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    • 58. 发明专利
    • HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL
    • JP2000241931A
    • 2000-09-08
    • JP4107799
    • 1999-02-19
    • MITSUBISHI PAPER MILLS LTD
    • SUMIOKA KOICHI
    • G03C1/498
    • PROBLEM TO BE SOLVED: To obtain a heat developable photosensitive material having good storage property, low fog and high sensitivity, and especially to obtain a heat developable photosensitive material having photosensitivity for IR rays by incorporating a sensitizing dye having at least one isothioureide group in the molecular structure. SOLUTION: This heat developable photosensitive material contains photosensitive silver halide particles, nonphotosensitive organic silver salts, a reducing agent for silver ion, and a binder on at least one face on a support, and the photosensitive material contains a sensitizing dye having at least one isothioureide group in the molecular structure. In this case, the photosensitive silver halide particles are spectrally sensitized in the wavelength regions according to the exposure wavelengths (usually 633 nm, 670 nm, 780nm and 810 to 830 nm). Thereby, the obtained heat developable photosensitive material is suitable for exposure to laser light in the wavelength regions, and it is especially suitable for exposure using a practically advantageous semiconductor laser. The obtained material has high sensitivity, low fog and excellent storage property. When a hydrazine derivative is incorporated, a high contrast image can be obtained.