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51. 发明专利

JP2010190430A Piezoelectric element driven metal diaphragm control valve 有权
标题翻译：压电元件驱动金属膜片控制阀
公开(公告)号：JP2010190430A
公开(公告)日：2010-09-02
申请号：JP2010123009
申请日：2010-05-28
申请人： Fujikin Inc , 株式会社フジキン
发明人： MATSUMOTO ATSUSHI , HIRATA KAORU , DOI RYOSUKE , IKEDA SHINICHI , NISHINO KOJI
IPC分类号： F16K31/02 , F16K7/14 , H02N2/00
摘要： PROBLEM TO BE SOLVED: To perform accurate and stable flow rate control even under a high-temperature environment; and to adjust a compressive force applied on a metal diaphragm 8. SOLUTION: A piezoelectric element driven metal diaphragm control valve includes the metal diaphragm 8 brought into contact with and separated from a valve seat 7c via a diaphragm presser 12 through extension of a piezoelectric element 13. In the control valve, a disk spring mechanism 14 arranged between the piezoelectric element 13 and the metal diaphragm 8 is composed of a diaphragm presser holder 22 into which the diaphragm presser 12 is inserted at the lower end and in which a storage space 22b is formed with its upper part opened at the upper end, a plurality of disk springs 23 arranged in the storage space 22b of the diaphragm presser holder 22, a ball receiver 24 placed on the upper surface of the top disk spring 23 and positioned below the piezoelectric element 13 for transmitting the extension of the piezoelectric element 13 to the disk springs 23, and a spring-adjusting nut 25 screwed to the diaphragm presser holder 22 so as to adjust the repulsion force of the disk springs 23 and to prevent the ball receiver 24 and the disk springs 23 from dropping out. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：即使在高温环境下也能进行精确稳定的流量控制; 并调整施加在金属隔膜8上的压缩力。解决方案：压电元件驱动的金属隔膜控制阀包括通过隔膜压紧件12与阀座7c接触并与阀座7c分离的金属隔膜8，压电元件13.在控制阀中，布置在压电元件13和金属隔膜8之间的盘弹簧机构14由隔膜推压器保持器22构成，隔膜推压器12在下端插入其中，其中存储空间22b形成为其上部开口的上部，布置在隔膜压紧保持器22的存储空间22b中的多个盘簧23，放置在顶部盘簧23的上表面上的球接收器24，以及位于压电元件13的下方，用于将压电元件13的延伸部分传递到盘形弹簧23;以及弹簧调节螺母25，以调节盘簧23的排斥力并防止球接收器24和盘弹簧23脱落。版权所有（C）2010，JPO＆INPIT

52. 发明专利

JP2008015581A Operation abnormality detecting method in downstream side valve of throttle mechanism of pressure type flow rate control apparatus 有权
标题翻译：压力型流量控制装置的压力机构下游侧阀的操作异常检测方法
公开(公告)号：JP2008015581A
公开(公告)日：2008-01-24
申请号：JP2006183061
申请日：2006-07-03
申请人： Fujikin Inc , 株式会社フジキン
发明人： NAGASE MASAAKI , DOI RYOSUKE , IKEDA SHINICHI , NISHINO KOJI , HIRATA KAORU , SUGITA KATSUYUKI , MATSUMOTO ATSUSHI
IPC分类号： G05D7/06 , G01F1/00 , G01F1/36
CPC分类号： G05D7/0635 , G01F1/36 , G01F15/005 , G01F15/022
摘要： PROBLEM TO BE SOLVED: To make opening of a downstream side valve of a throttle mechanism to be easily determined from a varying state of a flow rate output signal at operation time of a pressure type flow rate control apparatus since it is disadvantageous that an opening operation of the downstream side valve of the throttle mechanism cannot be determined by existence of the flow rate output signal on the mechanism in a conventional pressure type flow rate control apparatus. SOLUTION: In the pressure type flow rate control apparatus, the downstream side valve of the throttle mechanism is made to be opened while a flow rate setting value Qe to be inputted into the pressure type flow rate control apparatus is made to be varied, and magnitude ΔV of variation of the flow rate output signal Qo from the pressure type control apparatus in which the flow rate setting value Qe being varied is to be detected. When the magnitude ΔV of variation of the flow rate output signal Qo is larger than a determined value, an opening operation of the downstream side valve of the throttle mechanism is to be determined as normal, while the opening operation is to be determined as abnormal when the magnitude ΔV of the variation is smaller than the predetermined value. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了在压力式流量控制装置的运行时间内从流量输出信号的变化状态容易地确定节流机构的下游侧阀的打开，因为不利的是节气门机构的下游侧阀的打开动作不能由现有的压力式流量控制装置的机构的流量输出信号的存在来确定。解决方案：在压力式流量控制装置中，使节流机构的下游侧阀打开，同时输入到压力式流量控制装置的流量设定值Qe变化，并且要检测来自其中改变流量设定值Qe的压力型控制装置的流量输出信号Qo的变化幅度ΔV。当流量输出信号Qo的变化幅度ΔV大于确定值时，节流机构的下游侧阀的打开操作将被正常地确定，而打开操作将被确定为异常变化的幅度ΔV小于预定值。版权所有（C）2008，JPO＆INPIT

53. 发明专利

JP2008010510A Material vaporization supply apparatus and automatic pressure regulator used therefor 有权
标题翻译：材料蒸发供应装置及其自动调压器
公开(公告)号：JP2008010510A
公开(公告)日：2008-01-17
申请号：JP2006177113
申请日：2006-06-27
申请人： Fujikin Inc , 株式会社フジキン
发明人： HIRATA KAORU , NAGASE MASAAKI , HIDAKA ATSUSHI , MATSUMOTO ATSUSHI , DOI RYOSUKE , NISHINO KOJI , IKEDA SHINICHI
IPC分类号： H01L21/205 , C23C16/455
CPC分类号： C23C16/4481 , C23C16/52 , G05D16/2013 , Y10T137/7737
摘要： PROBLEM TO BE SOLVED: To provide a material vaporization supply apparatus which can accurately control the supply quantity of material to a process chamber, and is used for semiconductor manufacture by MODVC method. SOLUTION: The material vaporization supply apparatus is comprised of a source tank for accumulating material; a flow rate control device which adjusts a carrier gas from a carrier gas supply source at a constant flow rate, and supplies it to the material in the source tank; a primary piping route to lead a mixed gas Go of material vapor G 4 and a carrier gas G 1 accumulating in the upper space of the source tank; an automatic pressure regulator which adjusts the opening of a control valve provided at the end of the primary piping route on the basis of the detected values of pressure and temperature of the mixed gas Go of the primary piping route, and holds the pressure of the mixed gas Go in the source tank at a constant value by adjusting the sectional area of the route distributing the mixed gas Go; and a constant-temperature heater which heats a part other than a computation control unit of the source tank and the automatic pressure regulator at a set temperature. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够精确地控制处理室的材料供给量的材料蒸发供给装置，并且通过MODVC方法用于半导体制造。
解决方案：材料蒸发供应装置由用于堆积材料的源罐组成; 流量控制装置，其以恒定的流量调节来自载气供给源的载气，并将其供给到源罐中的材料; 引导物料蒸气G 4 的混合气体Go的主要管道路线和积聚在源罐的上部空间中的载气G 1 基于主要管路的混合气体Go的压力和温度的检测值，调整设置在主管路的末端的控制阀的开度的自动压力调节器，并且保持混合的压力气体通过调整分配混合气体Go的路径的截面积，以恒定值进入源罐; 以及恒温加热器，其在设定温度下加热源罐的计算控制单元和自动压力调节器以外的部分。版权所有（C）2008，JPO＆INPIT

54. 发明专利

JP2007095042A Method of detecting abnormality in fluid supply system using flow rate control device having pressure sensor 有权
标题翻译：使用具有压力传感器的流量控制装置检测流体供应系统中的异常的方法
公开(公告)号：JP2007095042A
公开(公告)日：2007-04-12
申请号：JP2006228526
申请日：2006-08-25
申请人： Fujikin Inc , 株式会社フジキン
发明人： NAGASE MASAAKI , DOI RYOSUKE , IKEDA SHINICHI , NISHINO KOJI , HIRATA KAORU , SUGITA KATSUYUKI , MATSUMOTO ATSUSHI
IPC分类号： G05D7/06
CPC分类号： G01F1/42 , F16K37/0091 , G05D7/0635
摘要： PROBLEM TO BE SOLVED: To simply, quickly, and accurately check abnormalities, such as an operational malfunction and a seat leakage of a plurality of valves assembled in a fluid supply system, using a flow rate control device, without removing the valves from a pile line of the fluid supply system with the use of a function of the flow rate control device having a pressure sensor. SOLUTION: In the fluid supply system having the flow rate control device provided with the pressure sensor that has a flow rate setting mechanism, a flow rate/pressure display mechanism and/or a flow rate self-diagnosis mechanism, abnormality of the flow rate control device and a control valve on the upstream side or on the downstream side of the flow rate control device is detected, by using a pressure display value of the flow rate control device and/or a diagnosis value of the flow rate self-diagnosis mechanism. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：使用流量控制装置简单，快速，准确地检查组装在流体供应系统中的多个阀的运行故障和阀座泄漏的异常，而不需要移除阀通过使用具有压力传感器的流量控制装置的功能，从流体供应系统的桩线。解决方案：在具有设置有具有流量设定机构，流量/压力显示机构和/或流量自诊断机构的压力传感器的流量控制装置的流体供给系统中，通过使用流量控制装置的压力显示值和/或流量控制装置的诊断值来检测流量控制装置的上游侧或下游侧的流量控制装置和控制阀，诊断机制。版权所有（C）2007，JPO＆INPIT

55. 发明专利

JP2005208712A Water hammer-less opening method for fluid channel, medical fluid supplying method using the same, and water hammer-less opening device 有权
标题翻译：用于流体通道的无水开口方法，使用该通道的医用流体供应方法和无水开式装置
公开(公告)号：JP2005208712A
公开(公告)日：2005-08-04
申请号：JP2004011497
申请日：2004-01-20
申请人： Fujikin Inc , Tadahiro Omi , 忠弘大見 , 株式会社フジキン
发明人： OMI TADAHIRO , NISHINO KOJI , NAGASE MASAAKI , DOI RYOSUKE , IKEDA SHINICHI , NISHIMURA RYUTARO
IPC分类号： F16L55/04 , F16K47/00 , F16K47/02 , G05D16/20
CPC分类号： F16K47/02 , Y10T137/0324 , Y10T137/0396 , Y10T137/7761 , Y10T137/7762 , Y10T137/7842 , Y10T137/86389 , Y10T137/86397 , Y10T137/86461
摘要： PROBLEM TO BE SOLVED: To rapidly open a fluid channel within a short period of time without causing any water hammer by an extremely simple device or operation. SOLUTION: This water hammer-less opening device is configured of an actuator operation type valve formed in a fluid channel, an electropneumatic converting device for supplying a two-step actuator operating pressure Pa to the actuator operation type valve, a vibration sensor fixed to the upstream side duct of the actuator operation type valve so as to be freely attached/detached, and a tuning box for inputting a vibration detection signal Pr detected by the vibration sensor, and for outputting a control signal Sc to control the level of a step operating pressure Ps' of the two-step actuator operating pressure Pa to the electropneumatic converting device, and for making the electropneumatic converting device output the two-step actuator operating pressure Pa with the step operating pressure Ps' for turning the vibration detection signal Pr to almost zero according to the adjustment of the control signal Sc. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：在短时间内快速打开流体通道，而不会通过非常简单的装置或操作造成任何水锤。解决方案：该无水锤打开装置由形成在流体通道中的致动器操作型阀构成，用于向致动器操作型阀提供两步致动器操作压力Pa的电动气动转换装置，振动传感器固定到致动器操作型阀的上游侧管道以便自由地安装/拆卸;以及调谐箱，用于输入由振动传感器检测到的振动检测信号Pr，并且用于输出控制信号Sc以控制将两步致动器操作压力Pa的步进操作压力Ps'设置到电动气动转换装置，并且使电动气动转换装置以步进操作压力Ps'输出两步致动器操作压力Pa，以转动振动检测信号根据控制信号Sc的调整，Pr几乎为零。版权所有（C）2005，JPO＆NCIPI

56. 发明专利

JP2005115501A Chamber internal pressure controller and internal pressure controlled chamber 有权
标题翻译：室内压力控制器和内压控制室
公开(公告)号：JP2005115501A
公开(公告)日：2005-04-28
申请号：JP2003346497
申请日：2003-10-06
申请人： Fujikin Inc , Tadahiro Omi , 忠弘大見 , 株式会社フジキン
发明人： OMI TADAHIRO , TERAMOTO AKINOBU , UNO TOMIO , DOI RYOSUKE , NISHINO KOJI , NAKAMURA OSAMU , MATSUMOTO ATSUSHI , NAGASE MASAAKI , IKEDA SHINICHI
IPC分类号： G05D7/06 , G05D16/20
CPC分类号： G05D16/208 , Y10T137/7761 , Y10T137/8741 , Y10T137/87507
摘要： PROBLEM TO BE SOLVED: To control a chamber internal pressure with high precision over a wide range while regulating a gas flow rate fed to a chamber by preventing a flow rate control precision in a low flow rate area from lowering greatly and accurately controlling the flow rate over the whole flow rate control area. SOLUTION: A gas supply device formed of a plurality of pressure type flow rate controllers connected in parallel and a controller controlling operation of them supplies a desired gas to a chamber evacuated by a vacuum pump while controlling a gas flow rate. One of the pressure type flow rate controllers serves as a controller controlling a gas flow area for up to 10% of the maximum flow rate supplied to the chamber, while the rest of the pressure type flow rate controllers control the rest of the gas flow rate areas. A pressure detector is arranged in the chamber, and the detection value of the pressure detector is inputted to the controller for regulating a control signal to the pressure type flow rate controller. In this way, the gas supply quantity to the chamber is controlled, and the chamber internal pressure is controlled. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：通过防止低流量区域中的流量控制精度降低大大和精确地控制，通过在宽范围内以高精度控制室内压力，同时调节供给到室的气体流量整个流量控制区域的流量。解决方案：由并联连接的多个压力式流量控制器形成的气体供给装置和控制其操作的控制器在控制气体流量的同时将期望的气体供应到由真空泵抽真空的室。压力式流量控制器中的一个用作控制气体流动面积达到提供给腔室的最大流量的10％的控制器，而其余的压力式流量控制器控制气体流量的其余部分区域。压力检测器设置在腔室中，压力检测器的检测值被输入到控制器，用于调节对压力型流量控制器的控制信号。以这种方式，控制到室的气体供应量，并且控制室内压力。版权所有（C）2005，JPO＆NCIPI

57. 发明专利

JP2004197754A Piezoelectric element driven metal diaphragm control valve 有权
公开(公告)号：JP2004197754A
公开(公告)日：2004-07-15
申请号：JP2002363201
申请日：2002-12-16
申请人： Fujikin Inc , 株式会社フジキン
发明人： DOI RYOSUKE , NISHINO KOJI , UENOYAMA TOYOMI , IKEDA SHINICHI
IPC分类号： F16K31/02 , H02N2/00
摘要： PROBLEM TO BE SOLVED: To provide a piezoelectric element driven metal diaphragm control valve to be applied to a pressure flow control device with a displacement enlarging mechanism, having more durability and high-speed and high-accurate operability. SOLUTION: The control valve comprises a valve body 2, a metal diaphragm valve element 3, a valve rod 4, a piezoelectric element 5, and the displacement enlarging mechanism 6. The displacement enlarging mechanism 6 consists of a support 7, a plurality of levers 8, a horizontal shaft 9, an intermediate abutting body 10, an input abutting body 11, a movable body 12, a constant pressure elastic body 13, an output abutting body 14, and a return elastic body 15. It has the movable body elevatably and rockingly provided at a central portion of the lowest lever 8 and the return elastic body 15 having elastic force smaller than the constant pressure elastic body 13, provided between the support 7 and the lowest lever 8 for returning each lever 8 to an original position, in particular. COPYRIGHT: (C)2004,JPO&NCIPI

58. 发明专利

JP2013232101A Gas distributary supply device for semiconductor manufacturing device 有权
标题翻译：用于半导体制造设备的气体分配供应装置
公开(公告)号：JP2013232101A
公开(公告)日：2013-11-14
申请号：JP2012103857
申请日：2012-04-27
申请人： Fujikin Inc , 株式会社フジキン
发明人： NISHINO KOJI , DOI RYOSUKE , HIRATA KAORU , SUGITA KATSUYUKI , IKEDA SHINICHI
IPC分类号： G05D7/06
CPC分类号： G05D7/0641 , G05D7/0664 , Y10T137/87772
摘要： PROBLEM TO BE SOLVED: To achieve the sharp downsizing, cost reduction, and accuracy enhancement of a gas distributary supply device of a semiconductor manufacturing device.SOLUTION: The gas distributary supply device of a semiconductor manufacturing device includes: a control valve 3 constituting a pressure type flow rate control part connected to a process gas inlet 11; a plurality of branch pipe lines 9a and 9n connected in parallel with the downstream side of a gas supply main pipe 8; branch pipe line opening/closing valves 10a and 10n interposed in the respective branch pipe lines; orifices 6a and 6n disposed at the downstream side of the branch pipe line opening/closing valves; a temperature sensor 4 disposed in the neighborhood of a process gas passage between the control valve and the orifices; a pressure sensor 5 disposed in the process gas passage between the control valve and the orifices; and an arithmetic control part 7 constituted of a pressure type flow rate arithmetic control part to which a pressure signal from the pressure sensor and a temperature signal from the temperature sensor are input, which calculates a total flow rate Q of process gas circulating through the orifices, and which outputs a control signal for controlling the control valve to perform an opening/closing operation in a direction in which a difference between the calculated flow rate value and a set flow rate value is decreased to a valve driving part 3a.
摘要翻译：要解决的问题：为了实现半导体制造装置的气体分配供给装置的急剧的小型化，降低成本和精度提高。解决方案：半导体制造装置的气体分配供给装置包括：控制阀3，其构成压力连接到处理气体入口11的流量控制部分; 与气体供给主管8的下游侧并联连接的多根分支管路9a，9n; 分支管路开/关阀10a和10n插入各支管中; 设置在分支管路开/关阀的下游侧的孔口6a和6n; 设置在控制阀和孔之间的处理气体通道附近的温度传感器4; 设置在控制阀和喷嘴之间的处理气体通道中的压力传感器5; 以及运算控制部7，其由输入来自压力传感器的压力信号和来自温度传感器的温度信号的压力型流量运算控制部构成，计算出通过该孔流动的处理气体的总流量Q 并且输出用于控制控制阀的控制信号，以在计算出的流量值和设定流量值之间的差减小到阀驱动部3a的方向上执行打开/关闭操作。

59. 发明专利

JP2013178709A Gas diversion supply device and gas diversion supply method using the same 有权
标题翻译：气体供应装置和气体分配供应方法
公开(公告)号：JP2013178709A
公开(公告)日：2013-09-09
申请号：JP2012043090
申请日：2012-02-29
申请人： Fujikin Inc , 株式会社フジキン
发明人： SAWADA YOHEI , IKEDA SHINICHI , DOI RYOSUKE , NISHINO KOJI
IPC分类号： G05D7/06
CPC分类号： G05D7/0641 , G05D7/0664 , Y10T137/0368 , Y10T137/776
摘要： PROBLEM TO BE SOLVED: To prevent an occurrence of gas overshoot in a diversion path when introducing gases in a gas diversion supply device for performing diversion supply of gas flow from a pressure flow rate controller through a plurality of diversion paths.SOLUTION: A gas diversion supply device is provided with: a pressure flow rate controller 4; a plurality of diversion paths Lto Lwhich are connected in parallel and perform diversion supply of gases from the pressure flow rate controller 4 to a process chamber 15; thermal type flow rate sensors 6a to 6n mediated in the respective diversion paths Lto L; motor-operated valves 7a to 7n provided on the downstream side of the thermal flow rate sensors 6a to 6n; and switching controllers 16a to 16n for controlling opening/closing of the respective motor-operated valves 7a to 7n. The switching controllers 16a to 16n are switchable between valve opening degree control for holding the motor-operated valves 7a to 7n by a valve opening degree control command signal Sp to a prescribed fixed valve opening degree and diversion flow rate control for adjusting opening degree of the motor-operated valves 7a to 7n by feedback control based on a flow rate detection signal Sm of the thermal type flow rate sensor 6 by a diversion flow rate control command signal Ss.
摘要翻译：要解决的问题：为了防止在通过多个引导路径从压力流量控制器进行气体流动的导流供气装置中引入气体时在引流路径中发生气体过冲。解决方案：气体导流供给装置设置有：压力流量控制器4; 多个并联连接的引导路径LtoL，并且执行从压力流量控制器4向处理室15分配气体供给; 在各导流路径Lto L中介导的热式流量传感器6a〜6n; 设置在热流量传感器6a〜6n的下游侧的电动阀7a〜7n; 以及用于控制各个电动阀7a至7n的打开/关闭的开关控制器16a至16n。开关控制器16a〜16n可以通过阀开度控制指令信号Sp保持电动阀7a〜7n的阀开度控制到规定的固定阀开度，以及用于调节开度控制指令通过基于热式流量传感器6的流量检测信号Sm的转向流量控制指令信号Ss进行的反馈控制，来实现电动阀7a〜7n的动作。

60. 发明专利

JP2013055303A Raw material vaporization supply device with raw material concentration detection mechanism 有权
标题翻译：原材料浓缩装置原料浓度检测机理
公开(公告)号：JP2013055303A
公开(公告)日：2013-03-21
申请号：JP2011194285
申请日：2011-09-06
申请人： Fujikin Inc , 株式会社フジキン
发明人： NAGASE MASAAKI , HIRATA KAORU , HIDAKA ATSUSHI , NISHINO KOJI , IKEDA SHINICHI , NAKAMURA TAKESHI
IPC分类号： H01L21/205 , C23C16/455
CPC分类号： F17D3/00 , C23C16/4482 , C23C16/45561 , G05D11/135 , Y10T137/8158
摘要： PROBLEM TO BE SOLVED: To provide a raw material vaporization supply device including a raw material concentration detection mechanism which allows for stable supply to a process chamber under high accuracy flow control, while adjusting the raw material concentration in a mixed gas accurately.SOLUTION: In the raw material vaporization supply device which supplies a carrier gas Gthrough a master flow controller 3 into a source tank 5, and supplies the saturation steam G of a raw material 4, generated while holding at a constant temperature in a thermostatic section, to a process chamber, an automatic pressure regulating device 8 is provided in the outflow path of a mixed gas Gfrom the source tank, and a mass flow meter 9 is provided on te downstream side thereof. Internal pressure Po of the source tank 5 is controlled to a predetermined value by performing open/close control of the control valve 8a of the automatic pressure regulating device 8. The detection values of flow rate Qof carrier gas G, and the source tank inner pressure Po by the master flow controller 3, and the flow rate Qof a mixed gas Gs of the mass flow meter 9 are input to a raw material concentration operation unit where the flow rate Qof the raw material 4 and the raw material concentration K are operated and displayed.
摘要翻译：解决的问题：提供一种原料蒸发供给装置，其包括原料浓度检测机构，其能够在精确地调整混合气体中的原料浓度的同时，在高精度流量控制下稳定地供给处理室。解决方案：在通过主流量控制器3将载气G K 供给源罐5的原料蒸发供给装置中，在恒温区域保持恒定温度下产生的原料4到处理室，在混合气体G S“的流出路径中设置有自动调压装置8， SB>，并且在其下游侧设置质量流量计9。通过执行自动压力调节装置8的控制阀8a的打开/关闭控制，将源箱5的内部压力Po控制到预定值。流量Q 1的检测值 / SB>载气G K ，由主流量控制器3输出源罐内压Po，流量Q S < 质量流量计9的混合气体Gs / SB>输入原料浓度运转单元，原料浓度运转单元中原料4的流量Q 2 浓度K被操作和显示。版权所有（C）2013，JPO＆INPIT

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