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51. 发明授权

US08097293B2 Operating method for an atomiser and a corresponding coating apparatus 有权
标题翻译：雾化器和相应涂层设备的操作方法
公开(公告)号：US08097293B2
公开(公告)日：2012-01-17
申请号：US12162457
申请日：2007-09-19
申请人： Benjamin Wöhr , Hans-Jürgen Nolte , Andreas Fischer , Peter Marquardt , Frank Herre , Marcus Frey
发明人： Benjamin Wöhr , Hans-Jürgen Nolte , Andreas Fischer , Peter Marquardt , Frank Herre , Marcus Frey
IPC分类号： B05D1/06 , B05B5/057
CPC分类号： B05B3/1014 , B05B5/0403 , B05B5/0426 , B05B12/08 , B05B12/084 , B05B12/10 , B05B13/0405 , B05B13/0426 , B05B13/0431
摘要： The invention relates to an operating method for an atomiser (1) for the coating of structural components, particularly of vehicle body parts, with the following steps: Application of a spray jet of a coating agent through the atomiser (1); discharge of a first guide air flow (11) for the formation of a spray jet; determination of at least one application parameter (η, γ, T, BC/CC, Qvarnish, n, U,) which reproduces a property (η, γ, T, BC/CC) of the applied coating agent or an operating variable (Qvarnish, n, U) of the atomiser (1) as well as influencing of the first guide air flow (11) as a factor of the application parameter (η, γ, T, BC/CC, Qvarnish, n, U,). Within the framework of the invention, there is the alternative option that fluctuations of the application parameters and, based thereon, variations of the spray jet width are taken into account by means of an adaptation of the path spacing (d) between the adjacent coating agent paths for the purpose of keeping the path overlapping constant. Furthermore, the invention comprises a corresponding coating apparatus.
摘要翻译：本发明涉及一种用于涂覆结构部件，特别是车身部件的雾化器（1）的操作方法，具有以下步骤：通过喷雾器（1）施加涂覆剂的喷射射流; 排出用于形成喷射射流的第一引导空气流（11）; 确定再现施加的涂覆剂的性质（＆eegr，γ，T，BC / CC）的至少一个应用参数（＆eegr;γ，T，BC / CC，Qvarnish，n，U）雾化器（1）的变量（Qvarnish，n，U）以及第一引导空气流（11）的影响作为应用参数（＆egr，γ，T，BC / CC，Qvarnish，n， U，）。在本发明的框架内，存在替代选择，通过适应相邻涂层剂之间的路径间距（d）来考虑应用参数的波动和基于其的喷雾宽度的变化，保持路径重叠的路径不变。此外，本发明包括相应的涂覆装置。

52. 发明申请

US20110237484A1 ELECTROCHEMICAL TEXTILE-WASHING PROCESS 审中-公开
标题翻译：电化纺织洗涤工艺
公开(公告)号：US20110237484A1
公开(公告)日：2011-09-29
申请号：US13070879
申请日：2011-03-24
申请人： Ulrich GRIESBACH , Steffen Maas , Florian Stecker , Andreas Fischer
发明人： Ulrich GRIESBACH , Steffen Maas , Florian Stecker , Andreas Fischer
IPC分类号： D06F35/00 , C11D7/60 , C11D17/00 , D06L1/12 , C08B1/00 , C07K14/47 , C08F110/06 , C08F14/26 , C08G18/34 , C08G63/00 , C08G69/26
CPC分类号： D06F1/12 , C08B15/02 , C11D11/0017 , D06F35/003 , D06L1/12 , D06L4/50 , D10B2201/02 , D10B2501/00
摘要： The present invention relates to a washing machine comprising an electrochemical cell, to a process for electrochemical cleaning of fibers, to laundry detergents for electrochemical cleaning of fibers and to the fibers thus cleaned.
摘要翻译：本发明涉及一种洗衣机，其包括电化学电池，纤维的电化学清洗方法，洗涤剂用于纤维的电化学清洗以及如此清洁的纤维。

53. 外观设计

USD636843S1 Rotary atomizer 有权
公开(公告)号：USD636843S1
公开(公告)日：2011-04-26
申请号：US29361653
申请日：2010-05-13
申请人： Hans-Jürgen Nolte , Andreas Fischer , Peter Marquardt , Jürgen Berkowitsch , Joachim Schneider
设计人： Hans-Jürgen Nolte , Andreas Fischer , Peter Marquardt , Jürgen Berkowitsch , Joachim Schneider

54. 发明申请

US20110022215A1 APPARATUS TO DETECT FAULT CONDITIONS OF A PLASMA PROCESSING REACTOR 审中-公开
标题翻译：检测等离子体加工反应器的故障条件的装置
公开(公告)号：US20110022215A1
公开(公告)日：2011-01-27
申请号：US12898342
申请日：2010-10-05
申请人： Douglas Keil , Eric Hudson , Chris Kimball , Andreas Fischer
发明人： Douglas Keil , Eric Hudson , Chris Kimball , Andreas Fischer
IPC分类号： G06F17/00 , G06F15/00
CPC分类号： C23C16/52 , C23C16/509 , H01J37/32935 , H01J37/3299
摘要： A method of fault detection for use in a plasma processing chamber is provided. The method comprises monitoring plasma parameters within a plasma chamber and analyzing the resulting information. Such analysis enables detection of failures and the diagnosis of failure modes in a plasma processing reactor during the course of wafer processing. The method comprises measuring the plasma parameters as a function of time and analyzing the resulting data. The data can be observed, characterized, compared with reference data, digitized, processed, or analyzed in any way to reveal a specific fault. Monitoring can be done with a detector such as a probe, which is preferably maintained within the plasma chamber substantively coplanar with a surface within the chamber, and directly measures net ion flux and other plasma parameters. The detector is preferably positioned at a grounded surface within the reactor such as a grounded showerhead electrode, and can be of a planar ion flux probe (PIF) type or a non-capacitive type. Chamber faults that can be detected include a build-up of process by-products in the process chamber, a helium leak, a match re-tuning event, a poor stabilization rate, and a loss of plasma confinement. If the detector is a probe, the probe can be embedded in a part of a plasma processing chamber and can comprises one or more gas feed-through holes.
摘要翻译：提供了一种用于等离子体处理室的故障检测方法。该方法包括监测等离子体室内的等离子体参数并分析所得到的信息。这样的分析使得能够在晶片处理过程中检测等离子体处理反应器中的故障和故障模式的诊断。该方法包括测量作为时间的函数的等离子体参数并分析所得到的数据。数据可以观察，表征，与参考数据进行比较，数字化，处理或分析，以显示特定故障。可以用诸如探针的检测器进行监测，该探针优选地保持在与腔室内的表面基本上共面的等离子体室内，并且直接测量净离子通量和其它等离子体参数。检测器优选地位于反应器内的接地表面，例如接地喷头电极，并且可以是平面离子通量探针（PIF）型或非电容型。可以检测到的室内故障包括处理室中的过程副产物的积聚，氦泄漏，匹配重新调谐事件，差的稳定化速率和等离子体约束的损失。如果检测器是探针，则探针可以嵌入在等离子体处理室的一部分中，并且可以包括一个或多个气体馈通孔。

55. 发明授权

US07845714B2 Hybrid-structure assembly support 有权
标题翻译：混合结构组装支持
公开(公告)号：US07845714B2
公开(公告)日：2010-12-07
申请号：US12094664
申请日：2006-11-23
申请人： Andreas Fischer , Robert Raulf
发明人： Andreas Fischer , Robert Raulf
IPC分类号： B60N99/00
CPC分类号： B62D25/084 , B62D29/001 , B62D29/004
摘要： An assembly support with hybrid structure for front ends of passenger vehicles and light trucks includes an upper cross member (1), a lateral member (2) attached to it from below with a flange plate (3) for connection with the face ends of vehicle longitudinal members and a lower cross member (4) connecting the lower sections (2.1) of these lateral members (2). In order to reinforce the assembly support in the area of the lower cross member (4), the lower cross member (4) consists of a shell body (5) with a flange (5.1) running along its edge and projecting outward, and of a sealing part (6) whose edge area overlaps it. The shell body (5) and the sealing part (6) are made of a stiff material, whereby the flange (5.1) and edge areas (6.1) of the above-mentioned components are surrounded by injected plastic used for the hybrid structure, and are thus bound together with the lateral members (2).
摘要翻译：用于乘客车辆和轻型卡车前端的混合结构的组件支撑件包括上横向构件（1），从下方连接到其上的侧部构件（2），其具有用于与车辆的端部连接的凸缘板（3）纵向构件和连接这些横向构件（2）的下部（2.1）的下横向构件（4）。为了加强在下横向构件（4）的区域中的组件支撑，下横向构件（4）由壳体（5）组成，壳体（5）具有沿其边缘延伸并向外突出的凸缘（5.1）其边缘区域与其重叠的密封部分（6）。壳体（5）和密封部分（6）由刚性材料制成，由此上述部件的凸缘（5.1）和边缘区域（6.1）被用于混合结构的注射塑料包围，并且因此与横向构件（2）结合在一起。

56. 发明申请

US20100297788A1 ARRANGEMENTS AND METHODS FOR IMPROVING BEVEL ETCH REPEATABILITY AMONG SUBSTRATES 有权
标题翻译：改善基质中水分可重复性的安排和方法
公开(公告)号：US20100297788A1
公开(公告)日：2010-11-25
申请号：US12471297
申请日：2009-05-22
申请人： Andreas Fischer , Neungho Shin , Fransisco Camargo
发明人： Andreas Fischer , Neungho Shin , Fransisco Camargo
IPC分类号： H01L21/66 , C23F1/08
CPC分类号： H01L22/20 , H01L22/12
摘要： A method, performed in connection with bevel etching of a substrate, for improving bevel-etch repeatability among substrates, is disclosed. The method includes providing an optical arrangement and ascertaining at least one bevel edge characteristic of a bevel edge of said substrate. The method also includes deriving at least one compensation factor from said at least one bevel edge characteristic, said at least one compensation factor pertaining to an adjustment in a bevel etch process parameter. The method further includes performing said bevel etching utilizing said at least one compensation factor.
摘要翻译：公开了一种与衬底的斜面蚀刻相关的方法，用于改善衬底之间的斜面蚀刻可重复性。该方法包括提供光学布置并且确定所述基板的斜边缘的至少一个斜边缘特性。该方法还包括从所述至少一个斜面边缘特性导出至少一个补偿因子，所述至少一个补偿因子属于斜面蚀刻工艺参数中的调整。该方法还包括利用所述至少一个补偿因子执行所述斜面蚀刻。

57. 发明授权

US07837825B2 Confined plasma with adjustable electrode area ratio 有权
标题翻译：密闭等离子体具有可调电极面积比
公开(公告)号：US07837825B2
公开(公告)日：2010-11-23
申请号：US11152022
申请日：2005-06-13
申请人： Andreas Fischer
发明人： Andreas Fischer
IPC分类号： H01L21/00
CPC分类号： H01J37/32623 , H01J37/32642
摘要： A plasma reactor comprises a chamber, a bottom electrode, a top electrode, a first set of confinement rings, a second set of confinement rings, and a ground extension. The top and bottom electrodes, the first and second sets of confinement rings, and the ground extension are all enclosed within the chamber. The first set of confinement rings is substantially parallel to the bottom electrode and the top electrode and surrounds a first volume between the bottom electrode and the top electrode. The second set of confinement rings is substantially parallel to the bottom electrode and the top electrode and surrounds a second volume between the bottom electrode and the top electrode. The second volume is at least greater than the first volume. A ground extension is adjacent to and surrounds the bottom electrode. The first set of confinement rings and the second set of confinement rings are capable of being raised and lowered to extend into a region above the ground extension.
摘要翻译：等离子体反应器包括腔室，底部电极，顶部电极，第一组约束环，第二组约束环和地面延伸部。顶部和底部电极，第一组和第二组约束环和接地延伸部都被封闭在腔室内。第一组限制环基本上平行于底部电极和顶部电极并围绕底部电极和顶部电极之间的第一容积。第二组限制环基本上平行于底部电极和顶部电极并围绕底部电极和顶部电极之间的第二体积。第二卷至少大于第一卷。接地延伸部分邻近并包围底部电极。第一组限制环和第二组限制环能够被升高和降低以延伸到地面延伸部上方的区域中。

58. 发明授权

US07824891B2 Method for producing D-pantothenic acid and/or salts thereof via purification by electrodialysis as an additive for animal feed 有权
标题翻译：通过电渗析纯化作为动物饲料添加剂来生产D-泛酸和/或其盐的方法
公开(公告)号：US07824891B2
公开(公告)日：2010-11-02
申请号：US10468610
申请日：2002-02-20
申请人： Kai-Uwe Baldenius , Christine Beck , Andreas Fischer , Hans-Peter Harz , Markus Lohscheidt , Martin Leemann
发明人： Kai-Uwe Baldenius , Christine Beck , Andreas Fischer , Hans-Peter Harz , Markus Lohscheidt , Martin Leemann
IPC分类号： C12P13/04 , C12P21/02 , C07G13/00 , C07C229/08
CPC分类号： C12P13/02 , A23K10/12 , A23K20/174
摘要： The invention relates to an improved method for producing D-pantothenic acid and/or salts thereof and to the use thereof as an additive for animal feed.
摘要翻译：本发明涉及一种生产D-泛酸及/或其盐的改进方法及其用作动物饲料添加剂的用途。

59. 发明申请

US20100160447A1 Crystalline Forms of (-)-(1R,2R)-3-(3-dimethylamino-1-ethyl-2-methylpropyl)-phenol hydrochloride 有权
标题翻译：（ - ） - （1R，2R）-3-（3-二甲基氨基-1-乙基-2-甲基丙基） - 苯酚盐酸盐的结晶形式
公开(公告)号：US20100160447A1
公开(公告)日：2010-06-24
申请号：US12634777
申请日：2009-12-10
申请人： Andreas Fischer , Helmut Buschmann , Michael Gruss , Dagmar Lischke
发明人： Andreas Fischer , Helmut Buschmann , Michael Gruss , Dagmar Lischke
IPC分类号： A61K31/137 , C07C211/27 , A61P25/00
CPC分类号： C07C213/10 , C07B2200/07 , C07B2200/13 , C07C215/54
摘要： A hitherto unknown crystalline form of (−)-(1R,2R)-3-(3-dimethylamino-1-ethyl-2-methylpropyl)-phenol hydrochloride, pharmaceutical compositions containing the new crystalline form, methods of producing the new crystalline form, and a related method of use including treatment of, e.g., pain and/or urinary incontinence.
摘要翻译：（ - ） - （1R，2R）-3-（3-二甲基氨基-1-乙基-2-甲基丙基） - 酚盐酸盐的迄今为止未知的结晶形式，含有新结晶形式的药物组合物，生产新结晶形式的方法以及相关的使用方法，包括例如疼痛和/或尿失禁的治疗。

60. 发明申请

US20100154994A1 CONTROLLING ION ENERGY DISTRIBUTION IN PLASMA PROCESSING SYSTEMS 有权
标题翻译：控制离子能量分布在等离子体处理系统中
公开(公告)号：US20100154994A1
公开(公告)日：2010-06-24
申请号：US12634959
申请日：2009-12-10
申请人： Andreas Fischer , Eric Hudson
发明人： Andreas Fischer , Eric Hudson
IPC分类号： H01L21/306
CPC分类号： H01J37/32623 , H01J37/32091
摘要： A plasma processing system for processing at least a substrate with plasma. The plasma processing chamber is capable of controlling ion energy distribution. The plasma processing system may include a first electrode. The plasma processing system also includes a second electrode that is different from the first electrode and is configured for bearing the substrate. The plasma processing system may also include a signal source coupled with the first electrode. The signal source may provide a non-sinusoidal signal through the first electrode to control ion energy distribution at the substrate when the substrate is processed in the plasma processing system, wherein the non-sinusoidal signal is periodic.
摘要翻译：一种等离子体处理系统，用于至少用等离子体处理衬底。等离子体处理室能够控制离子能量分布。等离子体处理系统可以包括第一电极。等离子体处理系统还包括与第一电极不同的第二电极，并且构造成用于承载衬底。等离子体处理系统还可以包括与第一电极耦合的信号源。当在等离子体处理系统中处理衬底时，信号源可以通过第一电极提供非正弦信号以控制衬底处的离子能量分布，其中非正弦信号是周期性的。

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