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    • 51. 发明授权
    • Imaging apparatus and camera system
    • 成像设备和相机系统
    • US08194180B2
    • 2012-06-05
    • US13305006
    • 2011-11-28
    • Koji ShibunoTakahiro IkedaHiroyuki KawaharaTakashi Abe
    • Koji ShibunoTakahiro IkedaHiroyuki KawaharaTakashi Abe
    • H04N5/225
    • G03B13/00
    • An imaging apparatus includes an optical system including a focus lens, a driver configured to drive the focus lens, a controller configured to control a supply of power to the driver, and a setting unit configured to set a power supply mode for specifying a method of supplying power to the driver. When a predetermined power supply mode is set, the controller determines according to a magnitude of a depth of field of the optical system during whether holding power for holding the state of the focus lens is supplied to the driver when the focus lens is stopped, and controls the supply of the holding power to the driver according to the result of the determination.
    • 一种成像装置,包括:光学系统,包括:聚焦透镜;被配置为驱动聚焦透镜的驱动器;配置成控制向驱动器供电的控制器;以及设置单元,其被配置为设定用于指定方法的电源模式 向司机供电。 当设定了预定的电源模式时,控制器在聚焦透镜停止时是否将保持焦点透镜的状态的保持功率提供给驾驶员的情况下根据光学系统的景深的大小来确定, 根据确定的结果控制向驾驶员提供保持力。
    • 59. 发明授权
    • Exposure method for correcting a focal point, and a method for manufacturing a semiconductor device
    • 用于校正焦点的曝光方法,以及半导体装置的制造方法
    • US07248349B2
    • 2007-07-24
    • US11220701
    • 2005-09-08
    • Takashi SatoShoji MimotogiTakahiro IkedaSoichi Inoue
    • Takashi SatoShoji MimotogiTakahiro IkedaSoichi Inoue
    • G01B9/00G01B11/00G03F9/00G03C5/00
    • G03F7/70516
    • There is disclosed an exposure method for correcting a focal point, comprising: illuminating a mask, in which a mask-pattern including at least a set of a first mask-pattern and a second mask-pattern mutually different in shape is formed, from a direction in which a point located off an optical axis of an exposure apparatus is a center of illumination, and exposing and projecting an image of said mask-pattern toward an image-receiving element; measuring a mutual relative distance between images of said first and second mask-patterns exposed and projected on said image-receiving element, thereby measuring a focal point of a projecting optical system of said exposure apparatus; and moving said image-receiving element along a direction of said optical axis of said exposure apparatus on a basis of a result of said measurement, and disposing said image-receiving element at an appropriate focal point of said projecting optical system.
    • 公开了一种用于校正焦点的曝光方法,包括:照射掩模,其中形成包括至少一组第一掩模图案和形成相互不同形状的第二掩模图案的掩模图案 使曝光装置的光轴离开的点为照明中心的方向,向图像接收元件曝光和投影所述掩模图案的图像; 测量曝光和投影在所述图像接收元件上的所述第一和第二掩模图案的图像之间的相对相对距离,从而测量所述曝光设备的投影光学系统的焦点; 并且基于所述测量的结果沿所述曝光装置的所述光轴的方向移动所述图像接收元件,并将所述图像接收元件设置在所述投影光学系统的适当焦点处。