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    • 52. 发明授权
    • Ceramic heating jig
    • 陶瓷加热夹具
    • US06384383B2
    • 2002-05-07
    • US09728082
    • 2000-12-04
    • Shoji KanoKenji ItoAkira Sato
    • Shoji KanoKenji ItoAkira Sato
    • H05B368
    • H01L21/67103
    • There is disclosed a ceramic heating jig consisting of a susceptor 2 on which a work to be heated is placed, a ceramic heater 3 for heating the susceptor and at least one heat shielding plate 4 for shielding heat of the ceramic heater wherein the susceptor and the heat shielding plate are located so that each of them is located across the ceramic heater each leaving a certain space therefrom, a thickness of the susceptor is 0.5 m to 5 mm, a thickness of the ceramic heater is 0.5 mm to 3 mm, a thickness of the heat shielding plate is 0.5 mm to 3 mm. Preferably, an interval between the members is 0.5 mm to 10 mm, and the members are elastically held as an integration by the elastic means 6 and the restraint means 7. There can be provided a ceramic heating jig wherein defects such as thermal deformation, breakage or the like of the susceptor or the like are hardly caused, temperature can be raised or lowered rapidly, and flatness of a susceptor can be kept even at high temperature.
    • 公开了一种陶瓷加热夹具,其由待加热的工件的基座2,用于加热基座的陶瓷加热器3和用于屏蔽陶瓷加热器的热量的至少一个热屏蔽板4组成,其中基座和 隔热板的位置使得它们各自位于陶瓷加热器两侧,留下一定的空间,基座的厚度为0.5μm至5mm,陶瓷加热器的厚度为0.5mm至3mm,厚度为 的隔热板为0.5mm〜3mm。 优选地,构件之间的间隔为0.5mm至10mm,并且通过弹性装置6和约束装置7将构件弹性保持为一体。可以提供陶瓷加热夹具,其中诸如热变形,断裂的缺陷 感受器等不易引起温度的升高或降低,即使在高温下也能保持基座的平坦度。
    • 53. 发明授权
    • Semiconductor wafer accommodating jig
    • 半导体晶片容纳夹具
    • US06247597B1
    • 2001-06-19
    • US09229446
    • 1999-01-13
    • Akira Sato
    • Akira Sato
    • B65D8500
    • H01L21/67379H01L21/67386H01L21/68707Y10S206/832Y10S414/14
    • A jig for accommodating and transferring a carrier for carrying at least an article, the carrier having a first container with a first opening larger than the article, and the carrier having at least a first flange structure which extends from a peripheral portion of the first opening, and the first flange structure having a first size defined to be a distance between opposite edges of the first flange structure in a first direction, wherein the jig comprises a second container having a second opening with a second size larger than the first size of the first flange structure of the carrier, and the jig further has at least a second flange structure in an opposite side to a side provided with the second opening, and the second flange structure has a third size larger than the second size, and the jig also has at least a window structure which extends at least opposite sides and which is positioned adjacent to the second flange structure, so that the window structure is closer to the second opening than the second flange structure, wherein the first opening of the carrier is sealable with a part of an inner wall of the second container as the jig by making the first opening of the carrier into contact with the part of the inner wall of the second container as the jig, and wherein the window structure comprises a flexible sheet deformable by an externally applied force.
    • 一种用于容纳和转移用于承载至少一个制品的载体的夹具,所述载体具有第一容器,所述第一容器具有比所述制品更大的第一开口,所述载体具有至少第一凸缘结构,所述第一凸缘结构从所述第一开口的周边部分延伸 并且所述第一凸缘结构具有在第一方向上被定义为所述第一凸缘结构的相对边缘之间的距离的第一尺寸,其中所述夹具包括第二容器,所述第二容器具有第二开口,所述第二开口的第二尺寸大于所述第一尺寸的第一尺寸 载体的第一凸缘结构,并且夹具还具有与设置有第二开口的一侧相对的至少第二凸缘结构,并且第二凸缘结构具有比第二尺寸大的第三尺寸,并且夹具也 具有至少一个至少相对的两侧延伸并且邻近第二凸缘结构定位的窗结构,使得窗结构更接近于 所述支架的第一开口可与所述第二容器的内壁的一部分密封,作为所述夹具,通过使所述托架的所述第一开口与所述第二凸缘的内壁的所述一部分接触, 第二容器作为夹具,并且其中窗结构包括通过外力施加的可变形的柔性片。
    • 54. 发明授权
    • Stereoscopic image display apparatus
    • 立体图像显示装置
    • US06201517B1
    • 2001-03-13
    • US09028626
    • 1998-02-24
    • Akira Sato
    • Akira Sato
    • G09G500
    • G02B27/2228G09G3/002G09G3/003H04N13/122H04N13/189H04N13/257H04N13/286H04N13/296H04N13/344H04N13/383H04N13/398
    • A display apparatus displays an image based on image data and distance data concerning each pixel. The display apparatus has a detector, a display data generator. The detector detects a visual range from a viewer's eye to the viewer's point of regard. The generator produces display data based on the image data, the distance data and the visual range. The display apparatus further has an image display, projector and controller. The image display displays an image based on the display data. The projector projects the displayed image as a virtual image. The controller controls a projection distance of the virtual image so that the virtual image is projected onto the point of regard.
    • 显示装置基于与各像素有关的图像数据和距离数据来显示图像。 显示装置具有检测器,显示数据发生器。 检测器检测从观察者的眼睛到观察者的观察点的视觉范围。 发生器根据图像数据,距离数据和视觉范围产生显示数据。 显示装置还具有图像显示器,投影仪和控制器。 图像显示基于显示数据显示图像。 投影机将显示的图像投影为虚拟图像。 控制器控制虚拟图像的投影距离,使得虚拟图像投影到观察点上。
    • 56. 发明授权
    • System for displaying combined imagery
    • 用于显示组合图像的系统
    • US6084557A
    • 2000-07-04
    • US82042
    • 1998-05-20
    • Tokuji IshidaShigeaki ImaiAkira SatoSusumu Tachi
    • Tokuji IshidaShigeaki ImaiAkira SatoSusumu Tachi
    • H04N13/04G02B27/00G02B27/01G09G3/00G09G5/00H04N7/00
    • G09G3/003G02B27/017G02B27/0172G09G3/002G02B2027/0132G02B2027/0178
    • A video see through AR system capable of obtaining correct depth information with respect to each pixel representing a two-dimensional image is disclosed so that a portion of imagery which should appear in the background of a final picture may be properly hidden behind imagery which should appear in the foreground of the final picture. A photographing device is provided for obtaining a two-dimensional image of a real object field disposed in conjugate relationship with an observer's eyes. Also provided is a device for measuring distances with respect to each pixel to the real object to be measured. The measured distance is compared with the distance to virtual imagery with respect to each pixel and the pixel which represents the imagery disposed closer to the observer is selected for the formation of combined imagery, which is displayed on the screen of a display device.
    • 公开了能够获得关于表示二维图像的每个像素的正确深度信息的视频观看AR系统,使得应该出现在最终图片的背景中的图像的一部分可以适当地隐藏在应该出现的图像之后 在最后的图片的前景。 提供拍摄装置,用于获得与观察者的眼睛共轭关系设置的真实物体场的二维图像。 还提供了一种用于测量与要测量的实际物体相对于每个像素的距离的装置。 将测量的距离与对于每个像素的虚拟图像的距离进行比较,并且选择表示设置在更靠近观察者的图像的像素,以形成显示在显示设备的屏幕上的组合图像。
    • 57. 发明授权
    • Equipment for intracerebral administration of preparations
    • 大脑内给药制剂的设备
    • US5800390A
    • 1998-09-01
    • US900135
    • 1997-07-25
    • Toru HayakawaToshiki YoshimineHiromu YamamotoAkira SatoTsunemasa IrieKeiji FujiokaYoshihiro TakadaYoshio Sasaki
    • Toru HayakawaToshiki YoshimineHiromu YamamotoAkira SatoTsunemasa IrieKeiji FujiokaYoshihiro TakadaYoshio Sasaki
    • A61M37/00A61M39/02A61M11/00
    • A61M37/00A61M39/0208A61M2210/0693
    • Equipment for intracerebral administration of preparations is composed of a preparation-administering device (1) holding a preparation (2), and a plunger (4) removably arranged in the preparation-administering device adapted to push the preparation held therein toward one end of the preparation-administering device. The intracerebral preparation-administration equipment is inserted into a preparation-introducing guide (5) previously implanted in the head of a patient to introduce the preparation into its guide hole (26). The preparation is then guided to a site of administration through a flexible guide tube (23) communicated with the guide hole of the preparation-introducing guide. The equipment for intracerebral administration of preparations may be composed of a tubular preparation-retaining member (30) having a preparation contained therein, and a holder (32) for holding the tubular preparation-retaining member along with a push rod (31) inserted thereinto as an integral part thereof. In this case, the administration equipment itself is inserted into and held in the preparation-introducing guide (5).
    • PCT No.PCT / JP92 / 00658 Sec。 371日期:1993年11月24日 102(e)日期1993年11月24日PCT提交1992年5月22日PCT公布。 第WO92 / 20400号公报 日期:1992年11月26日制剂的脑内给药设备由保持制剂(2)的制剂给药装置(1)和可移除地布置在准备投与装置中的柱塞(4)组成,其适于推动保持在其中的制剂 朝向准备给药装置的一端。 将脑内准备给药装置插入预先植入患者头部的制剂引入导向件(5)中,以将制剂引入其引导孔(26)。 然后将制剂通过与制剂引入导向件的引导孔连通的柔性引导管(23)引导到给药部位。 脑内给药制剂的装置可以由其中容纳有制剂的管状制剂保持构件(30)和用于将管状制剂保持构件与插入其中的推杆(31)保持的保持器(32)组成。 作为其组成部分。 在这种情况下,管理设备本身被插入并保持在准备导入引导件(5)中。
    • 58. 发明授权
    • Method of determining an indication for estimating item processing times
to model a production apparatus
    • 确定用于估计项目处理时间以对生产设备建模的指示的方法
    • US5768157A
    • 1998-06-16
    • US561638
    • 1995-11-22
    • Akira Sato
    • Akira Sato
    • G05B19/418B65G61/00G05B17/02G06F17/18G06Q50/00G06Q50/04G06F9/455
    • G05B17/02G06F17/18
    • A method is disclosed for determining a regression equation for modeling a production apparatus which processes a plurality of items in lots of different sizes. The regression equation is used to estimate a lot processing time of each of the lots. First, data representing the lot processing times is collected from the apparatus and inputted to a computer. Then, a frequency distribution for the lot processing times is determined in connection with each of the lots. Next, a plurality of sets of lot processing times are extracted from each of the frequency distributions by varying the data extraction rate. An average processing time of each of the plurality of sets of lot processing times is calculated. Then, a plurality of regression lines for the average lot processing times are determined for each of the lots. A degree of departure of each of the average lot processing times is determined based on the regression lines. Finally, the regression equation is selected from the regression lines based on the degree of departure.
    • 公开了一种用于确定用于对处理大量不同尺寸的多个物品的生产设备建模的回归方程式的方法。 回归方程用于估计每个批次的批处理时间。 首先,从装置收集表示批处理时间的数据并输入到计算机。 然后,结合批次确定批次处理时间的频率分布。 接下来,通过改变数据提取率,从每个频率分布中提取多组批次处理时间。 计算多组批处理时间中的每一组的平均处理时间。 然后,针对每个批次确定用于平均批处理时间的多个回归线。 基于回归线确定每个平均批处理时间的偏离程度。 最后,回归方程根据离散程度从回归线中选出。
    • 59. 发明授权
    • Armature resistance measuring apparatus and method
    • 电枢电阻测量装置及方法
    • US5457402A
    • 1995-10-10
    • US232503
    • 1994-04-25
    • Akira Sato
    • Akira Sato
    • G01R27/14G01R31/06
    • G01R31/346G01R27/14
    • A method and apparatus for determining the resistance of the coils and commutator connections in an armature of an electric motor wherein a current is generated between a first commutator segment and a commutator segment located at least three segments beyond said first segment, a first voltage is measured across the first commutator segment and an adjacent second commutator segment, a second voltage is measured across the second commutator segment and an adjacent third commutator segment, and a third voltage is measured across a pair of commutator segments which are adjacent to the first commutator segment. After the three voltages are measured, the current is disconnected, and a voltage is generated across two commutator segments spaced at least three segments beyond the first segment. The generated voltage is adjusted so that the voltage measured across the second and third commutator segments equals the previous measurement, and the voltages are remeasured. With the voltages measured across the second and third commutator segments being equal, the connection and coil resistances for the first commutator segment are calculated from the voltage measurements and the value of the generated current. The armature is then indexed, and the measurements repeated, to determine the coil and connection resistance of subsequent segments.
    • 一种用于确定电动机的电枢中的线圈和换向器连接的电阻的方法和装置,其中在第一换向器段和位于超过所述第一段的至少三个段的换向器段之间产生电流,测量第一电压 跨越第一换向器段和相邻的第二换向器段,跨越第二换向器段和相邻的第三换向器段测量第二电压,并且跨越与第一换向器段相邻的一对换向器段测量第三电压。 在测量三个电压之后,电流被断开,并且跨越跨越第一段的至少三个段的两个换向器段产生电压。 调整所产生的电压,使得在第二和第三换向器片段上测量的电压等于先前的测量值,并重新测量电压。 利用在第二和第三换向器段上测量的电压相等,根据电压测量值和所产生的电流的值来计算第一换向器段的连接和线圈电阻。 然后将电枢分度,并重复测量,以确定后续段的线圈和连接电阻。
    • 60. 发明授权
    • Method of manufacturing semiconductor device
    • 制造半导体器件的方法
    • US5290709A
    • 1994-03-01
    • US865961
    • 1992-04-09
    • Akira Sato
    • Akira Sato
    • H01L21/265H01L21/266H01L21/426
    • H01L21/266Y10S148/076Y10S148/082Y10S148/083
    • According to the present invention, in the ion implantation step in manufacturing a semiconductor device, a resist of a resist pattern formed on a portion of a semiconductor wafer is removed from the outer peripheral portion of the semiconductor wafer, and ion implantation is performed through the resist pattern.Since the resist is removed from the outer peripheral portion, a contact portion between a semiconductor wafer fixing portion of an ion implantation unit and the semiconductor wafer is conductive. Therefore, charges generated by the ion implantation escape from the wafer fixing portion, and the semiconductor wafer is not charged, thereby preventing electrostatic breakdown.
    • 根据本发明,在制造半导体器件的离子注入步骤中,从半导体晶片的外周部分去除形成在半导体晶片的一部分上的抗蚀剂图案的抗蚀剂,并且通过 抗蚀图案 由于抗蚀剂从外周部分去除,离子注入单元的半导体晶片固定部分和半导体晶片之间的接触部分是导电的。 因此,由离子注入产生的电荷从晶片固定部分逸出,并且半导体晶片不被充电,从而防止静电击穿。