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51. 发明授权

US07492812B2 RFID transceiver device 有权
标题翻译： RFID收发器设备
公开(公告)号：US07492812B2
公开(公告)日：2009-02-17
申请号：US11209627
申请日：2005-08-24
申请人： Teruhisa Ninomiya , Yusuke Kawasaki , Osamu Kuroda , Yoshinori Tanaka
发明人： Teruhisa Ninomiya , Yusuke Kawasaki , Osamu Kuroda , Yoshinori Tanaka
IPC分类号： H04L5/16
CPC分类号： H04B1/525 , G06K7/0008
摘要： An RFID transceiver device is capable of high sensitivity reception, by the reduction of noise, irrespective of the distance to the tag. The RFID transceiver device includes a delay circuit between a local oscillation circuit and a demodulation circuit, wherein the amount of delay of the delay circuit is set to a magnitude corresponding to the path difference between the path of leakage, via a duplexer into the demodulation circuit, of transmission signal output from the local oscillation circuit for transmission, and the path of direct input of the local oscillation signal from the local oscillation circuit to the demodulation circuit.
摘要翻译： RFID收发器设备能够通过降低噪声来实现高灵敏度接收，而与标签的距离无关。 RFID收发器装置包括在本地振荡电路和解调电路之间的延迟电路，其中延迟电路的延迟量被设置为对应于泄漏路径之间的路径差的大小，经由双工器到解调电路的从本地振荡电路输出的发送信号进行发送，以及将本地振荡信号从本地振荡电路直接输入到解调电路的路径。

52. 发明授权

US07171973B2 Substrate processing apparatus 有权
标题翻译：基板加工装置
公开(公告)号：US07171973B2
公开(公告)日：2007-02-06
申请号：US10195453
申请日：2002-07-16
申请人： Takehiko Orii , Tatsuya Nishida , Osamu Kuroda
发明人： Takehiko Orii , Tatsuya Nishida , Osamu Kuroda
IPC分类号： B08B3/02
CPC分类号： H01L21/67051 , C03C23/0075 , H01L21/67028 , H01L21/67178 , Y10S134/901 , Y10S134/902
摘要： The substrate processing apparatus has an enclosure structure enclosing a substrate support member to define a processing space. The enclosure structure has an opening closed by a shutter. A processing fluid supply unit, which supplies processing fluid, such as chemical liquid, is accommodated in a housing. The processing fluid supply unit accommodated in the housing is advanced into the processing space through the opening of the enclosure structure to feed the processing fluid onto the substrate supported by the substrate support member.
摘要翻译：衬底处理设备具有包围衬底支撑构件以限定处理空间的封闭结构。外壳结构具有由快门关闭的开口。供给处理流体（如化学液体）的处理流体供应单元容纳在壳体中。容纳在壳体中的处理流体供应单元通过外壳结构的打开而进入处理空间，以将处理流体供给到由基板支撑构件支撑的基板上。

53. 发明申请

US20060060803A1 Radiation image information reading apparatus 失效
公开(公告)号：US20060060803A1
公开(公告)日：2006-03-23
申请号：US11225164
申请日：2005-09-14
申请人： Yoshihiro Ishikawa , Masakazu Nakajo , Osamu Kuroda , Yuzuru Ohtsuka , Hideki Suzuki , Yasunori Ohta
发明人： Yoshihiro Ishikawa , Masakazu Nakajo , Osamu Kuroda , Yuzuru Ohtsuka , Hideki Suzuki , Yasunori Ohta
IPC分类号： G01T1/105
CPC分类号： G01T1/2014 , A61B6/4494 , G01T1/2016 , G03B42/02
摘要： When cassettes are placed on a conveyor disposed in a cassette loader and detectors disposed on a support plate on the conveyor detect information of identification strips on side walls of the cassettes, the cassettes are judged as being loaded properly in the cassette loader. When the detectors fail to detect the identification strips, the cassettes are judged as not being loaded in a desired state in the cassette loader.

54. 发明授权

US06769855B2 Substrate processing apparatus and substrate processing method 失效
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US06769855B2
公开(公告)日：2004-08-03
申请号：US10032528
申请日：2001-12-27
申请人： Masayuki Yokomori , Osamu Kuroda
发明人： Masayuki Yokomori , Osamu Kuroda
IPC分类号： B65G6500
CPC分类号： H01L21/67781 , G06F9/4493 , Y10S414/138
摘要： A substrate processing apparatus (1) includes a wafer loading/unloading and arraying part (14) to remove substrates W from a container (C) where a plurality of unprocessed substrates W to be processed are accommodated at regular intervals, substrate arraying part (51a, 51b, 60) for arranging the substrates W having been removed from two containers (C) at the loading/unloading and arraying part (14) at pitches half the pitch to arrange the substrates in the container (C), a processing part (4) for applying a designated process on the substrates (W), a transfer mechanism (17) for transporting the substrates (W) arranged by the substrate array part (51a, 51b, 60) to the processing part (4) and a stand-by part (75) to allow the substrates arranged by the substrate array parts to stand in readiness temporarily.
摘要翻译：衬底处理装置（1）包括晶片装载/排出部分（14），用于从要容纳多个待处理的多个未处理衬底W的容器（C）移除衬底W，所述衬底W以规则的间隔被容纳，衬底排列部分（51a ，51b，60），用于将已经从加载/卸载和排列部分（14）两个容器（C）移除的基板W以间距的一半排列，以将基板布置在容器（C）中，处理部分 4），用于在基板（W）上施加指定的处理;传送机构（17），用于将由基板阵列部分（51a，51b，60）布置的基板（W）传送到处理部分（4） - 通过部分（75），以允许由衬底阵列部分布置的衬底临时立即准备就绪。

55. 发明授权

US06368040B1 Apparatus for and method of transporting substrates to be processed 失效
公开(公告)号：US06368040B1
公开(公告)日：2002-04-09
申请号：US09251100
申请日：1999-02-16
申请人： Katuki Yamasaki , Osamu Kuroda , Kazuyuki Honda , Hiroshi Yamahata
发明人： Katuki Yamasaki , Osamu Kuroda , Kazuyuki Honda , Hiroshi Yamahata
IPC分类号： B65H100
CPC分类号： H01L21/67781 , Y10S414/136 , Y10S414/137
摘要： A substrate transporting apparatus includes a wafer transfer arm 10 for carrying a plurality of semiconductor wafers W being processed horizontally, a pitch changer 20 for carrying the wafers W at predetermined intervals vertically and a posture changing device 30 positioned between the wafer transfer arm 10 and the pitch changer 20, for changing the posture of the wafers W to the horizontal and vertical arrangements. The pitch changer 20 includes a first holding part 21A and a second holding part 21B which are adapted so as to elevate relatively to each other. The wafers W are held by either one of the holding parts 21A, 21B at the predetermined intervals. The posture changing device 30 has a pair of holders 31 between which the semiconductor wafers W is interposed. The holders 31 are respectively provided, on their sides opposing each other, with a plurality of holding grooves 32A, 32B for retaining the wafers W independently. With the arrangement, the whole apparatus can be small-sized to improve throughput and yield of products.

56. 发明授权

US5774250A Optical condenser system for light scanning apparatus 失效
标题翻译：光学扫描仪用光电聚光系统
公开(公告)号：US5774250A
公开(公告)日：1998-06-30
申请号：US839156
申请日：1997-04-23
申请人： Katsumi Shimada , Osamu Kuroda
发明人： Katsumi Shimada , Osamu Kuroda
IPC分类号： G02B26/10 , G02B13/00 , G02B13/18 , G02B26/12 , G02B26/08
CPC分类号： G02B26/125
摘要： An optical condenser system for a light scanning apparatus includes a first lens which is a single lens formed of plastic and a second lens which is a plano-convex lens formed of glass and convex toward the scanning surface. The first lens is concave toward a deflector of the light scanning apparatus and each side of the first lens is an aspheric surface defined by the following formula (6). The first and second lens satisfying the following formulae (1) to (5) 0.1f.ltoreq.d.sub.0 .ltoreq.0.3f (1) 0.02f.ltoreq.d.sub.2 .ltoreq.0.2f (2) -1.0.times.10.sup.2 /f.sup.3 .ltoreq.a.sub.1 .ltoreq.-1.0/f.sup.3( 3) 5.0.times.10/f.sup.5 .ltoreq.a.sub.2 .ltoreq.5.0.times.10.sup.3 /f.sup.5( 4) -0.3/f.ltoreq.1/f.sub.1 .ltoreq.0.3f (5) z=ch.sup.2 /�1+{1-(1+K)c.sup.2 h.sup.2}.sup.1/2 !+a.sub.1 h.sup.4 +a.sub.2 h.sup.6 +a.sub.3 h.sup.8 +a.sub.4 h.sup.10 ( 6) wherein f represents the focal length (mm) of the whole system, d.sub.0 represents the axial surface separation (mm) between the deflecting point at the deflector and the first lens, d.sub.2 represents the axial surface separation (mm) between the first lens and the second lens and f.sub.1 represents the focal length (mm) of the first lens.
摘要翻译：一种用于光扫描装置的光学聚光器系统包括：第一透镜，其是由塑料形成的单个透镜，第二透镜是由玻璃形成并且朝向扫描表面凸出的平凸透镜。第一透镜对于光扫描装置的偏转器是凹形的，并且第一透镜的每一侧是由下式（6）限定的非球面。满足以下公式（1）至（5）的第一和第二透镜0.1f

57. 发明授权

US5737018A Exposure apparatus and method for vibration control system 失效
标题翻译：振动控制系统的曝光装置和方法
公开(公告)号：US5737018A
公开(公告)日：1998-04-07
申请号：US442204
申请日：1995-05-16
申请人： Shuji Shimizu , Osamu Kuroda , Yasutaka Ito , Yoshikazu Takahashi
发明人： Shuji Shimizu , Osamu Kuroda , Yasutaka Ito , Yoshikazu Takahashi
IPC分类号： H04N5/232 , H04N5/235 , H04N5/238
CPC分类号： H04N5/2327 , H04N5/23248 , H04N5/23258 , H04N5/23274 , H04N5/2352
摘要： An exposure device controls the exposure of an image in a video camera using a vibration control system. The gain of an iris, which receives the image, the gain of an AGC amplifier, which amplifies the sensed image and the gain of an electronic shutter, which controls the speed at which images are sensed; are controlled by driving the iris in a first range indicative of an object illuminance when a hand vibration correcting operation is performed, driving the AGC amplifier in a second range indicative of the object illuminance, and driving the shutter in a third range indicative of the object illuminance.
摘要翻译：曝光装置使用振动控制系统控制摄像机中的图像的曝光。接收图像的虹膜的增益AGC放大器的增益，其放大感测图像和电子快门的增益，其控制图像被感测的速度; 通过在执行手部振动校正操作的情况下在指示对象照度的第一范围内驱动虹膜来控制虹膜，在指示对象照度的第二范围内驱动AGC放大器，并且在指示对象的第三范围内驱动快门照度。

58. 发明授权

US5473374A Exposing apparatus for performing exposure control corresponding to the luminance level of an object 失效
标题翻译：用于执行与物体的亮度水平相对应的曝光控制的曝光装置
公开(公告)号：US5473374A
公开(公告)日：1995-12-05
申请号：US260381
申请日：1994-06-14
申请人： Shuji Shimizu , Osamu Kuroda , Yasutaka Ito , Yoshikazu Takahashi
发明人： Shuji Shimizu , Osamu Kuroda , Yasutaka Ito , Yoshikazu Takahashi
IPC分类号： H04N5/232 , H04N5/235 , H04N5/238
CPC分类号： H04N5/2327 , H04N5/23248 , H04N5/23258 , H04N5/23274 , H04N5/2352
摘要： An exposing apparatus comprises: a lens group to fetch a light from an object; an iris to adjust a light amount from the lens group; an image pickup device to convert the light which passed through the iris into the electric signal; a detecting circuit to detect a luminance signal level from an output signal from the image pickup device; a reference level signal setting circuit to set an exposure control reference value to control the iris; an exposure control reference value modulating circuit to modulate the exposure control reference value when the iris is controlled; and a control circuit to set the exposure control reference value in correspondence to the luminance signal level when an output level of the detecting circuit is larger than a set value.
摘要翻译：曝光装置包括：用于从物体取出光的透镜组; 调整透镜组的光量的虹膜; 将通过虹膜的光转换成电信号的图像拾取装置; 检测电路，用于根据来自图像拾取装置的输出信号检测亮度信号电平; 基准电平信号设定电路，设定曝光控制基准值以控制所述光圈; 曝光控制基准值调制电路，用于当所述光圈被控制时调制所述曝光控制基准值; 以及控制电路，用于当检测电路的输出电平大于设定值时，根据亮度信号电平设定曝光控制基准值。

59. 发明授权

US5388405A System for purifying exhaust gas for use in an automobile 失效
标题翻译：用于汽车净化废气的系统
公开(公告)号：US5388405A
公开(公告)日：1995-02-14
申请号：US953218
申请日：1992-09-30
申请人： Masakatsu Fujishita , Takeshi Atago , Akio Honji , Osamu Kuroda , Toshio Ogawa , Noriko Watanabe , Minoru Osuga
发明人： Masakatsu Fujishita , Takeshi Atago , Akio Honji , Osamu Kuroda , Toshio Ogawa , Noriko Watanabe , Minoru Osuga
IPC分类号： F01N3/02 , F01N3/08 , F01N3/20 , F01N3/22 , F01N3/24 , F01N9/00 , F01N13/02 , F01N13/04 , F02M25/07
CPC分类号： F01N3/0835 , F01N13/009 , F01N13/011 , F01N3/0814 , F01N3/0871 , F01N3/0878 , F01N3/2093 , F01N2240/02 , F01N2240/18 , F01N2250/12 , F01N2410/12 , F01N3/20 , F02M26/15
摘要： A system for purifying an exhaust gas for use in an automobile is disclosed which does not externally discharge unburnt hydrocarbons until a catalyst becomes active. An adsorbent is provided upstream of the catalyst. A heat exchanger is disposed between an upstream portion of the adsorbent and a portion between the adsorbent and the catalyst for controlling the elevation of the temperature of the adsorbent and for promoting the elevation of the temperature of the catalyst. The unburnt hydrocarbons are absorbed by the adsorbent in the initial period of time from starting of an engine until the catalyst becomes active. Temperature control is made in such a manner that the unburnt hydrocarbons which are adsorbed by the adsorbent begins to be desorbed therefrom substantially simultaneously with the time when the catalyst begins to function. A large quantity of unburnt hydrocarbons which are emitted from an engine immediately after the starting of the engine are prevented from being externally discharged without being treated.
摘要翻译：公开了一种用于净化汽车中使用的废气的系统，其在外界不排出未燃烧的烃，直到催化剂变得活跃。在催化剂的上游设置吸附剂。吸附剂的上游部分和吸附剂和催化剂之间的部分设置有热交换器，用于控制吸附剂的温度升高并促进催化剂的温度升高。未燃烧的碳氢化合物在起动发动机直到催化剂变成活性的初始阶段被吸附剂吸收。以这样的方式进行温度控制，使得吸附在吸附剂上的未燃烧的碳氢化合物在催化剂开始起作用时基本同时脱附。在发动机起动之后立即从发动机排出的大量未燃烧的碳氢化合物被防止被外部排出而不被处理。

60. 发明授权

US4351715A Apparatus for high temperature electrodialysis 失效
标题翻译：高温电渗透仪
公开(公告)号：US4351715A
公开(公告)日：1982-09-28
申请号：US239578
申请日：1981-03-02
申请人： Harumi Matsuzaki , Osamu Kuroda , Isao Okouchi , Kenkichi Izumi , Sankichi Takahashi
发明人： Harumi Matsuzaki , Osamu Kuroda , Isao Okouchi , Kenkichi Izumi , Sankichi Takahashi
IPC分类号： B01D61/48 , B01D57/02 , B01D61/44 , B01D61/50 , B01D61/52 , B01D61/54 , B01D65/02 , C02F1/46 , C02F1/469 , B01D13/02
CPC分类号： B01D61/44 , C02F1/469 , B01D2311/10 , B01D2311/2661 , C02F1/4604 , C02F1/4693 , C02F2201/46115 , Y02W10/37
摘要： In electrodialysis of desalting or concentrating an electrolyte solution in desalting chambers and concentrating chambers constituted by alternately juxtaposing a plurality of anion and cation exchange membranes between at least a pair of electrodes by supplying the electrolyte solution into the desalting and concentrating chambers while introducing a gas in a bubble state into the electrolyte solution between the ion exchange membranes, the electrolyte solution is made to contact the gas in the bubble state while providing a temperature difference between the gas and the electrolyte solution. The scale deposition onto the ion exchange membranes is prevented with an increase in electrodialysis efficiency.
摘要翻译：在通过将脱盐室中的电解质溶液进行脱盐或浓缩，或者在通过将电解质溶液引入脱盐浓缩室中而将至少一对电极交替地并置到多个阴离子和阳离子交换膜中而形成的脱盐室和浓缩室中的同时，气泡状态进入离子交换膜之间的电解质溶液中，使电解质溶液以气泡状态接触气体，同时提供气体和电解质溶液之间的温度差。随着电渗析效率的提高，防止了离子交换膜上的垢沉积。

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