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    • 52. 发明公开
    • 성능이 향상된 CI(G)S 박막 제조 방법과 이를 이용한 태양전지.
    • 性能改进CI(G)S薄膜太阳能电池使用制造方法和。
    • KR1020140112148A
    • 2014-09-23
    • KR1020130026155
    • 2013-03-12
    • 한국에너지기술연구원
    • 어영주조준식박주형윤경훈안세진곽지혜윤재호조아라신기식안승규유진수박상현
    • H01L31/0749H01L31/042H01L31/18
    • H01L31/0749H01L21/02568H01L21/02664Y02E10/541Y02P70/521
    • Disclosed is a method for manufacturing a CI(G)S thin film as a light absorbing layer of a solar cell. The method includes the steps of: preparing a substrate; manufacturing a CI(G)S-based compound which is a precursor; forming a CI(G)S-based precursor thin film by coating the substrate with the precursor CI(G)S-based compound; drying the CI(G)S-based precursor thin film formed on the substrate; selenizing the dried CI(G)S-based precursor thin film through heat treatment to form a CI(G)S thin film; dipping the formed CI(G)S thin film in a solution containing sodium (Na) to deposit a buffer layer; and heat treating the CI(G)S thin film on which the buffer layer is deposited so that the Na on the buffer layer can be moved to the CI(G)S thin film in a Na+ state, thereby reducing defects of crystal grains of the CI(G)S thin film by the Na+ and using the CI(G)S thin film having improved performance as a light absorbing layer of a solar cell.
    • 公开了一种制造作为太阳能电池的光吸收层的CI(G)S薄膜的方法。 该方法包括以下步骤:制备基底; 制造作为前体的CI(G)S基化合物; 通过用前体CI(G)S基化合物涂覆基底来形成CI(G)S基前体薄膜; 干燥形成在基板上的CI(G)S基前体薄膜; 通过热处理对干燥的CI(G)S基前体薄膜进行硒化,形成CI(G)S薄膜; 将形成的CI(G)S薄膜浸入含有钠(Na)的溶液中以沉积缓冲层; 并对其中沉积有缓冲层的CI(G)S薄膜进行热处理,使得缓冲层上的Na能够以Na +态移动到CI(G)S薄膜,从而减少晶体的晶粒缺陷 通过Na +的CI(G)S薄膜和使用具有改进的性能的CI(G)S薄膜作为太阳能电池的光吸收层。
    • 56. 发明公开
    • 급속 열처리 공정을 사용한 CIGS 박막의 제조방법
    • 使用快速热处理的CIGS薄膜的制备方法
    • KR1020140026678A
    • 2014-03-06
    • KR1020120091874
    • 2012-08-22
    • 한국에너지기술연구원
    • 안세진윤재호곽지혜윤경훈신기식안승규조아라조준식박상현어영주유진수박주형
    • H01L31/0749H01L31/042H01L31/18
    • Y02E10/50Y02P70/521H01L31/0749H01L31/042H01L31/18
    • The present invention relates to a method for manufacturing a CIGS thin film which does not require an additional Se supply during rapid thermal processing (RTP), by performing the rapid thermal processing after forming a Cu-In-Ga-Se precursor thin film containing a Se component. Specifically, the method for manufacturing a CIGS thin film comprises the steps of forming a Cu-In-Ga-Se precursor thin film containing selenium in a substrate (step a); and performing rapid thermal processing to the precursor thin film formed in step a at a temperature exceeding 400°C and below 600°C and at a pressure of 1 to 760 torr for 1 to 30 minutes (step b). The present invention allows the precursor thin film to contain a sufficient amount of Se in itself in the process of manufacturing the CIGS precursor thin film. Therefore the precursor thin film does not require an additional Se supply during the rapid thermal processing, thereby minimizing loss of Se from controlling the rapid thermal processing conditions and providing a high crystalline CIGS thin film.
    • 本发明涉及一种在快速热处理(RTP)中不需要额外的Se供应的CIGS薄膜的制造方法,其特征在于,在形成含有Cu-In-Ga-Se前体薄膜的Cu-In-Ga-Se前体薄膜之后进行快速热处理 Se组件。 具体地说,制造CIGS薄膜的方法包括以下步骤:在衬底中形成含有硒的Cu-In-Ga-Se前体薄膜(步骤a)。 对步骤a中形成的前体薄膜,在超过400℃,600℃以下,1〜760托的压力下进行1〜30分钟的快速热处理(步骤b)。 本发明允许前体薄膜在制造CIGS前体薄膜的过程中本身含有足够量的Se。 因此,前体薄膜在快速热处理期间不需要额外的Se供应,从而使得Sn的损失最小化以控制快速热处理条件并提供高结晶CIGS薄膜。