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51. 发明授权

US08959559B2 Content distribution system, content distribution apparatus, content distribution method, content distribution program, and content playback apparatus 有权
标题翻译：内容分发系统，内容分发装置，内容分发方法，内容分发程序和内容再现装置
公开(公告)号：US08959559B2
公开(公告)日：2015-02-17
申请号：US13575527
申请日：2011-03-04
申请人： Hideki Nishimura , Jiro Kiyama
发明人： Hideki Nishimura , Jiro Kiyama
IPC分类号： H04N7/173 , H04N21/237 , H04N21/482 , H04N21/81 , H02J3/00
CPC分类号： H04N21/237 , H02J3/005 , H04N21/482 , H04N21/8126
摘要： A content distribution system that is supplied with power from a plurality of power sources having different environmental loads and that distributes content to a content playback apparatus connected via a communication circuit, the content distribution system distributing content with respect to a content distribution request from the content playback apparatus with a service quality that is determined so as to suppress the environmental load by the power supplied from the plurality of power sources to a predetermined environmental load.
摘要翻译：一种内容分配系统，其从具有不同环境负荷的多个电源提供电力，并且将内容分发到经由通信电路连接的内容再现装置，所述内容分发系统从内容分发关于内容分发请求的内容确定服务质量的播放装置，以便通过从多个电源提供的电力将环境负荷抑制到预定的环境负荷。

52. 发明申请

US20120304204A1 CONTENT DISTRIBUTION SYSTEM, CONTENT DISTRIBUTION APPARATUS, CONTENT DISTRIBUTION METHOD, CONTENT DISTRIBUTION PROGRAM, AND CONTENT PLAYBACK APPARATUS 有权
标题翻译：内容分配系统，内容分发设备，内容分发方法，内容分发程序和内容播放设备
公开(公告)号：US20120304204A1
公开(公告)日：2012-11-29
申请号：US13575527
申请日：2011-03-04
申请人： Hideki Nishimura , Jiro Kiyama
发明人： Hideki Nishimura , Jiro Kiyama
IPC分类号： H04N21/643 , H04N21/2543
CPC分类号： H04N21/237 , H02J3/005 , H04N21/482 , H04N21/8126
摘要： A content distribution system that is supplied with power from a plurality of power sources having different environmental loads and that distributes content to a content playback apparatus connected via a communication circuit, the content distribution system distributing content with respect to a content distribution request from the content playback apparatus with a service quality that is determined so as to suppress the environmental load by the power supplied from the plurality of power sources to a predetermined environmental load.
摘要翻译：一种内容分配系统，其从具有不同环境负荷的多个电源提供电力，并且将内容分发到经由通信电路连接的内容再现装置，所述内容分发系统从内容分发关于内容分发请求的内容确定服务质量的播放装置，以便通过从多个电源提供的电力将环境负荷抑制到预定的环境负荷。

53. 发明授权

US08293194B2 Analyzer 有权
标题翻译：分析仪
公开(公告)号：US08293194B2
公开(公告)日：2012-10-23
申请号：US12450467
申请日：2008-03-26
申请人： Hideki Nishimura , Yasushi Dobuchi
发明人： Hideki Nishimura , Yasushi Dobuchi
IPC分类号： G01N15/06 , G01N33/00 , G01N33/48
CPC分类号： G01N33/4875 , G01N27/3273 , Y10T436/11
摘要： The present invention relates to an analyzing device to be used by inserting an analytical instrument 2 comprising a plurality of terminal portions 25A to 28A therein, the device including a plurality of terminals 42 and 43 having a shape of a flat spring to be in contact with the plurality of terminal portions 25A to 28A, and a disposal mechanism for disposing of the analytical instrument 2 after completing an analysis. Contact portions 46 and 47 in the plurality of terminals 42 and 43 having a flat-spring shape to be in contact with the plurality of terminal portions 25A to 28A are placed to be in non-parallel with a direction orthogonal to a disposal direction D1 of the analytical instrument 2 in planar view. The portions 46 and 47 in the plurality of terminals 42 and 43 having the flat-spring shape are preferably placed so as to have a symmetrical or substantially symmetrical positional relationship relative to a center line L1 of the analytical instrument 2 extending along the disposal direction D1.
摘要翻译：本发明涉及通过将包括多个端子部分25A至28A的分析仪器2插入其中而使用的分析装置，该装置包括具有与弹簧形状接触的多个端子42和43 多个端子部25A〜28A，以及完成分析后的处理分析用具2的处置机构。具有与多个端子部25A〜28A接触的平坦弹簧形状的多个端子42和43中的接触部分46和47被放置成与与处理方向D1正交的方向不平行分析仪器2在平面视图中。具有扁平弹簧形状的多个端子42和43中的部分46和47优选地被放置成相对于沿着处理方向D1延伸的分析仪器2的中心线L1具有对称或基本上对称的位置关系。

54. 发明授权

US08278471B2 Method for producing ruthenium compound 有权
标题翻译：钌化合物的制备方法
公开(公告)号：US08278471B2
公开(公告)日：2012-10-02
申请号：US13279957
申请日：2011-10-24
申请人： Ryuuichi Saitou , Kang-go Chung , Hideki Nishimura , Tatsuya Sakai , Sanshiro Komiya , Naoto Noda , Maki Nishiguchi
发明人： Ryuuichi Saitou , Kang-go Chung , Hideki Nishimura , Tatsuya Sakai , Sanshiro Komiya , Naoto Noda , Maki Nishiguchi
IPC分类号： C07F15/00
CPC分类号： C07F17/02 , C07F15/0046 , C07F15/0053
摘要： A method for producing ruthenium compound including the step of reacting a compound represented by General Formula (1): RuL02 (wherein L0 represents an unsaturated hydrocarbon compound having 4 to 10 carbon atoms and at least two double bonds) with trifluorophosphine or reacting the compound represented by General Formula (1) with trifluorophosphine, and hydrogen or a halogen to obtain a compound represented by General Formula (2): Ru(PF3)l(L1)m(L2)n (wherein L1 represents a hydrogen atom or halogen atom, L2 represents an unsaturated hydrocarbon compound having 4 to 10 carbon atoms and at least two double bonds, l is an integer from 1 to 5, m is an integer from 0 to 4, and n is an integer from 0 to 2, provided that l+m+2n=5 or 6). With this method, a trifluorophosphine-ruthenium compound can be synthesized under low-temperature and low-pressure conditions.
摘要翻译：一种制备钌化合物的方法，包括使通式（1）表示的化合物：RuL02（其中L0表示具有4-10个碳原子和至少两个双键的不饱和烃化合物）与三氟化膦反应的步骤或使表示的化合物通式（1）表示的化合物和氢或卤素，得到通式（2）表示的化合物：Ru（PF 3）l（L1）m（L2）n（其中，L 1表示氢原子或卤素原子， L2表示具有4-10个碳原子和至少两个双键的不饱和烃化合物，l是1至5的整数，m是0-4的整数，n是0-2的整数，条件是l + m + 2n = 5或6）。通过该方法，可以在低温低压条件下合成三氟化膦 - 钌化合物。

55. 发明授权

US07354527B2 Chemical mechanical polishing pad and chemical mechanical polishing process 有权
标题翻译：化学机械抛光垫和化学机械抛光工艺
公开(公告)号：US07354527B2
公开(公告)日：2008-04-08
申请号：US11219843
申请日：2005-09-07
申请人： Hiroyuki Tano , Hideki Nishimura , Hiroshi Shiho
发明人： Hiroyuki Tano , Hideki Nishimura , Hiroshi Shiho
IPC分类号： B44C1/22
CPC分类号： B24B37/24
摘要： A chemical mechanical polishing pad which has a storage elastic modulus E′(30° C.) at 30° C. of 120 MPa or less and an (E′(30° C.)/E′(60° C.)) ratio of the storage elastic modulus E′(30° C.) at 30° C. to the storage elastic modulus E′(60° C.) at 60° C. of 2.5 or more when the storage elastic moduli of a polishing substrate at 30° C. and 60° C. are measured under the following conditions: initial load: 100 g maximum bias: 0.01 % frequency: 0.2 Hz. A chemical mechanical polishing process makes use of the above chemical mechanical polishing pad. The chemical mechanical polishing pad can suppress the production of a scratch on the polished surface in the chemical mechanical polishing step and can provide a high-quality polished surface, and the chemical mechanical polishing process provides a high-quality polished surface by using the chemical mechanical polishing pad.
摘要翻译：在30℃下的储能弹性模量E'（30℃）为120MPa以下，（E'（30℃）/ E'（60℃））的化学机械研磨垫）当研磨基材的储存弹性模量为60℃时，30℃下的储能弹性模量E'（30℃）与60℃下的储能弹性模量E'（60℃）的比为2.5以上在以下条件下测量30℃和60℃：初始负荷：最大偏压100g：0.01％频率：0.2Hz。化学机械抛光工艺利用上述化学机械抛光垫。化学机械抛光垫可以在化学机械抛光步骤中抑制抛光表面产生划痕，并可提供高质量的抛光表面，化学机械抛光工艺通过使用化学机械抛光垫

56. 发明申请

US20080079864A1 Liquid crystal panel module and liquid crystal display device using the same 有权
标题翻译：液晶面板模块和使用其的液晶显示装置
公开(公告)号：US20080079864A1
公开(公告)日：2008-04-03
申请号：US11905072
申请日：2007-09-27
申请人： Hideki Nishimura
发明人： Hideki Nishimura
IPC分类号： G02F1/1333
CPC分类号： G02F1/13452
摘要： Disclosed is a liquid crystal display panel module. The liquid crystal display panel module includes a liquid crystal display panel in which a liquid crystal layer is sandwiched between a pair of substrates facing each other, a printed wiring board which is electrically connected to the liquid crystal display panel, a first frame-shaped chassis which is arranged in front of the liquid crystal display panel, and a second frame-shaped chassis which is electrically conductive and arranged behind of the liquid crystal display panel. In the liquid crystal display panel module, the liquid crystal display panel is held by the first chassis and the second chassis. And, the second chassis and a grounding electrode of the printed wiring board are electrically connected by attaching the printed wiring board to the second chassis.
摘要翻译：公开了一种液晶显示面板模块。液晶显示面板模块包括液晶显示面板，液晶层夹在一对彼此相对的基板之间，电连接到液晶显示面板的印刷电路板，第一框架其布置在液晶显示面板的前面，并且第二框架底座是导电的并且布置在液晶显示面板后面。在液晶显示面板模块中，液晶显示面板由第一机架和第二机架保持。并且，通过将印刷线路板附接到第二机架，印刷线路板的第二机架和接地电极电连接。

57. 发明申请

US20060136515A1 Content synthesis device, content synthesis method, contents synthesis program, computer readable recording medium containing the content synthesis program, data structure of content data, and computer readable recording medium containing the content data 审中-公开
标题翻译：内容合成装置，内容合成方法，内容合成程序，包含内容合成程序的计算机可读记录介质，内容数据的数据结构和包含内容数据的计算机可读记录介质
公开(公告)号：US20060136515A1
公开(公告)日：2006-06-22
申请号：US10542902
申请日：2004-01-22
申请人： Tetsuya Matsuyama , Junko Mikata , Hideki Nishimura
发明人： Tetsuya Matsuyama , Junko Mikata , Hideki Nishimura
IPC分类号： G06F17/30
CPC分类号： G06T17/00
摘要： A contents synthesizing apparatus includes an input receiving portion receiving an input of first contents data including a synthesizing script describing synthesis of contents data and an input of second contents data, and a synthesis processing portion synthesizing the input first contents data with the input second contents data, based on the synthesizing script included in said input first contents data. Therefore, it becomes unnecessary to newly prepare a synthesizing script required for synthesizing contents data.
摘要翻译：一种内容合成装置，包括：输入接收部分，接收包括描述内容数据的合成和第二内容数据的输入的合成脚本的第一内容数据的输入;以及合成处理部分，将输入的第一内容数据与输入的第二内容数据合成基于包括在所述输入的第一内容数据中的合成脚本。因此，不需要新编制合成内容数据所需的合成脚本。

58. 发明申请

US20060060569A1 Chemical mechanical polishing pad and chemical mechanical polishing process 有权
标题翻译：化学机械抛光垫和化学机械抛光工艺
公开(公告)号：US20060060569A1
公开(公告)日：2006-03-23
申请号：US11219843
申请日：2005-09-07
申请人： Hiroyuki Tano , Hideki Nishimura , Hiroshi Shiho
发明人： Hiroyuki Tano , Hideki Nishimura , Hiroshi Shiho
IPC分类号： C03C15/00
CPC分类号： B24B37/24
摘要： A chemical mechanical polishing pad which has a storage elastic modulus E′ (30° C.) at 30° C. of 120 MPa or less and an (E′ (30° C.)/E′ (60° C.)) ratio of the storage elastic modulus E′ (30° C.) at 30° C. to the storage elastic modulus E′ (60° C.) at 60° C. of 2.5 or more when the storage elastic moduli of a polishing substrate at 30° C. and 60° C. are measured under the following conditions: initial load: 100 g maximum bias: 0.01 % frequency: 0.2 Hz. A chemical mechanical polishing process makes use of the above chemical mechanical polishing pad. The chemical mechanical polishing pad can suppress the production of a scratch on the polished surface in the chemical mechanical polishing step and can provide a high-quality polished surface, and the chemical mechanical polishing process provides a high-quality polished surface by using the chemical mechanical polishing pad.
摘要翻译：在30℃下的储能弹性模量E'（30℃）为120MPa以下，（E'（30℃）/ E'（60℃））的化学机械研磨垫）当研磨基材的储存弹性模量为60℃时，30℃下的储能弹性模量E'（30℃）与60℃下的储能弹性模量E'（60℃）的比为2.5以上在以下条件下测量30℃和60℃：初始负荷：最大偏压100g：0.01％频率：0.2Hz。化学机械抛光工艺利用上述化学机械抛光垫。化学机械抛光垫可以在化学机械抛光步骤中抑制抛光表面产生划痕，并可提供高质量的抛光表面，化学机械抛光工艺通过使用化学机械抛光垫

59. 发明申请

US20060018573A1 Oil Dynamic Bearing, Motor Supported on Oil Dynamic Bearing and Disk Drive Carrying the Motor 失效
标题翻译：油动动轴承，电机支持油动力轴承和磁盘驱动器携带电机
公开(公告)号：US20060018573A1
公开(公告)日：2006-01-26
申请号：US11160922
申请日：2005-07-15
申请人： Satoru Sodeoka , Hideki Nishimura , Takayuki Oe
发明人： Satoru Sodeoka , Hideki Nishimura , Takayuki Oe
IPC分类号： F16C32/06
CPC分类号： H02K7/086 , F16C17/045 , F16C17/102 , F16C17/105 , F16C33/107 , F16C2370/12 , G11B19/2018
摘要： An oil dynamic bearing, a motor and a disk drive adapted to be reduced in both size and thickness are disclosed. The oil dynamic bearing (B) includes at least two bearing portions (B1, B2), each having a bearing near end nearer to the rotational axis or the bearing center of the bearing and a bearing far end farther from the rotational axis or the bearing center of the bearing. The near and bearing far ends are each connected to a taper seal portion, which in turn communicates with the atmosphere. The taper seal portion connected to the bearing near end of the bearing portion (B1) and the taper seal portion connected to the bearing near end of the other bearing portion (B2) make up a common taper seal portion.
摘要翻译：公开了一种适于减小尺寸和厚度的油动轴承，电动机和盘驱动器。油动轴承（B）包括至少两个轴承部分（B 1，B 2），每个轴承部分具有靠近旋转轴线的轴承或轴承的轴承中心，以及远离旋转轴线的轴承远端，轴承的轴承中心。近端和远端各自连接到锥形密封部分，锥形密封部分又与大气连通。连接到轴承部分（B 1）附近的轴承的锥形密封部分和连接到另一个轴承部分（B 2）的端部附近的轴承的锥形密封部分构成共同的锥形密封部分。

60. 发明授权

US06914358B2 Spindle motor and disk drive furnished therewith 有权
标题翻译：主轴电机和磁盘驱动器配备
公开(公告)号：US06914358B2
公开(公告)日：2005-07-05
申请号：US10250083
申请日：2003-06-03
申请人： Shinya Tokunaga , Kaoru Uenosono , Hideki Nishimura , Yoshito Oku
发明人： Shinya Tokunaga , Kaoru Uenosono , Hideki Nishimura , Yoshito Oku
IPC分类号： F16C17/10 , F16C17/02 , F16C17/04 , F16C33/10 , G11B19/20 , H02K5/16 , H02K7/08 , H02K21/22 , G11B17/02 , H02K5/00
CPC分类号： F16C17/107 , F16C33/107 , F16C33/1085 , F16C2370/12 , H02K5/1675
摘要： In a spindle motor utilizing dynamic-pressure bearings having a full-fill structure, a bearing configuration that balances and sustains at or above atmospheric pressure the internal pressure of the bearing oil. Thrust and radial bearing sections are configured within oil-filled bearing clearances in between the rotor, the shaft, and a shaft-encompassing hollow bearing member. A communicating passage one end of which opens on, radially inwardly along, the thrust bearing section is formed in the bearing member. Either axial ends of the bearing clearance in between the bearing member and shaft communicate through the passage. The communicating passage enables the oil to redistribute itself within the bearing clearances. Pressure difference between the axial upper and lower ends of the oil retained in between the bearing member and the shaft is compensated through the communicating passage, preventing incidents of negative pressure within the oil and of over-lift on the rotor.
摘要翻译：在使用具有全填充结构的动压轴承的主轴电机中，轴承构造在大气压力或大于等于或高于轴承油的内部压力的情况下平衡和维持。推力轴承和径向轴承部分配置在转子，轴和包含轴的中空轴承部件之间的充油轴承间隙内。在轴承部件上形成有连通通道，其一端在推力轴承部分沿径向向内开口。轴承构件和轴之间的轴承间隙的轴向端部通过通道连通。连通通道使得油在轴承间隙内重新分布。通过连通通道补偿保持在轴承构件和轴之间的油的轴向上端和下端之间的压力差，防止油内的负压和转子上的过度提升。

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