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    • 52. 发明授权
    • Surface treatment method and apparatus for support of lithographic plate
    • 用于支撑平版印刷版的表面处理方法和装置
    • US06273784B1
    • 2001-08-14
    • US09207664
    • 1998-12-09
    • Toru YamazakiYuzo Rachi
    • Toru YamazakiYuzo Rachi
    • B24B100
    • B24B37/04B24D13/10
    • There is provided at least one of a moving device for moving a graining brush in the width direction of aluminum web and a turning device for turning the graining brush so that the graining brush can be placed obliquely against a transporting direction of the aluminum web. By moving the graining brush periodically in the width direction of the aluminum web, the entire graining brush uniformly comes into contact with the aluminum web. By turning the graining brush to place it obliquely against the transporting direction of the aluminum web, the entire graining brush can always come into contact with the aluminum web. Accordingly, the abrasion in the bristles of the graining brush is maintained uniform.
    • 提供了用于在铝幅材的宽度方向上移动平纹刷的移动装置中的至少一个以及用于转动所述平纹刷的转向装置,使得所述平纹刷可以相对于铝幅材的传送方向倾斜放置。 通过在铝幅材的宽度方向周期性地移动砂光刷,整个磨光均匀地与铝纤维网接触。 通过转动磨光刷将其倾斜地抵靠铝纤维网的输送方向,整个磨光刷总是能够与铝纤维网接触。 因此,磨光刷的刷毛的磨损保持均匀。
    • 53. 发明授权
    • Semiconductor device utilizing a pedestal collector region and method of
manufacturing the same
    • 利用基座集电区域的半导体装置及其制造方法
    • US5880516A
    • 1999-03-09
    • US705857
    • 1996-08-28
    • Toru Yamazaki
    • Toru Yamazaki
    • H01L29/73H01L21/331H01L21/74H01L29/08H01L29/732H01L29/00H01L21/82H01L27/102H01L29/70
    • H01L29/66272H01L29/0826
    • A semiconductor device having an epitaxial layer of one conductivity type formed on a semiconductor substrate of the other conductivity type, a base region of the other conductivity type formed on the epitaxial layer to extend from a surface of the epitaxial layer to a predetermined depth, the base region including an intrinsic base region and an external base region, an emitter region of the one conductivity type formed in the intrinsic base region, and a pedestal collector region of the one conductivity type formed in a portion of the epitaxial layer which is immediately under the base region to correspond thereto, wherein the pedestal collector region comprises a plurality of layers of pedestal collector regions which have an impurity concentration that changes in a direction of depth of the substrate and which are sequentially arranged in the direction of depth of the substrate.
    • 一种具有一种导电类型的外延层的半导体器件形成在另一导电类型的半导体衬底上,另一导电类型的基极区形成在外延层上以从外延层的表面延伸到预定深度, 包括本征基极区域和外部基极区域的基极区域,形成在本征基极区域中的一种导电类型的发射极区域和形成在外部层的正下方的部分中的一种导电类型的基座集电极区域 所述基底区域与其对应,其中所述基座集电极区域包括具有杂质浓度的基底集电极区域的多个层,所述杂质浓度沿所述基板的深度方向发生变化,并且所述杂质浓度依次布置在所述基板的深度方向上。
    • 55. 发明授权
    • Method of manufacturing bipolar transistor with reduced numbers of steps
without increasing collector resistance
    • 制造双极晶体管的方法,减少步数而不增加集电极电阻
    • US5516709A
    • 1996-05-14
    • US346163
    • 1994-11-21
    • Toru Yamazaki
    • Toru Yamazaki
    • H01L29/73H01L21/331H01L21/8222H01L21/8249H01L29/08H01L29/732H01L21/265
    • H01L29/66272H01L21/8222H01L21/8249H01L29/0821H01L29/7322Y10S148/01Y10S148/011Y10S148/124
    • A method of manufacturing a bipolar transistor including the steps of doping an impurity of the one conductivity type in a major surface portion of the semiconductor substrate to form a buried layer of the one conductivity type and growing an epitaxial layer on an entire surface on a major surface of the semiconductor substrate, forming a diffusion region of the opposite conductivity type in an emitter formation region on the major surface of the semiconductor substrate and forming a base connecting region in a base formation region to be in contact with the diffusion region of the opposite conductivity type, forming an insulating interlayer on the major surface of the semiconductor substrate including the diffusion region of the opposite conductivity type and the base connecting region, forming an emitter electrode layer contact hole reaching the diffusion region of the opposite conductivity type in an emitter formation region of the insulating interlayer and forming a collector region hole reaching the epitaxial layer in a collector formation region of the insulating interlayer, depositing a polysilicon film on the insulating interlayer and in the emitter electrode layer contact hole and the collector region hole, forming a patterning mask on the polysilicon film in the emitter formation region, patterning the patterning mask to leave a polysilicon film serving as an emitter electrode layer, and, at the same time, removing the epitaxial layer in the collector formation region by etching to form a collector groove.
    • 一种制造双极晶体管的方法,包括以下步骤:在半导体衬底的主表面部分掺杂一种导电类型的杂质,以形成一种导电类型的掩埋层,并在主体的整个表面上生长外延层 在半导体衬底的主表面上的发射体形成区域中形成相反导电类型的扩散区域,并在基底形成区域中形成与相对的扩散区域接触的基极连接区域 导电类型,在包括相反导电类型的扩散区域和基极连接区域的半导体衬底的主表面上形成绝缘中间层,在发射极形成中形成达到相反导电类型的扩散区域的发射极电极层接触孔 绝缘夹层的区域并形成收集器区域 n绝缘层到达绝缘层的集电极形成区域中的外延层,在绝缘中间层和发射极电极层接触孔和集电极区孔中沉积多晶硅膜,在发射极形成中的多晶硅膜上形成图案化掩模 区域,图案化图案掩模以留下用作发射极电极层的多晶硅膜,同时通过蚀刻去除集电极形成区域中的外延层以形成集电槽。
    • 56. 发明授权
    • Heterojunction bipolar transistor
    • 异质结双极晶体管
    • US5302841A
    • 1994-04-12
    • US800063
    • 1991-11-27
    • Toru Yamazaki
    • Toru Yamazaki
    • H01L29/73H01L21/331H01L29/165H01L29/737H01L31/072H01L29/06H01L31/109
    • H01L29/7378
    • A Si heterojunction bipolar transistor having a SiGe narrow gap base is disclosed, in which the Ge content in the base region is higher in the neighborhood of the base-emitter junction and also in the neighborhood of the base-collector junction as compared to a central portion of the base region, and also in which the Ge concentration distribution in the base region has a slope toward the central portion from the base-emitter and the base-collector region. The Ge content in the neighborhood of the emitter-base junction can be increased up to 30 to 40%, and the emitter-base junction diffusion potential can be greatly reduced. Further, the average Ge content can be held low owing to the slope of the Ge concentration distribution, thus ensuring freedom from dislocation.
    • 公开了具有SiGe窄间隙基极的Si异质结双极晶体管,其中基极区域中的Ge含量在基极 - 发射极结附近以及在基极 - 集电极结附近与中心相比较高 基底区域中的Ge浓度分布与基极 - 发射极和基极 - 集电极区域之间的中心部分具有斜率。 发射极 - 基极结附近的Ge含量可以提高到30至40%,并且可以大大降低发射极 - 基极结扩散电位。 此外,由于Ge浓度分布的斜率,平均Ge含量可以保持较低,因此确保无位错。