专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

51. 发明授权

US07884935B2 Pattern transfer apparatus, imprint apparatus, and pattern transfer method 有权
标题翻译：图案转印装置，压印装置和图案转印方法
公开(公告)号：US07884935B2
公开(公告)日：2011-02-08
申请号：US11736696
申请日：2007-04-18
申请人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
发明人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
IPC分类号： G01B11/00 , G01B15/00 , G01N21/86 , G01V8/00 , B41F1/34 , B41F21/12 , B41F21/14 , B41L1/02 , B29C45/76 , B29C35/08 , B29C35/12 , B29C47/92 , B29C47/96 , B29B13/00 , B29B15/00 , B28B17/00
CPC分类号： G03F7/0002 , B41M3/00 , B41M2205/26 , B82Y10/00 , B82Y40/00 , G03F9/00 , G03F9/7015 , G03F9/7042 , G03F9/7088
摘要： A pattern transfer apparatus transfers an imprint pattern formed on a mold, provided with an alignment mark, to a resin material on a substrate, provided with an alignment mark. A first image pickup device obtains an image of an object positioned at a first object position. A second image pickup device obtains an image of an object positioned at a second object position. The second object position is more distant from the alignment mark of the mold than the first object position. An optical system forms an image of an object positioned at the first object position and an image of an object positioned at the second object position. Alignment is performed based on first and second information obtained about positions of images of an alignment mark of a reference substrate and an alignment mark of the substrate, to transfer the imprinting pattern to the resin material.
摘要翻译：图案转印装置将形成在具有对准标记的模具上的印模图案转印到具有对准标记的基板上的树脂材料上。第一图像拾取装置获取位于第一对象位置的对象的图像。第二图像拾取装置获取位于第二对象位置的对象的图像。第二物体位置比第一物体位置更远离模具的对准标记。光学系统形成位于第一物体位置的物体的图像和位于第二物体位置的物体的图像。基于获得的关于参考基板的对准标记的图像的位置和基板的对准标记获得的第一和第二信息进行对准，以将印刷图案转印到树脂材料上。

52. 发明申请

US20080073604A1 IMPRINT APPARATUS AND IMPRINT METHOD 有权
标题翻译： IMPRINT设备和印刷方法
公开(公告)号：US20080073604A1
公开(公告)日：2008-03-27
申请号：US11851006
申请日：2007-09-06
申请人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
发明人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
IPC分类号： G06K9/00
CPC分类号： G03F9/7088 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7003 , G03F9/7042 , G06K9/325
摘要： An imprint apparatus, comprising a first holder for holding a mold having an imprint pattern; a second holder for holding a workpiece to which the imprint pattern is transferred; a first illumination system for irradiating a mark for determining a position of the mold and a mark for determining a position of the workpiece with light; a first and second optical systems for imaging the marks for the mold and workpiece at a first and second observation points respectively; an imaging optical system; a first and second image pick-up devices for observing the marks for the mold and workpiece respectively; and at least one of a first drive mechanism for moving the first image pick-up device while following movement of the first observation point and a second drive mechanism for moving the second image pick-up device while following movement of the second observation point.
摘要翻译：一种压印装置，包括用于保持具有印记图案的模具的第一保持器; 用于保持印刷图案被转印到的工件的第二保持器; 用于照射用于确定模具的位置的标记的第一照明系统和用于用光确定工件的位置的标记; 第一和第二光学系统，用于分别在第一和第二观察点成像用于模具和工件的标记; 成像光学系统; 分别用于观察模具和工件的标记的第一和第二图像拾取装置; 以及用于在跟随第一观察点的移动的同时移动第一图像拾取装置的第一驱动机构和用于在第二观察点的移动之前移动第二图像拾取装置的第二驱动机构中的至少一个。

53. 发明申请

US20070242272A1 PATTERN TRANSFER APPARATUS, IMPRINT APPARATUS, AND PATTERN TRANSFER METHOD 有权
标题翻译：图案转印装置，印刷装置和图案转印方法
公开(公告)号：US20070242272A1
公开(公告)日：2007-10-18
申请号：US11736696
申请日：2007-04-18
申请人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
发明人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
IPC分类号： G01B11/00
CPC分类号： G03F7/0002 , B41M3/00 , B41M2205/26 , B82Y10/00 , B82Y40/00 , G03F9/00 , G03F9/7015 , G03F9/7042 , G03F9/7088
摘要： A pattern transfer method for transferring an imprinting pattern formed on a mold provided with an alignment mark onto a substrate provided with an alignment mark or a resin material interposed between the substrate and the mold includes a first step for obtaining a first image by disposing the alignment mark provided to the mold and an alignment mark provided to a reference substrate at a first object position and observing the alignment marks through a first image pickup portion, a second step for obtaining a second image by disposing the alignment mark provided to the reference substrate at a second object position spaced apart from the first object position and observing the alignment mark through a second image pickup portion, and a third step for obtaining information about a difference in image position between the alignment marks by using the first and second images.
摘要翻译：用于将形成在具有对准标记的模具上形成的压印图案转印到设置有在基板和模具之间的对准标记或树脂材料的基板上的图案转印方法包括：第一步骤，通过设置对准来获得第一图像提供给模具的标记和在第一物体位置处提供给参考基板的对准标记，并且通过第一图像拾取部分观察对准标记;第二步骤，通过将设置在参考基板上的对准标记设置在第二图像与第一对象位置间隔开的第二对象位置，并通过第二图像拾取部分观察对准标记;以及第三步骤，通过使用第一和第二图像来获得关于对准标记之间的图像位置差异的信息。

54. 发明授权

US07531821B2 Imprint apparatus and imprint method including dual movable image pick-up device 有权
标题翻译：印刷装置和压印方法，包括双移动图像拾取装置
公开(公告)号：US07531821B2
公开(公告)日：2009-05-12
申请号：US11851006
申请日：2007-09-06
申请人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
发明人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
IPC分类号： G01N21/86
CPC分类号： G03F9/7088 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7003 , G03F9/7042 , G06K9/325
摘要： An imprint apparatus, comprising a first holder for holding a mold having an imprint pattern; a second holder for holding a workpiece to which the imprint pattern is transferred; a first illumination system for irradiating a mark for determining a position of the mold and a mark for determining a position of the workpiece with light; a first and second optical systems for imaging the marks for the mold and workpiece at a first and second observation points respectively; an imaging optical system; a first and second image pick-up devices for observing the marks for the mold and workpiece respectively; and at least one of a first drive mechanism for moving the first image pick-up device while following movement of the first observation point and a second drive mechanism for moving the second image pick-up device while following movement of the second observation point.
摘要翻译：一种压印装置，包括用于保持具有印记图案的模具的第一保持器; 用于保持印刷图案被转印到的工件的第二保持器; 用于照射用于确定模具的位置的标记的第一照明系统和用于用光确定工件的位置的标记; 第一和第二光学系统，用于分别在第一和第二观察点成像用于模具和工件的标记; 成像光学系统; 分别用于观察模具和工件的标记的第一和第二图像拾取装置; 以及用于在跟随第一观察点的移动的同时移动第一图像拾取装置的第一驱动机构和用于在第二观察点的移动之前移动第二图像拾取装置的第二驱动机构中的至少一个。

55. 发明申请

US20090283938A1 IMPRINT APPARATUS, IMPRINT METHOD, AND MOLD FOR IMPRINT 有权
标题翻译：印刷装置，印刷方法和模具用于印刷
公开(公告)号：US20090283938A1
公开(公告)日：2009-11-19
申请号：US12509996
申请日：2009-07-27
申请人： Nobuhito Suehira , Junichi Seki , Hideki Ina
发明人： Nobuhito Suehira , Junichi Seki , Hideki Ina
IPC分类号： B29C59/16 , B29C35/08
CPC分类号： G03F7/0002 , B29C35/08 , B29C59/16 , B82Y10/00 , B82Y40/00 , G01B11/14 , G03F9/703 , G03F9/7042 , G03F9/7065
摘要： An imprint apparatus for imprinting a mold pattern onto a substrate or a member on the substrate includes a light source for irradiating a surface of the mold disposed opposite to the substrate and a surface of the substrate with light; an optical system for guiding the light from the light source to the surface of the mold and the surface of the substrate and guiding reflected lights from these surfaces to a spectroscope; a spectroscope for dispersing the reflected lights guided by the optical system into a spectrum; and an analyzer for analyzing a distance between the surface of the mold and the surface of the substrate. The analyzer calculates the distance between the surface of the mold and the surface of the substrate by measuring a distance between the surface of the mold and a surface formed at a position away from the surface of the mold.
摘要翻译：用于将模具图案压印到基板或基板上的部件上的压印装置包括用于照射与基板相对设置的模具表面和基板的表面的光源; 用于将来自光源的光引导到模具的表面和基板的表面并将来自这些表面的反射光引导到分光器的光学系统; 用于将由光学系统引导的反射光分散到光谱中的分光镜; 以及分析器，用于分析模具表面与基板表面之间的距离。分析器通过测量模具表面与形成在远离模具表面的位置的表面之间的距离来计算模具表面与基材表面之间的距离。

56. 发明申请

US20090108483A1 ALIGNMENT METHOD, IMPRINT METHOD, ALIGNMENT APPARATUS, AND POSITION MEASUREMENT METHOD 有权
标题翻译：对准方法，印刷方法，对准装置和位置测量方法
公开(公告)号：US20090108483A1
公开(公告)日：2009-04-30
申请号：US11719878
申请日：2007-04-18
申请人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
发明人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/00 , G03F9/703 , G03F9/7049 , G03F9/7088
摘要： In an alignment method for effecting alignment between two plate-like objects, a first plate-like object provided with a first alignment mark and a second plate-like object provide with a second alignment mark are disposed opposite to each other. A first area and a second area are provided at mutually nonoverlapping positions in an image pickup area for being observed through an image pickup device. Images of the first and second alignment marks are picked up by the image pickup device from a direction substantially perpendicular to an in-plane direction of the first and second plate-like objects. Alignment control is effected by using first information about a deviation of the first alignment mark from a predetermined position in the first area and second information about a deviation of the second alignment mark from a predetermined position in the second area.
摘要翻译：在用于实现两个板状物体之间的对准的对准方法中，设置有第一对准标记的第一板状物体和提供有彼此相对设置的第二对准标记的第二板状物体。第一区域和第二区域设置在图像拾取区域中的相互非重叠位置，以便通过图像拾取装置观察。第一和第二对准标记的图像由图像拾取装置从基本上垂直于第一和第二板状物体的面内方向的方向拾取。通过使用关于第一对准标记与第一区域中的预定位置的偏差的第一信息和关于第二对准标记与第二区域中的预定位置的偏差的第二信息来实现对准控制。

57. 发明申请

US20080099941A1 Imprint Apparatus, Imprint Method, And Mold for Imprint 有权
标题翻译：压印装置，压印方法和压印模具
公开(公告)号：US20080099941A1
公开(公告)日：2008-05-01
申请号：US11719434
申请日：2006-10-18
申请人： Nobuhito Suehira , Junichi Seki , Hideki Ina
发明人： Nobuhito Suehira , Junichi Seki , Hideki Ina
IPC分类号： G01B11/14 , G03F7/00
CPC分类号： G03F7/0002 , B29C35/08 , B29C59/16 , B82Y10/00 , B82Y40/00 , G01B11/14 , G03F9/703 , G03F9/7042 , G03F9/7065
摘要： An imprint apparatus for imprinting a pattern provided to a mold onto a substrate or a member on the substrate includes a light source for irradiating a surface of the mold disposed opposite to the substrate and a surface of the substrate with light; an optical system for guiding the light from the light source to the surface of the mold and the surface of the substrate and guiding reflected lights from these surfaces to a spectroscope; a spectroscope for dispersing the reflected lights guided by the optical system into a spectrum; and an analyzer for analyzing a distance between the surface of the mold and the surface of the substrate. The analyzer calculates the distance between the surface of the mold and the surface of the substrate by measuring a distance between the surface of the mold and a surface formed at a position away from the surface of the mold.
摘要翻译：用于将提供给模具的图案压印到基板或基板上的部件上的印模装置包括用于照射与基板相对设置的模具的表面的光源和具有光的基板的表面; 用于将来自光源的光引导到模具的表面和基板的表面并将来自这些表面的反射光引导到分光器的光学系统; 用于将由光学系统引导的反射光分散到光谱中的分光镜; 以及分析器，用于分析模具表面与基板表面之间的距离。分析器通过测量模具表面与形成在远离模具表面的位置的表面之间的距离来计算模具表面与基材表面之间的距离。

58. 发明授权

US08047828B2 Imprint apparatus, imprint method, and mold for imprint 有权
标题翻译：压印设备，压印方法和压印模具
公开(公告)号：US08047828B2
公开(公告)日：2011-11-01
申请号：US11719434
申请日：2006-10-18
申请人： Nobuhito Suehira , Junichi Seki , Hideki Ina
发明人： Nobuhito Suehira , Junichi Seki , Hideki Ina
IPC分类号： G01B11/14 , G03F7/00
CPC分类号： G03F7/0002 , B29C35/08 , B29C59/16 , B82Y10/00 , B82Y40/00 , G01B11/14 , G03F9/703 , G03F9/7042 , G03F9/7065
摘要： An imprint apparatus for imprinting a pattern provided to a mold onto a substrate or a member on the substrate includes a light source for irradiating a surface of the mold disposed opposite to the substrate and a surface of the substrate with light; an optical system for guiding the light from the light source to the surface of the mold and the surface of the substrate and guiding reflected lights from these surfaces to a spectroscope; a spectroscope for dispersing the reflected lights guided by the optical system into a spectrum; and an analyzer for analyzing a distance between the surface of the mold and the surface of the substrate. The analyzer calculates the distance between the surface of the mold and the surface of the substrate by measuring a distance between the surface of the mold and a surface formed at a position away from the surface of the mold.
摘要翻译：用于将提供给模具的图案压印到基板或基板上的部件上的印模装置包括用于照射与基板相对设置的模具的表面的光源和具有光的基板的表面; 用于将来自光源的光引导到模具的表面和基板的表面并将来自这些表面的反射光引导到分光器的光学系统; 用于将由光学系统引导的反射光分散到光谱中的分光镜; 以及分析器，用于分析模具表面与基板表面之间的距离。分析器通过测量模具表面与形成在远离模具表面的位置的表面之间的距离来计算模具表面与基材表面之间的距离。

59. 发明授权

US08845318B2 Imprint apparatus, imprint method, and mold for imprint 有权
标题翻译：压印设备，压印方法和压印模具
公开(公告)号：US08845318B2
公开(公告)日：2014-09-30
申请号：US12509996
申请日：2009-07-27
申请人： Nobuhito Suehira , Junichi Seki , Hideki Ina
发明人： Nobuhito Suehira , Junichi Seki , Hideki Ina
IPC分类号： B29C59/16 , G03F7/00 , B82Y10/00 , B82Y40/00 , G01B11/14 , G03F9/00 , B29C35/08
CPC分类号： G03F7/0002 , B29C35/08 , B29C59/16 , B82Y10/00 , B82Y40/00 , G01B11/14 , G03F9/703 , G03F9/7042 , G03F9/7065
摘要： An imprint apparatus for imprinting a mold pattern onto a substrate or a member on the substrate includes a light source for irradiating a surface of the mold disposed opposite to the substrate and a surface of the substrate with light; an optical system for guiding the light from the light source to the surface of the mold and the surface of the substrate and guiding reflected lights from these surfaces to a spectroscope; a spectroscope for dispersing the reflected lights guided by the optical system into a spectrum; and an analyzer for analyzing a distance between the surface of the mold and the surface of the substrate. The analyzer calculates the distance between the surface of the mold and the surface of the substrate by measuring a distance between the surface of the mold and a surface formed at a position away from the surface of the mold.
摘要翻译：用于将模具图案压印到基板或基板上的部件上的压印装置包括用于照射与基板相对设置的模具表面和基板的表面的光源; 用于将来自光源的光引导到模具的表面和基板的表面并将来自这些表面的反射光引导到分光器的光学系统; 用于将由光学系统引导的反射光分散到光谱中的分光镜; 以及分析器，用于分析模具表面与基板表面之间的距离。分析器通过测量模具表面与形成在远离模具表面的位置的表面之间的距离来计算模具表面与基材表面之间的距离。

60. 发明申请

US20090101037A1 GAP MEASURING METHOD, IMPRINT METHOD, AND IMPRINT APPARATUS 审中-公开
标题翻译： GAP测量方法，印刷方法和印刷装置
公开(公告)号：US20090101037A1
公开(公告)日：2009-04-23
申请号：US11997491
申请日：2007-05-30
申请人： Nobuhito Suehira , Junichi Seki , Yukio Furukawa , Hideki Ina
发明人： Nobuhito Suehira , Junichi Seki , Yukio Furukawa , Hideki Ina
IPC分类号： B41F1/54 , G01B11/14
CPC分类号： B82Y10/00 , B82Y40/00 , G01B11/14 , G03F7/0002 , G03F9/00 , G03F9/703 , G03F9/7092
摘要： A gap measuring method for measuring a gap between two members by irradiating the two members with light is constituted by preparing a first member and a second member which are disposed opposite to each other; irradiating the first member and the second member with light from one member side to obtain spectral data about intensity of reflected light or transmitted light from the other member side; and determining a gap between the first member and the second member by comparing the obtained spectral data with a database in which a gap length and an intensity spectrum are correlated with each other.
摘要翻译：通过制备彼此相对布置的第一构件和第二构件来构成用于通过用光照射两个构件来测量两个构件之间的间隙的间隙测量方法; 用来自一个部件侧的光照射第一部件和第二部件，得到关于来自另一个部件侧的反射光强度或透射光的光谱数据; 以及通过将所获得的光谱数据与其中间隙长度和强度谱彼此相关的数据库进行比较来确定第一部件和第二部件之间的间隙。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式