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51. 发明授权

US07130039B2 Simultaneous multi-spot inspection and imaging 有权
公开(公告)号：US07130039B2
公开(公告)日：2006-10-31
申请号：US10418352
申请日：2003-04-17
申请人： Mehdi Vaez-Iravani , Lawrence Robert Miller
发明人： Mehdi Vaez-Iravani , Lawrence Robert Miller
IPC分类号： G01N21/68
CPC分类号： G01N21/95623 , G01N21/8806
摘要： A compact and versatile multi-spot inspection imaging system employs an objective for focusing an array of radiation beams to a surface and a second reflective or refractive objective having a large numerical aperture for collecting scattered radiation from the array of illuminated spots. The scattered radiation from each illuminated spot is focused to a corresponding optical fiber channel so that information about a scattering may be conveyed to a corresponding detector in a remote detector array for processing. For patterned surface inspection, a cross-shaped filter is rotated along with the surface to reduce the effects of diffraction by Manhattan geometry. A spatial filter in the shape of an annular aperture may also be employed to reduce scattering from patterns such as arrays on the surface. In another embodiment, different portions of the same objective may be used for focusing the illumination beams onto the surface and for collecting the scattered radiation from the illuminated spots simultaneously. In another embodiment, a one-dimensional array of illumination beams are directed at an oblique angle to the surface to illuminate a line of illuminated spots at an angle to the plane of incidence. Radiation scattered from the spots are collected along directions perpendicular to the line of spots or in a double dark field configuration.

52. 发明授权

US07116413B2 Inspection system for integrated applications 有权
标题翻译：综合应用检测系统
公开(公告)号：US07116413B2
公开(公告)日：2006-10-03
申请号：US10659556
申请日：2003-09-09
申请人： Mehdi Vaez-Iravani
发明人： Mehdi Vaez-Iravani
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/474 , G01N21/956
摘要： A compact surface inspection optical head is disclosed which comprises a frame with two rings of apertures therein. The first set of apertures surrounding and close to a normal direction to the surface to be inspected is connected to fibers used to collect scattered radiation useful for the detection of micro-scratches caused by chemical and mechanical polishing. Where the position of these apertures is selected to be away from patterned scattering or diffraction, these apertures and their associated fibers may be useful for anomaly detection on patterned surfaces. A second ring of apertures at low elevation angles to the surface inspected is connected to fibers to collect radiation scattered by the surface inspected for anomaly detection on patterned surfaces. This ring of apertures segments azimuthally the collection space so that the signal outputs from detectors that are saturated by the pattern diffraction or scattering may be discarded and only the outputs of unsaturated detectors are used for anomaly detection. A pair of larger apertures in the double dark field positions may be employed for anomaly detection on unpatterned surfaces. Scattered radiation passing through the two larger apertures may be collected by objectives or fiber bundles.
摘要翻译：公开了一种紧凑的表面检查光学头，其包括其中具有两个孔环的框架。围绕和接近待检查表面的正常方向的第一组孔径连接到用于收集用于检测由化学和机械抛光引起的微划痕的散射辐射的纤维。在这些孔的位置被选择为远离图案化散射或衍射的情况下，这些孔及其相关联的纤维可用于图案化表面上的异常检测。与被检查的表面的低仰角的第二个孔环连接到纤维上以收集由被检查的表面散射的辐射以在图案化表面上的异常检测。这个孔环以方位方式分段收集空间，从而可以丢弃由图案衍射或散射饱和的检测器的信号输出，并且仅使用不饱和检测器的输出进行异常检测。双暗场位置中的一对较大的孔可用于未图案化表面上的异常检测。通过两个较大孔径的散射辐射可以被物镜或纤维束收集。

53. 发明申请

US20050018181A1 Defect detection system 审中-公开
标题翻译：缺陷检测系统
公开(公告)号：US20050018181A1
公开(公告)日：2005-01-27
申请号：US10919600
申请日：2004-08-16
申请人： Mehdi Vaez-Iravani , Jeffrey Rzepiela , Carl Treadwell , Andrew Zeng , Robert Fiordalice
发明人： Mehdi Vaez-Iravani , Jeffrey Rzepiela , Carl Treadwell , Andrew Zeng , Robert Fiordalice
IPC分类号： G01N21/21 , G01N21/95 , G01N21/00
CPC分类号： G01N21/956 , G01N21/21 , G01N21/9501
摘要： Scattered radiation from a sample surface is collected by means of a collector that collects radiation substantially symmetrically about a line normal to the surface. The collected radiation is directed to channels at different azimuthal angles so- that information related to relative azimuthal positions of the collected scattered radiation about the line is preserved. The collected radiation is converted into respective signals representative of radiation scattered at different azimuthal angles about the line. The presence and/or characteristics of anomalies are determined from the signals. Alternatively, the radiation collected by the collector may be filtered by means of a spatial filter having an annular gap of an angle related to the angular separation of expected pattern scattering. Signals obtained from the narrow and wide collection channels may be compared to distinguish between micro-scratches and particles. Forward scattered radiation may be collected from other radiation and compared to distinguish between micro-scratches and particles. Intensity of scattering is measured when the surface is illuminated sequentially by S- and P-polarized radiation and compared to distinguish between micro-scratches and particles. Representative films may be measured using profilometers or scanning probe microscopes to determine their roughness and by the above-described instruments to determine haze in order to build a database. Surface roughness of unknown films may then be determined by measuring haze values and from the database.
摘要翻译：来自样品表面的散射辐射通过收集器收集，收集器围绕垂直于表面的线基本上对称地收集辐射。收集的辐射被引导到不同方位角的通道，以便保持与线周围收集的散射辐射的相对方位位置有关的信息。所收集的辐射被转换成代表围绕线路以不同方位角散射的辐射的各个信号。异常的存在和/或特征由信号确定。或者，由集电器收集的辐射可以通过具有与预期图案散射的角度间隔相关的角度的环形间隙的空间滤光器来过滤。可以比较从狭窄和宽收集通道获得的信号，以区分微划痕和微粒。可以从其他辐射收集向前散射的辐射，并进行比较以区分微划痕和微粒。当通过S和P偏振辐射依次照射表面时，测量散射强度并进行比较以区分微划痕和微粒。可以使用轮廓仪或扫描探针显微镜来测量代表性膜以确定其粗糙度，并且可以通过上述仪器来确定雾度以构建数据库。然后可以通过测量雾度值和数据库来确定未知膜的表面粗糙度。

54. 发明授权

US06781688B2 Process for identifying defects in a substrate having non-uniform surface properties 有权
标题翻译：用于识别具有不均匀表面性质的基底中的缺陷的方法
公开(公告)号：US06781688B2
公开(公告)日：2004-08-24
申请号：US10327484
申请日：2002-12-20
申请人： George J. Kren , Mehdi Vaez-Iravani , David W. Shortt
发明人： George J. Kren , Mehdi Vaez-Iravani , David W. Shortt
IPC分类号： G01N2100
CPC分类号： G01N21/9501
摘要： A surface inspection method of the invention includes scanning an inspection surface taking surface measurements. Determinations of various noise levels in the surface are made based on variations in the surface measurements. A dynamic threshold is then determined. The dynamic threshold adapts to the noise levels in the inspection surface to provide a varying threshold that can provide areas of high and low defect sensitivity on the same inspection surface. Defects are then identified by comparing surface measurements with the dynamic threshold. Additionally, the invention includes a surface inspection method that uses signal-to-noise ratios to identify defects. Such a method scans an inspection surface to obtain surface measurements. Noise levels associated with the inspection surface are then determined. Signal-to-noise ratios are determined for the surface measurements. The signal-to-noise ratios are compared with a signal-to-noise ratio threshold value. Defects are identified based on the comparisons of the signal-to-noise ratio of the surface measurements with the signal-to-noise ratio threshold value.
摘要翻译：本发明的表面检查方法包括扫描检查表面进行表面测量。基于表面测量的变化确定表面中各种噪声水平。然后确定动态阈值。动态阈值适应于检查表面中的噪声水平，以提供可在同一检查表面上提供高和低缺陷灵敏度区域的变化阈值。然后通过将表面测量与动态阈值进行比较来识别缺陷。此外，本发明包括使用信噪比来识别缺陷的表面检查方法。这种方法扫描检查表面以获得表面测量。然后确定与检查表面相关联的噪声水平。确定表面测量的信噪比。将信噪比与信噪比阈值进行比较。基于表面测量的信噪比与信噪比阈值的比较来识别缺陷。

55. 发明授权

US5139336A Optical measuring apparatus using amplitude modulation of slipt beams 失效
标题翻译：光学测量装置使用松弛调制的幅度调制
公开(公告)号：US5139336A
公开(公告)日：1992-08-18
申请号：US573150
申请日：1990-09-14
申请人： Chung W. See , Mehdi Vaez-Iravani
发明人： Chung W. See , Mehdi Vaez-Iravani
IPC分类号： G01B9/02 , G01B11/06 , G01B11/24 , G01B11/245 , G01B11/30 , G01J9/04
CPC分类号： G01B11/303 , G01B11/0675 , G01J9/04
摘要： A heterodyne interferometer to achieve simultaneous and independent measurements of amplitude and phase includes a beam splitting device, BS which splits of the incident light beam into two parts with equal amplitudes and an angular deviation, .alpha.; imposes two unequal frequency shifts F.sub.1 and F.sub.2 on the two beams and amplitude modulates the two beams in phase quadrature at frequency F.sub.s. The two beams emerging from the beam splitter BS are focused by a lens L1 normally on to the surface of an object O. Upon reflection from the object surface, the two beams traverse through the lens and beam splitter a second time, where they are recombined. Both the frequencies and the amplitudes of the two beams will be shifted (or modulated) again after the second passage. The recombined beam is then diverted towards a photodetector PD via the beamsplitter.
摘要翻译： PCT No.PCT / GB89 / 00325 Sec。 371 1990年9月14日第 102（e）1990年9月14日PCT PCT 1989年3月30日提交PCT。出版物WO89 / 09380 用于实现幅度和相位的同时和独立测量的外差干涉仪包括分束装置BS，其将入射光束分成具有相等幅度的两个部分和角度偏差α; 在两个波束上施加两个不相等的频移F1和F2，并以频率Fs对相位正交的两个波束进行幅度调制。从分束器BS出射的两个光束通常由透镜L1聚焦在物体O的表面上。在从物体表面反射时，两个光束第二次穿过透镜和分束器，在那里它们被重新组合。在第二次通过之后，两个波束的频率和幅度将再次移动（或调制）。然后，重新组合的光束经由分束器转向光电检测器PD。

56. 发明授权

US4873434A Scanning optical microscope using single laser beam 失效
标题翻译：使用单个激光束扫描光学显微镜
公开(公告)号：US4873434A
公开(公告)日：1989-10-10
申请号：US75508
申请日：1987-07-20
申请人： Chung W. See , Mehdi Vaez-Iravani
发明人： Chung W. See , Mehdi Vaez-Iravani
IPC分类号： G01B11/30 , G02B21/00
CPC分类号： G02B21/002 , G01B11/303
摘要： A scanning optical microscope which comprises a source of optical radiation and means for focussing radiation from the source into an interrogating spot on a surface under examination. The spot is deflected about a point on the surface, and the surface topography is measured by measuring the amplitude and/or phase of the radiation reflected from the surface at the spot position.
摘要翻译：一种扫描光学显微镜，其包括光学辐射源和用于将来自所述源的辐射聚焦到被检查表面上的询问点的装置。斑点围绕表面的一点偏转，并且通过测量在光点位置处从表面反射的辐射的幅度和/或相位来测量表面形貌。

57. 发明授权

US09068917B1 Systems and methods for inspection of a specimen 有权
标题翻译：检测样品的系统和方法
公开(公告)号：US09068917B1
公开(公告)日：2015-06-30
申请号：US11374711
申请日：2006-03-14
申请人： Mehdi Vaez-Iravani , Eliezer Rosengaus
发明人： Mehdi Vaez-Iravani , Eliezer Rosengaus
IPC分类号： G01N21/00 , G01N21/88
CPC分类号： G01N21/00 , G01N21/88 , G01N21/9501 , G01N21/956 , G01N2021/8825
摘要： Systems and methods for inspection of a specimen are provided. One system includes an illumination subsystem configured to illuminate the specimen by scanning a spot across the specimen. The system also includes a non-imaging detection subsystem configured to generate output signals responsive to light specularly reflected from the spot scanned across the specimen. In addition, the system includes a processor configured to generate images of the specimen using the output signals and to detect defects on the specimen using the images. In one embodiment, the non-imaging detection subsystem includes an objective and a detector. An NA of the objective does not match a pixel size of the detector. In another embodiment, the non-imaging detection subsystem includes an objective having an NA of greater than about 0.05. The system may be configured for multi-spot illumination and multi-channel detection. Alternatively, the system may be configured for single spot illumination and multi-channel detection.
摘要翻译：提供了用于检查样本的系统和方法。一个系统包括照明子系统，该照明子系统被配置为通过扫描样品上的斑点照射样本。该系统还包括非成像检测子系统，其被配置为响应于从穿过样本扫描的点镜面反射的光产生输出信号。另外，该系统包括处理器，该处理器被配置为使用输出信号产生样本的图像，并使用该图像来检测样本上的缺陷。在一个实施例中，非成像检测子系统包括物镜和检测器。目标的NA与检测器的像素尺寸不匹配。在另一个实施例中，非成像检测子系统包括具有大于约0.05的NA的物镜。该系统可以被配置用于多点照明和多通道检测。或者，该系统可以被配置用于单点照明和多通道检测。

58. 发明授权

US08817248B2 Simultaneous multi-spot inspection and imaging 有权
标题翻译：同时多点检查和成像
公开(公告)号：US08817248B2
公开(公告)日：2014-08-26
申请号：US12362191
申请日：2009-01-29
申请人： Mehdi Vaez-Iravani , Lawrence Robert Miller
发明人： Mehdi Vaez-Iravani , Lawrence Robert Miller
IPC分类号： G01N21/00
CPC分类号： G01N21/95623 , G01N21/8806
摘要： A compact and versatile multi-spot inspection imaging system employs an objective for focusing an array of radiation beams to a surface and a second reflective or refractive objective having a large numerical aperture for collecting scattered radiation from the array of illuminated spots. The scattered radiation from each illuminated spot is focused to a corresponding receiver or detector so that information about a scattering may be conveyed to a corresponding detector in a remote detector array for processing. Radiation reflected from the spots is imaged into a first array of receivers or detectors so that each receiver in the first array receives radiation from a corresponding spot in the array of spots; and scattered radiation from the spots is imaged onto a second array of receivers or detectors in a dark field imaging scheme so that each receiver or detector in the second array receives radiation from a corresponding spot.
摘要翻译：紧凑且通用的多点检查成像系统采用将辐射束阵列聚焦到表面的目标和具有大数值孔径的第二反射或折射物镜，用于收集来自照明点阵列的散射辐射。来自每个照明点的散射的辐射被聚焦到相应的接收器或检测器，使得关于散射的信息可以被传送到用于处理的远程检测器阵列中的对应的检测器。从斑点反射的辐射被成像为第一阵列的接收器或检测器，使得第一阵列中的每个接收器接收来自阵列阵列中的相应斑点的辐射; 并且来自斑点的散射的辐射在暗场成像方案中成像到接收器或检测器的第二阵列上，使得第二阵列中的每个接收器或检测器接收来自相应光斑的辐射。

59. 发明授权

US07746459B2 Systems configured to inspect a wafer 有权
标题翻译：配置为检查晶片的系统
公开(公告)号：US07746459B2
公开(公告)日：2010-06-29
申请号：US11837220
申请日：2007-08-10
申请人： Azmi Kadkly , Stephen Biellak , Mehdi Vaez-Iravani
发明人： Azmi Kadkly , Stephen Biellak , Mehdi Vaez-Iravani
IPC分类号： G01N21/00
CPC分类号： G01N21/9501
摘要： Systems configured to inspect a wafer are provided. One system includes an illumination subsystem configured to illuminate an area on the wafer by directing light to the wafer at an oblique angle of incidence. The system also includes a collection subsystem configured to simultaneously collect light scattered from different spots within the illuminated area and to focus the light collected from the different spots to corresponding positions in an image plane. In addition, the system includes a detection subsystem configured to separately detect the light focused to the corresponding positions in the image plane and to separately generate output responsive to the light focused to the corresponding positions in the image plane. The output can be used to detect defects on the wafer.
摘要翻译：提供了配置用于检查晶片的系统。一个系统包括照明子系统，该照明子系统被配置为以倾斜的入射角将光引导到晶片上来照射晶片上的区域。该系统还包括收集子系统，其被配置为同时收集从照明区域内的不同点散射的光并且将从不同点收集的光聚焦到图像平面中的相应位置。另外，该系统包括检测子系统，该检测子系统被配置为分别检测聚焦到图像平面中的对应位置的光，并且响应于聚焦到图像平面中的对应位置的光单独产生输出。该输出可用于检测晶圆上的缺陷。

60. 发明申请

US20090161096A1 Simultaneous Multi-Spot Inspection And Imaging 有权
标题翻译：同时多点检测和成像
公开(公告)号：US20090161096A1
公开(公告)日：2009-06-25
申请号：US12362191
申请日：2009-01-29
申请人： Mehdi Vaez-Iravani , Lawrence Roberts Miller
发明人： Mehdi Vaez-Iravani , Lawrence Roberts Miller
IPC分类号： G01N21/88
CPC分类号： G01N21/95623 , G01N21/8806
摘要： A compact and versatile multi-spot inspection imaging system employs an objective for focusing an array of radiation beams to a surface and a second reflective or refractive objective having a large numerical aperture for collecting scattered radiation from the array of illuminated spots. The scattered radiation from each illuminated spot is focused to a corresponding optical fiber channel so that information about a scattering may be conveyed to a corresponding detector in a remote detector array for processing. For patterned surface inspection, a cross-shaped filter is rotated along with the surface to reduce the effects of diffraction by Manhattan geometry. A spatial filter in the shape of an annular aperture may also be employed to reduce scattering from patterns such as arrays on the surface. In another embodiment, different portions of the same objective may be used for focusing the illumination beams onto the surface and for collecting the scattered radiation from the illuminated spots simultaneously. In another embodiment, a one-dimensional array of illumination beams are directed at an oblique angle to the surface to illuminate a line of illuminated spots at an angle to the plane of incidence. Radiation scattered from the spots are collected along directions perpendicular to the line of spots or in a double dark field configuration.
摘要翻译：紧凑且通用的多点检查成像系统采用将辐射束阵列聚焦到表面的目标和具有大数值孔径的第二反射或折射物镜，用于收集来自照明点阵列的散射辐射。来自每个照明点的散射辐射被聚焦到相应的光纤通道，使得关于散射的信息可以被传送到用于处理的远程检测器阵列中的相应检测器。对于图案化表面检查，十字形过滤器与表面一起旋转，以减少曼哈顿几何形状的衍射效应。也可以采用环形孔形状的空间滤光器，以减少从诸如表面上的阵列的图案的散射。在另一个实施例中，相同物镜的不同部分可用于将照明光束聚焦到表面上并且用于从同时收集来自照明斑点的散射辐射。在另一个实施例中，照明光束的一维阵列以与入射平面成一定角度的一定角度照射到该表面上的倾斜角度。从斑点散射的辐射沿垂直于斑点线的方向或双暗场构型收集。

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