专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

51. 发明授权

US08693083B2 Micromirror unit and method of making the same 有权
标题翻译：微镜单元及其制作方法
公开(公告)号：US08693083B2
公开(公告)日：2014-04-08
申请号：US13336190
申请日：2011-12-23
申请人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
发明人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
IPC分类号： G02B26/00
CPC分类号： B81C1/00142 , B81B3/0078 , B81B2201/042 , B81B2201/045 , B81B2203/0136 , B81B2203/0181 , B81B2203/058 , B81C1/00396 , G02B26/0841 , Y10S359/904
摘要： A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.
摘要翻译：提供了一种用于制造微镜单元的方法，该微镜单元包括框架，反射镜形成基座和将框架连接到反射镜形成基座的桥。该方法包括以下步骤。首先，在基板上形成第一掩模图案，以掩蔽基板的被加工成框架和反射镜形成基座的部分。然后，在衬底上形成第二掩模图案，用于掩蔽加工成桥的衬底部分。然后，以第一和第二掩模图形作为掩模装置对基板进行第一蚀刻处理。然后，选择性地去除第二掩模图案。然后，以第一掩模图案作为掩模装置对基板进行第二蚀刻处理。最后，删除第一个掩模图案。

52. 发明申请

US20120105936A1 MICROMIRROR UNIT AND METHOD OF MAKING THE SAME 有权
标题翻译：微机单元及其制造方法
公开(公告)号：US20120105936A1
公开(公告)日：2012-05-03
申请号：US13336190
申请日：2011-12-23
申请人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
发明人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
IPC分类号： G02B26/00
CPC分类号： B81C1/00142 , B81B3/0078 , B81B2201/042 , B81B2201/045 , B81B2203/0136 , B81B2203/0181 , B81B2203/058 , B81C1/00396 , G02B26/0841 , Y10S359/904
摘要： A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.
摘要翻译：提供了一种用于制造微镜单元的方法，该微镜单元包括框架，反射镜形成基座和将框架连接到反射镜形成基座的桥。该方法包括以下步骤。首先，在基板上形成第一掩模图案，以掩蔽基板的被加工成框架和反射镜形成基座的部分。然后，在衬底上形成第二掩模图案，用于掩蔽加工成桥的衬底部分。然后，以第一和第二掩模图形作为掩模装置对基板进行第一蚀刻处理。然后，选择性地去除第二掩模图案。然后，以第一掩模图案作为掩模装置对基板进行第二蚀刻处理。最后，删除第一个掩模图案。

53. 发明授权

US08107157B2 Micromirror unit and method of making the same 有权
标题翻译：微镜单元及其制作方法
公开(公告)号：US08107157B2
公开(公告)日：2012-01-31
申请号：US11480512
申请日：2006-07-05
申请人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
发明人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
IPC分类号： G02B26/00
CPC分类号： B81C1/00142 , B81B3/0078 , B81B2201/042 , B81B2201/045 , B81B2203/0136 , B81B2203/0181 , B81B2203/058 , B81C1/00396 , G02B26/0841 , Y10S359/904
摘要： A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.
摘要翻译：提供了一种用于制造微镜单元的方法，该微镜单元包括框架，反射镜形成基座和将框架连接到反射镜形成基座的桥。该方法包括以下步骤。首先，在基板上形成第一掩模图案，以掩蔽基板的被加工成框架和反射镜形成基座的部分。然后，在衬底上形成第二掩模图案，用于掩蔽加工成桥的衬底部分。然后，以第一和第二掩模图形作为掩模装置对基板进行第一蚀刻处理。然后，选择性地去除第二掩模图案。然后，以第一掩模图案作为掩模装置对基板进行第二蚀刻处理。最后，删除第一个掩模图案。

54. 发明申请

US20070091415A1 Micromirror unit and method of making the same 有权
标题翻译：微镜单元及其制作方法
公开(公告)号：US20070091415A1
公开(公告)日：2007-04-26
申请号：US11480512
申请日：2006-07-05
申请人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
发明人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
IPC分类号： G02B26/00
CPC分类号： B81C1/00142 , B81B3/0078 , B81B2201/042 , B81B2201/045 , B81B2203/0136 , B81B2203/0181 , B81B2203/058 , B81C1/00396 , G02B26/0841 , Y10S359/904
摘要： A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.
摘要翻译：提供了一种用于制造微镜单元的方法，该微镜单元包括框架，反射镜形成基座和将框架连接到反射镜形成基座的桥。该方法包括以下步骤。首先，在基板上形成第一掩模图案，以掩蔽基板的被加工成框架和反射镜形成基座的部分。然后，在衬底上形成第二掩模图案，用于掩蔽加工成桥的衬底部分。然后，以第一和第二掩模图形作为掩模装置对基板进行第一蚀刻处理。然后，选择性地去除第二掩模图案。然后，以第一掩模图案作为掩模装置对基板进行第二蚀刻处理。最后，删除第一个掩模图案。

55. 发明授权

US07099066B2 Micromirror unit and method of making the same 有权
公开(公告)号：US07099066B2
公开(公告)日：2006-08-29
申请号：US11082881
申请日：2005-03-18
申请人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
发明人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
IPC分类号： G02B26/00
CPC分类号： B81C1/00142 , B81B3/0078 , B81B2201/042 , B81B2201/045 , B81B2203/0136 , B81B2203/0181 , B81B2203/058 , B81C1/00396 , G02B26/0841 , Y10S359/904
摘要： A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.

56. 发明申请

US20050162730A1 Micromirror unit and method of making the same 有权
公开(公告)号：US20050162730A1
公开(公告)日：2005-07-28
申请号：US11082881
申请日：2005-03-18
申请人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
发明人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
IPC分类号： B81B3/00 , B81C1/00 , G02B26/08 , G11B7/09 , G02B26/00
CPC分类号： B81C1/00142 , B81B3/0078 , B81B2201/042 , B81B2201/045 , B81B2203/0136 , B81B2203/0181 , B81B2203/058 , B81C1/00396 , G02B26/0841 , Y10S359/904
摘要： A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.

57. 发明申请

US20050134951A1 Micro-oscillating element provided with torsion bar 有权
标题翻译：微振动元件设有扭杆
公开(公告)号：US20050134951A1
公开(公告)日：2005-06-23
申请号：US11053880
申请日：2005-02-10
申请人： Xiaoyu Mi , Osamu Tsuboi , Satoshi Ueda , Ippei Sawaki
发明人： Xiaoyu Mi , Osamu Tsuboi , Satoshi Ueda , Ippei Sawaki
IPC分类号： B81B3/00 , B81B5/00 , G02B26/08 , G02B26/10
CPC分类号： G02B26/0841 , B81B3/007 , B81B2201/0235 , B81B2201/033 , B81B2201/042 , B81B2203/0109 , B81B2203/0154 , B81B2203/058
摘要： A micro-oscillating element is provided with a frame (113) and a oscillating member (111) connected with the frame (113) via a connector (112). Each connector (112) includes two torsion bars (112a), each torsion bar (112a) being constructed so that the rigidity becomes relatively high toward the frame (113) and relatively low toward the oscillating member (111) by forming a plurality of holes (112b).
摘要翻译：微振动元件设置有经由连接器（112）与框架（113）连接的框架（113）和摆动构件（111）。每个连接器（112）包括两个扭杆（112a），每个扭杆（112a）被构造成使得刚性通过形成多个相对于框架（113）而相对较低朝着摆动构件（111）变得相对较高的孔（112b）。

58. 发明授权

US6021003A Optical device 失效
标题翻译：光学装置
公开(公告)号：US6021003A
公开(公告)日：2000-02-01
申请号：US151028
申请日：1998-09-10
申请人： Takashi Katsuki , Ippei Sawaki , Michio Miura , Satoshi Ueda , Fumitaka Abe
发明人： Takashi Katsuki , Ippei Sawaki , Michio Miura , Satoshi Ueda , Fumitaka Abe
IPC分类号： H04N1/04 , G02B3/00 , G02B3/06 , G02B5/18 , G02B27/18 , G02B27/10
CPC分类号： G02B3/0043 , G02B3/005 , G02B3/06 , G02B5/1876
摘要： An optical device including an optical imaging system for forming a real image of an object on a light-receiving surface, the optical imaging system including first and second cylindrical lenses and first and second intermediate lenses, each of the intermediate lenses being composed of a plurality of lens elements arrayed in a line, the first and second cylindrical lenses being opposed to each other so that generatrices thereof are parallel to each other, the first and second intermediate lenses being arranged between the first and second cylindrical lenses in a direction of the generatrices so that a light beam emanated from the object is condensed onto the light-receiving surface through the first cylindrical lens, the first intermediate lens, the second intermediate lens and the second cylindrical lens, wherein each of the lens elements is formed of a one-dimensional binary lens having a light-condensing property only in the direction of the generatrices, whereby a real image by the first and second cylindrical lenses and an erect image by the first and second intermediate lenses are formed perpendicular to each other on the light-receiving surface.
摘要翻译：一种光学装置，包括用于在光接收表面上形成物体的实像的光学成像系统，所述光学成像系统包括第一和第二柱面透镜以及第一和第二中间透镜，每个中间透镜由多个排列成一行的透镜元件，第一和第二柱面透镜彼此相对，使得它们的母体彼此平行，第一和第二中间透镜沿着母线的方向布置在第一和第二柱面透镜之间使得从物体发出的光束通过第一柱面透镜，第一中间透镜，第二中间透镜和第二柱面透镜被聚光到受光面上，其中每个透镜元件由单向透镜形成，具有仅在母线方向上具有聚光特性的二维二元透镜，由此通过图像的真实图像第一和第二柱面透镜以及第一和第二中间透镜的直立图像在光接收表面上彼此垂直地形成。

59. 发明授权

US06473221B2 Galvano-mirror and method of making the same 有权
标题翻译： Galvano镜和制作相同的方法
公开(公告)号：US06473221B2
公开(公告)日：2002-10-29
申请号：US09803014
申请日：2001-03-12
申请人： Satoshi Ueda , Ippei Sawaki , Yoshihiro Mizuno
发明人： Satoshi Ueda , Ippei Sawaki , Yoshihiro Mizuno
IPC分类号： G02B2608
CPC分类号： G02B26/0841 , G11B7/08564 , Y10T156/1052
摘要： A method of making a galvano-mirror is provided. It includes the following steps. First, a first material substrate formed with a plurality of mirror plate regions is prepared. The mirror plate regions correspond in arrangement to the mirror plate of the galvano-mirror. Then, a second material substrate formed with a plurality of driver plate regions is prepared. The driver plate regions correspond in arrangement to the driver plate of the galvano-mirror. Then, the first and the second material substrates are attached to each other so that each of the mirror plate regions faces a relevant one of the driver plate regions. Finally, the attached first and second material substrates are divided into individual gaslvano-mirrors.
摘要翻译：提供了制作电流镜的方法。它包括以下步骤。首先，准备形成有多个镜面板区域的第一材料基板。镜面板区域与电动反射镜的镜板相对应。然后，准备形成有多个驱动板区域的第二材料基板。驱动器板区域布置成与电流镜的驱动器板对应。然后，将第一和第二材料基板彼此附接，使得每个镜板区域面对相关的一个驱动器板区域。最后，连接的第一和第二材料基底被分成单独的气体镜。

60. 发明授权

US06061479A Image reader apparatus 失效
标题翻译：图像读取装置
公开(公告)号：US06061479A
公开(公告)日：2000-05-09
申请号：US998995
申请日：1997-12-29
申请人： Yoshiro Ishikawa , Takashi Katsuki , Michio Miura , Satoshi Ueda , Ippei Sawaki , Fumitaka Abe
发明人： Yoshiro Ishikawa , Takashi Katsuki , Michio Miura , Satoshi Ueda , Ippei Sawaki , Fumitaka Abe
IPC分类号： G06T1/00 , H04N1/107 , G06K7/00 , G06K9/20 , H04N1/024 , H04N1/71
CPC分类号： H04N1/1077 , H04N1/107
摘要： An image reader apparatus includes an illuminating element to illuminate a document face to be read, an optical element to form an image of the document face illuminated by the illuminating element, an image sensor to photoelectrically convert the image formed by light passing through the optical element, and a running roller rotating in contact with the document face, wherein a horizontal distance between a document contact portion of the running roller where the running roller contacts the document and a center of imaging of the optical element is shorter than or equal to 10 mm.
摘要翻译：一种图像读取装置，包括用于照亮待读取的文件面的照明元件，形成由照明元件照射的文件面的图像的光学元件，对通过光学元件的光形成的图像进行光电转换的图像传感器以及与文件面接触地旋转的行进辊，其中，运行辊与文件接触的行进辊的原稿接触部分与光学元件的成像中心之间的水平距离小于或等于10mm 。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式