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    • 54. 发明专利
    • PRODUCTION OF HEXACHLORODISILANE
    • JPS61205614A
    • 1986-09-11
    • JP4470185
    • 1985-03-08
    • MITSUI TOATSU CHEMICALS
    • HIAI ATSUHIKOWAKIMURA KAZUOUSE TADAHARU
    • C01B33/107
    • PURPOSE:In producing hexachlorodisilane by lowering chlorosilane with chlorine in a fluidized bed, to prevent clogging in a device and to raise yield, by feeding separately chlorine and silicon tetrachloride as a fluidizing gas at a specific temperature reaction and using inert particles as a fluidizing medium. CONSTITUTION:Silicon tetrachloride is fed from the piping 1 to the evaporator 4. Silicon tetrachloride vapor is introduced from the piping 5 through a distribution plate at the lower part of the fluidized bed 6. The fluidized bed 6 is filled with inert particles (e.g., alumina passing 60 meshes) as a fluidizing medium. A chloropolysilane (SinCl2n+2, n>=3) and chlorine of raw materials are fed from the piping 2, and the piping 3, respectively, through the lower side of the fluidized bed to the fluidized bed. Silicon tetrachloride used as a fluidizing gas is not premixed with chlorine and not fed to the fluidized bed, but they are separately fed to the fluidized bed, so clogging of a distribution plate of the fluidizing gas is prevented. Yield is raised by controlling the reaction temperature in the fluidized bed at 250-450 deg.C.