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    • 55. 发明授权
    • Preparation of thiazolo (2,3-b) zuinazolones
    • 噻唑(2,3-b)唑胺酮的制备
    • US5030727A
    • 1991-07-09
    • US508495
    • 1990-04-12
    • Gerhard HamprechtGuenther SeyboldNorbert MeyerBruno Wuerzer
    • Gerhard HamprechtGuenther SeyboldNorbert MeyerBruno Wuerzer
    • A01N43/90C07D277/32C07D513/04
    • C07D513/04A01N43/90
    • The process of manufacturing thiazolo-(2,3-b)-quinoazolones of the formula I ##STR1## where R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are defined in the disclosure, wherein either a) an anthranilamide derivative of the formula II ##STR2## where R.sup.5 and R.sup.6 are hydrogen or C.sub.1 -C.sub.4 -alkyl, is reacted with a thiazole derivative of the formula III ##STR3## where X is fluorine, chlorine, bormine, alkylsulfonyl or arylsulfonyl, or b) for certain radicals R.sup.4' from the group R.sup.4 - a thiazolo-(2,3-b)-quinazolone of the general formula IV ##STR4## is reacted with a nucleophile R.sup.4' -H, where R.sup.4' is alkoxy, alkylthio or unsubstituted or halogen-, alkyl-, haloalkyl-, nitro- or alkoxy-substituted phenoxy or thiophenyl, or an alkali metal, alkaline earth metal or ammonium salt of an alcohol.
    • 制备式I的噻唑并(2,3-b) - 喹唑啉酮的方法,其中R 1,R 2,R 3和R 4在本公开内容中定义,其中a)式II的邻氨基苯甲酰胺衍生物 其中R 5和R 6是氢或C 1 -C 4 - 烷基与式III的噻唑衍生物(III)反应,其中X是氟,氯,甲酚,烷基磺酰基或芳基磺酰基,或b )通式IV(IV)的噻唑并(2,3-b) - 喹唑酮的一些基团R4'与亲核试剂R4'-H反应,其中R4'是烷氧基, 烷硫基或未取代的或卤素,烷基 - ,卤代烷基 - ,硝基 - 或烷氧基取代的苯氧基或噻吩基,或醇的碱金属,碱土金属或铵盐。
    • 57. 发明授权
    • Thiophene compounds
    • 噻吩化合物
    • US4937256A
    • 1990-06-26
    • US356552
    • 1989-05-25
    • Reiner KoberJoachim LeyendeckerRainer SeeleStefan KarbachNorbert MeyerKarl-Otto WestphalenBruno WuerzerGerhard Wagenblast
    • Reiner KoberJoachim LeyendeckerRainer SeeleStefan KarbachNorbert MeyerKarl-Otto WestphalenBruno WuerzerGerhard Wagenblast
    • A01N43/10C07D333/22C07D333/28C07D333/38C07D409/14C07D413/14
    • C07D409/14A01N43/10C07D333/22C07D333/28
    • Thiophene compounds of the formula I ##STR1## where the substituents and the index have the following meanings: n is 0 or 1;R.sup.1 is hydrogen, halogen, C.sub.1 -C.sub.8 -alkyl, C.sub.1 -C.sub.6 -alkoxy, C.sub.1 -C.sub.8 -haloalkyl or C.sub.1 -C.sub.6 -haloalkoxy;R.sup.2, R.sup.3, R.sup.4 and R.sup.5 are cyano, nitro or the groups given for R.sup.1 ;A is hydrogen, C.sub.1 -C.sub.8 -alkyl, C.sub.1 -C.sub.6 -haloalkyl, C.sub.1 -C.sub.8 -alkoxy, C.sub.1 -C.sub.6 -haloalkoxy, substituted or unsubstituted aryl or heteroaryl, a radical OR.sup.6, whereR.sup.6 is hydrogen, C.sub.1 -C.sub.8 -alkyl, substituted C.sub.1 -C.sub.4 -alkyl, substituted or unsubstituted C.sub.2 -C.sub.8 -alkenyl, substituted or unsubstituted C.sub.3 -C.sub.7 -alkynyl, C.sub.4 -C.sub.9 -cycloalkyl, or a radical NR.sup.7 R.sup.8, where R.sup.7 and R.sup.8 are hydrogen, C.sub.1 -C.sub.8 -alkyl, C.sub.1 -C.sub.8 -alkoxy, C.sub.1 -C.sub.6 -haloalkyl, C.sub.1 -C.sub.6 -haloalkoxy, substituted or unsubstituted aryl or hetaryl, substituted or unsubstituted C.sub.1 -C.sub.12 -alkylcarbonyl, C.sub.1 -C.sub.12 -haloalkylcarbonyl, substituted or unsubstituted aryl or hetaryl,and their environmentally acceptable salts, processes for their manufacture, and their use.
    • 式I的噻吩化合物(I)其中取代基和指数具有以下含义:n为0或1; R 1是氢,卤素,C 1 -C 8 - 烷基,C 1 -C 6 - 烷氧基,C 1 -C 8 - 卤代烷基或C 1 -C 6 - 卤代烷氧基; R2,R3,R4和R5是氰基,硝基或R1给出的基团; A是氢,C 1 -C 8 - 烷基,C 1 -C 6 - 卤代烷基,C 1 -C 8 - 烷氧基,C 1 -C 6 - 卤代烷氧基,取代或未取代的芳基或杂芳基,基团OR 6,其中R 6是氢,C 1 -C 8烷基, 取代或未取代的C 2 -C 8 - 烯基,取代或未取代的C 3 -C 7 - 炔基,C 4 -C 9 - 环烷基或NR 7 R 8基团,其中R 7和R 8为氢,C 1 -C 8 - 烷基,C 1 -C 8 - C 1-8 - 烷氧基,C 1 -C 6 - 卤代烷基,C 1 -C 6 - 卤代烷氧基,取代或未取代的芳基或杂芳基,取代或未取代的C 1 -C 12烷基羰基,C 1 -C 12 - 卤代烷基羰基,取代或未取代的芳基或杂芳基, 盐,其制造方法及其用途。