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51. 发明专利

JPS63119280A BLUE LIGHT EMITTING DIODE 失效
公开(公告)号：JPS63119280A
公开(公告)日：1988-05-23
申请号：JP26456986
申请日：1986-11-06
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： OKAWA KAZUHIRO , MITSUYU TSUNEO , YAMAZAKI OSAMU
IPC分类号： H01L33/28 , H01L33/30
摘要： PURPOSE:To contrive high efficiency and long life by continuously growing epitaxially by using chlorine as the dopant of n-type ZnSe and nitrogen as the dopant of p-type ZnSe. CONSTITUTION:The reason why GaAs is used for a substrate 1 is that the lattice constant is nearly the same as that of ZnSe and that the excellent single crystal layer of the ZnSe can be grown epitaxially. An appropriate impurity is evaporated with a crystalline matrix material ZnSe and a chlorine-doped N-type ZnSe layer 2 and a nitrogen-doped P-type ZnSe layer 3 are continuously grown in sequence by changing the sort of the impurity. The electron density of the chlorine-doped N-type ZnSe layer 2 is made 5X10 cm or more to obtain high efficiency. If excessive chlorine is doped, a deep level is formed in band energy and the light emission except blue is made stronger so it is required to restrain the addition of the chlorine to an extent of electron density 5X10 cm or less. The thickness of the chlorine-doped N-type ZnSe layer 2 is made 1mum or more.

52. 发明专利

JPS63118701A PRODUCTION OF OPTICAL ELEMENT 失效
公开(公告)号：JPS63118701A
公开(公告)日：1988-05-23
申请号：JP26593886
申请日：1986-11-07
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： SHIONO TERUHIRO , SETSUNE KENTARO , YAMAZAKI OSAMU
IPC分类号： G02B5/18 , G02B3/08
摘要： PURPOSE:To improve optical characteristics by applying positive resist to the surface of a substrate, converging ion beams into the resist so as to make the beams correspond to the shape of an optical element while changing acceleration voltage to draw a picture and executing development processing to change the film thickness of the resist. CONSTITUTION:The positive resist 6 is applied to the glass substrate 1 and an electrification preventing film 3 is vacuum deposited on the surface of the resist 6. The acceleration voltage of ion beams 5 is periodically changed from a large value to a small value or a small value to a large value so as to correspond to the shape of a grating 20 with a fixed period to converge the ion beams 5 into the resist 6 and directly draw a picture. Finally, the film 3 is removed by etching and developed, so that resist is deeply peeled on the draw portion with a high ion beam acceleration voltage and the film thickness of the resist 6 can be changed to obtain the grating 20. Thus, an excellent sectional shape can be obtained with high reproducibility and the optical characteristics can be improved.

53. 发明专利

JPS62271426A ALIGNMENT OF MASK POSITION 失效
公开(公告)号：JPS62271426A
公开(公告)日：1987-11-25
申请号：JP11526686
申请日：1986-05-20
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： FUKUDA TOMIYO , TONO HIDETAKA , YAMAZAKI OSAMU
IPC分类号： G03F1/00 , G03F1/38 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/67 , H01L21/68
摘要： PURPOSE:To improve the accurary of alignment in a manufacturing process by forming silmultaneously a first layer (waveguide) pattern and an alignment mark to be a first marker. CONSTITUTION:A resist pattern 11 for lift-off is formed on a substrate 41 whereon a PLZT thin film 44 is formed by sputtering. Next, a Ta2O5 film 24 being a material of a waveguide is formed by sputtering and then aluminum 12 is evaporated. When the resist pattern 11 is exfoliated, an alignment mark 12A and a first layer (waveguide) pattern 24A are formed. After a posi-resist 14 is formed by coating, subsequently, exposure and development are performed by using a mask 13 for removal, and thereafter the resist 14 is remived. Then the first alignment mark 12A is left on Ta2O5 24B formed simultaneouely with the waveguide pattern 24A. Then, the alignment of the position of a second layer (electrode) pattern mask 15 is performed by using the alignment mark 12A and a part of the second pattern mask 15 to be a second marker 16, and the exposure of a resist for lift-off is conducted.

54. 发明专利

JPS62250401A OPTICAL DEVICE AND ITS MANUFACTURE 失效
公开(公告)号：JPS62250401A
公开(公告)日：1987-10-31
申请号：JP9325686
申请日：1986-04-24
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： SHIONO TERUHIRO , SETSUNE KENTARO , YAMAZAKI OSAMU
IPC分类号： G03H1/08 , G02B5/18 , G02B6/12 , G02B6/122
摘要： PURPOSE:To facilitate a process and to make positioning accurate relatively to an optical element by using a photosensitive thin film which increases in transmissivity when irradiated with an electron beam or ion beam. CONSTITUTION:A substrate 11 uses a glass plate which has ITO for charge-up prevention against an electron beam 15 or ion beam on the surface and the photosensitive thin film 12 use a mixture of a natural polysaccharide body such as pulran and a diazo compound. The substrate 11 is coated with the photosensitive material 12 and CMS electron beam resist 14 which has a lower sensitivity than the photosensitive material in that order. Then, an irradiation quantity distribution is given by the electron beam 15 so as to correspond to the phase shift function of a Fresnel lens whose periphery is rectangularly clipped and a development process is carried out to vary the film thickness of the resist 14, thereby forming a Fresnel lens array 13. Thus, a light shield film is simultaneously formed with lenses, so the process becomes extremely simple and the accuracy of the positioning between the lens array 13 and light shield film after completion is improved.

55. 发明专利

JPS62205281A PLASMA DEVICE 失效
公开(公告)号：JPS62205281A
公开(公告)日：1987-09-09
申请号：JP4655786
申请日：1986-03-04
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： MANABE YOSHIO , MITSUYU TSUNEO , YAMAZAKI OSAMU
IPC分类号： C23C16/50 , C23C16/511 , C23F4/00
摘要： PURPOSE:To form a film having uniform and good quality with simple constitution by disposing a cylindrical substrate in a plasma chamber to which a microwave and magnetic field are impressed and making the intensity distribution of the magnetic field high near the cylindrical substrate and low in the position apart therefrom in the outside circumferential direction. CONSTITUTION:The cylindrical substrate 2 is disposed into the plasma chamber 1 where plasma is induced by the microwave and magnetic field. A gas for CVD is then introduced into said chamber. The above-mentioned magnetic field is impressed in approximately parallel with the substrate 2 by hole pieces 8 disposed on the outside of the plasma chamber 1. The intensity distribution thereof is formed high near the cylindrical substrate 2 and low in the position apart therefrom in the outside circumferential direction. The direct contact of the plasma with the chamber wall is thereby obviated and the ions and free radicals are transported to the cylindrical substrate 2 by which the good-quality film is formed without a rotating mechanism. The intensity of the magnetic field near the cylindrical substrate 2 is adjusted to the intensity at which electron cyclotron resonance arises or above and the plasma chamber 1 is formed to the cylindrical shape coaxial with the cylindrical substrate 2 so that a coaxial or semi-coaxial type microwave resonator is preferably formed by both.

56. 发明专利

JPS62109049A PRODUCTION OF MINUTE OPTICAL ELEMENT 失效
公开(公告)号：JPS62109049A
公开(公告)日：1987-05-20
申请号：JP24930285
申请日：1985-11-07
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： SHIONO TERUHIRO , SETSUNE KENTARO , YAMAZAKI OSAMU
IPC分类号： G02B5/18 , G02B3/00 , G02B7/28 , G03B3/00 , G03B13/30 , G03C5/16 , G03F7/20
摘要： PURPOSE:To obtain the titled element having an excellent optical characteristics by changing an accelerating voltage of an electron beam in a range of a low accelerating voltage so as to correspond to a shape of the titled element, thereby forming directly an image on the positive type electron beam resist, and by effecting a developing treatment, thereby changing the thickness of the electron beam resist film. CONSTITUTION:The positive type electron beam resist 12 is coated on a substrate 11, for example, in 1.3mum thickness, and an antistatic film 13 is vacuum- deposited on the resist 12 in 100Angstrom thickness. The image is formed directly on the positive type electron beam resist 12 by changing the accelerating voltage of the electron beam 14 in the range of the low accelerating voltage so as to correspond to the shape of the formed grating 12'. Thus, a depth of entering the electron beam 14 within the electron beam resist layer 12 becomes small, depending upon the accelerating voltage. Eve if a light exposure is somewhat excess, the thickness of the film after developing almost becomes constant.

57. 发明专利

JPS6269247A OPTICAL SWITCH 失效
公开(公告)号：JPS6269247A
公开(公告)日：1987-03-30
申请号：JP20913285
申请日：1985-09-20
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： FUKUDA TOMIYO , TONO HIDETAKA , YAMAZAKI OSAMU
IPC分类号： G02F1/055 , G02F1/313
摘要： PURPOSE:To obtain an optical switch which is superior in quenching ratio and branch ratio by refracting light in mode other than the mode of a waveguide by a waveguide prism, and changing the traveling direction of the light and preventing it from being transmitted to an optical fiber in mode other than the waveguide mode. CONSTITUTION:A crossing optical waveguide 11 made of a transparent thin film 12 having electrooptic effect is provided on a substrate and then a buffer layer is formed so as to cover the optical waveguide 11 and transparent electrode 12. The optical waveguide 11 is a ridge waveguide which have a projection part formed of the beltlike thin film 12 on the surface of the thin film 12. A prism are 17 which has a higher refractive index than the buffer layer is formed on the thin film 12 in the vicinity of the light input and output parts of two input and output light waveguides, an electrode 14 which has a narrow electrode gap 14' on the waveguide intersection part is provided across the buffer layer, and the gap 14' is so positioned that the thin film 12 right below it is on the bisector of the intersection line connecting the two input and output waveguide end parts. When a voltage is applied to an electrode 14, this switch operates.

58. 发明专利

JPS6259933A OPTICAL SWITCH 失效
公开(公告)号：JPS6259933A
公开(公告)日：1987-03-16
申请号：JP19932885
申请日：1985-09-11
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： FUKUDA TOMIYO , TONO HIDETAKA , YAMAZAKI OSAMU
IPC分类号： G02F1/055 , G02F1/31 , G02F1/313
摘要： PURPOSE:To prevent a harmful light wave from entering a waveguide and to improve a quenching ratio by changing the propagation direction of a light wave in propagation mode other than a waveguide mode by the refraction of a waveguide prism. CONSTITUTION:A transparent thin film 2 which has electropic effect is formed on a substrate and a strip road 12 which has a buffer layer made of a transparent thin dielectric film and a transparent dielectric having a higher refractive index than the buffer layer in a thin beltlike film shape are arranged in an optical waveguide shape and surrounded with the buffer layer and transparent thin film. Therefore, the effective refractive index of the transparent thin film 1 right under the strip road 12 is high and a light wave l is confined laterally, so the light wave l is guided along the strip roads 12. The strip road (optical waveguide) 12 has an input optical waveguide 12a provided opposite an input optical fiber 13 and an input optical waveguide 12b arranged opposite an input optical fiber 13b and their other-end parts from an output optical waveguide 12c and an output optical waveguide 12d, and coupled optically with output optical fibers 14a and 14b.

59. 发明专利

JPS6243837A METHOD AND APPARATUS OF MANUFACTURING VAPOR DEPOSITION MAGNETIC TAPE 失效
公开(公告)号：JPS6243837A
公开(公告)日：1987-02-25
申请号：JP18162585
申请日：1985-08-21
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： KITAHATA MAKOTO , YAMAZAKI OSAMU
IPC分类号： C23C14/56 , G11B5/85
摘要： PURPOSE:To improve the utilizing efficiency of a metal used for a vapor deposition source by running a base film in jigzag so as to increase the part vapor- deposited obliquely. CONSTITUTION:The base film 1 is run in jigzag to increase a part 5 vapor- deposited obliquely. In this case, since a part 6 vapor-deposited obliquely from the reverse direction, a mask 3 to mask the part 6 is required for provision. Thus, a vapor-deposition magnetic tape with excellent adhesion and magnetic characteristic is obtained with high vapor-deposition efficiency.

60. 发明专利

JPS6243608A OPTICAL CIRCUIT ELEMENT 失效
公开(公告)号：JPS6243608A
公开(公告)日：1987-02-25
申请号：JP18300485
申请日：1985-08-22
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： TONO HIDETAKA , FUKUDA TOMIYO , YAMAZAKI OSAMU
IPC分类号： G02B6/30 , G02B6/42
摘要： PURPOSE:To realize high-efficiency optical coupling with good productivity by arranging the tip of a taper-sectioned part at one end of a self-convergent cylindrical lens closely to an optical waveguide on a substrate. CONSTITUTION:Light propagated in an optical fiber is incident on the self- convergent cylindrical lens 3 and then incident on a taper surface 9 while drawing a sine-wave tragectory because of the self-convergency of the lens 3; and the light is reflected totally there and propagated in the lens 3 while drawing a sine-wave tragectory again. The light is projected from the tip 10 of the lens 3 and enters the optical waveguide 5 from its end surface 5a. The beam size of the guided light intensity distribution 8a in the optical waveguide 5 is matched with the beam size of a propagated light beam 7c to obtain maximum coupling efficiency.

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