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51. 发明公开

EP1546693A1 DARK FIELD INSPECTION SYSTEM 审中-公开
标题翻译：暗场检查系统
公开(公告)号：EP1546693A1
公开(公告)日：2005-06-29
申请号：EP03799278.1
申请日：2003-09-08
申请人： Applied Materials Israel, Ltd. , Applied Materials, Inc.
发明人： KORNGUT, Doron , ADMONI, Erez , KADAR, Ofer , HAIKOVIZ, Lev , FELDMAN, Haim , GUETTA, Avishay
IPC分类号： G01N21/95
CPC分类号： G01N21/8806 , G01N21/47 , G01N21/4788 , G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/1772 , G01N2021/4711 , G01N2021/4735 , G01N2021/479 , G01N2021/4792 , G01N2021/8822 , G01N2021/8845 , G01N2201/0697
摘要： Apparatus for inspection of a sample includes a radiation source, which is adapted to direct optical radiation onto an area of a surface of the sample, and a plurality of image sensors. Each of the image sensors is configured to receive the radiation scattered from the area into a different, respective angular range, so as to form respective images of the area. An image processor is adapted to process at least one of the respective images so as to detect a defect on the surface.

52. 发明公开

EP1495357A2 UV COMPATIBLE PROGRAMMABLE SPATIAL FILTER 失效
标题翻译： UV-兼容可编程空间滤波器
公开(公告)号：EP1495357A2
公开(公告)日：2005-01-12
申请号：EP03745648.0
申请日：2003-03-28
申请人： KLA-Tencor Technologies Corporation
发明人： WILK, Dieter, E. , TANG, Anlun , VELLA, Eric, N. , RUNYON, Rex , SULLIVAN, Jamie, M. , JOHNSON, Ralph, T.
IPC分类号： G02F1/00
CPC分类号： G02B27/46 , G01N21/9501 , G01N21/95623 , G01N2021/8822 , G01N2021/95676
摘要： Disclosed are mechanisms for selectively filtering spatial portions of light emanating from a sample under inspection within an optical system. In one embodiment, a programmable spatial filter (PSF) is constructed from materials that are compatible with light in a portion of the UV wavelength range. In a specific implementation, the PSF is constructed from a UV compatible material, such as a polymer stabilized liquid crystal material. In a further aspect, the PSF also includes a pair of plates that are formed from a UV grade glass. The PSF may also include a relatively thin first and second ITO layer that results in a sheet resistance between about 100 and about 300 W per square. In a specific embodiment, the PSF provides selective filtering in two directions. In other words, the PSF provides two dimensional filtering.

53. 发明公开

EP1119739A1 VERMESSEN KLEINER, PERIODISCHER WELLIGKEITEN IN OBERFLÄCHEN 有权
标题翻译：测量曲面LESS定期涟漪
公开(公告)号：EP1119739A1
公开(公告)日：2001-08-01
申请号：EP99944622.2
申请日：1999-09-07
申请人： DaimlerChrysler AG
发明人： BAUMGART, Jörg , RAU, Norbert , TRUCKENBRODT, Horst
IPC分类号： G01B11/30 , G01N21/88
CPC分类号： G01N21/95623 , G01B11/303
摘要： The invention relates to a method and a device for recognizing small, periodic undulations in technical surfaces according to the scattered light method, whereby the surface is illuminated with a beam of light (primary light) and the secondary light that is reflected by said surface is examined. This makes it possible to carry out measurements with a reproducible validity in a quick, freehanded manner even in the raw production stage. According to the invention, a monochromatic coherent primary light is used. Said light toucheshe surface of the workpiece and is directed onto the surface in an approximately perpendicular manner with respect to the expected periodic undulations. A diffraction image of the undulated surface structure is produced in the secondary light beam. The appearance of two maximums of intensity indicates that a periodic undulation is present. It is possible to deduce the periodic length of the undulation from the distance between adjacent maximums of intensity according to inverse proportionality and to deduce the depth of the undulation from the troughs of the undulations between the crests of said undulations.

54. 发明授权

EP0526982B1 Fine structure evaluation apparatus and method 失效
标题翻译：装置和方法用于评估精细结构
公开(公告)号：EP0526982B1
公开(公告)日：1996-08-28
申请号：EP92306053.7
申请日：1992-06-30
申请人： CANON KABUSHIKI KAISHA
发明人： Tsuji, Toshihiko, c/o Canon Kabushiki Kaisha , Saito, Kenji, c/o Canon Kabushiki Kaisha
IPC分类号： G01B11/02
CPC分类号： G01N21/9501 , G01B11/028 , G01N21/95607 , G01N21/95623 , G01N2021/95676

55. 发明公开

EP0721582A1 INSPECTION SYSTEM WITH IN-LENS, OFF-AXIS ILLUMINATOR 失效
标题翻译：与非轴向光检查系统通过透镜
公开(公告)号：EP0721582A1
公开(公告)日：1996-07-17
申请号：EP94929995.0
申请日：1994-09-30
申请人： OPTICAL SPECIALITIES, INC.
发明人： LIN, Lawrence, H. , SCHEFF, Victor, A.
IPC分类号： G01B11 , G01N21 , G02B27 , H01L21
CPC分类号： G01N21/95623 , G02B27/46
摘要： An inspection system (2) employs a beam of monochromatic light (12) that travels through a Fourier transform lens (16) before striking a specimen wafer (4) at an angle (υ) with respect to the normal (26) of the specimen wafer (4) to produce diffracted light (28b and 28c) that has a broad spatial frequency spectrum which can be selectively filtered to produce a dark field image pattern of the various sized defects in an inspection area (22) of the wafer. The nearly collimated beam of monochromatic light strikes the wafer at an angle (υ) with respect to the normal of the wafer of between zero degrees and a predetermined maximum angle. For the inspection system disclosed, the predetermined maximum angle is the angle formed when the beam of monochromatic light is as far away from the optic axis as possible yet still within the numerical aperture of the Fourier transform lens (16). Moreover, if a specific range of defect sizes is anticipated, the system can be optimized by setting the angle (υ) at which the collimated beam of monochromatic light strikes the wafer to the angle (υ) which allows the system to collect those spatial frequencies which are best representative of the anticipated range of defects sizes.

56. 发明授权

EP0115573B1 Verfahren und Vorrichtung zur automatischen Erkennung von Fehlern in Geweben und ähnlichen textilen Flächengebilden 有权
标题翻译：用于自动识别WEBS和类似纺织品图案中的缺陷的方法和装置
公开(公告)号：EP0115573B1
公开(公告)日：1988-05-11
申请号：EP83110933.5
申请日：1983-11-02
申请人： ZELLWEGER USTER AG
发明人： Leuenberger, Rolf , Hunziker, Christian
IPC分类号： G01N21/89 , G02B27/46
CPC分类号： G01N21/95623 , G01N21/95607

57. 发明公开

EP0206681A2 Optical method for forming a hologram. 失效
标题翻译：用于形成全息图的光学方法。
公开(公告)号：EP0206681A2
公开(公告)日：1986-12-30
申请号：EP86304554
申请日：1986-06-13
申请人： UNIV LELAND STANFORD JUNIOR
发明人： GOODMAN JOSEPH W , HESSELINK LAMBERTUS , OCHOA ELLEN
IPC分类号： G01N21/88 , G01N21/956 , G02B27/46 , G02F1/35 , G03F1/00 , G03F1/08 , G03H1/00 , G03H1/16
CPC分类号： G03H1/16 , G01N21/95623 , G03H2001/026 , G03H2001/0268
摘要： An optical system for selectively enhancing and/or suppressing the spectral intensity of components in an object beam, is disclosed. Initially, a forward transform operation such as, for example, using Fourier optics (9), is applied to an input beam which contains a complex function characteristic of an object. The resulting Fourier transform is applied to a non-linear optical medium (11) and interferes with a reference beam (12) to form a hologram in the medium (11). The hologram is then read-out (13) and an inverse transform operation (15) is performed on the resulting output beam (14), to provide an output optical beam which contains, for example, selectively enhanced intensity components and/or selectively suppressed intensity components.

58. 发明申请

WO2016088734A1 欠陥観察方法及び欠陥観察装置审中-公开
标题翻译：缺陷观察方法和缺陷观察装置
公开(公告)号：WO2016088734A1
公开(公告)日：2016-06-09
申请号：PCT/JP2015/083688
申请日：2015-12-01
申请人：株式会社日立ハイテクノロジーズ
发明人：大谷　祐子 , 高木　裕治 , 中山　英樹
IPC分类号： G01N21/956 , G01N23/225 , H01L21/66
CPC分类号： G01N21/95607 , G01N21/956 , G01N21/95623 , G01N23/2251 , G01N2021/95615
摘要：　本発明は、他の検査装置（１０７）で検出した試料（１０１）上の欠陥の位置情報を用いて試料上の欠陥を光学顕微鏡（１０５）で撮像した画像から欠陥を検出して欠陥の位置情報を修正し、修正した位置情報を用いて走査型電子顕微鏡ＳＥＭ（１０６）で試料上の欠陥を詳細に観察する欠陥観察方法及び欠陥観察装置において、前記欠陥の位置情報を修正する際に、検出する欠陥に応じて光学顕微鏡（１０５）の検出光学系（２１０）の空間分布光学素子（２０５）を切り替え、切り替えた空間分布光学素子（２０５）の種類に応じて、光学顕微鏡（１０５）で欠陥の画像を取得する画像取得条件および当該画像から欠陥を検出する画像処理条件を変えるものである。　本発明によると、半導体デバイスの製造工程において半導体ウェハ上に発生した欠陥を高速かつ高検出率で観察できる。
摘要翻译：本发明提供了一种缺陷观察方法和缺陷观察装置，其通过使用由另一个检测到的样本上的缺陷的位置信息来检测由光学显微镜（105）捕获的样品（101）上的缺陷的图像的缺陷检查装置（107），修改缺陷的位置信息，并利用扫描型电子显微镜SEM（106）使用修正的位置信息详细地观察样品上的缺陷。当要修改缺陷的位置信息时，根据检测到的缺陷切换光学显微镜（105）的检测光学系统（210）的空间分布的光学元件（205）和图像捕获条件通过光学显微镜（105）捕获缺陷的图像，并根据切换的空间分布式光学元件（205）的类型改变从图像检测到缺陷的图像处理条件，。根据本发明，可以以高检测速度快速地观察半导体器件的制造期间在半导体晶片中发生的缺陷。

59. 发明申请

WO2015000673A1 INSPECTION APPARATUS AND METHOD, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROCESSING CELL AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：检查装置和方法，光刻设备，光刻处理单元和器件制造方法
公开(公告)号：WO2015000673A1
公开(公告)日：2015-01-08
申请号：PCT/EP2014/062338
申请日：2014-06-13
申请人： ASML NETHERLANDS B.V.
发明人： QUINTANILHA, Richard
IPC分类号： G03F7/20 , G01N21/956
CPC分类号： G03F7/70625 , G01N21/95623 , G01N2201/061 , G01N2201/08 , G01N2201/12 , G03F7/70633
摘要： The present invention determines property of a target (30) on a substrate (W), such as a grating on a wafer. An inspection apparatus has an illumination source (702, 710) with two or more illumination beams (716, 716', 716", 716"') in the pupil plane of a high numerical aperture objective lens (L3). The substrate and target are illuminated via the objective lens from different angles of incidence with respect to the plane of the substrate. In the case of four illumination beams, a quad wedge optical device (QW) is used to separately redirect diffraction orders of radiation scattered from the substrate and separates diffraction orders from the two or more illumination beams. For example four 0 th diffraction orders are separated for four incident directions. After capture in multimode fibers (MF), spectrometers (S1- S4) are used to measure the intensity of the separately redirected 0 th diffraction orders as a function of wavelength. This may then be used in determining a property of a target.
摘要翻译：本发明确定了诸如晶片上的光栅的衬底（W）上的靶（30）的性质。检查装置具有在高数值孔径物镜（L3）的光瞳平面中具有两个或更多个照明光束（716,716'，716“，716”'）的照明源（702,710）。通过物镜相对于衬底的平面从不同的入射角度照射衬底和靶。在四个照明光束的情况下，使用四楔形光学器件（QW）分别重新引导从衬底散射的辐射的衍射级，并将衍射级与两个或更多个照明光束分离。例如，四个入射方向分开第四个第零衍射级。在多模光纤（MF）中捕获之后，使用光谱仪（S1-4.4）测量作为波长的函数的单独重定向的第0衍射级的强度。这可以用于确定目标的属性。

60. 发明申请

WO2012043058A1 検査装置、検査方法及びプログラム审中-公开
标题翻译：检验设备，检验方法和程序
公开(公告)号：WO2012043058A1
公开(公告)日：2012-04-05
申请号：PCT/JP2011/067598
申请日：2011-08-01
申请人：株式会社日立ハイテクノロジーズ , 田中一正
发明人：田中　一正
IPC分类号： G01N21/956 , H01L21/66
CPC分类号： G01N21/9501 , G01N21/95623 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要：　空間フィルタの設定には、オペレータの目視によるスキャン画像の確認と空間フィルタの調整の繰り返し作業が必要とされる。また、設定状態がオペレータに依存する。散乱光の像（ビーム像）と回折光の像（フーリエ像）を同時に観察すると共に、散乱光の像（ビーム像）と回折光の像（フーリエ像）の各強度プロファイルを同時に監視する。１本の空間フィルタだけを回折光の像の視野範囲でスキャンし、空間フィルタを挿入しない場合の強度プロファイルに対する状態変化を検出する。検出された状態変化に基づいて空間フィルタの設定条件を決定する。
摘要翻译：当设置空间滤波器时，操作者必须重复执行扫描图像的视觉确认并调整所述空间滤波器。设置状态也与操作者相关。同时观察散射光图像（光束图像）和衍射光图像（傅里叶图像），散射光图像（光束图像）和衍射光图像（傅立叶图像）的强度分布也同时监控。在衍射光图像的视觉范围内扫描一个且仅一个空间滤波器，并且检测当未插入空间滤波器时的状态变化与强度分布。基于检测到的状态变化来确定空间滤波器设定条件。

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