporting pole.
摘要翻译：用于涂覆多个工件的溅射涂覆设备包括限定空腔的沉积壳体，容纳在空腔中的支撑组件和容纳在空腔中并延伸穿过支撑组件以面对工件的目标组件。支撑组件包括多个支撑构件。每个支撑构件包括主体和延伸穿过主体的多个调节单元。每个调节单元包括固定到本体的支撑杆，固定连接到支撑杆并从支撑杆径向延伸的第一固定杆和第二固定杆，可伸缩地连接到支撑杆的第一螺纹杆和第二螺纹杆并且从所述支撑杆径向延伸;以及驱动构件，所述驱动构件容纳在所述支撑杆中，用于驱动所述第一螺纹杆，并且所述第二螺纹杆相对于所述支撑杆缩回。

63. 发明申请

US20120067279A1 CONVEYING DEVICE AND DEPOSITION DEVICE USING SAME 失效
标题翻译：使用相同的输送装置和沉积装置
公开(公告)号：US20120067279A1
公开(公告)日：2012-03-22
申请号：US13112242
申请日：2011-05-20
申请人： CHUNG-PEI WANG
发明人： CHUNG-PEI WANG
IPC分类号： B05C13/00
CPC分类号： B05B13/0235 , C23C14/50 , C23C14/505
摘要： A conveying device for a deposition device includes a transport device and a carrier. The transport device includes a main body, two wheels, a connection shaft, and a first bevel gear. The connection shaft is mounted on the main body. The two wheels are mounted on two opposite ends of the connection shaft. The first bevel gear is sleeved on the connection shaft. The carrier includes a revolving frame, a rotating shaft, a second bevel gear, and at least one carrying bar. The rotating shaft is mounted on the revolving frame. The second bevel gear is sleeved on one end of the rotating shaft and meshed with the first bevel gear. The revolving frame rotates relative to the rotating shaft. The at least one carrying bar is mounted on the revolving frame and driven by the rotating shaft to rotate. Each carrying bar includes supporting elements for carrying workpieces.
摘要翻译：用于沉积装置的输送装置包括输送装置和载体。输送装置包括主体，两个轮，连接轴和第一锥齿轮。连接轴安装在主体上。两个轮子安装在连接轴的两个相对端上。第一个锥齿轮套在连接轴上。载体包括旋转框架，旋转轴，第二锥齿轮和至少一个承载杆。旋转轴安装在旋转框架上。第二锥齿轮套在旋转轴的一端并与第一锥齿轮啮合。旋转架相对于旋转轴旋转。至少一个搬运杆安装在旋转框架上并由旋转轴驱动以旋转。每个承载杆包括用于承载工件的支撑元件。

64. 发明申请

US20120040096A1 COATING METHOD FOR FORMING PATTERN ON WORKPIECE 失效
标题翻译：用于形成工件图案的涂装方法
公开(公告)号：US20120040096A1
公开(公告)日：2012-02-16
申请号：US12977076
申请日：2010-12-23
申请人： CHUNG-PEI WANG
发明人： CHUNG-PEI WANG
IPC分类号： C23C16/04 , C23C16/06 , C23C16/56 , C23C16/44
CPC分类号： C23C14/042 , C23C14/20
摘要： A coating method for forming a pattern on a workpiece is provided. The method includes the follow steps: providing a workpiece having a surface, forming a coating layer over the surface using a physical vapor deposition method; providing a mask having a shape conforming to a predetermined pattern; attaching the mask to the surface such that a portion of the coating layer is shielded. The coating layer consists of a shielded portion and an unwanted portion surrounding the shielded portion. Finally, removing the unwanted portion of the coating layer using a magnetic abrasive finishing method, and removing the mask to obtain the shielded portion having the predetermined pattern on the workpiece.
摘要翻译：提供了一种用于在工件上形成图案的涂布方法。该方法包括以下步骤：提供具有表面的工件，使用物理气相沉积方法在表面上形成涂层; 提供具有符合预定图案的形状的掩模; 将掩模附着到表面，使得涂层的一部分被屏蔽。涂层由屏蔽部分和围绕屏蔽部分的不需要的部分组成。最后，使用磁性研磨整理方法除去涂层的不想要的部分，并且去除掩模以获得在工件上具有预定图案的屏蔽部分。

65. 发明申请

US20110303536A1 SPUTTERING APPARATUS WITH MAGNETIC MODULE 审中-公开
标题翻译：具有磁性模块的溅射装置
公开(公告)号：US20110303536A1
公开(公告)日：2011-12-15
申请号：US13149883
申请日：2011-05-31
申请人： CHUNG-PEI WANG
发明人： CHUNG-PEI WANG
IPC分类号： C23C14/34 , C23C16/48
CPC分类号： C23C14/34 , C23C14/35 , H01J37/3405 , H01J37/3417
摘要： An exemplary sputtering apparatus includes a chamber, a rotatable rack, a gate, two first magnetic elements, and a second magnetic element. A sidewall of the chamber has an opening defined therein. The rotatable rack is provided in a center of the chamber. The gate is provided in the opening. The two first magnetic elements are mounted on the gate. The second magnetic element is mounted inside the chamber. The second magnetic element neighbors one of the two first magnetic elements. A first angle is defined between two imaginary lines running from the rack to each of the two first magnetic elements. A second angle is defined between an imaginary line running from the rack to the second magnetic element and the imaginary line running from the rack to said one of the two first magnetic elements neighboring the second magnetic element. The first angle and the second angle are different.
摘要翻译：示例性的溅射装置包括腔室，可旋转齿条，门，两个第一磁性元件和第二磁性元件。腔室的侧壁具有限定在其中的开口。旋转齿条设置在腔室的中心。门口设在开口处。两个第一磁性元件安装在门上。第二磁性元件安装在腔室内。第二磁性元件邻近两个第一磁性元件之一。在从机架运行到两个第一磁性元件中的每一个的两根假想线之间限定第一角度。第二角度定义在从齿条延伸到第二磁性元件的假想线和从机架延伸到与第二磁性元件相邻的两个第一磁性元件中的所述一个的假想线之间。第一角度和第二角度是不同的。

66. 发明授权

US08075373B2 Roll grinding apparatus 失效
标题翻译：辊磨机
公开(公告)号：US08075373B2
公开(公告)日：2011-12-13
申请号：US12184939
申请日：2008-08-01
申请人： Chung-Pei Wang
发明人： Chung-Pei Wang
IPC分类号： B24B5/04
CPC分类号： B24B5/042 , B24B41/062
摘要： A roll grinding apparatus includes a clamping device, a grinding wheel, a first driver, and a second driver. The clamping device includes a base, a support connected with the base and being movable relative to the base, a first clamping member and a second clamping member coupled to the first clamping member. The first clamping member and the second clamping member are rotatably mounted on the support for cooperating to clamp the workpiece. The first clamping member and the second clamping member are movable relative to the grinding wheel by movement of the support relative to the base so that the rotary axes of the first and second clamping members are adjusted to be parallel to a central axis of the grinding wheel. The first driver is connected with the first clamping member. The second driver is connected with the second clamping member.
摘要翻译：辊研磨装置包括夹紧装置，砂轮，第一驱动器和第二驱动器。夹紧装置包括基座，与基座连接并且可相对于基座移动的支撑件，联接到第一夹紧构件的第一夹紧构件和第二夹紧构件。第一夹紧构件和第二夹紧构件可旋转地安装在支撑件上用于协作以夹紧工件。第一夹紧构件和第二夹紧构件通过支撑件相对于基座的移动相对于砂轮可移动，使得第一和第二夹紧构件的旋转轴线被调节为平行于砂轮的中心轴线。第一驱动器与第一夹紧件连接。第二驱动器与第二夹紧构件连接。

67. 发明申请

US20110266146A1 SPUTTERING APPARATUS 失效
标题翻译：溅射装置
公开(公告)号：US20110266146A1
公开(公告)日：2011-11-03
申请号：US12891817
申请日：2010-09-28
申请人： CHUNG-PEI WANG
发明人： CHUNG-PEI WANG
IPC分类号： C23C14/34
CPC分类号： C23C14/34 , C23C14/564
摘要： A sputtering apparatus includes a preheating chamber, a deposition chamber, a passage in communication with the preheating chamber and the deposition chamber, a first support assembly received in the preheating chamber, a second support assembly received in the deposition chamber, a number of posts capable of mounting on each of the first and second support assemblies, a transferring robot arranged in the preheating chamber, and a magnetic assembly fixed on the transferring robot. The transferring robot is configured for demounting the post from the two support assemblies, transferring the demounted post between the preheating chamber and the deposition chamber, and mounting the transferred post on the two support assemblies. The magnetic assembly is configured for collecting iron workpieces dropped on a bottom in the preheating chamber, the deposition chamber, or the passage.
摘要翻译：溅射装置包括预热室，沉积室，与预热室和沉积室连通的通道，容纳在预热室中的第一支撑组件，容纳在沉积室中的第二支撑组件，多个支柱安装在第一和第二支撑组件中的每一个上，布置在预热室中的传送机器人和固定在传送机器人上的磁性组件。传送机器人构造成用于从两个支撑组件拆卸柱子，在预热室和沉积室之间传送拆卸的柱，以及将转移的柱安装在两个支撑组件上。磁性组件被配置用于收集落在预热室，沉积室或通道中的底部的铁工件。

68. 发明申请

US20110247854A1 MULTI-FILM STRUCTURE AND METHOD FOR MAKING SAME, AND ELECTRONIC DEVICE HAVING SAME 审中-公开
标题翻译：多层膜结构及其制造方法以及具有相同功能的电子设备
公开(公告)号：US20110247854A1
公开(公告)日：2011-10-13
申请号：US12857566
申请日：2010-08-17
申请人： Ga-Lane CHEN , Chao-Tsang WEI , Chung-Pei WANG , Hsin-Chin HUNG
发明人： Ga-Lane CHEN , Chao-Tsang WEI , Chung-Pei WANG , Hsin-Chin HUNG
IPC分类号： H05K5/00
CPC分类号： H05K5/0243
摘要： A multi-film structure includes a substrate having a surface, a chromium nitride film formed on the surface of the substrate, and a color layer deposited on the chromium nitride film. The color layer includes an aluminum oxide film doped with chromium atoms. A weight percent of the chromium in the color layer is less than that of the aluminum in the color layer.
摘要翻译：多膜结构包括具有表面的基板，形成在基板的表面上的氮化铬膜和沉积在氮化铬膜上的着色层。彩色层包括掺有铬原子的氧化铝膜。彩色层中的铬的重量百分比小于彩色层中的铬的重量百分数。

69. 发明授权

US08018583B2 Lens screening device 失效
标题翻译：镜头筛选装置
公开(公告)号：US08018583B2
公开(公告)日：2011-09-13
申请号：US12485919
申请日：2009-06-17
申请人： Chung-Pei Wang
发明人： Chung-Pei Wang
IPC分类号： G01B9/00
CPC分类号： B07B1/469 , B07B13/16 , B07B2201/04
摘要： An lens screening device for controlling diameters of lenses within a range from a lower threshold to a upper threshold. The lens screening device includes a number of connecting poles and two screening plates. Each of the screening plates includes a tray and a scraper slidably disposed on the tray and configure for scraping the tray. The tray defines a number of through holes of same diameter therein. The diameter of the through holes in an upper screening plate is larger than that of the through holes in a lower screening plate.
摘要翻译：一种透镜筛选装置，用于控制在从下限阈值到上限阈值范围内的透镜直径。透镜筛选装置包括多个连接杆和两个筛板。每个筛板包括托盘和可滑动地设置在托盘上的刮板，并且构造成用于刮取托盘。托盘限定了多个直径相同的通孔。上筛板中的通孔的直径大于下筛板中的通孔的直径。

70. 发明申请

US20110174673A1 COLORED DEVICE CASING AND SURFACE-TREATING METHOD FOR FABRICATING SAME 审中-公开
标题翻译：用于制造它们的彩色装置外壳和表面处理方法
公开(公告)号：US20110174673A1
公开(公告)日：2011-07-21
申请号：US12862782
申请日：2010-08-25
申请人： GA-LANE CHEN , CHAO-TSANG WEI , CHUNG-PEI WANG , CHING-CHOU CHANG , SHIH-CHE CHIEN , WEI-CHENG LING , CHIA-YING WU , HSIN-CHIN HUNG , MING-YANG LIAO , TAI-SHENG TSAI , CHIEN-HAO HUANG
发明人： GA-LANE CHEN , CHAO-TSANG WEI , CHUNG-PEI WANG , CHING-CHOU CHANG , SHIH-CHE CHIEN , WEI-CHENG LING , CHIA-YING WU , HSIN-CHIN HUNG , MING-YANG LIAO , TAI-SHENG TSAI , CHIEN-HAO HUANG
IPC分类号： B65D88/00 , C23C14/32
CPC分类号： C23C14/0015 , C04B41/009 , C04B41/5062 , C04B41/87 , C04B2111/82 , C23C14/024 , C23C14/0641 , C23C14/345 , C23C14/3464 , C23C28/04 , C04B35/00 , C04B41/4531
摘要： A colored device casing includes a base, a color layer and a bonding layer. The base has at least one smooth region. The bonding layer is positioned between the base and the color layer and bonds the base and color layer together. A portion of the color layer corresponding to and located over the smooth region has a value of L* in a range from about 81.76 to about 83.76, a value of a* in a range from about −0.63 to about 0.37 and a value of b* in a range from about −1.04 to about −0.04 according to the Commission Internationale del'Eclairage LAB system. A surface-treating method for fabricating the colored casing is also provided.
摘要翻译：彩色器件外壳包括基底，彩色层和粘合层。底座至少有一个光滑的区域。接合层位于基底和着色层之间，并将基底和着色层粘合在一起。对应于并位于平滑区域上方的着色层的一部分具有在约81.76至约83.76范围内的L *值，a *在约-0.63至约0.37的范围内，值b *在约-1.04至约-0.04的范围内，根据国际认证委员会LAB系统。还提供了一种用于制造彩色外壳的表面处理方法。

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