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51. 发明公开

CN102021521A 真空溅射装置无效
公开(公告)号：CN102021521A
公开(公告)日：2011-04-20
申请号：CN200910306812.8
申请日：2009-09-09
申请人：鸿富锦精密工业(深圳)有限公司 , 鸿海精密工业股份有限公司
发明人：王仲培 , 吴佳颖
IPC分类号： C23C14/34 , C23C14/56
CPC分类号： C23C14/3464 , C23C14/505 , C23C14/568 , H01J37/185 , H01J37/34 , H01J2237/184
摘要：一种真空溅射装置，其用于对基材镀膜。该真空溅射装置包括内空的第一屏蔽罩以及第二屏蔽罩，第一屏蔽罩与第二屏蔽罩之间设置有一第一阀门，第一阀门用于控制第一屏蔽罩与第二屏蔽罩隔开或连通。第一屏蔽罩上开设有一抽真空孔，其用于在每次打开第一阀门前，通过一真空装置将第一屏蔽罩内部抽为真空。第二屏蔽罩的内侧壁上设置有多个靶材。第一屏蔽罩在与第一阀门相对的底面上设置有包括一轴向气压缸以及一支撑轴的升降装置。基材设置在支撑轴远离轴向气压缸的端部且朝向所述第二屏蔽罩。轴向气压缸与第一屏蔽罩固定连接，其用于控制所述支撑轴相对第二屏蔽罩往返运动。该真空溅射装置能够提高镀膜质量。

52. 发明公开

CN101728201A 具有双装载选项的带电粒子光学系统无效
公开(公告)号：CN101728201A
公开(公告)日：2010-06-09
申请号：CN200910208884.9
申请日：2009-10-30
申请人： FEI公司
发明人： J·A·M·范登奥特拉尔 , J·赫姆肯斯 , P·唐纳 , F·尼德洛夫 , W·旺德格姆
IPC分类号： H01J37/20 , H01J37/26
CPC分类号： H01J37/185 , H01J37/26 , H01J2237/184 , H01J2237/2001 , H01J2237/202 , H01J2237/204 , Y10S977/854
摘要：本发明涉及具有双装载选项的带电粒子光学系统。具体而言，一种诸如电子显微镜的带电粒子光学系统(100)具有真空腔室(102)，该真空腔室具有用于在运行使用中容纳多个试样的一个特定试样(114)的空间(104)。该带电粒子光学系统具有装载器(106)，该装载器具有可移入和移出空间的一部分(108)。该部分配置成能够将从系统的外部带来的试样载体(110)附接到第一保持器(112)上，或使载体从第一保持器脱离并从系统的内部移除载体。该载体容纳第一试样。该系统具有位于腔室的壁中的接口(116)，该接口用于可移除地容纳第一保持器(112)或第二保持器(118)，在第二保持器(118)上安装有第二试样(120)。

53. 发明公开

CN101490824A 连续大面积扫描注入工艺的方法与系统失效
公开(公告)号：CN101490824A
公开(公告)日：2009-07-22
申请号：CN200780026734.5
申请日：2007-07-25
申请人：硅源公司
发明人：弗兰乔斯·J·亨利
IPC分类号： H01L21/425 , H01L21/677
CPC分类号： H01L21/67754 , H01J37/185 , H01J37/20 , H01J37/3171 , H01J37/32412 , H01J2237/184 , H01J2237/30 , H01J2237/31 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要：公开了一种使用连续的大面积扫描注入工艺制造掺杂基底的方法。在一个实施例中，本方法包括在具有进口和出口的腔中提供一种可移动的轨道构件。本方法也可以包括提供包括第一多个瓦片的第一基底。本方法包括将包括第一多个瓦片的第一基底从入口转移到可移动的轨道构件上。对第一多个瓦片实施扫描注入工艺。本方法也包括在真空中保持包括第二多个瓦片的第二基底。本方法包括将包括第二多个瓦片的第二基底从入口转移到可移动的轨道构件上。本方法包括使用扫描注入工艺对第二多个瓦片实施注入工艺。

54. 发明公开

CN101179010A 具有门缝打开和关闭装置的处理室失效
公开(公告)号：CN101179010A
公开(公告)日：2008-05-14
申请号：CN200710181228.5
申请日：2007-10-25
申请人：爱德牌工程有限公司
发明人：孙亨圭
IPC分类号： H01L21/00 , H01L21/02 , H01L21/3065 , H01L21/67 , H01J37/32 , H05H1/00 , B01J3/00 , B01J3/02 , G02F1/1333 , C23F4/00
CPC分类号： H01L21/67126 , H01J37/185 , H01J37/32458 , H01J2237/184
摘要：提供了一种使用等离子体的用于蚀刻基片的蚀刻装置的处理室，比如液晶显示(LCD)基片。该处理室可包括：室本体，其一个壁中形成有门缝；打开和关闭门缝内开口的旋转内门；以及旋转内门的门驱动机构。在蚀刻基片时，内门关闭以防止室本体内部与门缝相通。从而，其中形成等离子体的空间可维持对称，因此等离子体可均匀地分布在室本体内部。

55. 发明专利

NO812087A 未知
公开(公告)号：NO812087A
公开(公告)日：1981-12-22
申请号：NO812087
申请日：1981-06-19
申请人： SHINETSU CHEMICAL CO , HITACHI LTD
发明人： IMADA KIYOSHI , UENO SUSUMU , NOMURA HIROKAZU , KOBAYASHI HIROAKI , HATADA KENJI , ABE KAZUHIKO , HATA YOSHITADA , TOHKAI MASAIE , KATO KENICHI
IPC分类号： B01J19/08 , B29C59/14 , B29C71/04 , B29D7/01 , C08J7/00 , D06B19/00 , D06M10/02 , F16J15/00 , F16J15/16 , H01J37/18 , H05H
CPC分类号： D06M10/025 , B29C59/14 , B29C2059/147 , B29K2001/00 , B29K2001/12 , B29K2007/00 , B29K2027/06 , B29K2313/00 , D06M2101/22 , D06M2200/00 , D06M2200/35 , F16J15/006 , F16J15/168 , H01J37/185

56. 发明公开

EP3218921A2 SAMPLE STAGE 审中-公开
标题翻译：示例阶段
公开(公告)号：EP3218921A2
公开(公告)日：2017-09-20
申请号：EP15830884.1
申请日：2015-11-11
申请人： Phenom-World Holding B.V.
发明人： STAMSNIJDER, Gerhardus Bernardus , VAN DEN BOS, Paul Cornelis Maria , KLUIJTMANS, Ton Antonius Cornelis Henricus , STOKS, Sander Richard Marie , HAMMEN, Adrianus Franciscus Johannes , VAN DER MAST, Karel Diederick
IPC分类号： H01J37/20
CPC分类号： H01J37/20 , H01J37/18 , H01J37/185 , H01J37/28 , H01J2237/2006 , H01J2237/20221 , H01J2237/20228 , H01J2237/20235 , H01J2237/204
摘要： Sample stage, e.g. for use in a scanning electron microscope. The sample stage includes a base, a sample carrier, and an actuator assembly arranged for moving the sample carrier in at least one direction substantially parallel to the base. The actuator assembly is arranged so as not to contribute to the mechanical stiffness of the sample stage from the sample carrier to the base.
摘要翻译：样品台，例如用于扫描电子显微镜。样品台包括基座，样品载体和致动器组件，致动器组件被设置用于沿基本平行于基座的至少一个方向移动样品载体。致动器组件被布置成不会对从样本载体到基部的样本台的机械刚度有贡献。

57. 发明公开

EP2760042A3 Charged particle beam instrument with a specimen pre-evacuation chamber 审中-公开
标题翻译： Teilchenstrahlinstrument与预备排气室用于样品转移
公开(公告)号：EP2760042A3
公开(公告)日：2015-08-26
申请号：EP14153074.1
申请日：2014-01-29
申请人： Jeol Ltd.
发明人： Matsushita, Mitsuhide
IPC分类号： H01J37/18
CPC分类号： H01J37/18 , H01J37/185 , H01J37/20 , H01J37/28 , H01J2237/184 , H01J2237/188 , H01J2237/204 , Y10T137/86002
摘要： A charged particle beam instrument is offered which has a specimen pre-evacuation chamber where damage and scattering of a specimen can be prevented. The charged particle beam instrument (100) includes the specimen chamber (10), the specimen pre-evacuation chamber (20) connected with the specimen chamber (10) via a gate valve (12), an outflow flow rate adjusting valve (70) for adjusting the flow rate of gas exhausted from the specimen pre-evacuation chamber (20), and a controller (82) for controlling the outflow flow rate adjusting valve (70). The controller (82) performs an operation for controlling the adjusting valve (70) to a first degree of opening, an operation for making a decision as to whether the difference between a first pressure in the pre-evacuation chamber (20) measured by the pressure gauge (30) before the adjusting valve (70) is controlled to the first degree of opening and a second pressure in the pre-evacuation chamber (20) measured by the pressure gauge (30) after the adjusting valve (70) has been controlled to the first degree of opening is greater than a first reference value, and an operation for controlling the adjusting valve (70) to a second degree of opening smaller than the first degree of opening if the decision is affirmative to indicate that the difference between the first and second pressures is greater than the first reference value.

58. 发明公开

EP2669927A3 Inspection system for use with scanning electron microscope 审中-公开
标题翻译： Inspektionssystem zur Verwendung mit Rasterelektronenmikroskop
公开(公告)号：EP2669927A3
公开(公告)日：2015-08-12
申请号：EP13169847.4
申请日：2013-05-30
申请人： Samsung Display Co., Ltd.
发明人： Park, Young-Gil , Baek, Won-Bong , Oh, Ki-Won
IPC分类号： H01J37/18 , H01J37/20 , H01J37/28
CPC分类号： H01J37/26 , H01J37/185 , H01J37/20 , H01J37/28 , H01J2237/24592 , H01J2237/2605
摘要： An inspection system using a scanning electron microscope includes a scanning electron microscope chamber (100) inspecting an object (10) to be inspected by using an electron beam (1) and maintaining a vacuum condition, a stage (200) positioned below the scanning electron microscope chamber to be separated therefrom and mounted with the object to be inspected, and a transverse guide (300) transferring the scanning electron microscope chamber on the stage. Atmospheric conditions are maintained between the scanning electron microscope chamber and the object to be inspected. Accordingly, object to be inspected a large size of an object to be inspected may be inspected without damage to the object to be inspected such that a cost reduction and a yield improvement may be realized.
摘要翻译：使用扫描电子显微镜的检查系统包括扫描电子显微镜室（100），通过使用电子束（1）检查要检查的物体（10）并保持真空状态;位于扫描电子下方的载物台（200）显微镜室被分离并安装在被检查物体上，横向引导件（300）将扫描电子显微镜室转移到载物台上。在扫描电子显微镜室和待检查对象之间保持大气条件。因此，可以检查待检查物体的大尺寸的物体，而不损坏被检查物体，从而可以实现成本降低和产量提高。

59. 发明公开

EP2558838A2 ION BEAM SAMPLE PREPARATION APPARATUS AND METHODS 有权
标题翻译：装置及其制造方法离子束样本
公开(公告)号：EP2558838A2
公开(公告)日：2013-02-20
申请号：EP11769334.1
申请日：2011-04-08
申请人： Gatan Inc.
发明人： HUNT, John Andrew , COYLE, Steven Thomas
IPC分类号： G01N1/28 , H01J37/20
CPC分类号： H01J37/20 , G01N1/32 , H01J37/185 , H01J37/31 , H01J2237/2007 , H01J2237/3118
摘要： Disclosed are embodiments of an ion beam sample preparation apparatus and methods for using the embodiments. The apparatus comprises an ion beam irradiating means in a vacuum chamber that may direct ions toward a sample, a shield blocking a portion of the ions directed toward the sample, and a shield retention stage with shield retention means that replaceably and removably holds the shield in a position. Complementary datum features on both shield and shield retention stage enable accurate and repeatable positioning of the sample in the apparatus for sample processing and reprocessing. A retention stage lifting means allows the creation of a loading chamber that is isolated from the main vacuum chamber where sample ion beam milling takes place. A heat sink means is configured to conduct heat away from the sample undergoing sample preparation in the ion beam.

60. 发明授权

EP2033206B1 SLIDER BEARING FOR USE WITH AN APPARATUS COMPRISING A VACUUM CHAMBER 有权
标题翻译：轴承有真空腔全面的设备使用
公开(公告)号：EP2033206B1
公开(公告)日：2011-06-08
申请号：EP07756002.7
申请日：2007-04-26
申请人： FEI Company
发明人： PERSOON, Johannes, Antonius, Hendricus , ENGELEN, Andreas, Theodorus , LICHTENEGGER, Siegfried , VAN DOOREN, Petrus, Henricus, Joannes
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J37/185 , H01J37/20 , H01J2237/166 , H01J2237/184 , H01J2237/2006 , H01J2237/204
摘要： A slider bearing for use with an apparatus comprising a vacuum chamber (11).The slider bearing comprises: a base plate (20) in contact with the vacuum chamber (11) at one side, said base plate showing a first through-hole (21) in contact with the vacuum chamber (11), a second plate (30), one side of the second plate in contact with the base plate (20), said second plate showing a second through-hole (31), the faces of the base plate and the second plate facing each other being sufficiently smooth to form a non-elastomeric vacuum seal, said base plate (20) and said second plate (30) slidable between a first relative position in which the first through-hole (21) and the second through-hole (31) do not overlap and a second relative position in which the first through-hole and the second through-hole overlap, characterised in that the second plate (30) is a flexible plate, the face of the flexible plate opposite to the base plate is equipped to seal against a cup (50), the cup equipped to hold a sample (1), the first through-hole (21) in the base plate shows a rim facing the flexible plate (30) with a controlled curvature, the curvature of the rim formed such that the vacuum seal between the base plate and the flexible plate forms on a pre-defined contour and that the Hertzian contact pressure is smaller than a pre-defined maximum contact pressure, the pre-determined maximum contact pressure chosen to minimise particle generation. By forming the second plate as a flexible plate the pressure with which the base plate and the second plate are pressed together is better reproducible than when both plates are rigid. By forming the rim with a controlled radius, the particle generation is minimized.

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