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51. 发明公开

KR1020070114037A 포토레지스트용 스트리퍼 조성물 有权
标题翻译：剥离器组合物
公开(公告)号：KR1020070114037A
公开(公告)日：2007-11-29
申请号：KR1020070050844
申请日：2007-05-25
申请人： 주식회사 엘지화학
发明人： 한희 , 박민춘 , 김경준 , 서성우 , 권혁준 , 안경호 , 최병규 , 민성준 , 황지영
IPC分类号： G03F7/42 , H01L21/027 , H01L21/306
CPC分类号： G03F7/425 , H01L21/0272
摘要： A photoresist stripper composition, a method for stripping a photoresist containing aluminum copper or aluminum and copper on a substrate by using the composition, and a method for preparing a liquid crystal display device and a semiconductor device by using the stripping method are provided to remove a photoresist layer without damaging an under conductive layer or an insulating layer even if isopropanol is not used. A photoresist stripper composition comprises at least one corrosion inhibitor selected from the group consisting of compounds represented by the formulae 1, 2 and 3; a water-soluble organic amine compound in an amount of 2-50 times to the amount of the corrosion inhibitor by weight; and a polar solvent, wherein R1 and R2 are identical or different each other and are independently H or OH; R3 is H, a t-butyl group, a carboxyl group, a methyl ester group, an ethyl ester group, or a propyl ester group; r4 is H or a C1-C4 alkyl group; and R5 and R6 are identical or different each other and are independently a C1-C4 hydroxyalkyl group.
摘要翻译：光致抗蚀剂剥离剂组合物，通过使用该组合物在基材上剥离含有铝铜或铝和铜的光致抗蚀剂的方法，以及通过使用剥离法制备液晶显示装置和半导体装置的方法，即使不使用异丙醇也不会损坏下导电层或绝缘层。光致抗蚀剂剥离剂组合物包含至少一种选自由式1,2和3表示的化合物的腐蚀抑制剂; 水溶性有机胺化合物，其量为防腐剂重量的2-50倍; 和极性溶剂，其中R 1和R 2彼此相同或不同，并且独立地为H或OH; R3是H，叔丁基，羧基，甲酯基，乙酯基或丙酯基; R 4是H或C 1 -C 4烷基; 并且R 5和R 6彼此相同或不同，并且独立地为C 1 -C 4羟烷基。

52. 发明公开

KR1020070107242A 구리 몰리브덴 배선용 세정제 无效
标题翻译：铜箔薄膜清洁剂
公开(公告)号：KR1020070107242A
公开(公告)日：2007-11-07
申请号：KR1020060039463
申请日：2006-05-02
申请人： 주식회사 엘지화학
发明人： 서성우 , 박민춘 , 박찬효 , 권혁준 , 안경호 , 한희 , 민성준 , 최병규
IPC分类号： C11D1/40 , C11D3/28 , C11D11/00 , C11D3/00 , H01L21/02
CPC分类号： C11D1/40 , C11D3/0073 , C11D3/28 , C11D11/0047 , C11D11/0088 , H01L21/02041
摘要： A cleaner for copper/molybdenum wiring is provided to prevent corrosion of the wiring and to remove copper oxide particles while not adversely affecting smoothness of the surface of the interconnections, and to allow cleaning of interconnections leaving no residual anti-corrosive agent. A cleaner for copper/molybdenum wiring comprises: (1) 0.1-5 wt% of at least one compound selected from an alkyl amine represented by the following formula 1, amino acid represented by the following formula 2 and organic acid represented by the following formula 3; and (2) the balance amount of deionized water. In formula 1, each of a and b represents an amine group, and n is an integer of 1-10. In formula 2, R is an amino group-containing hydroxy group, (CH2)1~10-COOH or C1-C10 alkyl group. In formula 3, each of c, d and e independently represents H, OH, (CH2)1~10-COOH, C1-C10 alkyl group or halogen atom.
摘要翻译：提供一种用于铜/钼布线的清洁器，以防止布线的腐蚀和去除氧化铜颗粒，同时不会不利地影响互连表面的平滑度，并且允许清洁不留下残留的防腐蚀剂的互连。用于铜/钼布线的清洁剂包括：（1）0.1-5重量％的至少一种选自由下式1表示的烷基胺，下式2表示的氨基酸和由下式表示的有机酸的化合物 3; 和（2）去离子水的余量。在式1中，a和b各自表示胺基，n为1-10的整数。在式2中，R是含氨基的羟基，（CH 2）1〜10-COOH或C 1 -C 10烷基。在式3中，c，d和e各自独立地表示H，OH，（CH 2）1〜10 -COOH，C 1 -C 10烷基或卤素原子。

53. 发明公开

KR1020060117667A 포토레지스트용 스트리퍼 조성물 有权
标题翻译：剥离器组合物
公开(公告)号：KR1020060117667A
公开(公告)日：2006-11-17
申请号：KR1020050040115
申请日：2005-05-13
申请人： 주식회사 엘지화학
发明人： 박찬효 , 하용준 , 박민춘 , 변요한 , 권혁준 , 한희 , 안경호 , 서성우
IPC分类号： G03F7/42
摘要： Photoresist stripper composition containing particular anti-corrosion agent with specific structure is provided to conveniently and clearly remove modified and cured photoresist film caused by photolithography and wet etching process at high or low temperature, and minimize corrosion of insulating film. The photoresist stripper composition consists of: (a) 5 to 50wt.% of water soluble organic amine compound; (b) 20 to 70wt.% of aprotic alkyleneglycol monoalkylether compound with boiling point more than 150deg.C; (c) 0.01 to 70wt.% of polar non-aprotic solvent; and (d) an anti-corrosive agent selected from compounds represented by formula(1). In the formula(1), R1, R2, R3 and R4 are hydrogen, hydroxy group or alkyl group having carbon atoms ranging from 1 to 4, and R5 and R6 are independently hydroxyalkyl group having carbon atoms ranging from 1 to 4.
摘要翻译：提供含有特定结构特定防腐蚀剂的光刻胶剥离剂组合物，以便在高温或低温下通过光刻和湿蚀刻工艺方便且清楚地除去由光刻和湿蚀刻工艺引起的改性和固化的光致抗蚀剂膜，并使绝缘膜的腐蚀最小化。光致抗蚀剂剥离剂组合物由以下组成：（a）5〜50重量％的水溶性有机胺化合物; （b）20〜70重量％的沸点超过150℃的非质子性亚烷基二醇单烷基醚化合物; （c）0.01〜70重量％极性非质子溶剂; 和（d）选自式（1）表示的化合物的抗腐蚀剂。在式（1）中，R 1，R 2，R 3和R 4为氢，羟基或碳原子数为1至4的烷基，R 5和R 6独立地为碳原子数为1至4的羟基烷基。

54. 发明公开

KR1020040098751A 포토레지스트용 스트리퍼 조성물 有权
标题翻译：包含水溶性有机胺化合物的光电子剥离剂组合物，聚丙烯酸甘油单烷基醚化合物，极性溶剂，剥离助剂和腐蚀抑制剂，使用组合物的光电离子的剥离方法和使用该方法制备的LCD装置或半导体引发剂
公开(公告)号：KR1020040098751A
公开(公告)日：2004-11-26
申请号：KR1020030030987
申请日：2003-05-15
申请人： 주식회사 엘지화학
发明人： 하용준 , 서성우 , 박민춘 , 윤선영
IPC分类号： G03F7/42
摘要： PURPOSE: Provided are a photoresist stripper composition which is suitable for both dipping method and single wafer treatment method, can strip the photoresist layer modified by an etching process at a low temperature for a short time and does not damage a conductive layer and an insulating layer comprising copper or copper alloy even without using isopropanol as a neutral cleaning solution, a stripping method of photoresist using the composition and a liquid crystal display device or semiconductor device prepared by the method. CONSTITUTION: The photoresist stripper composition comprises 5-50 wt% of a water-soluble organic amine compound; 20-70 wt% of a protic alkylene glycol monoalkyl ether compound having a boiling point of 150 deg.C or more; 0.01-70 wt% of a polar aprotic solvent; 0.01-5 wt% of at least one kind of stripping accelerator selected from the group consisting of the compounds represented by the formula 1; and 0.01-5 wt% of at least one kind of corrosion inhibitor selected from the group consisting of the compounds represented by the formula 2, wherein R1 is H or a C1-C4 alkyl group; R2 and R3 are independently a C1-C4 hydroxyalkyl group; R4 and R5 are independently H or OH; and R6 is H, a t-butyl group or a carboxyl group. Preferably the water-soluble organic amine compound is at least one selected from the group consisting of a primary aminoalcohol, a secondary aminoalcohol and a tertiary aminoalcohol.
摘要翻译：目的：提供适用于浸渍方法和单晶片处理方法的光致抗蚀剂剥离剂组合物，可以在短时间内在低温下剥离通过蚀刻工艺修饰的光致抗蚀剂层，并且不会损坏导电层和绝缘层包括铜或铜合金，即使不使用异丙醇作为中性清洗溶液，使用该组合物的光致抗蚀剂的剥离方法和通过该方法制备的液晶显示装置或半导体器件。构成：光致抗蚀剂剥离剂组合物包含5-50重量％的水溶性有机胺化合物; 20-70重量％的沸点为150℃以上的质子性亚烷基二醇单烷基醚化合物; 0.01-70重量％极性非质子溶剂; 0.01-5重量％的选自由式1表示的化合物的至少一种剥离促进剂; 和0.01-5重量％的选自由式2表示的化合物的至少一种腐蚀抑制剂，其中R 1是H或C 1 -C 4烷基; R2和R3独立地是C1-C4羟烷基; R4和R5独立地是H或OH; R6为H，叔丁基或羧基。优选地，水溶性有机胺化合物是选自伯氨基醇，仲氨基醇和叔氨基醇中的至少一种。

55. 发明公开

KR1020040098750A 구리 배선용 포토레지스트 스트리퍼 조성물 有权
标题翻译：包含水溶性有机胺化合物的光电子剥离剂组合物，有机溶剂和腐蚀抑制剂，使用组合物的光电离子的剥离方法和使用该方法制备的LCD装置或半导体引发剂
公开(公告)号：KR1020040098750A
公开(公告)日：2004-11-26
申请号：KR1020030030986
申请日：2003-05-15
申请人： 주식회사 엘지화학
发明人： 하용준 , 서성우 , 박민춘 , 윤선영
IPC分类号： G03F7/42
摘要： PURPOSE: Provided are a photoresist stripper composition for copper wire which is suitable for both dipping method and single wafer treatment method, can strip the photoresist layer modified by an etching process at a low temperature for a short time and does not damage a conductive layer and an insulating layer comprising copper or copper alloy, a stripping method of photoresist using the composition and a liquid crystal display device or semiconductor device prepared by the method. CONSTITUTION: The photoresist stripper composition comprises 5-50 parts by weight of a water-soluble organic amine compound; 20-95 parts by weight of an organic solvent having a boiling point of 150 deg.C or more; and 0.01-5 parts by weight of at least one kind of corrosion inhibitor selected from the group consisting of compounds represented by the formula 1 or 2, wherein R1 is H or a C1-C12 alkyl group; R2 is H or a C1-C5 alkyl group; and R3 is H, a hydroxyl group or a thiol group. Preferably the water-soluble organic amine compound is at least one selected from the group consisting of a primary aminoalcohol, a secondary aminoalcohol and a tertiary aminoalcohol.
摘要翻译：目的：提供适用于浸渍方法和单晶片处理方法的铜线用光致抗蚀剂剥离剂组合物，可以在短时间内在低温下剥离通过蚀刻工艺修饰的光致抗蚀剂层，并且不会损坏导电层，包含铜或铜合金的绝缘层，使用该组合物的光致抗蚀剂的剥离方法以及通过该方法制备的液晶显示装置或半导体器件。构成：光致抗蚀剂剥离剂组合物包含5-50重量份的水溶性有机胺化合物; 20〜95重量份沸点为150℃以上的有机溶剂; 和0.01-5重量份选自由式1或2表示的化合物组成的组中的至少一种腐蚀抑制剂，其中R 1是H或C 1 -C 12烷基; R2是H或C1-C5烷基; R3为H，羟基或硫醇基。优选地，水溶性有机胺化合物是选自伯氨基醇，仲氨基醇和叔氨基醇中的至少一种。

56. 发明公开

KR1020140069738A 광추출층 无效
标题翻译：光提取层
公开(公告)号：KR1020140069738A
公开(公告)日：2014-06-10
申请号：KR1020120137401
申请日：2012-11-29
申请人： 주식회사 엘지화학
发明人： 박민춘
IPC分类号： H01L51/52 , H05B33/22
CPC分类号： H01L51/5259 , H01L51/5243 , H01L51/5275 , H01L51/56 , H01L2251/56 , H05B33/22
摘要： The present application relates to a light extraction layer, a manufacturing method thereof, a substrate for an organic electronic device, and the organic electronic device. The light extraction layer according to the embodiment of the present application is formed with a thin thickness by a phase separated structure and obtains a high light extraction effect even though a small amount of inorganic particles are included. Also, the light extraction layer is patterned. For example, a part of the light extraction layer which is not sealed by the substrate and a sealing substrate is removed by a photolithography method when the light extraction layer is applied to the organic light emitting device. Thereby, oxygen and/or moisture inputted through the light extraction layer are prevented.
摘要翻译：本申请涉及光提取层，其制造方法，有机电子器件用基板和有机电子器件。根据本申请的实施例的光提取层通过相分离结构形成薄的厚度，并且即使包括少量的无机颗粒也能获得高的光提取效果。此外，对光提取层进行图案化。例如，当将光提取层施加到有机发光器件时，通过光刻法去除未被基板密封的一部分光提取层和密封基板。由此，防止了通过光提取层输入的氧气和/或水分。

57. 发明公开

KR1020140062629A 유기 발광 소자 및 이의 제조방법 有权
标题翻译：有机发光装置及其制备方法
公开(公告)号：KR1020140062629A
公开(公告)日：2014-05-26
申请号：KR1020120128712
申请日：2012-11-14
申请人： 주식회사 엘지화학
发明人： 이연근 , 안용식 , 김정두 , 박민춘 , 김지희 , 문제민 , 주문규
IPC分类号： H01L51/50 , H05B33/22 , H05B33/10
CPC分类号： H01L51/5262 , G02B5/0226 , H01L51/5004 , H01L51/5268 , H01L2251/55 , H01L2251/558
摘要： The present invention relates to an organic light emitting device and a method for manufacturing the same. More specifically, the organic light emitting device according to the present invention comprises a cathode with a two-layer structure. The present invention can increase a reflectance of the cathode by including a light extraction layer between a substrate and an anode, thereby minimizing a loss of light caused by a refractive index difference between a transparent electrode and the substrate, and increasing light emitting efficiency of the organic light emitting device, particularly an organic light emitting device used for illumination.
摘要翻译：本发明涉及一种有机发光器件及其制造方法。更具体地说，根据本发明的有机发光器件包括具有两层结构的阴极。本发明可以通过在基板和阳极之间包括光提取层来增加阴极的反射率，从而最小化由透明电极和基板之间的折射率差导致的光的损失，并且增加发光效率有机发光装置，特别是用于照明的有机发光装置。

58. 发明授权

KR101380000B1 전도성 구조체, 터치패널 및 이의 제조방법 有权
标题翻译：导电结构，触控面板及其制造方法
公开(公告)号：KR101380000B1
公开(公告)日：2014-04-10
申请号：KR1020120031769
申请日：2012-03-28
申请人： 주식회사 엘지화학
发明人： 황지영 , 박민춘 , 손용구 , 구범모
IPC分类号： G06F3/041 , H01B5/14
CPC分类号： H05K1/0274 , G06F3/041 , G06F2203/04103 , H05K1/09 , H05K3/002 , H05K3/06 , H05K3/10 , H05K3/285 , H05K7/02 , H05K2201/2054 , Y10T29/49155
摘要： 본 발명은 a) 기재, b) 상기 기재의 적어도 일 면에 구비된 전도성 패턴, 및 c) 상기 전도성 패턴의 상부면 및 하부면에 구비되고, 상기 전도성 패턴의 측면의 적어도 일부에 구비되며, 상기 전도성 패턴에 대응되는 영역에 구비된 암색화 패턴을 포함하는 전도성 구조체, 이를 포함하는 터치패널 및 이의 제조방법에 관한 것이다.
摘要翻译：提供一种导电结构，其包括：a）基底，b）设置在基底的至少一侧的导电图案，以及c）设置在导电图案的上表面和下表面上的变暗层，设置在至少一个并且设置在与导电图案区域相对应的区域中，以及包括该导电图案区域的触摸面板及其制造方法。

59. 发明公开

KR1020130115184A 유기전자소자용 기판 有权
标题翻译：有机电子设备用基板
公开(公告)号：KR1020130115184A
公开(公告)日：2013-10-21
申请号：KR1020130107707
申请日：2013-09-09
申请人： 주식회사 엘지화학
发明人： 이연근 , 안용식 , 김정두 , 박민춘 , 김지희
IPC分类号： H01L51/52
CPC分类号： H01L51/5268 , G02B5/0268 , G02B5/0273 , H01L51/5237 , H01L51/524 , H01L51/5253 , H01L51/56 , H05B33/22 , H01L51/0096 , H01L51/5275 , H01L2251/53
摘要： PURPOSE: A substrate for an organic electronic device is provided to improve durability by stably attaching the substrate to a sealing structure. CONSTITUTION: The formation area of an electrode layer (102) is wider than the formation area of a light scattering layer (103). The electrode layer is formed on the surface of a base material layer (101). The light scattering layer is not formed on the surface of the base material layer. The electrode layer is formed outside the light scattering layer. The light scattering layer includes scattering particles.
摘要翻译：目的：提供一种用于有机电子器件的衬底，以通过将衬底稳定地附着到密封结构来提高耐久性。构成：电极层（102）的形成面积比光散射层（103）的形成面积宽。电极层形成在基材层（101）的表面上。光散射层不形成在基材层的表面上。电极层形成在光散射层的外侧。光散射层包括散射粒子。

60. 发明公开

KR1020130111156A 유기전자소자용 기판 无效
标题翻译：有机电子设备用基板
公开(公告)号：KR1020130111156A
公开(公告)日：2013-10-10
申请号：KR1020120084217
申请日：2012-07-31
申请人： 주식회사 엘지화학
发明人： 박민춘 , 손세환
IPC分类号： H01L51/52 , H05B33/22 , H05B33/14
CPC分类号： H01L51/5275 , G02B5/0242 , G02B2207/109 , H01L51/0096 , H01L51/5268 , H01L2251/5369 , H05B33/22 , Y02E10/549 , H01L51/5262 , H01L51/5203
摘要： PURPOSE: A substrate for an organic electronic device is provided to improve performance by controlling the growth of a dark spot. CONSTITUTION: High refraction particles are formed on a base material layer (101). The refractive index of the high refraction particles is 1.5 or more. The refractive index of scattering particles is different from the refractive index of binders in a range of 2.1 to 3.5. The refractive index of the binders is 1.4 or more. The refractive index of a light scattering planar layer (102) is 1.5 to 3.5.
摘要翻译：目的：提供用于有机电子器件的衬底，以通过控制黑斑的生长来改善性能。构成：在基材层（101）上形成高折射粒子。高折射率粒子的折射率为1.5以上。散射颗粒的折射率不同于粘合剂的折射率在2.1至3.5的范围内。粘合剂的折射率为1.4以上。光散射平面层（102）的折射率为1.5〜3.5。

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