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    • 55. 发明授权
    • Methods to make bimorph MEMS devices
    • 制造双压电晶片MEMS器件的方法
    • US06895645B2
    • 2005-05-24
    • US10375975
    • 2003-02-25
    • Baomin XuWilliam S. Wong
    • Baomin XuWilliam S. Wong
    • H01L41/09H01L41/24H02N2/04H04R17/00H01L41/04
    • B81B3/0024B81B2201/032H01L41/094H01L41/22H01L41/313H01L41/314H01L41/337Y10T29/42Y10T29/49126Y10T29/49128Y10T29/4913Y10T29/49147Y10T29/49155Y10T29/49156
    • A bimorph structure is produced by depositing a first material on a first surface of a first substrate to form a first element structure. A second material is deposited onto a surface of a second substrate to form a second element structure. Electrodes are deposited on a surface of each of the first element structure and the second element structure. The first element structure is bonded to a first transfer substrate, and the second element structure is bonded to a second transfer substrate. The first substrate is removed from the first element structure, and the second substrate is removed from the second element structure. Second side electrodes are deposited on a second surface of each of the first element structures and the second element structure. The first element structure and the second element structure are directly bonded to each other. One of the first transfer substrate and the second transfer substrate is then removed, and the surface of the element structure from which one of the transfer substrates has been removed is bonded to a final target substrate. Thereafter, the other transfer substrate is removed, and electrical connections are made.
    • 通过在第一基板的第一表面上沉积第一材料以形成第一元件结构来生产双压电晶片结构。 将第二材料沉积到第二基板的表面上以形成第二元件结构。 电极沉积在第一元件结构和第二元件结构中的每一个的表面上。 第一元件结构被结合到第一转移衬底,并且第二元件结构被结合到第二转移衬底。 从第一元件结构去除第一衬底,并且从第二元件结构去除第二衬底。 第二侧电极沉积在每个第一元件结构和第二元件结构的第二表面上。 第一元件结构和第二元件结构彼此直接结合。 然后去除第一转印衬底和第二转印衬底之一,并且去除了一个转印衬底的元件结构的表面被结合到最终靶衬底。 此后,移除另一转印基板,并进行电连接。