专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

51. 发明专利

JP2012129365A Exposure device and exposure method using exposure device 审中-公开
标题翻译：曝光装置和使用曝光装置的曝光方法
公开(公告)号：JP2012129365A
公开(公告)日：2012-07-05
申请号：JP2010279627
申请日：2010-12-15
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： KAJIYAMA KOICHI , ARAI TOSHINARI , HASHIMOTO KAZUSHIGE
IPC分类号： H01L21/027 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide an exposure device in which a mask is not required to be replaced according to the number of pixels, the number of picture elements and/or the size of a region for forming an exposure pattern when exposing a plurality of exposed members having different number of pixels, different number of picture elements and/or different size of a region for forming an exposure pattern.SOLUTION: The exposure device 1 is provided with an exposure light source 11, a condenser lens 14, and a mask 12, and the exposure light emitted from the exposure light source 11 is made to transmit the condenser lens 14 and the mask 12. On the optical path of the exposure light between the mask 12 and an exposed member 2, a zoom lens 16 capable of adjusting the size of a region in the exposed member 2 irradiated with the exposure light is provided. The exposure device 1 is provided with a fly-eye lens 13 and a polarization conversion element 15, as required.
摘要翻译：要解决的问题：提供一种曝光装置，其中不需要根据像素的数量，像素的数量和/或用于在曝光时形成曝光图案的区域的尺寸来替换掩模具有不同数量的像素，不同数量的图像元素和/或用于形成曝光图案的区域的不同尺寸的多个曝光构件。
解决方案：曝光装置1设置有曝光光源11，聚光透镜14和掩模12，并且使从曝光光源11发射的曝光光透过聚光透镜14和掩模在掩模12和暴露部件2之间的曝光光的光路上，设置能够调节曝光部件2中照射曝光光线的区域的大小的变焦透镜16。根据需要，曝光装置1设置有飞眼透镜13和偏振转换元件15。版权所有（C）2012，JPO＆INPIT

52. 发明专利

JP2012128187A Exposure device and exposure mask 审中-公开
标题翻译：曝光装置和曝光面罩
公开(公告)号：JP2012128187A
公开(公告)日：2012-07-05
申请号：JP2010279645
申请日：2010-12-15
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： KAJIYAMA KOICHI , ARAI TOSHINARI , HASHIMOTO KAZUSHIGE
IPC分类号： G03F7/20 , G02B5/30 , G03F1/70
摘要： PROBLEM TO BE SOLVED: To provide an exposure device and exposure mask able to perform simultaneous exposure using exposure light of linear P-polarization and linear S-polarization.SOLUTION: An exposure device 1 is provided with a light source 11, a condenser lens 14, and a mask 12. Exposure light emitted from the exposure light source 11 is transmitted through the condenser lens 14 and mask 12. The exposure device 1 is provided with a fly eye lens 13. The mask 12 is provided with a plurality of first polarization conversion elements 122a for transmitting only linear polarization, which is P-polarization, and a plurality of second polarization conversion elements 122b for transmitting only linear polarization, which is S-polarization. The first polarization conversion elements 122a and second polarization conversion elements 122b are alternately arranged in the light transmission area. The first and second polarization conversion elements 122a and 122b are, for example, long members, and are alternately arranged in a width direction extending in one direction.
摘要翻译：要解决的问题：提供能够使用线性P偏振和线性S偏振的曝光的同时曝光的曝光装置和曝光掩模。解决方案：曝光装置1设置有光源11，聚光透镜14和掩模12.从曝光光源11发射的曝光被透射通过聚光透镜14和掩模12.曝光装置 1具有飞眼透镜13.掩模12设置有多个第一偏振转换元件122a，用于仅传输P极化的线性偏振，以及多个用于仅透射线偏振的第二偏振转换元件122b ，这是S极化。第一偏振转换元件122a和第二偏振转换元件122b交替地布置在光透射区域中。第一和第二偏振转换元件122a和122b例如是长构件，并且沿沿一个方向延伸的宽度方向交替布置。版权所有（C）2012，JPO＆INPIT

53. 发明专利

JP2011232398A Alignment processing method and alignment processing apparatus 有权
标题翻译：对准处理方法和对齐处理装置
公开(公告)号：JP2011232398A
公开(公告)日：2011-11-17
申请号：JP2010100053
申请日：2010-04-23
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： KAJIYAMA KOICHI , ARAI TOSHINARI , MIZUMURA MICHINOBU
IPC分类号： G02F1/1337
CPC分类号： G03F9/7084 , G02F1/13 , G02F1/1337 , G02F1/133788 , G03F7/7035 , G03F7/70566
摘要： PROBLEM TO BE SOLVED: To reduce a tact time of an alignment treatment process by forming two stripe alignment regions, of which alignment states are different from each other, in one alignment process.SOLUTION: A substrate 4 on which an alignment layer is applied is faced close to a photomask 7 including a first mask pattern group 6A, on which a plurality of slender openings are formed at a given alignment pitch, and a second mask pattern group 6B, which is arranged in parallel to the first mask pattern group 6A and on which a plurality of slender openings are formed at the same pitch as the plurality of openings in the first mask pattern group 6A. The substrate 4 is then moved in a direction where the first and second mask pattern groups 6A and 6B intersect. P-polarized light is irradiated on the first and second mask pattern groups 6A and 6B of the photomask 7 respectively with different incident angles θ, thereby forming first and second alignment regions, which have different alignment states from each other, alternately on the alignment layer.
摘要翻译：要解决的问题：通过在一个对准过程中形成对准状态彼此不同的两个条状取向区域来减少对准处理过程的节拍时间。解决方案：其上施加有取向层的基板4面对靠近包括第一掩模图案组6A的光掩模7，在其上以给定的对准间距形成有多个细长的开口，第二掩模图案组6B平行于第一掩模图案组6A布置并且以与第一掩模图案组6A中的多个开口相同的间距形成有多个细长的开口。然后基板4沿第一和第二掩模图案组6A和6B相交的方向移动。 P偏振光分别以不同的入射角θ照射在光掩模7的第一和第二掩模图案组6A和6B上，从而在取向层上交替地形成彼此不同的取向状态的第一和第二取向区域。版权所有（C）2012，JPO＆INPIT

54. 发明专利

JP2009104029A Exposing device 有权
标题翻译：曝光装置
公开(公告)号：JP2009104029A
公开(公告)日：2009-05-14
申请号：JP2007277371
申请日：2007-10-25
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： KAJIYAMA KOICHI , ARAI TOSHINARI
IPC分类号： G03F7/20 , G02F1/13 , G02F1/1335 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a proximity exposing device having a work stage, wherein deterioration in the bond and drop of particles on a porous plate by exposure light is reduced, for holding and conveying a workpiece with no contact.
SOLUTION: The exposing device is provided with a conveying means 3 holding one end part of a flat exposed body W to convey it in a predetermined direction at a constant speed, the work stage 4 disposed along the exposed body W conveying course of the conveying means 3 and provided with a flat upper face, a part of which is formed of an electroplated porous plate to supply and discharge gas between the exposed body W conveyed by the conveying means 3 and the upper face through vents of the porous plate, and an exposure optical system 2 arranged above the work stage 4 to form an exposure pattern by emitting exposure light to the exposed body W conveyed above the work stage 4 via a photomask 23 having the exposure pattern.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了提供具有工作台的接近曝光装置，其中减少了通过曝光光使多孔板上的颗粒的粘结和下降的劣化，用于保持和传送工件而不接触。解决方案：曝光装置设置有传送装置3，其保持平坦的暴露体W的一个端部以以恒定速度沿预定方向传送，工作台4沿着暴露的主体W设置在传送过程中输送装置3，其具有平坦的上表面，其一部分由电镀多孔板形成，以在通过输送装置3输送的暴露体W与多孔板的通气口的上表面之间供给和排出气体，以及布置在工作台4上方的曝光光学系统2，以通过经由具有曝光图案的光掩模23向在工作台4上方传送的暴露体W发射曝光来形成曝光图案。版权所有（C）2009，JPO＆INPIT

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式