会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 51. 发明申请
    • SPIRAL MEMBRANE ELEMENT
    • 螺旋膜元件
    • US20090065426A1
    • 2009-03-12
    • US12282550
    • 2007-03-09
    • Katsumi IshiiShinichi ChikuraHideki MatsudaMasashi BeppuHiroki FujiokaYasuhiro Uda
    • Katsumi IshiiShinichi ChikuraHideki MatsudaMasashi BeppuHiroki FujiokaYasuhiro Uda
    • B01D63/10B01D63/06B32B37/14
    • B01D63/103B01D63/10
    • An object of the present invention is to provide a spiral membrane element that can improve the barrier property of a fiber reinforced plastic layer having a fiber roll as a reinforcing phase and that can effectively prevent occurrence of cracks. The spiral membrane element of the present invention is a spiral membrane element containing a cylindrical roll R in which a separation membrane, a feed-side flow passageway member, and a permeate-side flow passageway member are spirally wound in a laminate state around a perforated center tube 5 and in which a sealing part for preventing mixing of feed-side fluid and permeate-side fluid is disposed, wherein a fiber reinforced plastic layer 26 having a fiber roll as a reinforcing phase is formed on the outer circumferential side of said cylindrical roll R, and a plastic layer 24 is disposed in the inner part or on the inner side of the fiber reinforced plastic layer 26 approximately over the entire length and approximately over the entire circumference of the fiber reinforced plastic layer 26.
    • 本发明的目的是提供一种螺旋膜元件,其可以提高具有纤维辊作为增强相的纤维增强塑料层的阻隔性,并且能够有效地防止裂纹的发生。 本发明的螺旋膜元件是包含圆筒形辊R的螺旋膜元件,其中分离膜,进料侧流动通道构件和渗透侧流动通道构件以层压状态螺旋卷绕在穿孔 中心管5,其中设置有用于防止进料侧流体和渗透侧流体混合的密封部分,其中在所述圆柱体的外圆周侧上形成有作为增强相的纤维辊的纤维增强塑料层26 辊R,塑料层24设置在纤维增强塑料层26的内部或内侧,大致在纤维增强塑料层26的整个长度和大致整个圆周上。
    • 52. 发明申请
    • Spiral membrane element and method of manufacturing the same
    • 螺旋膜元件及其制造方法
    • US20050077229A1
    • 2005-04-14
    • US10954211
    • 2004-10-01
    • Katsumi Ishii
    • Katsumi Ishii
    • B01D63/00B01D63/08B01D63/10B01D65/00
    • B01D63/10B01D65/003
    • A spiral membrane element having an enlarged effective membrane surface area without having its separation performance lowered, while maintaining the sealing property of any sealing portion of a cylindrically wound body, and a manufacturing method of the same are disclosed. The spiral membrane element includes a cylindrically wound body comprising a perforated central tube and, spirally wound therearound, a separation membrane, a feed-side passage material and a permeation-side passage material in a laminated state, and a sealing portion for preventing a feed-side fluid and a permeation-side fluid from being mixed together, wherein the sealing portion formed at each of both ends of the cylindrically wound body is spirally formed with a substantially constant width by an adhesive and has a trimmed section formed on its whole end surface, and the cylindrically wound body has a ratio of its length to the length of the central tube of 0.96 to 1.00, and a ratio of an ineffective membrane surface area to the entire membrane surface area of 0.02 to 0.10.
    • 公开了一种具有扩大的有效膜表面积而不具有分离性能降低的螺旋膜元件,同时保持了圆筒形卷体的任何密封部分的密封性能及其制造方法。 螺旋膜元件包括圆筒形卷绕体,其包括穿孔中心管,并且在其周围螺旋地缠绕有层压状态的分离膜,进料侧通道材料和渗透侧通道材料以及用于防止进料的密封部分 侧流体和渗透侧流体混合在一起,其中形成在圆筒形卷绕体的两端的密封部分通过粘合剂螺旋地形成为具有基本上恒定的宽度,并且在其整个端部上形成有修整部分 表面,并且圆筒形卷绕体的长度与中心管的长度的比率为0.96〜1.00,膜表面积与整个膜表面积的比率为0.02〜0.10。
    • 53. 发明授权
    • Processing unit for a substrate
    • 基板处理单元
    • US06493961B2
    • 2002-12-17
    • US09983241
    • 2001-10-23
    • Katsumi Ishii
    • Katsumi Ishii
    • F26B2106
    • H01L21/67757H01L21/67769H01L21/67778Y10S414/138Y10S414/14
    • A processing unit for a substrate has a vertical thermal processing furnace 4 having a bottom and an opening 4a provided at the bottom. A boat 3 holding substrates W in vertical multistairs can be placed on a first lid 17, and the first lid 17 can open and close the opening 4a of the vertical thermal processing furnace 4 with the boat 3 placed thereon. The processing unit also has a boat-placing portion 19 on which the boat 3 and another boat 3 can be placed and a boat conveying mechanism 21 for conveying the two boats 3 alternatively between the boat-placing portion 19 and the first lid 17. A second lid 18 hermetically closes the opening 4a of the vertical thermal processing furnace 4 when the first lid 17 opens the opening 4a but no boat 3 passes through the opening 4a. The processing unit can effectively reduce the undesirable influence from the opening 4a when the first lid 17 is taken off from the opening 4a and the boat 3 is conveyed out, and can also reduce the wasted energy by preventing the fall of the temperature in the interior of the thermal processing furnace 4.
    • 用于基板的处理单元具有垂直热处理炉4,其具有设置在底部的底部和开口4a。 可以在第一盖17上放置容纳垂直多层的基板W的船3,并且第一盖17可以在其上放置船3的状态下打开和关闭垂直热处理炉4的开口4a。 处理单元还具有船放置部分19,船3和另一个船3可以放置在船上,舟船输送机构21用于在船放置部分19和第一盖17之间交替地输送两个船3。 当第一盖17打开开口4a但没有船3穿过开口4a时,第二盖18密封地关闭垂直热处理炉4的开口4a。 当第一盖17从开口4a取出并且船3被输出时,处理单元可以有效地减少开口4a的不良影响,并且还可以通过防止内部温度的下降来减少浪费的能量 的热处理炉4。
    • 55. 发明授权
    • Processing method and processing unit for substrate
    • 基板加工方法及加工单元
    • US06231290B1
    • 2001-05-15
    • US09271341
    • 1999-03-18
    • Hisashi KikuchiKatsumi Ishii
    • Hisashi KikuchiKatsumi Ishii
    • B65G4907
    • H01L21/67757H01L21/67098H01L21/67772H01L21/67775Y10S414/135Y10S414/138
    • A processing unit for a substrate comprises a partition 6 provided between an atmospheric area S1 and an inert gas area S2. The partition 6 has an opening 22 to communicate the atmospheric area S1 and the inert gas area S2. A door 23 is provided at the opening 22 to open and close it. Carrier holding device 11 is provided for holding a carrier 2 of the substrate in such a manner that the carrier 2 comes in contact with the opening 22 on the side of the atmospheric area. Inert gas replacing device 56 is provided for replacing a gas in the carrier 2 with an inert gas by introducing the inert gas into the carrier 2 when the door 23 closes the opening 22 and the carrier 2 comes in contact with the opening 22 on the side of the atmospheric area by the carrier holding device 11. This processing unit can perform the process of the substrate without increasing the concentration of the oxygen in the inert gas area S2 by preventing leakage of the air from the atmospheric area S1 into the inert gas area S2.
    • 用于基板的处理单元包括设置在大气区域S1和惰性气体区域S2之间的分隔件6。 分隔件6具有用于连通大气区域S1和惰性气体区域S2的开口22。 门23设置在开口22处以打开和关闭门23。 载体保持装置11用于以使得载体2与大气区域侧的开口22接触的方式保持基板的载体2。 惰性气体置换装置56被设置成当门23关闭开口22并且载体2与侧面上的开口22接触时,通过将惰性气体引入载体2中,用惰性气体代替载体2中的气体 通过载体保持装置11,该处理单元可以通过防止空气从大气区域S1泄漏到惰性气体区域中而不增加惰性气体区域S2中的氧气的浓度来进行基板的处理 S2。
    • 58. 发明授权
    • Decompression container
    • 减压容器
    • US5520142A
    • 1996-05-28
    • US409427
    • 1995-03-24
    • Towl IkedaKatsumi IshiiYoji Iizuka
    • Towl IkedaKatsumi IshiiYoji Iizuka
    • B01J3/03C23C14/00C23C14/56C23C16/44H01L21/00H01L21/205H01L21/302H01L21/3065C23C16/00
    • H01L21/67017B01J3/03C23C14/564C23C16/4401
    • A gap is defined between an inner region of an end face of a first container member of a container and an inner region of an abutting portion of a second container member, the inner regions being situated inside a seal member. The respective inner regions of the end face of the first container member and the abutting portion of the second container member, which are situated inside the seal member, are prevented from coming into contact with each other when the interior of the container is decompressed. Even though the second container member is bent inward by atmospheric pressure when the container is decompressed to a predetermined degree of vacuum, therefore, the abutting portion thereof cannot come into contact with the inner edge of the end face of the first container member. Thus, if decompression and exposure to atmospheric pressure are repeated to bend the container member repeatedly, there is no possibility of the inner edge portion of the end face of the first container member being separated or rubbed off to produce dust.
    • 在容器的第一容器构件的端面的内部区域和第二容器构件的抵接部的内部区域之间限定有间隙,内部区域位于密封构件的内部。 当容器内部减压时,防止位于密封构件内部的第一容器构件的端面的各个内部区域和第二容器构件的抵接部分彼此接触。 因此,即使当容器减压至预定的真空度时第二容器构件向内弯曲,因此其抵接部分不能与第一容器构件的端面的内边缘接触。 因此,如果重复减压和暴露于大气压力以反复地使容器构件弯曲,则不会使第一容器构件的端面的内边缘部分分离或摩擦而产生灰尘。
    • 59. 发明授权
    • Arm apparatus for conveying semiconductor wafer and processing system
using same
    • 用于输送半导体晶片的臂装置和使用它的处理系统
    • US5236295A
    • 1993-08-17
    • US872106
    • 1992-04-22
    • Katsumi IshiiYoshinori Mochizuki
    • Katsumi IshiiYoshinori Mochizuki
    • H01L21/673H01L21/677H01L21/687
    • H01L21/67303H01L21/67766H01L21/67778H01L21/68707
    • A wafer boat has an upper projection, a lower projection, and a lower flange. A horizontal/vertical conversion handling apparatus for handling the wafer boat comprises a rotatable arm, and upper and lower hands provided at both ends of the arm. The arm is rotatable by at least 90.degree. in a vertical plane. The upper hand has boat contact portions for contact in horizontal and vertical modes, which are engaged with the upper projection on both sides thereof. The boat contact portions of the upper hand are vertically arranged such that the positions of the boat contact portions are reversed by the 180.degree. rotation of the upper hand. The lower hand has boat contact portions for contact in a horizontal mode, which are engaged with the lower projection on both sides thereof, and boat contact portions for contact in a vertical mode, which are engaged with the lower surface of the lower flange. The boat contact portions of the lower hand are vertically arranged, such that the positions of both the boat contact portions for contact in the horizontal mode and the boat contact portions for contact in the vertical mode are reversed by the 180.degree. rotation of the lower hand. The positions of the boat contact portions ar changed according to the steps to be performed, thereby preventing cross-contamination.
    • 晶片舟皿具有上突起,下突出部和下凸缘。 用于处理晶片舟的水平/垂直转换处理装置包括可旋转的臂,以及设置在臂的两端的上下手。 臂在垂直平面内可旋转至少90°。 上方具有用于在水平和垂直模式下接触的船形接触部分,其与其两侧的上突出部接合。 上手的船接触部分垂直布置成使得船接触部分的位置由上手180°旋转而相反。 下方具有用于以水平模式接触的船形接触部分,其与其两侧的下突出部接合,以及与垂直模式接触的船形接触部分,其与下凸缘的下表面接合。 下手的船接触部分垂直布置,使得在水平模式下接触的船形接触部分的两个位置和垂直方式接触的船接触部分的位置通过下方的180°旋转而反转 。 根据要执行的步骤,船接触部分ar的位置改变,从而防止交叉污染。
    • 60. 发明授权
    • Vertical heat treating apparatus
    • 立式热处理装置
    • US5236181A
    • 1993-08-17
    • US765890
    • 1991-09-26
    • Katsumi IshiiTakanobu AsanoMasaharu Abe
    • Katsumi IshiiTakanobu AsanoMasaharu Abe
    • C30B33/00
    • C30B33/00
    • A vertical heating apparatus comprises a casing having an opening through which a plurality of transport members receiving articles to be processed are loaded in and unloaded from the casing, a heat treating furnace provided in an upper portion of the casing, a transport member storing portion provided in the casing at a side space of the heat treating furnace, for receiving the transport members, a processing member for transporting the articles to be processed in the heat treating furnace, a transferring mechanism for transferring the articles to be processed and received by the transport members to the processing member, and a vertically moving mechanism provided below the heat treating furnace in the casing, for loading and unloading the articles to be processed and received by the processing member in and from the heat treating furnace.
    • 立式加热装置包括具有开口的多个运送构件的容纳体,所述多个运送构件容纳待加工物品从所述壳体上装卸的壳体,设置在所述壳体的上部的热处理炉, 在热处理炉的侧空间的壳体中,为了接收输送构件,在处理炉中输送待处理物品的搬运机构,用于转运待处理物品的运送机构, 构件到加工构件,以及设置在壳体内的热处理炉下方的垂直移动机构,用于将处理构件加工和被处理物品加载和卸载在热处理炉内。