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    • 56. 发明申请
    • Dynamic illumination uniformity and shape control for lithography
    • 光刻的动态照明均匀性和形状控制
    • US20060087634A1
    • 2006-04-27
    • US10971675
    • 2004-10-25
    • Jay BrownKoichi Matsumoto
    • Jay BrownKoichi Matsumoto
    • G03B27/72
    • G03F7/70116
    • A subsystem for an exposure apparatus has at least one array of tilting mirrors placed in either an image reticle plane or a conjugate image plane to provide dynamic control of an illumination beam through an exposure field. In the system, an optical subsystem and a plurality of mirrors directs light to a reticle and a sensor senses the illumination distribution of the light at a wafer stage. When the at least one array of tilting mirrors is placed in the image reticle plane, a control is used to interpolate data of the illumination distribution sensed by the sensor, and then control movement of at least one mirror of the array of mirrors based on the interpolated data.
    • 用于曝光装置的子系统具有放置在图像标线板平面或共轭图像平面中的至少一个倾斜镜阵列,以通过曝光场提供对照明光束的动态控制。 在该系统中,光学子系统和多个反射镜将光引导至光罩,并且传感器感测在晶片台处的光的照明分布。 当至少一个倾斜镜阵列被放置在图像标线片平面中时,使用控制来内插由传感器感测的照明分布的数据,然后基于所述反射镜阵列的至少一个反射镜的运动 内插数据。