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    • 53. 发明授权
    • Process for preparing high purity hydrogen peroxide aqueous solution
    • 制备高纯度过氧化氢水溶液的方法
    • US5670028A
    • 1997-09-23
    • US558724
    • 1995-11-16
    • Yukio InabaYohsuke UenoMasahiko WatanabeYukihiro Nishida
    • Yukio InabaYohsuke UenoMasahiko WatanabeYukihiro Nishida
    • B01D3/14B01D3/32C01B15/013B01D3/00B01D3/34
    • C01B15/013B01D3/14B01D3/32Y10S159/15Y10S203/20
    • A process for preparing a high purity H.sub.2 O.sub.2 aqueous solution, which comprises the steps of: (a) feeding a crude H.sub.2 O.sub.2 aqueous solution containing H.sub.2 O.sub.2, organic carbon impurities and inorganic impurities into a distillation column having an inner wall at least the surface of which is made of a fluorine resin and internals and packings at least the surface of which are made of a fluorine resin being provided internally of the distillation column, from a bottom portion of the distillation column; (b) subjecting the crude hydrogen peroxide aqueous solution to distillation under reduced pressure and under heating the bottom portion; (c) taking out a distillate containing an extremely low concentration of H.sub.2 O.sub.2 from a top portion of the distillation column without using the distillate for reflux in a distillation operation, and feeding ultra pure water in an amount satisfying (an amount of ultra pure water fed into column top)/((an amount of column top distillate)--(an amount of ultra pure water fed into column top)) being 0.1 to 20 into the top portion of the distillation column; and (d) taking out a H.sub.2 O.sub.2 aqueous solution having a high purity from a middle portion of the distillation column, simultaneously or successively.
    • 一种制备高纯度H 2 O 2水溶液的方法,其包括以下步骤:(a)将含有H 2 O 2的粗H 2 O 2水溶液,有机碳杂质和无机杂质进料到至少具有内表面的内壁的蒸馏塔中, 由氟树脂制成,至少其表面由在蒸馏塔内部设置的氟树脂制成的内部填料和填料从蒸馏塔的底部排出; (b)将粗过氧化氢水溶液在减压下加热并在底部进行蒸馏; (c)从蒸馏塔的顶部取出含有极低浓度的H 2 O 2的馏出物,在蒸馏操作中不使用馏出物进行回流,并且以超过一定量的量加入超纯水 进入塔顶)/((塔顶馏出物的量) - (进入塔顶的超纯水的量))为0.1-20进入蒸馏塔的顶部; 和(d)从蒸馏塔的中间部分同时或相继取出具有高纯度的H 2 O 2水溶液。