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51. 发明授权

US07115024B2 Profile control platen 有权
标题翻译：型材控制台板
公开(公告)号：US07115024B2
公开(公告)日：2006-10-03
申请号：US11029287
申请日：2005-01-05
申请人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Thomas H. Osterheld , Sen-Hou Ko , Mohsen Salek
发明人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Thomas H. Osterheld , Sen-Hou Ko , Mohsen Salek
IPC分类号： B24B7/22
CPC分类号： B24B37/16
摘要： A platen for chemical mechanical polishing of a substrate includes a surface upon which a polishing pad can be placed, a support structure, and a controller. The surface has a first region and a second region and is operable to exert force against the polishing pad during polishing. The support structure is located beneath the second region and is operable to cause the second region to exert more force than the first region. The controller is operable to adjust the amount of force that is exerted by the second region.
摘要翻译：用于基板的化学机械抛光的压板包括可以放置抛光垫的表面，支撑结构和控制器。表面具有第一区域和第二区域，并且可操作以在抛光期间对抛光垫施加力。支撑结构位于第二区域下方并且可操作以使第二区域施加比第一区域更多的力。控制器可操作以调节由第二区域施加的力的量。

52. 发明授权

US06979250B2 Carrier head with flexible membrane to provide controllable pressure and loading area 失效
标题翻译：承载头带有柔性膜，提供可控的压力和装载面积
公开(公告)号：US06979250B2
公开(公告)日：2005-12-27
申请号：US10806649
申请日：2004-03-22
申请人： Steven M. Zuniga , Hung Chih Chen , Ming Kuie Tseng
发明人： Steven M. Zuniga , Hung Chih Chen , Ming Kuie Tseng
IPC分类号： B24B37/30 , B24B49/16 , B24B1/00
CPC分类号： B24B37/30 , B24B49/16
摘要： A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane that applies a controllable load to a substrate in an area with a controllable inner diameter.
摘要翻译：用于化学机械抛光装置的载体头包括柔性膜，其在可控内径的区域中对基底施加可控制的载荷。

53. 发明授权

US06923714B1 Carrier head with a non-stick membrane 有权
公开(公告)号：US06923714B1
公开(公告)日：2005-08-02
申请号：US10943296
申请日：2004-09-17
申请人： Steven M. Zuniga , Hung Chih Chen
发明人： Steven M. Zuniga , Hung Chih Chen
IPC分类号： B24B1/00 , B24B37/30 , B24B7/22
CPC分类号： B24B7/22 , B24B37/30
摘要： A carrier head for chemical mechanical polishing of a substrate includes a base and a flexible membrane extending beneath the base to define a chamber. The flexible membrane has a core of a first material and an outer layer of a second material having a lower adhesion to the substrate than the first material. An exposed surface of the outer layer provides a mounting surface for the substrate.

54. 发明授权

US06890249B1 Carrier head with edge load retaining ring 有权
标题翻译：承载头带边缘负载保持环
公开(公告)号：US06890249B1
公开(公告)日：2005-05-10
申请号：US10327236
申请日：2002-12-20
申请人： Steven M. Zuniga , Ming-Kuei Tseng
发明人： Steven M. Zuniga , Ming-Kuei Tseng
IPC分类号： B24B37/04 , B24B47/02
CPC分类号： B24B37/32
摘要： A carrier head for chemical mechanical polishing of a substrate having a front surface, a back surface and an edge. The carrier head has a base, an inner retaining ring positioned beneath the base, and an outer retaining ring surrounding the inner retaining ring to retain the inner retaining ring. The inner retaining ring has a main portion with a first surface to apply a load to a perimeter portion of the back surface of the substrate and an annular lower projection protruding downwardly from the main portion with a second surface to circumferentially surround the edge of the substrate to retain the substrate.
摘要翻译：用于具有前表面，后表面和边缘的基底的化学机械抛光的载体头。承载头具有基座，位于基座下方的内部保持环和围绕内部保持环以保持内部保持环的外部保持环。内保持环具有主要部分，其具有第一表面，以将负载施加到基板的后表面的周边部分;以及环形下突出部，其从主体部分向下突出并具有第二表面以周向地围绕基板的边缘以保持基底。

55. 发明授权

US06857945B1 Multi-chamber carrier head with a flexible membrane 有权
公开(公告)号：US06857945B1
公开(公告)日：2005-02-22
申请号：US09712389
申请日：2000-11-13
申请人： Hung Chih Chen , Steven M. Zuniga
发明人： Hung Chih Chen , Steven M. Zuniga
IPC分类号： B24B37/27 , B24B37/04 , B24B41/06 , B24B49/16 , H01L21/304 , B24B29/00
CPC分类号： B24B37/30 , B24B41/061 , B24B49/16
摘要： A carrier head that has a base assembly and a flexible membrane. The flexible membrane has a generally circular main portion with a lower surface that provides a substrate-mounting surface and a plurality of concentric annular portions extending from the main portion and secured to the base assembly. The volume between the base assembly and the flexible membrane forming a plurality of pressurizable chambers.

56. 发明授权

US06848980B2 Vibration damping in a carrier head 有权
标题翻译：载波头中的振动阻尼
公开(公告)号：US06848980B2
公开(公告)日：2005-02-01
申请号：US10124066
申请日：2002-04-16
申请人： Hung Chih Chen , Steven M. Zuniga , Ramakrishna Cheboli
发明人： Hung Chih Chen , Steven M. Zuniga , Ramakrishna Cheboli
IPC分类号： B24B37/04 , H01L21/304 , B24B7/00 , B24B9/00
CPC分类号： B24B37/32 , B24B37/30
摘要： A carrier head has a backing assembly with a substrate support surface, a housing connectable to a drive shaft to rotate with the drive shaft about a rotation axis, and a dampening material in a load path between the backing assembly and the housing. The dampening material reduces transmission of vibrations from the backing assembly to the housing.
摘要翻译：载体头部具有背衬组件，其具有衬底支撑表面，可连接到驱动轴的壳体，其随驱动轴围绕旋转轴线旋转，以及在背衬组件和壳体之间的负载路径中的阻尼材料。阻尼材料减少了从背衬组件到壳体的振动传播。

57. 发明授权

US06358121B1 Carrier head with a flexible membrane and an edge load ring 有权
标题翻译：承载头带有柔性膜和边缘负载环
公开(公告)号：US06358121B1
公开(公告)日：2002-03-19
申请号：US09610582
申请日：2000-07-05
申请人： Steven M. Zuniga
发明人： Steven M. Zuniga
IPC分类号： B24B722
CPC分类号： B24B37/30 , B24B37/32
摘要： A carrier head for chemical mechanical polishing includes a base and a flexible membrane. A lower surface of the flexible membrane provides a substrate receiving surface of a substrate. The lower surface includes a first surface to apply a first pressure to a first portion of the substrate. A second surface surrounding the first surface applies a second pressure on a second portion of the substrate. An edge load ring surrounds the second surface. A lower surface of the edge load ring provides a third surface to apply a third pressure to a third portion of the substrate surrounding the second portion.
摘要翻译：用于化学机械抛光的载体头包括基底和柔性膜。柔性膜的下表面提供了基板的基板接收表面。下表面包括将第一压力施加到基板的第一部分的第一表面。围绕第一表面的第二表面在基底的第二部分上施加第二压力。边缘负载环围绕第二表面。边缘负载环的下表面提供第三表面，以将第三压力施加到围绕第二部分的基板的第三部分。

58. 发明授权

US06244942B1 Carrier head with a flexible membrane and adjustable edge pressure 有权
标题翻译：承载头具有柔性膜和可调边缘压力
公开(公告)号：US06244942B1
公开(公告)日：2001-06-12
申请号：US09349834
申请日：1999-07-08
申请人： Steven M. Zuniga
发明人： Steven M. Zuniga
IPC分类号： B24B722
CPC分类号： B24B37/30 , B24B37/32
摘要： A carrier head for a chemical mechanical polishing apparatus has a base, a flexible membrane extending beneath the base to define a pressurizable chamber, a retaining ring, and a spacer ring. At least one of the retaining ring and the spacer includes a projection or an indentation positioned adjacent a portion of the membrane that extends over the spacer, so that the pressure applied at a perimeter of the first membrane portion differs from the pressure applied in center of the first membrane portion.
摘要翻译：用于化学机械抛光装置的承载头具有底座，在底座下方延伸的柔性膜以限定可加压室，保持环和间隔环。保持环和间隔件中的至少一个包括邻近在隔离件上延伸的膜的一部分定位的突起或凹陷，使得施加在第一膜部分的周边处的压力与施加在第一膜部分的中心处的压力不同第一膜部分。

59. 发明授权

US06210255B1 Carrier head for chemical mechanical polishing a substrate 有权
标题翻译：载体头用于化学机械抛光底物
公开(公告)号：US06210255B1
公开(公告)日：2001-04-03
申请号：US09296935
申请日：1999-04-22
申请人： Steven M. Zuniga , Hung Chih Chen
发明人： Steven M. Zuniga , Hung Chih Chen
IPC分类号： B24B100
CPC分类号： B24B37/30
摘要： A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane with an expandable lip portion to engage a substrate for improved chemical mechanical polishing. The lip portion can form or break a seal with the substrate in response to pressure changes in a chamber in the carrier head.
摘要翻译：用于化学机械抛光装置的载体头包括具有可膨胀唇部的柔性膜，以与基底接合以改善化学机械抛光。响应于载体头中的室中的压力变化，唇部可以与基底形成或破裂密封。

60. 发明申请

US20200276686A1 Retainer for Chemical Mechanical Polishing Carrier Head 审中-公开
公开(公告)号：US20200276686A1
公开(公告)日：2020-09-03
申请号：US16799688
申请日：2020-02-24
申请人： Andrew J. Nagengast , Steven M. Zuniga
发明人： Andrew J. Nagengast , Steven M. Zuniga
IPC分类号： B24B37/32
摘要： A carrier head for chemical mechanical polishing includes a base, an actuator, a substrate mounting surface, and a retainer. The retainer includes an inner section and an outer section connected by a flexure. A bottom of the inner section of the retainer provides an inner portion of a lower surface configured to contact a polishing pad. An inner surface of the inner section extends upwardly from an inner edge of the lower surface to circumferentially surround the substrate mounting surface. The inner section of the retainer is positioned to receive a controllable load from the actuator and is vertically movable relative to the base. A bottom of the outer section of the retainer provides an outer portion of the lower surface. The outer section of the retainer is vertically fixed to the base. The inner section of the retainer is vertically movable relative to the outer section of the retainer.

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