会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 57. 发明授权
    • Composition for photo imaging
    • 摄影成像的组成
    • US5439766A
    • 1995-08-08
    • US976115
    • 1992-11-13
    • Richard A. DayDonald H. GlatzelJohn R. MertzJoel L. RothDavid J. RussellLogan L. Simpson
    • Richard A. DayDonald H. GlatzelJohn R. MertzJoel L. RothDavid J. RussellLogan L. Simpson
    • G03C1/725
    • G03C1/725
    • According to the present invention, good image resolution of a cationically polymerized epoxy based coating, such as a solder mask or dielectric or etch resist, is provided by combining a cationically polymerized epoxy based coating with conventional epoxy glass substrates cured with a curing agent that does not produce basic reaction products. Preferably, the coating is photoimagable. The method for making the same is also provided. The coating material includes an epoxy resin system comprising between from about 10% to about 90%, preferably about 28% to about 57% by weight of a polyol epoxy resin, and from about 10% to about 90%, preferably about 43% to 72% by weight, of a brominated epoxy resin. Optionally, a polyepoxy resin or an epoxy creosol novolak resin is added to the resin system. The polyepoxy resin may be added from an effective amount up to less than 90% of the resin system; the epoxy creosol novolak may be added from an effective amount up to about 80 pph.
    • 根据本发明,通过将阳离子聚合的环氧基涂层与用固化剂固化的常规环氧玻璃基底组合来提供阳离子聚合的环氧基涂层(例如焊料掩模或电介质或抗蚀剂)的良好图像分辨率, 不产生碱性反应产物。 优选地,涂层是可光成像的。 还提供了制造它们的方法。 涂料包括环氧树脂体系,其包含约10%至约90%,优选约28%至约57%重量的多元醇环氧树脂,以及约10%至约90%,优选约43%至 72重量%的溴化环氧树脂。 任选地,在树脂体系中加入聚环氧树脂或环氧酚醛清漆树脂。 聚环氧树脂可以从有效量添加到树脂体系的90%以下; 可以从高达约80pph的有效量加入环氧裂解酚醛清漆。
    • 60. 发明授权
    • Method of depositing a metal on a surface
    • 在表面上沉积金属的方法
    • US3950570A
    • 1976-04-13
    • US466314
    • 1974-05-02
    • John Thomas Kenney
    • John Thomas Kenney
    • G03C1/72C23C18/18G03C1/725G03C5/58H05K3/18B44D1/18G03C5/00
    • H05K3/185G03C1/725G03C5/58
    • A method of depositing a metal on a surface of a substrate is disclosed. A surface of the substrate is sensitized with a photosensitive sensitizer comprising a photosensitive species of (1) an element selected from Ni, Mn, U, Mo and W, or (2) a combination of elements comprising Pd and an element selected from In and Ce. The sensitized surface is exposed to a suitable source of radiation, e.g., ultraviolet radiation, to delineate a surface pattern, corresponding to a desired metal pattern, containing a species of at least one selected element which is either (1) capable of reducing an activation metal ion to catalytic activating metal or (2) capable of being reduced to a catalytic activating metal such as catalytic palladium. The ultraviolet radiation-delineated surface pattern is then exposed or treated with a solution comprising an activating metal ion to reduce and deposit thereon an activating metal. The deposited activating metal pattern is then exposed, as by immersion, to a suitable electroless metal deposition solution wherein an electroless metal is catalytically reduced on the activating metal pattern. However, where Pd-In, Pd-Ce sensitizers are employed, exposure to an activating metal ion containing solution is unnecessary and the delineated surface pattern is directly exposed to the electroless metal deposition solution.
    • 公开了一种在衬底的表面上沉积金属的方法。 使用包含(1)选自Ni,Mn,U,Mo和W的元素的光敏物质的感光敏化剂,或(2)包含Pd和选自In的元素的组合,以及 Ce。 致敏表面暴露于合适的辐射源(例如紫外线辐射),以描绘对应于期望的金属图案的表面图案,其包含至少一种选择元素的物质,其中(1)能够减少活化 金属离子与催化活化金属或(2)能还原成催化活化金属如催化钯。 然后将紫外线照射的表面图案用包含活化金属离子的溶液进行曝光或处理,以减少和沉积活化金属。 沉积的活化金属图案然后通过浸渍暴露于合适的无电金属沉积溶液,其中化学金属在活化金属图案上被催化还原。 然而,当使用Pd-In,Pd-Ce增感剂时,不需要暴露于含活化金属离子的溶液,并且将所描绘的表面图案直接暴露于无电金属沉积溶液。