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    • 51. 发明授权
    • Position measuring arrangement
    • 位置测量装置
    • US08477317B2
    • 2013-07-02
    • US12804735
    • 2010-07-28
    • Florian SchindlerRobert KrausJoel HeersinkMichael Stepputat
    • Florian SchindlerRobert KrausJoel HeersinkMichael Stepputat
    • G01B11/02
    • G01S17/42G01S17/36
    • A position measuring arrangement that includes a retroreflector, a light source generating a lightbeam and a scanning unit that generates a partially-divergent lightbeam. The scanning unit includes a scanning mirror mounted so it is deflected in a reproducible manner so that a grid-like scanning of a two-dimensional spatial area by the partially-divergent lightbeam takes place over a plurality of scanning tracks. The position measuring arrangement including an interferometric distance measuring unit that includes a beam splitter element that splits the lightbeam generated by the light source so that split lightbeams pass through a reference arm and a measuring arm at least once in each direction. The interferometric distance measuring unit includes an opto-electronic detector unit, through which a detection of distance-dependent signals from superimposed lightbeams from the reference arm and the measuring arm takes place.
    • 一种位置测量装置,包括后向反射器,产生光束的光源和产生部分发散的光束的扫描单元。 扫描单元包括安装的扫描反射镜,其以可再现的方式偏转,使得通过部分发散的光束的二维空间区域的网格状扫描发生在多个扫描轨道上。 所述位置测量装置包括干涉距离测量单元,所述干涉距离测量单元包括分束器元件,所述分束器元件分裂由所述光源产生的光束,使得分束光束在每个方向上至少穿过参考臂和测量臂。 干涉距离测量单元包括光电检测器单元,通过该光电检测器单元检测来自参考臂和测量臂的叠加光束的距离相关信号。